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61. 发明申请

US20050271253A1 Target detection system using radar and image processing 有权
标题翻译：目标检测系统采用雷达和图像处理
公开(公告)号：US20050271253A1
公开(公告)日：2005-12-08
申请号：US11188160
申请日：2005-07-21
申请人： Akihiro Ohta , Kenji Oka
发明人： Akihiro Ohta , Kenji Oka
IPC分类号： G01C3/08 , G01C11/06 , G01S7/41 , G01S11/12 , G01S13/86 , G01S13/93 , G06K9/32 , G06T7/00 , G06K9/00
CPC分类号： G01C3/08 , G01C11/06 , G01S7/41 , G01S11/12 , G01S13/867 , G01S13/931 , G06K9/3233 , G06T7/97
摘要： A target detection system using an EHF radar and the image processing is disclosed, in which the processing time is shortened by mutually complementing the disadvantages of the EHF radar and the image processing thereby to improve the reliability. The system comprises a radar, an image acquisition unit and an image processing ECU. The microcomputer of the ECU specifies an image recognition area based on the power output from the radar, and carries out the image processing only within the specified recognition area for the image obtained from the image acquisition unit. By performing the image processing only for the area where a target is detected by the radar, the time required for image processing is shortened on the one hand and the erroneous detection of letters on the road surface or the like is eliminated.
摘要翻译：公开了使用EHF雷达和图像处理的目标检测系统，其中通过相互补充EHF雷达的缺点和图像处理来缩短处理时间，从而提高可靠性。该系统包括雷达，图像获取单元和图像处理ECU。 ECU的微型计算机基于从雷达输出的功率来指定图像识别区域，并且仅在从图像获取单元获得的图像的指定识别区域内执行图像处理。通过仅对由雷达检测到目标的区域进行图像处理，一方面缩短了图像处理所需的时间，并且消除了路面上的字母的错误检测等。

62. 发明授权

US06947587B1 Defect inspection method and apparatus 失效
标题翻译：缺陷检查方法和装置
公开(公告)号：US06947587B1
公开(公告)日：2005-09-20
申请号：US09294137
申请日：1999-04-20
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G01N21/95 , G01N21/956 , G06K9/00 , G06T7/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.
摘要翻译：检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像彼此进行比较，从而可以检查图案。

63. 发明授权

US06263099B1 Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns of an object to be inspected 失效
标题翻译：半导体基板的制造方法以及检查被检查体的图案的缺陷的方法和装置
公开(公告)号：US06263099B1
公开(公告)日：2001-07-17
申请号：US09107432
申请日：1998-06-30
申请人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
发明人： Shunji Maeda , Yasuhiko Nakayama , Minoru Yoshida , Hitoshi Kubota , Kenji Oka
IPC分类号： G06K900
CPC分类号： G01N21/8806 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/95615 , G01N2201/0618 , G01N2201/0634
摘要： A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect which occurs on the pattern.
摘要翻译：一种用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法及其装置以及以高产率制造半导体晶片等半导体基板的半导体基板的制造方法和系统。通过将通过物镜的环形照明照射到安装在台架上的晶片上，检查被检查物体上的微细图案，晶片上具有微细精细图案。照明光可以根据在物镜的光瞳上检测到的图像而被圆形或椭圆偏振并且被控制，并且通过检测来自晶片的反射光来获得图像信号。将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷，从而同时以高分辨率检测微细微图案或微细图案上的缺陷。此外，通过分析缺陷的原因和在图案上发生的缺陷因素来控制生产线的工艺条件。

64. 发明授权

US08983235B2 Pupil detection device and pupil detection method 有权
标题翻译：瞳孔检测装置和瞳孔检测方法
公开(公告)号：US08983235B2
公开(公告)日：2015-03-17
申请号：US13821382
申请日：2011-09-22
申请人： Sotaro Tsukizawa , Kenji Oka
发明人： Sotaro Tsukizawa , Kenji Oka
IPC分类号： G06K9/32 , G06K9/00
CPC分类号： G06K9/00597 , G06K9/00604 , G06K9/00845
摘要： Disclosed is a pupil detection device capable improving the pupil detection accuracy even if a detection target image is a low-resolution image. In a pupil detection device (100), an eye area actual size calculation unit (102) acquires an actual scale value of an eye area, a pupil state prediction unit (103) calculates an actual scale prediction value of a pupil diameter, a necessary resolution estimation unit (105) calculates a target value of resolution on the basis of the calculated actual scale prediction value, an eye area image normalization unit (107) calculates a scale-up/scale-down factor on the basis of the calculated target value of resolution and the actual scale value of the eye area, and normalizes the image of the eye area on the basis of the calculated scale-up/scale-down factor, and a pupil detection unit (108) detects a pupil image from the normalized eye area image.
摘要翻译：公开了即使检测目标图像是低分辨率图像也能够提高瞳孔检测精度的瞳孔检测装置。在瞳孔检测装置（100）中，眼部实际尺寸计算部（102）获取眼睛区域的实际比例值，瞳孔状态预测部（103）计算瞳孔直径的实际尺度预测值，必要分辨率估计单元（105）根据计算出的实际比例预测值计算分辨率的目标值，眼睛区域图像归一化单元（107）基于计算出的目标值计算放大/缩小比例因子的分辨率和眼睛区域的实际比例值，并且基于计算出的放大/缩小因子来对眼睛区域的图像进行归一化，并且瞳孔检测单元（108）从归一化后的瞳孔图像检测瞳孔图像眼睛区域图像。

