专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US4226501A Four mirror unobscurred anastigmatic telescope with all spherical surfaces 失效
标题翻译：四镜无反射的无声望远镜与所有球面
公开(公告)号：US4226501A
公开(公告)日：1980-10-07
申请号：US950647
申请日：1978-10-12
申请人： David R. Shafer
发明人： David R. Shafer
IPC分类号： G02B17/06
CPC分类号： G02B23/06 , G02B17/0663 , G02B17/0657
摘要： A telescope made only of spherical mirrors including a first mirror system comprising a first, concave spherical mirror and a second, convex spherical mirror have a common center of curvature, the ratio of the radius of said first, concave mirror to said second convex mirror being approximately .sqroot.5+1:.sqroot.5-1, said first mirror arranged to intersect input rays of collimated light and to direct them to said second mirror, said first and second mirrors arranged off axis so as to not obstruct the light path to said first mirror; and a second mirror system comprising at least a third, concave mirror and a fourth, convex mirror having a common center of curvature, the radius of said third mirror being approximately twice the radius of said fourth mirror, said third mirror positioned to intersect light reflected from said second mirror and to reflect it to said fourth mirror, said fourth mirror reflecting light back to said third mirror from which it is reflected to form a real image, the optical axis of said system being defined by a line between the centers of curvature of said first and second systems.
摘要翻译：仅由球面镜构成的望远镜包括第一反射镜系统，该第一反射镜系统包括第一凹球面镜和第二凸球面镜，其具有共同的曲率中心，所述第一凹面镜与所述第二凸面镜的半径之比为大约2ROOT 5 + 1：2ROOT 5-1，所述第一反射镜被布置为与准直光的输入光线相交并将其引导到所述第二反射镜，所述第一和第二反射镜布置在离轴上，以便不阻挡到所述第一镜子; 以及第二镜系统，包括至少第三凹面镜和具有共同曲率中心的第四凸面镜，所述第三镜的半径大约是所述第四镜的半径的两倍，所述第三镜被定位成相互反射的光从所述第二反射镜并将其反射到所述第四反射镜，所述第四反射镜将光反射回所述第三反射镜，从其反射以形成实像，所述系统的光轴由曲率中心之间的线的所述第一和第二系统。

52. 发明授权

US07869121B2 Small ultra-high NA catadioptric objective using aspheric surfaces 有权
标题翻译：使用非球面表面的小超高NA反射折射物镜
公开(公告)号：US07869121B2
公开(公告)日：2011-01-11
申请号：US11375316
申请日：2006-03-13
申请人： David R. Shafer , J. Joseph Armstrong , Yung-Ho Chuang
发明人： David R. Shafer , J. Joseph Armstrong , Yung-Ho Chuang
IPC分类号： G02B5/08
CPC分类号： G02B21/04 , G02B17/0856
摘要： A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. One or more elements may employ an aspheric surface. The objective may provide an uncorrected spectral bandwidth up to approximately 193 to 266 nanometers and numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.
摘要翻译：提供了用于成像试样的相对较高的NA目标。该目的包括具有至少一个聚焦透镜的透镜组，该至少一个聚焦透镜被配置为接收光能并形成中间图像，定向成接收中间图像并提供中间光能的至少一个场透镜，以及定位成接收中间图像的中间图像光能并向样品施加光能。一个或多个元件可以采用非球面。该目的可以提供高达约193至266纳米的未校正的光谱带宽和超过0.9的数值孔径。元素的直径小于100毫米，并且可以适合标准显微镜。场透镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其它透镜不同的材料形成。

53. 发明授权

US07639419B2 Inspection system using small catadioptric objective 有权
标题翻译：检验系统采用小反射折射目标
公开(公告)号：US07639419B2
公开(公告)日：2009-12-29
申请号：US10615512
申请日：2003-07-07
申请人： Yung-Ho Chuang , J. Joseph Armstrong , David R. Shafer
发明人： Yung-Ho Chuang , J. Joseph Armstrong , David R. Shafer
IPC分类号： G02B17/08
CPC分类号： G01N21/8806 , G01N21/9501 , G02B5/001 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70225 , G03F7/70341
摘要： A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.
摘要翻译：公开了一种用于减小尺寸反射折射率物镜的系统。包括缩小尺寸物镜的系统包括允许增强成像的各种子系统，子系统包括照明，成像，自动对焦，定位，传感器，数据采集和数据分析。该目的可以通过红外光范围具有在约190纳米范围内的波长的光能，并且物镜的元件的直径小于100mm。该目的包括聚焦透镜组和至少一个定位成从聚焦透镜组接收聚焦光能并提供中间光能的场透镜。目的还包括一个Mangin镜面布置。该设计为成像目的赋予数值孔径超过0.65并且高达约0.90的受控光能，并且该设计可用于各种环境中。

