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81. 发明授权

US4752251A Electrical connector 失效
标题翻译：电连接器
公开(公告)号：US4752251A
公开(公告)日：1988-06-21
申请号：US619455
申请日：1984-06-11
申请人： Shinichi Kato , Takuya Yamazaki
发明人： Shinichi Kato , Takuya Yamazaki
IPC分类号： H01R13/42 , H01R13/436 , H01R13/50 , H01R13/502
CPC分类号： H01R13/4367
摘要： An electrical connector comprises a housing formed with bores opening in an end wall thereof and locking arrangement for holding an electrical terminal in each of the bores, and a cover including an end wall and a peripheral wall. The cover is formed with partitions defining grooves extending inwardly from a predetermined portion of the peripheral wall thereof. The cover is formed also with projections at ends of some of the partitions. Cutouts are formed in the remaining portion of the peripheral wall of the cover. The housing has slots for receiving the projections of the cover and projections for engaging in the cutouts of the cover.
摘要翻译：电连接器包括形成有在其端壁中开口的孔的壳体和用于将电端子保持在每个孔中的锁定装置，以及包括端壁和周壁的盖。盖形成有从其周壁的预定部分向内延伸的槽的隔板。盖子还在一些隔板的端部形成有突起。在盖的周壁的剩余部分形成切口。壳体具有用于接收盖的突起和用于接合盖的切口的突起的槽。

82. 发明授权

US4719508A Endoscopic photographing apparatus 失效
标题翻译：内镜摄影装置
公开(公告)号：US4719508A
公开(公告)日：1988-01-12
申请号：US914183
申请日：1986-10-01
申请人： Masahiko Sasaki , Shinichi Kato , Tadashi Kato , Masahide Kanno , Yutaka Takahashi , Katsuyuki Saito
发明人： Masahiko Sasaki , Shinichi Kato , Tadashi Kato , Masahide Kanno , Yutaka Takahashi , Katsuyuki Saito
IPC分类号： H04N5/44 , H04N5/445 , H04N9/04 , A61B1/04 , A61B1/06
CPC分类号： H04N7/012 , H04N9/045 , H04N21/478
摘要： An endoscopic photographing apparatus comprises a first frame memory for successively storing the image signals, generated from a solid-state image sensor with every scanning line, in synchronism with drive signals, and a second frame memory for successively storing the image signals, read successively from the first frame memory, by the interlacing method, and delivering the stored image signals to a monitor, in synchronism with television synchronizing signals, for display.
摘要翻译：一种内窥镜拍摄装置，包括：第一帧存储器，用于与驱动信号同步地连续地存储从具有每条扫描线的固态图像传感器产生的图像信号;以及第二帧存储器，用于连续存储图像信号，第一帧存储器，通过交错方法，并将所存储的图像信号与电视同步信号同步地传送到监视器，以供显示。

83. 发明授权

US4711999A Apparatus for photometrically detecting an optically focused condition of an optical system 失效
标题翻译：用于光学检测光学系统的光学聚焦状态的装置
公开(公告)号：US4711999A
公开(公告)日：1987-12-08
申请号：US5282
申请日：1987-01-14
申请人： Yoshio Shishido , Susumu Takahashi , Kazumasa Matsuo , Atsushi Miyazaki , Shinichi Nishigaki , Shinichi Kato , Takeaki Nakamura , Akibumi Ishikawa
发明人： Yoshio Shishido , Susumu Takahashi , Kazumasa Matsuo , Atsushi Miyazaki , Shinichi Nishigaki , Shinichi Kato , Takeaki Nakamura , Akibumi Ishikawa
IPC分类号： G02B7/32 , G02B23/24 , G01J1/20
CPC分类号： G02B7/32 , G02B23/2407
摘要： An apparatus for detecting a focused condition of an optical system, in which a light-receiving means arranged at a fixed position corresponding to a focus position photometrically detects a focused condition. A light beam having a definite shape is projected onto an object to be imaged by a light projection means. The reflected light beam is conducted along an optical axis of the optical system, deflected, and detected by the light receiving means for determining whether a focused condition exists. Several embodiments are disclosed for projecting a light spot of high contrast of the object and for detecting a focused condition on the basis of the intensity distribution of light received by the light-receiving means. The apparatus may be applied to an endoscope and other optical systems.
摘要翻译：一种用于检测光学系统的聚焦状态的装置，其中配置在与聚焦位置相对应的固定位置的光接收装置光学检测聚焦状态。具有确定形状的光束通过光投影装置投射到要被成像的物体上。反射光束沿着光学系统的光轴传导，被光接收装置偏转并检测，以确定是否存在聚焦状态。公开了用于投射物体的高对比度的光斑并且用于基于由光接收装置接收的光的强度分布来检测聚焦状态的几个实施例。该装置可以应用于内窥镜和其它光学系统。

