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1. 发明授权

US07612706B2 Monopulse radar apparatus and antenna switch 有权
标题翻译：单脉冲雷达装置和天线开关
公开(公告)号：US07612706B2
公开(公告)日：2009-11-03
申请号：US11630040
申请日：2005-07-15
申请人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
发明人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
IPC分类号： G01S13/00
CPC分类号： G01S13/931 , G01S13/4445 , G01S13/4454 , H01Q25/02
摘要： An antenna unit includes at least one transmission antenna and plural reception antennas. A receiver detects information including azimuth information for a target, based on an output from the antenna unit. An antenna switching unit switches connections between a transmitter and the transmission antenna and between the reception antenna and the receiver. The antenna unit includes a wide-beam array antenna and plural narrow-beam array antennas having a narrower beam width than the array antenna. A monopulse process is performed based on an output of a predetermined pair of array antennas from among the array antennas formed as the narrow-beam array antennas.
摘要翻译：天线单元包括至少一个发射天线和多个接收天线。接收机基于天线单元的输出来检测包括目标的方位信息的信息。天线切换单元切换发射机与发射天线之间以及接收天线与接收机之间的连接。天线单元包括宽阵列天线和具有比阵列天线窄的波束宽度的多个窄波束阵列天线。基于形成为窄束阵列天线的阵列天线中的预定阵列天线的输出执行单脉冲处理。

2. 发明申请

US20070182619A1 Monopulse radar apparatus and antenna switch 有权
标题翻译：单脉冲雷达装置和天线开关
公开(公告)号：US20070182619A1
公开(公告)日：2007-08-09
申请号：US11630040
申请日：2005-07-15
申请人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
发明人： Kanako Honda , Kenji Oka , Kimihisa Yoneda
IPC分类号： G01S13/44
CPC分类号： G01S13/931 , G01S13/4445 , G01S13/4454 , H01Q25/02
摘要： An antenna system is effectively formed in a limited space, to make a configuration of the antenna system a simple mechanism. In a monopulse radar apparatus, an antenna unit includes an array antenna (a wide-beam array antenna) formed by a part of antenna elements that are constituent elements of the antenna unit (an area K1), and a plurality of narrow-beam array antennas formed as array antennas having a narrower beam width than the array antenna. A monopulse process is performed based on an output of a predetermined pair of array antennas (areas K2 and K3) from among the array antennas formed as the narrow-beam array antennas.
摘要翻译：在有限的空间中有效地形成天线系统，使得天线系统的配置成为简单的机构。在单脉冲雷达装置中，天线单元包括由作为天线单元的构成要素（区域K 1）的天线元件的一部分形成的阵列天线（宽光束阵列天线）和多个窄光束阵列天线形成为具有比阵列天线窄的波束宽度的阵列天线。基于形成为窄束阵列天线的阵列天线中的预定对阵列天线（区域K 2和K 3）的输出执行单脉冲处理。

3. 发明授权

US08949043B2 Surface inspecting apparatus and method for calibrating same 有权
标题翻译：表面检查装置及其校准方法
公开(公告)号：US08949043B2
公开(公告)日：2015-02-03
申请号：US13202734
申请日：2010-02-02
申请人： Kenji Oka , Kenji Mitomo , Kenichiro Komeda
发明人： Kenji Oka , Kenji Mitomo , Kenichiro Komeda
IPC分类号： G01N21/94 , G01N21/93 , G01N21/95
CPC分类号： G01N21/9501 , G01N21/93 , G01N2201/103
摘要： While an illumination optical system is irradiating the surface of a contaminated standard wafer with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer, then detectors of a detection optical system each detect the light scattered from the surface of the contaminated standard wafer, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes of the detectors, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed. This makes is easy to calibrate the detection sensitivity.
摘要翻译：当照明光学系统用照明光照射污染的标准晶片的表面时，该照明光被扫描在受污染的标准晶片的表面上，然后检测光学系统的检测器每个都检测从污染的表面散射的光标准晶片，接下来的预定参考值除了散射光上的检测结果之外，用于计算检测器的光电倍增管的检测灵敏度校正的补偿参数“Comp”，并将补偿参数“Comp”分为时间 - 变化劣化参数“P”，光学特性参数“Opt”和传感器特性参数“Lr”，并相应地管理。这使得检测灵敏度变得容易。

