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81. 发明授权

US07655542B2 Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device 失效
标题翻译：用于沉积光伏器件微晶硅膜的方法和设备
公开(公告)号：US07655542B2
公开(公告)日：2010-02-02
申请号：US11426127
申请日：2006-06-23
申请人： Soo Young Choi , Takako Takehara , John M. White , Yong Kee Chae
发明人： Soo Young Choi , Takako Takehara , John M. White , Yong Kee Chae
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： H01L21/02579 , C23C16/24 , C30B25/105 , C30B29/06 , H01J37/32082 , H01J37/32449 , H01J37/32495 , H01L21/0237 , H01L21/02532 , H01L21/02576 , H01L21/0262 , H01L31/1824 , Y02E10/545 , Y02P70/521
摘要： Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.
摘要翻译：在本发明中提供了具有改进的沉积速率和膜质量的沉积微晶硅膜层的方法。此外，提供具有微晶硅膜的光伏（PV）电池。在一个实施例中，该方法以大于约20nm /分钟的沉积速率在衬底上产生微晶硅膜，其中微晶硅膜的结晶体积在约20％至约80％之间。

82. 发明申请

US20090197015A1 METHOD AND APPARATUS FOR CONTROLLING PLASMA UNIFORMITY 审中-公开
标题翻译：用于控制等离子体均匀性的方法和装置
公开(公告)号：US20090197015A1
公开(公告)日：2009-08-06
申请号：US12344210
申请日：2008-12-24
申请人： Jozef Kudela , Gaku Furuta , Carl A. Sorensen , Soo Young Choi , John M. White
发明人： Jozef Kudela , Gaku Furuta , Carl A. Sorensen , Soo Young Choi , John M. White
IPC分类号： C23C16/513
CPC分类号： H01J37/32623 , C23C16/345 , C23C16/5096 , H01J37/32082
摘要： Systems, methods, and apparatus involve a plasma processing chamber for depositing a film on a substrate. The plasma processing chamber includes a lid assembly having a ground plate, a backing plate, and a non-uniformity existing between the ground plate and the backing plate. The non-uniformity may interfere with RF wave uniformity and cause an impedance imbalance between portions of the ground plate and backing plate. The non-uniformity may include a structure or a reduced spacing of non-uniform surfaces. A reduced spacing of non-uniform surfaces may exist where a first distance between the ground plate and the backing plate at a first end is different from a second distance between the ground plate and the backing plate at a second end. The structure may be from 2 cm to 10 cm thick, cover from 20% to 50% of the backing plate, and be located away from a discontinuity existing inside the chamber.
摘要翻译：系统，方法和装置包括用于在基板上沉积膜的等离子体处理室。等离子体处理室包括具有接地板，背板和存在于接地板和背板之间的不均匀性的盖组件。不均匀性可能会干扰RF波均匀性，并导致接地板和背板的部分之间的阻抗不平衡。不均匀性可以包括非均匀表面的结构或减小的间隔。存在不均匀表面的减小的间隔，其中在第一端处的接地板和背板之间的第一距离在第二端处不同于接地板和背板之间的第二距离。该结构可以是2cm至10cm厚，覆盖背板的20％至50％，并且位于远离存在于腔室内的不连续处。

83. 发明申请

US20090101201A1 NIP-NIP THIN-FILM PHOTOVOLTAIC STRUCTURE 审中-公开
标题翻译： NIP-NIP薄膜光伏结构
公开(公告)号：US20090101201A1
公开(公告)日：2009-04-23
申请号：US11876359
申请日：2007-10-22
申请人： John M. White , Soo Young Choi
发明人： John M. White , Soo Young Choi
IPC分类号： H01L31/045 , C23C16/54 , H01L31/18
CPC分类号： H01L31/076 , H01L31/0475 , H01L31/18 , H01L31/1824 , H01L31/1884 , H01L31/202 , Y02E10/545 , Y02E10/548 , Y02P70/521
摘要： A thin film multi-junction photovoltaic structure is presented as well as methods and apparatus for forming the same. The photovoltaic structure comprises first and second NIP junctions formed over a translucent substrate.
摘要翻译：介绍了薄膜多结光伏结构及其形成方法和装置。光伏结构包括在半透明基板上形成的第一和第二NIP结。

