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    • 71. 发明授权
    • Radiation source with high average EUV radiation output
    • 具有高平均EUV辐射输出的辐射源
    • US06815900B2
    • 2004-11-09
    • US10741882
    • 2003-12-19
    • Imtiaz AhmadJuergen KleinschmidtGuido SchrieverUwe StammSven Goetze
    • Imtiaz AhmadJuergen KleinschmidtGuido SchrieverUwe StammSven Goetze
    • H05H100
    • H05G2/003
    • The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation based on a hot, dense plasma generated by gas discharge. The object of the invention, to find a novel possibility for the realization of an EUV radiation source which achieves a high average radiation output in the EUV region and sufficiently long life and long-term stability, is met according to the invention in that a first electrode housing and a second electrode housing which are electrically separated from one another so as to be resistant to breakdown form parts of a vacuum chamber for a gas discharge for plasma generation, and the second electrode housing has an electrode collar which is enclosed concentrically by the first electrode housing so that the gas discharge is oriented substantially only parallel to the axis of symmetry of the electrode housings, and the electrode collar is stepped radially relative to the concentric insulator layer in such a way that at least one end region of the electrode collar is at a distance from the concentric insulator layer such that a concentric gap is formed. A substantially longer operating duration is achieved by the optimized electrode geometry in conjunction with material selection and effective heat dissipation.
    • 本发明涉及一种用于基于由气体放电产生的热的致密等离子体产生极紫外(EUV)辐射的辐射源。 本发明的目的是为了发现实现EUV辐射源的新型可能性,其实现了EUV区域中的高平均辐射输出并且具有足够长的寿命和长期稳定性,根据本发明,满足第一 电极壳体和第二电极壳体,其彼此电分离,以便抵抗用于等离子体产生的气体放电的真空室的部件的分解,并且第二电极壳体具有电极套环,该电极套筒同心地包围 第一电极壳体,使得气体放电基本上仅平行于电极壳体的对称轴线定向,并且电极套环相对于同心绝缘体层级径向地延伸,使得电极套环的至少一个端部区域 距离同心绝缘体层一定距离,从而形成同心间隙。 通过优化的电极几何结构与材料选择和有效散热来实现更长的操作持续时间。
    • 72. 发明授权
    • Narrow band excimer laser with a prism-grating as line-narrowing optical element
    • 具有棱镜光栅的窄带准分子激光器作为窄线光学元件
    • US06795473B1
    • 2004-09-21
    • US09602184
    • 2000-06-22
    • Juergen KleinschmidtThomas Schroeder
    • Juergen KleinschmidtThomas Schroeder
    • H01S322
    • G02B5/1838G02B5/1814H01S3/08004H01S3/08009H01S3/081H01S3/0812H01S3/1055H01S3/225
    • An excimer or molecular fluorine laser system includes a laser chamber filled with a gas mixture at least including a halogen-containing species and a buffer gas, and multiple electrodes with the laser chamber connected to a discharge circuit energizing the gas mixture. The laser chamber is within a laser resonator generating an output beam. The resonator includes a line-narrowing package for reducing a bandwidth of the output beam. The line-narrowing package includes a grating or grism element for use with a highly reflective (HR) and/or an anti-reflective (AR) dielectric coating. The grating may serve as a resonator reflector having a dielectric HR coating. The grating may be disposed before a HR mirror and thus have a dielectric AR or HR coating when the grating is configured in transmission or reflection mode, respectively. The grating may be used as an output coupler, and may be partially reflective with or without a coating. The grism may have a dielectric AR coating on any transmissive surface and a dielectric HR coating on any reflective surface.
    • 准分子或分子氟激光系统包括填充有至少包含含卤物质和缓冲气体的气体混合物的激光室,以及激光室连接到对气体混合物通电的放电回路的多个电极。 激光室在产生输出光束的激光谐振器内。 谐振器包括用于减小输出光束的带宽的线窄化封装。 线条窄化包装包括用于高反射(HR)和/或抗反射(AR)电介质涂层的光栅或棱镜元件。 光栅可以用作具有介电HR涂层的谐振器反射器。 光栅可以设置在HR反射镜之前,并且因此在光栅被配置为透射或反射模式时分别具有介电AR或HR涂层。 光栅可以用作输出耦合器,并且可以是部分反射的,具有或不具有涂层。 棱镜可以在任何反射表面上的任何透射表面上具有介电AR涂层和介电HR涂层。
    • 73. 发明授权
    • Multiple-pass interferometric device
    • 多通道干涉仪
    • US06747741B1
    • 2004-06-08
    • US09975091
    • 2001-10-09
    • Juergen Kleinschmidt
    • Juergen Kleinschmidt
    • G02B902
    • G01J3/26
    • An apparatus measures a spectral distribution of a narrow-band laser beam generated by a line-narrowed excimer laser or a molecular fluorine laser system. The apparatus includes an an interferometric device disposed along an optical path of an output beam of the laser system such that the beam traverses the interferometric device on a first pass, a retro-reflector disposed after the interferometric device along the optical path for retro-reflecting the beam back through the interferometric device on a second pass, and a detector for detecting an intensity of the beam after the second pass through the interferometric device. Preferably, spectral information is determined when the free spectral range of the interferometric device is tuned and the detector measures the intensity of the beam at a plurality of free spectral ranges or when the wavelength of the output beam is tuned.
    • 一种装置测量由窄线准分子激光器或分子氟激光系统产生的窄带激光束的光谱分布。 该装置包括沿着激光系统的输出光束的光路布置的干涉仪,使得光束在第一遍上穿过干涉测量装置,设置在沿着光路的干涉测量装置之后的回射反射器用于回射 在第二次通过时,光束通过干涉测量装置返回,以及检测器,用于在第二次通过干涉仪之后检测光束的强度。 优选地,当干涉测量装置的自由光谱范围被调谐并且检测器在多个自由光谱范围内测量光束的强度时,或当输出光束的波长被调谐时确定光谱信息。