4. 发明授权

US08831899B2 Inspecting apparatus and an inspecting method 有权
标题翻译：检查仪器和检查方法
公开(公告)号：US08831899B2
公开(公告)日：2014-09-09
申请号：US13127051
申请日：2009-10-15
申请人： Kazunori Nemoto , Akira Hamamatsu , Hideo Ota , Kenji Oka , Takahiro Jingu
发明人： Kazunori Nemoto , Akira Hamamatsu , Hideo Ota , Kenji Oka , Takahiro Jingu
IPC分类号： G01C19/00 , G01N21/00 , B82Y35/00 , G01N21/93 , G01B11/30 , G01N21/95 , G01N21/88 , H01L21/66
CPC分类号： G01B11/303 , B82Y35/00 , G01N21/93 , G01N21/9501 , G01N2021/8822 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system and method for determining measurement results of a dark-field inspection apparatus up to a microscopic area. A dark-field inspection apparatus is calibrated using a reference wafer having microroughness of an irregular asperity pattern accurately formed on a surface, and the microroughness of the surface having an ensured microroughness degree. This microroughness is measured by using an AFM, and an expected haze value is obtained based on the measured value. Then, haze of the surface of the reference wafer is measured by the dark-field inspection apparatus to be inspected to obtain an actually-measured haze value, and a difference between the expected haze value and the actually-measured haze value is obtained. Based on this difference, a haze measurement parameter of the dark-field inspection apparatus is adjusted so that the actually-measured haze value and the expected haze value match each other.
摘要翻译：用于确定暗视场检查装置的测量结果直到微观区域的系统和方法。使用具有精确形成在表面上的不规则凹凸图案的微粗糙度的参考晶片校准暗场检查装置，并且具有确保的微粗糙度的表面的微粗糙度。通过使用AFM测量该微粗糙度，并且基于测量值获得预期雾度值。然后，通过需要检查的暗视野检查装置测量参考晶片的表面的雾度，以获得实际测得的雾度值，并获得预期雾度值和实际测得的雾度值之间的差。基于该差异，调整暗场检查装置的雾度测量参数，使得实际测量的雾度值和预期雾度值彼此匹配。

5. 发明授权

US08804108B2 Inspection method and inspection apparatus 有权
标题翻译：检验方法和检验仪器
公开(公告)号：US08804108B2
公开(公告)日：2014-08-12
申请号：US13202727
申请日：2009-12-04
申请人： Kenji Mitomo , Kenji Oka
发明人： Kenji Mitomo , Kenji Oka
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/956 , G01N2021/4707 , G01N2021/8822
摘要： This application relates to an inspection apparatus including: a stage which holds a specimen; an illumination optical system which illuminates a surface of the specimen held on the stage, with illumination light; a dark-field optical system which detects scattered light generated by the illumination light with which the specimen is illuminated; a photoelectric converter which converts the scattered light detected by the dark-field optical system, into an electric signal; an A/D converter which converts the electric signal obtained by conversion by the photoelectric converter, into a digital signal; a judgement unit which determines the dimension of a foreign substance on the surface of the specimen on the basis of a magnitude of the scattered light from the foreign substance; and a signal processor which determines an inspection condition by use of information on the scattered light from the specimen surface.
摘要翻译：本申请涉及一种检查装置，包括：保持试样的台架; 照明光学系统，用照明光照亮保持在舞台上的标本的表面; 一个暗场光学系统，用于检测被照射的照明光产生的散射光; 将由暗视场光学系统检测出的散射光转换成电信号的光电转换器; 将通过光电转换器的转换获得的电信号转换为数字信号的A / D转换器; 判断单元，其基于来自异物的散射光的大小来确定样品表面上的异物的尺寸; 以及信号处理器，其通过使用关于来自样本表面的散射光的信息来确定检查条件。

6. 发明授权

US08552445B2 Semiconductor light emitting device and method for manufacturing the same 有权
标题翻译：半导体发光器件及其制造方法
公开(公告)号：US08552445B2
公开(公告)日：2013-10-08
申请号：US12808472
申请日：2008-12-26
申请人： Yohei Wakai , Hiroaki Matsumura , Kenji Oka
发明人： Yohei Wakai , Hiroaki Matsumura , Kenji Oka
IPC分类号： H01L33/00
CPC分类号： H01L33/005 , H01L33/007 , H01L33/0079 , H01L33/20 , H01L33/22 , H01L33/36 , H01L33/382 , H01L33/44 , H01L2933/0016 , H01L2933/0058
摘要： A semiconductor light emitting device having high reliability and excellent light distribution characteristics is provided. Specifically, a semiconductor light emitting device 1 is provided with an n-electrode 50, which is arranged on a light extraction surface on the side opposite to the surface whereupon a semiconductor stack 40 is mounted on a substrate 10. A plurality of convexes are arranged on a first convex region 80 and a second convex region 90 on the light extraction surface. The second convex region 90 adjoins to the interface between the n-electrode 50 and the semiconductor stack 40, between the first convex region 80 and the n-electrode 50. The base end of the first convex arranged in the first convex region 80 is positioned closer to alight emitting layer 42 than the interface between the n-electrode 50 and the semiconductor stack 40, and the base end of the second convex arranged in the second convex region 90 is positioned closer to the interface between the n-electrode 50 and the semiconductor stack 40 than the base end of the first convex.
摘要翻译：提供了具有高可靠性和优异的光分布特性的半导体发光器件。具体地，半导体发光器件1设置有n电极50，其被配置在与衬底10上安装有半导体堆叠40的表面相反侧的光提取表面上。多个凸起布置在光提取表面上的第一凸区80和第二凸区90上。第二凸区域90与第一凸区域80和n电极50之间的n电极50和半导体堆叠体40之间的界面相邻。布置在第一凸区域80中的第一凸部的基端位于比n电极50和半导体堆叠40之间的界面更靠近发光层42，并且布置在第二凸区域90中的第二凸起的基端位于更靠近n电极50和第二凸起区域90之间的界面处。半导体堆叠40比第一凸起的基端。