84. 发明申请

US20090077804A1 PRODUCTION LINE MODULE FOR FORMING MULTIPLE SIZED PHOTOVOLTAIC DEVICES 审中-公开
标题翻译：用于形成多个大小的光伏器件的生产线模块
公开(公告)号：US20090077804A1
公开(公告)日：2009-03-26
申请号：US12201840
申请日：2008-08-29
申请人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G.J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J.B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
发明人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G.J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J.B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
IPC分类号： H01L31/18 , H01L21/304 , B26F3/00
CPC分类号： H01L21/67236 , B23K26/364 , B26F3/002 , B26F3/004 , B65G49/064 , B65G2249/02 , B65G2249/04 , C03B33/03 , C03B33/033 , H01L21/67132 , H01L21/67712 , H01L21/67715 , H01L21/67721 , H01L21/67727 , H01L21/6776 , H01L31/022425 , H01L31/03921 , H01L31/0504 , H01L31/075 , H02S50/00 , H02S50/10 , Y02E10/548 , Y02P40/57 , Y10T29/49002 , Y10T29/49355 , Y10T29/5196 , Y10T29/53113 , Y10T29/5313 , Y10T29/5317 , Y10T29/53187 , Y10T29/53365 , Y10T29/53417 , Y10T225/10 , Y10T225/325 , Y10T225/329
摘要： The present invention generally relates to a sectioning module positioned within an automated solar cell device fabrication system. The solar cell device fabrication system is adapted to receive a single large substrate and form multiple silicon thin film solar cell devices from the single large substrate.
摘要翻译：本发明一般涉及一种位于自动化太阳能电池器件制造系统内的切片模块。太阳能电池器件制造系统适于接收单个大型衬底并从单个大衬底形成多个硅薄膜太阳能电池器件。

85. 发明申请

US20080302303A1 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 审中-公开
标题翻译：用流平面设计沉积均匀硅膜的方法和装置
公开(公告)号：US20080302303A1
公开(公告)日：2008-12-11
申请号：US11759599
申请日：2007-06-07
申请人： Soo Young Choi , Tae Kyung Won , John M. White
发明人： Soo Young Choi , Tae Kyung Won , John M. White
IPC分类号： C23C16/00 , B05B1/14
CPC分类号： C23C16/24 , C23C16/45565 , C23C16/5096 , H01J37/32449
摘要： Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.
摘要翻译：提供了具有由气体分配板产生的流动梯度的方法和装置。在一个实施例中，该方法和装置特别适用于但不限于沉积太阳能电池应用的硅膜。用于沉积用于太阳能电池应用的均匀膜的设备包括处理室和设置在处理室中的四边形气体分配板，并且具有由四个侧面分开的至少四个角。气体分配板还包括通过气体分配板形成的第一多个扼流圈，位于角部的第一多个扼流圈，以及通过气体分配板形成的第二多个扼流圈，沿着侧面设置的第二多个扼流圈在所述角区域之间的所述气体分配板中，所述第一多个扼流器具有比所述第二多个扼流圈更大的流动阻力。

86. 发明申请

US20070221128A1 Method and apparatus for improving uniformity of large-area substrates 审中-公开
标题翻译：改善大面积基板均匀性的方法和装置
公开(公告)号：US20070221128A1
公开(公告)日：2007-09-27
申请号：US11389603
申请日：2006-03-23
申请人： Soo Young Choi , John M. White
发明人： Soo Young Choi , John M. White
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/345 , C23C16/5096 , C23C16/52
摘要： Embodiments of the present invention generally provide methods and apparatus for improving the uniformity of a film deposited on a large-area substrate, particularly for films deposited in a PECVD system. In one embodiment, a plasma-processing chamber is configured to be asymmetrical relative to a substrate in order to compensate for plasma density non-uniformities in the chamber caused by unwanted magnetic fields. In another embodiment, a plasma-processing chamber is adapted to create a neutral current bypass path that reduces electric current flow through a magnetic field-generating feature in the chamber. In another embodiment, a method is provided for depositing a uniform film on a large-area substrate in a plasma-processing chamber. The chamber is made electrically symmetric during processing by creating a neutral current bypass path, wherein the neutral current bypass path substantially reduces neutral current flow through a magnetic field-generating feature in the chamber.
摘要翻译：本发明的实施例通常提供了用于改善沉积在大面积基板上的膜的均匀性的方法和装置，特别是用于沉积在PECVD系统中的薄膜。在一个实施例中，等离子体处理室被配置为相对于衬底是不对称的，以便补偿由不想要的磁场引起的腔室中的等离子体密度不均匀性。在另一个实施例中，等离子体处理室适于产生中性电流旁路路径，其减小通过腔室中的磁场产生特征的电流。在另一个实施例中，提供了一种用于在等离子体处理室中的大面积衬底上沉积均匀膜的方法。通过产生中性电流旁路路径，室在处理期间被电对称，其中中性线旁路通过基本上减少通过腔室中的磁场产生特征的中性点电流。