65. 发明授权

US08539248B2 Associating biometric information with passwords 有权
标题翻译：将生物特征信息与密码相关联
公开(公告)号：US08539248B2
公开(公告)日：2013-09-17
申请号：US10956874
申请日：2004-10-02
申请人： Mikio Hagiwara , Kishiko Itoh , Kenji Oka , Akira Hino , Masaki Obinata
发明人： Mikio Hagiwara , Kishiko Itoh , Kenji Oka , Akira Hino , Masaki Obinata
IPC分类号： G06F21/00
CPC分类号： G06F21/32
摘要： Associating biometric information with passwords is disclosed. If biometric information received from a user matches stored biometric information, stored passwords associated therewith are retrieved. If these stored passwords are identical to access-enabling passwords, then the user is permitted to gain access associated with the access-enabling passwords. If the biometric information matches the stored biometric information but the stored passwords do not match the access-enabling passwords or are not present, then the user is requested to manually enter passwords, which are stored. If these stored passwords are identical to the access-enabling passwords, the user is permitted to gain access. However, if the biometric information does not match the stored biometric information, or if the biometric information has not been received from the user or is not present, then the user is requested to manually enter passwords. If these passwords match the access-enabling passwords, then the user is permitted to gain access.
摘要翻译：公开了将生物特征信息与密码相关联。如果从用户接收的生物特征信息与存储的生物特征信息相匹配，则检索与其相关联的存储的密码。如果这些存储的密码与访问启用密码相同，则允许用户获得与访问启用密码相关联的访问。如果生物特征信息与存储的生物特征信息匹配，但存储的密码与访问启用密码不匹配或不存在，则请求用户手动输入存储的密码。如果这些存储的密码与访问启用密码相同，则允许用户访问。然而，如果生物特征信息与存储的生物特征信息不匹配，或者如果没有从用户接收到生物特征信息或不存在生物特征信息，则请求用户手动输入密码。如果这些密码与访问启用密码相匹配，则允许用户访问。

66. 发明申请

US20120128230A1 DEFECT INSPECTION METHOD AND APPARATUS 审中-公开
标题翻译：缺陷检查方法和装置
公开(公告)号：US20120128230A1
公开(公告)日：2012-05-24
申请号：US13362151
申请日：2012-01-31
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.
摘要翻译：一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

67. 发明授权

US07821447B2 Bias adjustment of radio frequency unit in radar apparatus 有权
标题翻译：雷达设备射频单元的偏置调整
公开(公告)号：US07821447B2
公开(公告)日：2010-10-26
申请号：US12232067
申请日：2008-09-10
申请人： Kenji Oka , Hiroshi Ito , Jun Ito
发明人： Kenji Oka , Hiroshi Ito , Jun Ito
IPC分类号： G01S13/00
CPC分类号： G01S7/4004 , G01S7/032
摘要： Disclosed is a method of bias adjustment for a millimeter wave radar apparatus that can efficiently and highly accurately adjust the bias of an MMIC used in a radio frequency circuit in the millimeter wave radar apparatus. The method comprises: providing a DA converter in a bias circuit in the millimeter wave radar apparatus comprising an antenna, a radio frequency unit, and a processing unit for performing transmission and reception processing of the radio frequency unit; connecting a signal generator in place of the antenna; and connecting a test processing unit and a control apparatus to the radio frequency unit, wherein the control apparatus applies an initial bias value in the form of a digital value to the MMIC, calculates the target value for the digital bias value based on the result of the measurement of the received signal, and takes the target value as the digital bias value for the production processing unit when the radio frequency characteristic of the received signal obtained by applying the target value to the MMIC lies within specified limits.
摘要翻译：公开了一种毫米波雷达装置的偏置调整方法，其能够高效且高精度地调整毫米波雷达装置中用于射频电路的MMIC的偏置。该方法包括：在毫米波雷达装置的偏置电路中设置DA转换器，该雷达装置包括天线，射频单元和用于执行射频单元的发送和接收处理的处理单元; 连接信号发生器代替天线; 以及将测试处理单元和控制装置连接到所述射频单元，其中，所述控制装置将数字值形式的初始偏置值应用于所述MMIC，基于所述MMIC的结果来计算所述数字偏置值的目标值当通过将目标值应用于MMIC而获得的接收信号的射频特性位于规定的限度内时，接收信号的测量，并将目标值作为生产处理单元的数字偏置值。