7. 发明申请

US20120076438A1 VISUAL LINE ESTIMATING APPARATUS 有权
标题翻译：可视线估计装置
公开(公告)号：US20120076438A1
公开(公告)日：2012-03-29
申请号：US13240200
申请日：2011-09-22
申请人： Kenji Oka , Sotaro Tsukizawa
发明人： Kenji Oka , Sotaro Tsukizawa
IPC分类号： G06K9/36
CPC分类号： G06K9/0061 , G06K9/00838
摘要： The visual line estimating apparatus 200 comprises: an image inputting section 201 operable to take an image of a human; a visual line measurement section 202 operable to measure a direction of a visual line on the basis of the taken image; a visual line measuring result storing section 211 operable to store therein visual line measuring results previously measured; a representative value extracting section 212 operable to extract a previous representative value; and a visual line determining section 213 operable to judge whether or not a difference between the representative value and the visual line measuring result is lower than a predetermined threshold to determine a visual line estimating result from the representative value and the visual line measuring result.
摘要翻译：视线估计装置200包括：图像输入部201，用于拍摄人的图像; 视线测量部分202，可操作以基于所拍摄的图像测量视线的方向; 可视线测量结果存储部分211，用于存储先前测量的可视线测量结果; 代表值提取部212，用于提取先前的代表值; 以及视线确定部分213，其可操作以判断代表值和视线测量结果之间的差是否低于预定阈值，以根据代表值和视线测量结果确定视线估计结果。

8. 发明申请

US20120050516A1 PUPIL DETECTION DEVICE AND PUPIL DETECTION METHOD 有权
标题翻译： PUPIL检测装置和检测方法
公开(公告)号：US20120050516A1
公开(公告)日：2012-03-01
申请号：US13318431
申请日：2011-01-24
申请人： Sotaru Tsukizawa , Kenji Oka
发明人： Sotaru Tsukizawa , Kenji Oka
IPC分类号： H04N7/18
CPC分类号： G06K9/00604
摘要： A pupil detection apparatus and pupil detection method are provided that enable a high-accuracy detection result to be selected and output even when a gray scale image using near-infrared light is used. In a pupil detection apparatus (100), based on a calculated value of red-eye occurrence intensity that is relative brightness of brightness within a first pupil image detected by a pupil detection section (103) with respect to brightness of a peripheral image outside the first pupil image, and a correlation characteristic of red-eye occurrence intensity and a pupil detection accuracy value, a switching determination section (105) selectively outputs a detection result of the first pupil image or a detection result of a second pupil image detected by a pupil detection section (104). The pupil detection apparatus (100) has a first imaging pair comprising an imaging section (111) and an illumination section (112) separated by separation distance d1, and a second imaging pair whose separation distance d2 is greater than that of the first imaging pair. One pupil detection section (103) uses an image captured by the first imaging pair, and the other pupil detection section (104) uses an image captured by the second imaging pair.
摘要翻译：提供了一种瞳孔检测装置和光瞳检测方法，即使当使用使用近红外光的灰度图像时，也能够选择和输出高精度检测结果。在瞳孔检测装置（100）中，基于由瞳孔检测部（103）检测出的第一瞳孔图像内的亮度相对亮度相对于外部图像外的周边图像的亮度的红眼发生强度的计算值第一光瞳图像以及红眼发生强度和瞳孔检测精度值的相关特性，切换判定部（105）选择性地输出第一瞳孔图像的检测结果或由第二瞳孔图像检测到的第二瞳孔图像的检测结果瞳孔检测部（104）。瞳孔检测装置（100）具有第一成像对，其包括成像部（111）和以分离距离d1分隔开的照明部（112），以及第二成像对，其间隔距离d2大于第一成像对。一个光瞳检测部（103）使用由第一成像对拍摄的图像，另一光瞳检测部（104）使用由第二成像对拍摄的图像。

