会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 84. 发明授权
    • Onboard positioning system
    • 车载定位系统
    • US5657232A
    • 1997-08-12
    • US465901
    • 1995-06-06
    • Seiji IshikawaYuichi MurakamiTomio YasudaToshimitsu Oka
    • Seiji IshikawaYuichi MurakamiTomio YasudaToshimitsu Oka
    • G01S5/14G01S11/10G01S19/20G06G7/78
    • G01S11/10G01S19/47G01S19/52
    • A relative speed of a vehicle with respect to a satellite is detected from a deviation of a tuning frequency caused by the Doppler effect, and a vehicle speed is determined from the relative speed. A piezoelectric oscillation gyro detects an angular speed of rotation of the vehicle, which is integrated to determine an azimuth. A travel is detected in terms of the vehicle speed and the azimuth, and the detected travel and information from available GPS satellites are substituted into a navigation equation to solve it for a solution. Alternatively, altitude information detected by an altitude sensor and the angular speed of rotation of the vehicle as detected by the piezoelectric oscillation gyro may be is inputted. The angular speed of rotation is integrated to determine the azimuth. Information from two GPS satellites and information representing azimuth .phi. and altitude .DELTA.z are substituted into the navigation equation to solve it for a solution. Kalman filter is employed. Even when available GPS satellites is two or one, the determination of the position of the vehicle is enabled. The need for a vehicle speed sensor is eliminated, and the accuracy of positioning is enhanced.
    • 根据由多普勒效应引起的调谐频率的偏差来检测车辆相对于卫星的相对速度,并且根据相对速度确定车速。 压电振荡陀螺仪检测车辆的角速度,其被积分以确定方位角。 根据车速和方位角检测行驶,将检测到的行驶和来自可用GPS卫星的信息代入导航方程式,以求解其解。 或者,可以输入由高精度传感器检测的高度信息和由压电振荡陀螺仪检测到的车辆的旋转角速度。 旋转的角速度被积分以确定方位角。 来自两个GPS卫星的信息和代表方位角度和高度DELTA z的信息被代入导航方程式以求解它。 卡尔曼滤波器被采用。 即使可用的GPS卫星是两个或一个,确定车辆的位置是有效的。 消除了对车速传感器的需要,并提高了定位精度。
    • 85. 发明授权
    • Polishing apparatus with swinging structures
    • 具有摆动结构的抛光装置
    • US5653624A
    • 1997-08-05
    • US527422
    • 1995-09-13
    • Seiji IshikawaNorio KimuraKatsuyuki Aoki
    • Seiji IshikawaNorio KimuraKatsuyuki Aoki
    • B24B37/10B24B5/00B24B29/00
    • B24B37/105
    • A compact polishing apparatus requires less operating space than a conventional polishing apparatus generally used for polishing semiconductor wafers. The present apparatus has a swing shaft to provide a swing motion to a pressing device including a top ring member. There are three ranges of swing motion, i.e. a polishing range which is a small motion range used for polishing a wafer within the confined area of a turntable, a receiving range which is a medium motion range used for loading/unloading of a wafer in an area beyond the turntable, and a standby range which is a large motion range used for moving the top ring member to a standby or rinsing position in an area beyond the turntable. Because of the swing-based arrangement of the components in the present apparatus, isolation of critical components is easily achieved, thus resulting in low maintenance costs and long service life of the present apparatus. These advantages offer significant cost savings in the management of polishing operations.
    • 紧凑的抛光装置比通常用于抛光半导体晶片的常规抛光装置需要较少的操作空间。 本装置具有摆动轴,以向包括顶环构件的按压装置提供摆动运动。 有三个摆动运动范围,即抛光范围,该抛光范围是用于在转台的受限区域内抛光晶片的小运动范围,作为用于将晶片加载/卸载的介质运动范围的接收范围 以及用于将顶环构件移动到转台之外的区域中的待机或冲洗位置的大的运动范围的待机范围。 由于本装置中的部件的基于摆动的布置,容易实现关键部件的隔离,因此导致本装置的维护成本低和使用寿命长。 这些优点为抛光操作的管理提供了显着的成本节约。