68. 发明授权

US07786036B2 Dielectric porcelain composition, and method for manufacturing capacitor using the same 有权
标题翻译：介电瓷组合物及其制造方法
公开(公告)号：US07786036B2
公开(公告)日：2010-08-31
申请号：US11795128
申请日：2006-03-24
申请人： Kazuhiro Komatsu , Kazuki Hirata , Atsuo Nagai , Tadashi Onomi , Kenji Oka
发明人： Kazuhiro Komatsu , Kazuki Hirata , Atsuo Nagai , Tadashi Onomi , Kenji Oka
IPC分类号： C04B35/468
CPC分类号： C04B35/4682 , C04B35/62685 , C04B2235/3206 , C04B2235/3215 , C04B2235/3217 , C04B2235/3224 , C04B2235/3239 , C04B2235/3263 , C04B2235/3418 , C04B2235/5409 , C04B2235/5445 , C04B2235/658 , C04B2235/6582 , C04B2235/6588 , C04B2235/663 , C04B2235/79 , C04B2235/96 , H01B3/12 , H01G4/1227 , H01G4/30
摘要： A dielectric ceramic composition containing at least 0.15 to 2.5 mol of a Mg compound in terms of MgO, 0 to 1.6 mol of a Ba compound in terms of BaCO3, 0.1 to 3.0 mol of a Ln (Ln includes two or three kinds of elements selected from Er, Dy, and Ho with Er being essential) compound in terms of Ln2O3, 0.01 to 0.4 mol of a Mn compound in terms of MnO4/3, 0.01 to 0.26 mol of a V compound in terms of V2O5, 0.3 to 3.5 mol of a Si compound in terms of SiO2, and 0.01 to 2.5 mol of an Al compound in terms of Al2O3 to 100 mol of barium titanate adjusted for a Ba/Ti molar ratio of 0.997 to 1.007.
摘要翻译：一种电介质陶瓷组合物，其包含至少0.15至2.5摩尔的Mg化合物，以MgO计，0至1.6摩尔Ba化合物，以BaCO 3计，0.1至3.0摩尔的Ln（Ln包括选择的两种或三种元素从Er，Dy和Ho与Er是必需的）化合物以Ln 2 O 3计，0.01〜0.4mol的Mn化合物换算成MnO 4/3，0.01〜0.26mol V化合物，V2O5为0.3〜3.5mol 的Si化合物，以SiO 2为0.01〜2.5摩尔的Al化合物，以Ba 2 Ti摩尔比为0.997〜1.007调节的Al 2 O 3〜100摩尔的钛酸钡。

69. 发明授权

US07729516B2 Ranging device utilizing image processing 有权
标题翻译：利用图像处理的测距装置
公开(公告)号：US07729516B2
公开(公告)日：2010-06-01
申请号：US11839701
申请日：2007-08-16
申请人： Nobukazu Shima , Akihiro Oota , Kenji Oka
发明人： Nobukazu Shima , Akihiro Oota , Kenji Oka
IPC分类号： G06K9/32 , G06K9/48 , H04N7/18 , H04N13/02
CPC分类号： G06K9/00805 , B60W2420/42 , G06K9/3241 , G06K2209/23 , G06T7/97
摘要： An image size changing section obtains a size changed image by changing the size of one of two original images captured by a pair of cameras. If an edge of an object has many oblique components, the edge is difficult to detect as a vertical edge but, when the image is horizontally reduced, an oblique edge becomes close to a vertical edge. For this reason, feature end points are extracted with reliability by a feature extracting section and, thereby, an object is recognized and the distance to the object is determined reliably.
摘要翻译：图像尺寸改变部通过改变由一对相机拍摄的两个原始图像中的一个的尺寸来获得尺寸改变图像。如果物体的边缘具有许多倾斜分量，则边缘难以被检测为垂直边缘，但是当图像水平减小时，倾斜边缘变得接近垂直边缘。因此，通过特征提取部分可靠地提取特征终点，从而识别对象并且可靠地确定到对象的距离。

70. 发明授权

US07612706B2 Monopulse radar apparatus and antenna switch 有权
标题翻译：单脉冲雷达装置和天线开关
公开(公告)号：US07612706B2
公开(公告)日：2009-11-03
申请号：US11630040
申请日：2005-07-15
申请人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
发明人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
IPC分类号： G01S13/00
CPC分类号： G01S13/931 , G01S13/4445 , G01S13/4454 , H01Q25/02
摘要： An antenna unit includes at least one transmission antenna and plural reception antennas. A receiver detects information including azimuth information for a target, based on an output from the antenna unit. An antenna switching unit switches connections between a transmitter and the transmission antenna and between the reception antenna and the receiver. The antenna unit includes a wide-beam array antenna and plural narrow-beam array antennas having a narrower beam width than the array antenna. A monopulse process is performed based on an output of a predetermined pair of array antennas from among the array antennas formed as the narrow-beam array antennas.
摘要翻译：天线单元包括至少一个发射天线和多个接收天线。接收机基于天线单元的输出来检测包括目标的方位信息的信息。天线切换单元切换发射机与发射天线之间以及接收天线与接收机之间的连接。天线单元包括宽阵列天线和具有比阵列天线窄的波束宽度的多个窄波束阵列天线。基于形成为窄束阵列天线的阵列天线中的预定阵列天线的输出执行单脉冲处理。

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