87. 发明授权

US08328939B2 Diffuser plate with slit valve compensation 有权
标题翻译：扩散板带狭缝阀补偿
公开(公告)号：US08328939B2
公开(公告)日：2012-12-11
申请号：US11780478
申请日：2007-07-20
申请人： Soo Young Choi , John M. White
发明人： Soo Young Choi , John M. White
IPC分类号： C23C16/00 , C23C16/455 , C23C16/50 , C23C16/507 , H01L21/3065
CPC分类号： C23C16/345 , C23C16/455 , C23C16/45565 , C23C16/5096 , H01J37/3244 , H01J37/32596
摘要： The present invention generally comprises a diffuser plate for a PECVD chamber. The diffuser plate comprises a plurality of hollow cathode cavities. The edge of the diffuser plate that will reside closest to a slit valve within a processing chamber may have the shape and/or size of the hollow cathode cavities adjusted to compensate for the proximity to the slit valve. By adjusting the shape and/or size of the hollow cathode cavities closest to the slit valve, the diffuser plate may permit a uniform plasma distribution across the processing chamber and thus, a uniform film thickness upon a substrate during a PECVD process.
摘要翻译：本发明通常包括用于PECVD室的扩散板。扩散板包括多个空心阴极腔。最靠近处理室内的狭缝阀的扩散器板的边缘可以具有被调整以补偿与狭缝阀接近的空心阴极腔的形状和/或尺寸。通过调节最接近狭缝阀的中空阴极腔的形状和/或尺寸，扩散板可以允许跨过处理室的均匀的等离子体分布，从而在PECVD工艺期间在衬底上具有均匀的膜厚度。

88. 发明授权

US08225496B2 Automated integrated solar cell production line composed of a plurality of automated modules and tools including an autoclave for curing solar devices that have been laminated 失效
标题翻译：由多个自动模块和工具组成的自动化集成太阳能电池生产线，包括用于固化已层压的太阳能装置的高压釜
公开(公告)号：US08225496B2
公开(公告)日：2012-07-24
申请号：US12202199
申请日：2008-08-29
申请人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G. J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J. B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
发明人： Robert Z. Bachrach , Yong-Kee Chae , Soo Young Choi , Nicholas G. J. De Vries , Yacov Elgar , Eric A. Englhardt , Michel R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J. B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
IPC分类号： H01L51/44 , H01L51/48 , H01L21/768 , H01L31/072
CPC分类号： H01L21/67236 , B23K26/364 , B26F3/002 , B26F3/004 , B65G49/064 , B65G2249/02 , B65G2249/04 , C03B33/03 , C03B33/033 , H01L21/67132 , H01L21/67712 , H01L21/67715 , H01L21/67721 , H01L21/67727 , H01L21/6776 , H01L31/022425 , H01L31/03921 , H01L31/0504 , H01L31/075 , H02S50/00 , H02S50/10 , Y02E10/548 , Y02P40/57 , Y10T29/49002 , Y10T29/49355 , Y10T29/5196 , Y10T29/53113 , Y10T29/5313 , Y10T29/5317 , Y10T29/53187 , Y10T29/53365 , Y10T29/53417 , Y10T225/10 , Y10T225/325 , Y10T225/329
摘要： The present invention generally relates to a system that can be used to form a photovoltaic device, or solar cell, using processing modules that are adapted to perform one or more steps in the solar cell formation process. The automated solar cell fab is generally an arrangement of automated processing modules and automation equipment that is used to form solar cell devices. The automated solar fab will thus generally comprise a substrate receiving module that is adapted to receive a substrate, one or more absorbing layer deposition cluster tools having at least one processing chamber that is adapted to deposit a silicon-containing layer on a surface of the substrate, one or more back contact deposition chambers, one or more material removal chambers, a solar cell encapsulation device, an autoclave module, an automated junction box attaching module, and one or more quality assurance modules that are adapted to test and qualify the completely formed solar cell device.
摘要翻译：本发明一般涉及一种可用于形成光伏器件或太阳能电池的系统，该系统使用适于在太阳能电池形成过程中执行一个或多个步骤的处理模块。自动化太阳能电池制造厂通常是用于形成太阳能电池器件的自动化处理模块和自动化设备的布置。因此，自动化太阳能工厂将通常包括适于接收衬底的衬底接收模块，一个或多个吸收层沉积簇工具，其具有至少一个适于在衬底的表面上沉积含硅层的处理室，一个或多个背接触沉积室，一个或多个材料去除室，太阳能电池封装装置，高压釜模块，自动接线盒附接模块和一个或多个质量保证模块，其适于测试和限定完全形成太阳能电池装置。