9. 发明申请

US20100264443A1 SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：半导体发光器件及其制造方法
公开(公告)号：US20100264443A1
公开(公告)日：2010-10-21
申请号：US12808472
申请日：2008-12-26
申请人： Yohei Wakai , Hiroaki Matsumura , Kenji Oka
发明人： Yohei Wakai , Hiroaki Matsumura , Kenji Oka
IPC分类号： H01L33/02
CPC分类号： H01L33/005 , H01L33/007 , H01L33/0079 , H01L33/20 , H01L33/22 , H01L33/36 , H01L33/382 , H01L33/44 , H01L2933/0016 , H01L2933/0058
摘要： A semiconductor light emitting device having high reliability and excellent light distribution characteristics is provided. Specifically, a semiconductor light emitting device 1 is provided with an n-electrode 50, which is arranged on a light extraction surface on the side opposite to the surface whereupon a semiconductor stack 40 is mounted on a substrate 10. A plurality of convexes are arranged on a first convex region 80 and a second convex region 90 on the light extraction surface. The second convex region 90 adjoins to the interface between the n-electrode 50 and the semiconductor stack 40, between the first convex region 80 and the n-electrode 50. The base end of the first convex arranged in the first convex region 80 is positioned closer to alight emitting layer 42 than the interface between the n-electrode 50 and the semiconductor stack 40, and the base end of the second convex arranged in the second convex region 90 is positioned closer to the interface between the n-electrode 50 and the semiconductor stack 40 than the base end of the first convex.
摘要翻译：提供了具有高可靠性和优异的光分布特性的半导体发光器件。具体地，半导体发光器件1设置有n电极50，其被配置在与衬底10上安装有半导体堆叠40的表面相反侧的光提取表面上。多个凸起布置在光提取表面上的第一凸区80和第二凸区90上。第二凸区域90与第一凸区域80和n电极50之间的n电极50和半导体堆叠体40之间的界面相邻。布置在第一凸区域80中的第一凸部的基端位于比n电极50和半导体堆叠40之间的界面更靠近发光层42，并且布置在第二凸区域90中的第二凸起的基端位于更靠近n电极50和第二凸起区域90之间的界面处。半导体堆叠40比第一凸起的基端。

10. 发明申请

US20090102702A1 Bias adjustment of radio frequency unit in radar apparatus 有权
标题翻译：雷达设备射频单元的偏置调整
公开(公告)号：US20090102702A1
公开(公告)日：2009-04-23
申请号：US12232067
申请日：2008-09-10
申请人： Kenji Oka , Hiroshi Ito , Jun Ito
发明人： Kenji Oka , Hiroshi Ito , Jun Ito
IPC分类号： G01S13/00
CPC分类号： G01S7/4004 , G01S7/032
摘要： Disclosed is a method of bias adjustment for a millimeter wave radar apparatus that can efficiently and highly accurately adjust the bias of an MMIC used in a radio frequency circuit in the millimeter wave radar apparatus. The method comprises: providing a DA converter in a bias circuit in the millimeter wave radar apparatus comprising an antenna, a radio frequency unit, and a processing unit for performing transmission and reception processing of the radio frequency unit; connecting a signal generator in place of the antenna; and connecting a test processing unit and a control apparatus to the radio frequency unit, wherein the control apparatus applies an initial bias value in the form of a digital value to the MMIC, calculates the target value for the digital bias value based on the result of the measurement of the received signal, and takes the target value as the digital bias value for the production processing unit when the radio frequency characteristic of the received signal obtained by applying the target value to the MMIC lies within specified limits.
摘要翻译：公开了一种毫米波雷达装置的偏置调整方法，其能够高效且高精度地调整毫米波雷达装置中用于射频电路的MMIC的偏置。该方法包括：在毫米波雷达装置的偏置电路中设置DA转换器，该雷达装置包括天线，射频单元和用于执行射频单元的发送和接收处理的处理单元; 连接信号发生器代替天线; 以及将测试处理单元和控制装置连接到所述射频单元，其中，所述控制装置将数字值形式的初始偏置值应用于所述MMIC，基于所述MMIC的结果来计算所述数字偏置值的目标值当通过将目标值应用于MMIC而获得的接收信号的射频特性位于规定的限度内时，接收信号的测量，并将目标值作为生产处理单元的数字偏置值。

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