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81. 发明申请

US20040154537A1 Diffusion furnace used for manufacturing integrated circuits and method for cooling the diffusion furnace 审中-公开
标题翻译：用于制造集成电路的扩散炉和冷却扩散炉的方法
公开(公告)号：US20040154537A1
公开(公告)日：2004-08-12
申请号：US10771747
申请日：2004-02-03
发明人： Choung-Ku Chon , Dong-Hyun Choi
IPC分类号： C23C016/00 , H01L021/44 , H01L021/04 , H01L021/22
CPC分类号： H01L21/67109 , C30B25/08 , C30B31/10
摘要： A diffusion furnace includes a support member, a process chamber, a sealing member for sealing from the process chamber the outside, and a cooling system for cooling the sealing member. The process chamber is installed on the support member, and the sealing member is inserted between the support member and the chamber. The cooling system has a first fluid passage and a second fluid passage. The first and second fluid passages are formed in the support member. A first fluid flows in the first fluid passage to cool the sealing member, and a second fluid flows in the second fluid passage to cool the sealing member when the supply of the first fluid is interrupted. With the present invention, cooling water and a coolant can be prevented from being mixed together. Therefore, it is possible to prevent the contamination of an apparatus and the waste of expensive cooling water.
摘要翻译：扩散炉包括支撑构件，处理室，用于从处理室外部密封的密封构件和用于冷却密封构件的冷却系统。处理室安装在支撑构件上，并且密封构件插入在支撑构件和腔室之间。冷却系统具有第一流体通道和第二流体通道。第一和第二流体通道形成在支撑构件中。第一流体在第一流体通道中流动以冷却密封构件，并且当第一流体的供应被中断时，第二流体在第二流体通道中流动以冷却密封构件。利用本发明，可以防止冷却水和冷却剂混合在一起。因此，可以防止装置的污染和昂贵的冷却水的浪费。

82. 发明授权

US06737613B2 Heat treatment apparatus and method for processing substrates 有权
标题翻译：热处理装置及其处理方法
公开(公告)号：US06737613B2
公开(公告)日：2004-05-18
申请号：US10395179
申请日：2003-03-25
申请人： Takatomo Yamaguchi , Kazuhiro Morimitsu , Tatsuhisa Matsunaga
发明人： Takatomo Yamaguchi , Kazuhiro Morimitsu , Tatsuhisa Matsunaga
IPC分类号： F27B514
CPC分类号： H01L21/67303 , C30B31/10 , H01L21/67109
摘要： A heat treatment apparatus includes a vertically disposed process tube defining a reaction chamber therein; a main heater for heating the reaction chamber, the main heater being disposed outside of the process tube; a boat for holding a plurality of wafers, the boat being loaded into and unloaded from the reaction chamber; and a boat rotating device for rotating the boat. The boat rotating device is provided with a rotatable hollow shaft assembly and a fixed shaft coaxially disposed inside the rotatable hollow shaft assembly. A sub-heater is attached to an upper end of the fixed shaft, and the boat and an insulating portion are disposed on the rotatable hollow shaft assembly.
摘要翻译：一种热处理设备，包括在其中限定反应室的垂直设置的处理管; 用于加热反应室的主加热器，主加热器设置在处理管的外部; 用于保持多个晶片的船，所述船被装载到所述反应室中并从所述反应室卸载; 以及用于旋转船的船旋转装置。船用旋转装置设置有可旋转的空心轴组件和同轴地设置在可旋转中空轴组件内部的固定轴。副加热器附接到固定轴的上端，并且船和绝缘部分设置在可旋转的中空轴组件上。

83. 发明申请

US20030183614A1 Heat treatment apparatus and method for processing substrates 有权
标题翻译：热处理装置及其处理方法
公开(公告)号：US20030183614A1
公开(公告)日：2003-10-02
申请号：US10395179
申请日：2003-03-25
申请人： HITACHI KOKUSAI ELECTRIC INC.
发明人： Takatomo Yamaguchi , Kazuhiro Morimitsu , Tatsuhisa Matsunaga
IPC分类号： F27D011/00 , F27B005/14
CPC分类号： H01L21/67303 , C30B31/10 , H01L21/67109
摘要： A heat treatment apparatus includes a vertically disposed process tube defining a reaction chamber therein; a main heater for heating the reaction chamber, the main heater being disposed outside of the process tube; a boat for holding a plurality of wafers, the boat being loaded into and unloaded from the reaction chamber; and a boat rotating device for rotating the boat. The boat rotating device is provided with a rotatable hollow shaft assembly and a fixed shaft coaxially disposed inside the rotatable hollow shaft assembly. A sub-heater is attached to an upper end of the fixed shaft, and the boat and an insulating portion are disposed on the rotatable hollow shaft assembly.
摘要翻译：一种热处理设备，包括在其中限定反应室的垂直设置的处理管; 用于加热反应室的主加热器，主加热器设置在处理管的外部; 用于保持多个晶片的船，所述船被装载到所述反应室中并从所述反应室卸载; 以及用于旋转船的船旋转装置。船用旋转装置设置有可旋转的空心轴组件和同轴地设置在可旋转中空轴组件内部的固定轴。副加热器附接到固定轴的上端，并且船和绝缘部分设置在可旋转的中空轴组件上。