89. 发明申请

US20120103264A1 METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS 审中-公开
标题翻译：用流平面设计沉积均匀硅膜的方法和装置
公开(公告)号：US20120103264A1
公开(公告)日：2012-05-03
申请号：US13349332
申请日：2012-01-12
申请人： SOO YOUNG CHOI , Tae Kyung Won , John M. White
发明人： SOO YOUNG CHOI , Tae Kyung Won , John M. White
IPC分类号： C23C16/455
CPC分类号： C23C16/24 , C23C16/45565 , C23C16/5096 , H01J37/32449
摘要： Methods and apparatus having a flow gradient created from a gas distribution plate are provided. In one embodiment, the method and apparatus are particularly useful for, but not limited to, depositing a silicon film for solar cell applications. The apparatus for depositing a uniform film for solar cell applications includes a processing chamber, and a quadrilateral gas distribution plate disposed in the processing chamber and having at least four corners separated by four sides. The gas distribution plate further includes a first plurality of chokes formed through the gas distribution plate, the first plurality of chokes located in the corners, and a second plurality of chokes formed through the gas distribution plate, the second plurality of chokes located along the sides of the gas distribution plate between the corner regions, wherein the first plurality of chokes have a greater flow resistance than that of the second plurality of chokes.
摘要翻译：提供了具有由气体分配板产生的流动梯度的方法和装置。在一个实施例中，该方法和装置特别适用于但不限于沉积太阳能电池应用的硅膜。用于沉积用于太阳能电池应用的均匀膜的设备包括处理室和设置在处理室中的四边形气体分配板，并且具有由四个侧面分开的至少四个角。气体分配板还包括通过气体分配板形成的第一多个扼流圈，位于角部的第一多个扼流圈，以及通过气体分配板形成的第二多个扼流圈，沿着侧面设置的第二多个扼流圈在所述角区域之间的所述气体分配板中，所述第一多个扼流器具有比所述第二多个扼流圈更大的流动阻力。

90. 发明申请

US20080178807A1 GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-SIZE HOLES FOR LARGE SIZE PECVD SYSTEMS 审中-公开
标题翻译：气体分布均匀度改进由具有多个尺寸PECVD系统的多尺寸孔板
公开(公告)号：US20080178807A1
公开(公告)日：2008-07-31
申请号：US12099112
申请日：2008-04-07
申请人： Qunhua Wang , Li Hou , Sanjay Yadav , Gaku Furuta , Kenji Omori , Soo Young Choi , John M. White
发明人： Qunhua Wang , Li Hou , Sanjay Yadav , Gaku Furuta , Kenji Omori , Soo Young Choi , John M. White
IPC分类号： C23C16/00
CPC分类号： H01J37/3244 , C23C16/45565 , C23F4/00 , H01J37/32449
摘要： Embodiments of a gas distribution plate for distributing gas in a processing chamber for large area substrates are provided. The embodiments describe a gas distribution plate assembly for a plasma processing chamber having a cover plate comprises a diffuser plate having an upstream side, a downstream side facing a processing region, and a plurality of gas passages formed through the diffuser plate, and a baffle plate, placed between the cover plate of the process chamber and the diffuser plate, having a plurality of holes extending from the upper surface to the lower surface of the baffle plate, wherein the plurality of holes have at least two sizes. The small pinholes of the baffle plate are used to allow sufficient pass-through of gas mixture, while the large holes of the baffle plate are used to improve the process uniformity across the substrate.
摘要翻译：提供了用于在大面积基板的处理室中分配气体的气体分配板的实施例。实施方式描述了一种用于等离子体处理室的气体分配板组件，其具有盖板，该盖板包括具有上游侧，面向加工区域的下游侧和通过扩散板形成的多个气体通道的扩散板，以及挡板，放置在处理室的盖板和扩散板之间，具有从挡板的上表面延伸到下表面的多个孔，其中多个孔具有至少两个尺寸。挡板的小针孔用于允许气体混合物的充分通过，而挡板的大孔用于改善基板上的工艺均匀性。

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