84. 发明授权

US4627759A Screw type connector set 失效
标题翻译：螺丝式连接器组
公开(公告)号：US4627759A
公开(公告)日：1986-12-09
申请号：US620302
申请日：1984-06-13
申请人： Shinichi Kato , Kiyoto Watanabe , Yoji Saito , Akio Yamagata
发明人： Shinichi Kato , Kiyoto Watanabe , Yoji Saito , Akio Yamagata
IPC分类号： H01R13/629 , F16B31/02 , H01R13/621 , H01R13/627 , H01R13/64 , F16D9/00 , F16P5/00
CPC分类号： H01R13/6215 , H01R13/627 , H01R13/64 , Y10T403/11 , Y10T403/1616 , Y10T403/1683 , Y10T403/68
摘要： A new type connector set is provided. Its male connector member includes a male housing having an engaging portion in the form of a nut. The female connector member includes a female housing with an opening to receive said male housing therethrough, a support member fixed within said female housing and having a chamber to receive the engaging portion of the male housing in it and a bolt rotatably extending within said chamber to be screwed into the nut. Said bolt is prevented from moving in an axial direction thereof and has a constricted portion in it.
摘要翻译：提供了一种新型连接器组。其阳连接器构件包括具有螺母形式的接合部分的阳壳体。阴连接器构件包括阴壳体，其具有用于接收所述阳壳体的开口，固定在所述阴壳体内的支撑构件，并且具有用于容纳阳壳体的接合部分的腔室和在所述腔室内可旋转地延伸的螺栓拧入螺母。所述螺栓被阻止在其轴向方向上移动并且在其中具有收缩部分。

85. 发明授权

US4522134A Pattern generating system of computer sewing machine 失效
标题翻译：电脑缝纫机图案生成系统
公开(公告)号：US4522134A
公开(公告)日：1985-06-11
申请号：US558851
申请日：1983-12-07
申请人： Susumu Hanyu , Hideaki Takenoya , Shinichi Kato
发明人： Susumu Hanyu , Hideaki Takenoya , Shinichi Kato
IPC分类号： D05B3/02 , D05B19/02 , D05B21/00 , D05C5/02
CPC分类号： D05B19/02
摘要： A pattern stitch sewing machine is disclosed in which enlarged patterns are made possible by storing a plurality of divided part patterns in an electronic memory. Further data for stopping the sewing needle at its lower dead point at the end of each part pattern is provided so that the operator may shift the fabric about the needle in preparation for sewing a succeeding part pattern.
摘要翻译：公开了一种图案缝纫机，其中通过将多个分割部分图形存储在电子存储器中而实现扩大图案。提供用于在每个部件图案的末端停止缝纫针在其下死点处的进一步的数据，使得操作者可以使织物围绕针移动以准备缝合后续部件图案。