84. 发明授权

US06412821B1 Device for the vacuum-tight connecting of two bodies of different materials 有权
标题翻译：用于真空密封连接两种不同材料的装置
公开(公告)号：US06412821B1
公开(公告)日：2002-07-02
申请号：US09170091
申请日：1998-10-13
申请人： Winfried Schulmann , Helmut Kaiser , Udo Wenske
发明人： Winfried Schulmann , Helmut Kaiser , Udo Wenske
IPC分类号： F16L1700
CPC分类号： C30B25/08 , C30B31/10 , F16L21/04 , F16L27/11 , Y10S285/911
摘要： A device for connecting two bodies, especially a quartz body and a metallic body, which assures with few and simply formed components a high sealing ability at high temperature differences and at very low pressures and makes possible an easy assembly and disassembly. The device for the vacuum-tight connecting of two bodies of different materials, each of which has an essentially tubular end section (20, 30) and in the connected state of which the tubular end section (30) of the first body surrounds at least partially the end section (20) of the second body, includes an intermediate conduit (13) for intermediate suction removal of gases and is formed between the tubular end sections (20, 30) of the bodies with two seals (100, 150) which seal off the intermediate conduit (130).
摘要翻译：一种用于连接两个主体，特别是石英体和金属体的装置，其确保在几个且简单形成的部件中在高温差和非常低的压力下具有高密封能力，并且可以容易地组装和拆卸。用于真空紧密连接两个不同材料的主体的装置，每个主体具有基本上管状的端部部分（20,30），并且处于连接状态，第一主体的管状端部（30）至少包围部分地是第二主体的端部部分（20）包括用于中间抽吸气体的中间管道（13），并且在主体的管状端部部分（20,30）之间形成有两个密封件（100,150），该密封件密封中间导管（130）。

85. 发明授权

US5870526A Inflatable elastomeric element for rapid thermal processing (RTP) system 失效
标题翻译：用于快速热处理（RTP）系统的充气弹性体元件
公开(公告)号：US5870526A
公开(公告)日：1999-02-09
申请号：US895665
申请日：1997-07-17
申请人： Helmut Aschner , Helmut Merkle , Ulrich Walk , Dieter Zernickel
发明人： Helmut Aschner , Helmut Merkle , Ulrich Walk , Dieter Zernickel
IPC分类号： H01L21/26 , C23C16/44 , C30B25/08 , C30B31/10 , C30B35/00 , F27B5/10 , F27D7/06 , H01L21/00 , A21B2/00
CPC分类号： C23C16/4409 , C23C16/4401 , C30B25/08 , C30B31/10 , C30B35/00 , H01L21/67115
摘要： A rapid thermal processing (RTP) chamber is disclosed, wherein a transparent plate and a body are sealed with a gas tight seal, and wherein the gas tight seal is activated by inflating an inflatable element.
摘要翻译：公开了一种快速热处理（RTP）室，其中透明板和主体用气密密封密封，并且其中气密密封通过使可充气元件膨胀来启动。