86. 发明授权

US4466395A Flow control device of a helically-shaped intake port 失效
标题翻译：螺旋形进气口的流量控制装置
公开(公告)号：US4466395A
公开(公告)日：1984-08-21
申请号：US391378
申请日：1982-06-23
申请人： Shinichi Kato , Yoshihiko Dohi , Katsuhiko Motosugi , Ituo Koga
发明人： Shinichi Kato , Yoshihiko Dohi , Katsuhiko Motosugi , Ituo Koga
IPC分类号： F01P3/02 , F02B1/04 , F02B31/00 , F02B31/08 , F02F1/42 , F02M35/10
CPC分类号： F02B31/082 , F01P3/02 , F02F1/4228 , F02B1/04 , Y02T10/146
摘要： A helically-shaped intake port comprising a helical portion formed around an intake valve and a substantially straight inlet passage portion tangentially connected to the helical portion. A bypass passage is branched off from the inlet passage portion and connected to the helical portion. A rotary valve is arranged in the bypass passage and actuated by a vacuum operated diaphragm apparatus. The rotary valve is opened when the amount of air fed into the cylinder of an engine is increased beyond a predetermined value. A cooling water passage is arranged beneath and near the bypass passage.
摘要翻译：螺旋状进气口包括围绕进气阀形成的螺旋部分和与螺旋部切向连接的基本上直的入口通道部分。旁通通道从入口通道部分分出并连接到螺旋部分。旋转阀布置在旁路通道中并由真空操作的隔膜装置致动。当进给发动机气缸的空气量增加超过预定值时，旋转阀打开。旁路通道下方和附近设有冷却水通道。

87. 发明授权

US4347504A Device for detecting a burnt-out fuse 失效
标题翻译：用于检测烧坏保险丝的装置
公开(公告)号：US4347504A
公开(公告)日：1982-08-31
申请号：US179999
申请日：1980-08-21
申请人： Satoru Murofushi , Tadao Shibuya , Shinichi Kato , Mitsuo Endo
发明人： Satoru Murofushi , Tadao Shibuya , Shinichi Kato , Mitsuo Endo
IPC分类号： H01H85/56 , G01R31/02 , H01H37/76 , H01H85/02 , H01H85/045 , H01H85/147 , H01H85/153 , H01H85/32 , G08B21/00
CPC分类号： H01H85/32
摘要： A device for detecting a burnt-out fuse in a fuse box accommodating a plurality of parallelly arranged blade-type fuses. The device comprises an insulative support body mounted to the fuse box, an electrically conductive rubber member carried on said support body and a light emitting element connected between said rubber bar member and ground. The rubber bar member faces the output sides of the blade type fuses accommodated in the fuse box such that the rubber bar member acts as a contact means ready for depressing.
摘要翻译：一种用于检测容纳多个平行布置的叶片型保险丝的保险丝盒中的烧焦保险丝的装置。该装置包括安装到保险丝盒的绝缘支撑体，承载在所述支撑体上的导电橡胶构件和连接在所述橡胶棒构件与地面之间的发光元件。橡胶条构件面对容纳在保险丝盒中的叶片型保险丝的输出侧，使得橡胶条构件用作准备按压的接触装置。

88. 发明申请

US20160293424A1 HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS FOR HEATING SUBSTRATE BY IRRADIATING SUBSTRATE WITH LIGHT 有权
标题翻译：热处理方法和热处理装置通过用光照射基板加热基板
公开(公告)号：US20160293424A1
公开(公告)日：2016-10-06
申请号：US15143043
申请日：2016-04-29
申请人： Kazuhiko FUSE , Shinichi Kato , Kenichi Yokouchi
发明人： Kazuhiko FUSE , Shinichi Kato , Kenichi Yokouchi
IPC分类号： H01L21/225 , H01L21/324 , H01L21/265
CPC分类号： H01L21/2253 , F27B17/0025 , H01L21/02694 , H01L21/26513 , H01L21/2686 , H01L21/324 , H01L21/67115 , H01L21/67248 , H01L21/68707 , H01L21/68742
摘要： First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is performed to increase the temperature of a front surface of a semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 1 to 20 milliseconds. This achieves the activation of the impurities. Subsequently, second irradiation which gradually decreases the emission output from the maximum value over a time period in the range of 3 to 50 milliseconds is performed to maintain the temperature of the front surface within a ±25° C. range around the target temperature for a time period in the range of 3 to 50 milliseconds. This prevents the occurrence of process-induced damage while suppressing the diffusion of the impurities.
摘要翻译：执行使闪光灯的发射输出在1至20毫秒的范围内达到其最大值的第一次照射，以将半导体晶片的前表面的温度从预热温度升高到目标温度在1到20毫秒的范围内的时间段。这实现了杂质的活化。随后，进行从3-50毫秒的范围内的最大值的最大值逐渐降低的第二次照射，将前表面的温度保持在目标温度±25℃左右的范围内时间段在3到50毫秒的范围内。这防止了杂质的扩散抑制了工艺引起的损伤的发生。