86. 发明授权

US5709543A Vertical heat treatment apparatus 失效
标题翻译：立式热处理设备
公开(公告)号：US5709543A
公开(公告)日：1998-01-20
申请号：US706530
申请日：1996-09-04
申请人： Tomohisa Shimazu
发明人： Tomohisa Shimazu
IPC分类号： H01L21/22 , C23C16/458 , C30B25/08 , C30B25/10 , C30B25/12 , C30B31/10 , C30B31/12 , C30B31/14 , H01L21/00 , H01L21/205 , H01L21/31 , H01L21/324 , F27D3/12
CPC分类号： H01L21/67098 , C23C16/4583 , C30B25/08 , C30B25/10 , C30B25/12 , C30B31/10 , C30B31/12 , C30B31/14
摘要： The vertical heat treatment apparatus according to the present invention in which a substrate holder holding a plurality of substrates-to-be-processed at a vertical interval is mounted on the top of a cap for opening and closing the bottom opening (furnace throat) of a vertical heat treatment furnace through a heat insulation structure for a heat treatment in the uniform heat region in the furnace, the heat insulation structure comprising support rods for supporting the substrate holder, and a plurality of thin heat insulation plates having insertion holes in which the support rods are loosely inserted in, and supported by the support rods, separated from each other by spacers at a prescribed interval in the direction of height of the support rods, whereby the heat insulation structure can have a simple structure and have decreased heat capacities, and throughput can be improved.
摘要翻译：根据本发明的垂直热处理装置，其中将保持多个待垂直间隔的基板的基板保持器安装在用于打开和关闭底部开口（炉喉）的盖的顶部一个垂直热处理炉，通过隔热结构在炉内均匀加热区域进行热处理，该隔热结构包括用于支撑衬底保持架的支撑杆，以及多个具有插入孔的薄隔热板，支撑杆松散地插入并由支撑杆支撑，在支撑杆的高度方向上以规定的间隔彼此隔开，由此隔热结构可以具有简单的结构并且具有降低的热容量，并且可以提高吞吐量。

87. 发明授权

US5605454A Four port tube to extend the life of quartz tubes used for the well drive process 失效
标题翻译：四口管延长石英管的寿命，用于井驱动过程
公开(公告)号：US5605454A
公开(公告)日：1997-02-25
申请号：US542090
申请日：1995-10-12
申请人： Craig A. Bellows , Curtis M. Herbert, Jr.
发明人： Craig A. Bellows , Curtis M. Herbert, Jr.
IPC分类号： C30B31/10 , C30B31/12 , F27D21/00 , F27D19/00
CPC分类号： F27D21/0014 , C30B31/10 , C30B31/12
摘要： A quartz tube with multiple thermocouple ports arranged along its radius allows for the quartz tube to be rotated while the thermocouple is always placed in the bottom position of the quartz tube. This avoids a problem of the sagging of the quartz tube. When quartz tubes are not rotated, the quartz tubes tend to start sagging from their top. By rotating the quartz tube different portions of the quartz tube are at the top at different times. By using multiple thermocouple ports arranged around the radius of the quartz tube, the thermocouple can be positioned at the bottom of the quartz tube for different orientations of the quartz tube.
摘要翻译：具有沿其半径布置的多个热电偶端口的石英管允许石英管旋转，同时热电偶总是位于石英管的底部位置。这避免了石英管的下垂问题。当石英管不旋转时，石英管往往从顶部开始下垂。通过旋转石英管，石英管的不同部分在不同时间处于顶部。通过使用围绕石英管半径布置的多个热电偶端口，热电偶可以位于石英管的底部，用于石英管的不同取向。

88. 发明授权

US5504346A Insitu detection of tube sagging in semiconductor diffusion furnace using a laser beam that is blocked when tube sags 失效
标题翻译：使用激光束在半导体扩散炉中管道下垂的现场检测，该激光束在管子下垂时被阻塞
公开(公告)号：US5504346A
公开(公告)日：1996-04-02
申请号：US308043
申请日：1994-09-16
申请人： Allen Page , Oscar L. Caton
发明人： Allen Page , Oscar L. Caton
IPC分类号： C30B25/12 , C30B31/10 , H01L21/00 , G01N21/86
CPC分类号： H01L21/67115 , C30B25/12 , C30B31/10
摘要： Semiconductor wafers are processed in a semiconductor diffusion furnace. During processing, the semiconductor wafers are placed in a quartz tube. Also during processing, a laser beam is transmitted below a top surface of the quartz tube. While the quartz tube is not sagging, the laser beam is detected with a detector. When the top surface of the quartz tube sags so that the laser beam is obstructed by the top surface, the laser beam is no longer detected by the detector. At this point the detector will alert an operator of the system that the top surface of the quartz tube is sagging so that the laser beam is obstructed by the top surface. The operator of the semiconductor diffusion furnace then may replace the quartz tube before damage is done to the semiconductor wafers.
摘要翻译：半导体晶片在半导体扩散炉中进行处理。在处理期间，将半导体晶片放置在石英管中。此外，在处理过程中，激光束在石英管的顶表面下方传递。当石英管不下垂时，用检测器检测激光束。当石英管的顶表面下垂时，激光束被顶表面阻挡，激光束不再被检测器检测到。此时，检测器将警告系统的操作者，石英管的顶表面下垂，使得激光束被顶表面阻挡。然后半导体扩散炉的操作者可以在对半导体晶片进行损伤之前替换石英管。

89. 发明授权

US5283089A Non-porous diffusion furnace components 失效
标题翻译：无孔扩散炉组件
公开(公告)号：US5283089A
公开(公告)日：1994-02-01
申请号：US434757
申请日：1989-11-13
申请人： Carl H. Bates
发明人： Carl H. Bates
IPC分类号： C30B31/10 , C30B31/14 , C30B35/00 , F27D5/00 , F16L59/00
CPC分类号： C30B35/002 , C30B31/10 , C30B31/14 , Y10T428/131 , Y10T428/1314 , Y10T428/259 , Y10T428/2993 , Y10T442/2975
摘要： Components for semiconductor diffusion furnaces are constructed of a high purity impervious silicon carbide or silicon nitride matrix deposited onto and within a pre-shaped fibrous matrix of silicon carbide or silicon nitride which contains sufficient nucleation aids to produce a structure having a density greater than about 85% of theoretical density. The impregnation of the matrix material into the fibrous reinforcement prevents undesired gaseous components from contaminating the atmosphere of the furnace, and the fibrous reinforcement provides strength combined with light weight.
摘要翻译：用于半导体扩散炉的部件由沉积在碳化硅或氮化硅的预成形纤维基质上并在其内部的高纯度不渗透碳化硅或氮化硅基体构成，其包含足够的成核助剂以产生密度大于约85的结构理论密度的百分比。将基质材料浸渍到纤维增强物中可防止不需要的气体组分污染炉子的气氛，并且纤维增强材料提供强度与重量的组合。

90. 发明授权

US5178534A Controlled diffusion environment capsule and system 失效
标题翻译：控制扩散环境胶囊和系统
公开(公告)号：US5178534A
公开(公告)日：1993-01-12
申请号：US860560
申请日：1992-03-30
申请人： Christopher J. Bayne , Harold C. Guiver
发明人： Christopher J. Bayne , Harold C. Guiver
IPC分类号： C30B31/10 , C30B31/14 , C30B31/16
CPC分类号： C30B31/10 , C30B31/14 , C30B31/16
摘要： A controlled diffusion environment capsule system (10) is used with a conventional tubular high temperature furnace (12) as employed in semiconductor manufacturing. The system (10) includes a cantilever boat loading apparatus (14) and a quartz diffusion capsule (16). Wafer carriers (20) support semiconductor wafers (22) concentrically with capsule (16) in closely spaced relationship for processing in the furnace (12). The diffusion capsule (16) is supported on a pair of quartz rods (24). A quartz injector tube (28) extends the length of the diffusion capsule (16). The injector tube (28) has three rows of high aspect-ratio apertures (30) extending along its length to disperse nitrogen or other inert gas uniformly across the sufaces (32) of the wafers (22). A quartz extender (34) is connected to the distal end of the diffusion capsule (16), through which reactant gases are supplied to the capsule (16) for diffusion and/or oxidation, from an inlet source (35) of the reactant gases on the furnace tube near the extender (34). The extender (34) has two apertured baffle plates (36) and (38) which have holes (40) and (42) in patterns that are offset relative to one another. A third plate (44) has a larger hole (46) at its center. The hole (46) focuses reactant gases into the capsule and the holes (40) and (42) provide turbulence to the reactant gas stream prior to its entry into the capsule (16) to assure uniform mixing.
摘要翻译：与半导体制造中使用的常规管状高温炉（12）一起使用受控扩散环境胶囊系统（10）。系统（10）包括悬臂舟装载装置（14）和石英扩散胶囊（16）。晶片载体（20）以与密封件（16）同心的方式支撑半导体晶片（22），用于在炉子（12）中进行加工。扩散胶囊（16）被支撑在一对石英棒（24）上。石英注射管（28）延伸扩散胶囊（16）的长度。注射管（28）具有三列沿其长度延伸的高纵横比孔（30），以将氮气或其它惰性气体均匀地分散在晶片（22）的表面（32）上。石英延长器（34）连接到扩散胶囊（16）的远端，反应气体从反应物气体的入口源（35）向反应气体供给到胶囊（16）以进行扩散和/或氧化，在炉管附近的扩展器（34）上。扩展器（34）具有两个有孔的挡板（36）和（38），其具有相对于彼此偏移的图案中的孔（40）和（42）。第三板（44）在其中心具有较大的孔（46）。孔（46）将反应物气体聚集到胶囊中，并且孔（40）和（42）在其进入胶囊（16）之前向反应物气流提供湍流以确保均匀混合。

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