89. 发明授权

US09343313B2 Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light 有权
标题翻译：热处理方法和通过用光照射基板来加热基板的热处理装置
公开(公告)号：US09343313B2
公开(公告)日：2016-05-17
申请号：US13417498
申请日：2012-03-12
申请人： Kazuhiko Fuse , Shinichi Kato , Kenichi Yokouchi
发明人： Kazuhiko Fuse , Shinichi Kato , Kenichi Yokouchi
IPC分类号： H01L21/263 , H01L21/324 , H01L21/268 , H01L21/67 , H01L21/687 , F27B17/00 , H01L21/265
CPC分类号： H01L21/2253 , F27B17/0025 , H01L21/02694 , H01L21/26513 , H01L21/2686 , H01L21/324 , H01L21/67115 , H01L21/67248 , H01L21/68707 , H01L21/68742
摘要： First irradiation which causes an emission output from a flash lamp to reach its maximum value over a time period in the range of 1 to 20 milliseconds is performed to increase the temperature of a front surface of a semiconductor wafer from a preheating temperature to a target temperature for a time period in the range of 1 to 20 milliseconds. This achieves the activation of the impurities. Subsequently, second irradiation which gradually decreases the emission output from the maximum value over a time period in the range of 3 to 50 milliseconds is performed to maintain the temperature of the front surface within a ±25° C. range around the target temperature for a time period in the range of 3 to 50 milliseconds. This prevents the occurrence of process-induced damage while suppressing the diffusion of the impurities.
摘要翻译：执行使闪光灯的发射输出在1至20毫秒的范围内达到其最大值的第一次照射，以将半导体晶片的前表面的温度从预热温度升高到目标温度在1到20毫秒的范围内的时间段。这实现了杂质的活化。随后，进行从3-50毫秒的范围内的最大值的最大值逐渐降低的第二次照射，将前表面的温度保持在目标温度±25℃左右的范围内时间段在3到50毫秒的范围内。这防止了杂质的扩散抑制了工艺引起的损伤的发生。

90. 发明授权

US08559799B2 Heat treatment apparatus and method for heating substrate by photo-irradiation 有权
标题翻译：热处理装置及通过光照射加热基板的方法
公开(公告)号：US08559799B2
公开(公告)日：2013-10-15
申请号：US12563409
申请日：2009-09-21
申请人： Hideo Nishihara , Shinichi Kato
发明人： Hideo Nishihara , Shinichi Kato
IPC分类号： F26B19/00
CPC分类号： H01L21/67115 , H01L21/26513 , H01L21/2686
摘要： Two-step photo-irradiation heat treatment is performed so that a total photo-irradiation time is not more than one second and that a first step of photo-irradiation of a semiconductor wafer is performed with a light-emission output that averages out at a first light-emission output and a second step of photo-irradiation of the semiconductor wafer is performed in accordance with an output waveform that peaks at a second light-emission output that is higher than both average and maximum light-emission outputs in the first step. Performing preliminary photo-irradiation with a relatively low light-emission output in the first step and then performing intense photo-irradiation with a higher peak in the second step enables the surface temperature of a semiconductor wafer to increase further with a smaller amount of energy than in conventional cases, while preventing the semiconductor wafer from shattering.
摘要翻译：进行两步光照射热处理，使得总的光照射时间不超过1秒，并且利用平均在a的光发射输出进行半导体晶片的光照射的第一步骤第一发光输出和半导体晶片的光照射的第二步骤根据在第二发光输出处峰值的输出波形进行，该输出波形高于第一步骤中的平均和最大发光输出。在第一步骤中以相对低的发光输出进行初步光照射，然后在第二步骤中用较高的峰进行强光照射使得半导体晶片的表面温度能够以更少量的能量进一步增加，在常规情况下，同时防止半导体晶片破碎。

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