54. 发明授权

US07502177B2 Broad band DUV, VUV long-working distance catadioptric imaging system 有权
标题翻译：宽带DUV，VUV长距离反射折射成像系统
公开(公告)号：US07502177B2
公开(公告)日：2009-03-10
申请号：US11594634
申请日：2006-11-08
申请人： David R. Shafer , Yung-Ho Chuang
发明人： David R. Shafer , Yung-Ho Chuang
IPC分类号： G02B17/08 , G02B21/06
CPC分类号： G02B21/04 , G02B13/143 , G02B17/0804 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.
摘要翻译：提出了具有非常小的中心遮蔽性的高性能物镜，用于孔径和傅立叶滤波的外部光瞳，宽的制造公差，大的数值孔径，长的工作距离和大的视场。目标最好是远心的。该设计非常适用于紫外至紫外光谱范围波长的宽带亮场和激光暗场成像和检测。

55. 发明授权

US07426082B2 Catadioptric projection objective with geometric beam splitting 失效
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US07426082B2
公开(公告)日：2008-09-16
申请号：US11282587
申请日：2005-11-21
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学元件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

56. 发明授权

US07218445B2 Microlithographic reduction projection catadioptric objective 失效
标题翻译：微光刻折射反射折射目标
公开(公告)号：US07218445B2
公开(公告)日：2007-05-15
申请号：US10438153
申请日：2003-05-13
申请人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
发明人： David R. Shafer , Russell Hudyma , Wilhelm Ulrich
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/0828 , G02B17/0844 , G02B17/0848 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.
摘要翻译：光刻还原投影反折射物镜包括具有偶数个至少四个反射镜并且具有正的整体放大倍率的第一光学组和比具有多个透镜的第一光学组更多的图像的第二基本上折射的光学组。第二光学组具有用于提供图像缩小的负总体放大倍率。第一光学组为第二光学组提供补偿像差校正。目标形成数值孔径至少基本为0.65，优选大于0.70，或更优选大于0.75的图像。

57. 发明授权

US07180658B2 High performance catadioptric imaging system 有权
标题翻译：高性能反射折射成像系统
公开(公告)号：US07180658B2
公开(公告)日：2007-02-20
申请号：US10434374
申请日：2003-05-07
申请人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
发明人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/0812 , G02B17/0856 , G02B21/04 , G03F7/70225 , G03F7/70341
摘要： A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy and comprising at least one focusing lens. The objective further comprises at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.
摘要翻译：公开了一种减小尺寸的反射折射物镜和系统。该目的可以通过红外光范围具有在约190纳米范围内的波长的光能。元件的直径小于100毫米。该目的包括被配置为接收光能并且包括至少一个聚焦透镜的聚焦透镜组。该目的还包括至少一个取向为从聚焦透镜组接收聚焦光能并提供中间光能的场透镜。该目的还包括Mangin镜布置，其定位成从场透镜接收中间光能并形成受控的光能以传输到样本。芒格镜配置赋予数值孔径超过0.65并且高达约0.90的受控光能，并且该设计可以用于各种环境中。

58. 发明授权

US06842298B1 Broad band DUV, VUV long-working distance catadioptric imaging system 有权
标题翻译：宽带DUV，VUV长距离反射折射成像系统
公开(公告)号：US06842298B1
公开(公告)日：2005-01-11
申请号：US09796117
申请日：2001-02-28
申请人： David R. Shafer , Yung-Ho Chuang
发明人： David R. Shafer , Yung-Ho Chuang
IPC分类号： G02B17/08 , G02B21/04 , G03F7/20
CPC分类号： G02B21/04 , G02B13/143 , G02B17/0804 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.
摘要翻译：提出了具有非常小的中心遮蔽性的高性能物镜，用于孔径和傅立叶滤波的外部光瞳，宽的制造公差，大的数值孔径，长的工作距离和大的视场。目标最好是远心的。该设计非常适用于紫外至紫外光谱范围波长的宽带亮场和激光暗场成像和检测。

59. 发明授权

US06801358B2 Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system 失效
标题翻译：宽带深紫外/真空紫外线反射折射成像系统
公开(公告)号：US06801358B2
公开(公告)日：2004-10-05
申请号：US10352638
申请日：2003-01-27
申请人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
发明人： David R. Shafer , Yung-Ho Chuang , J. Joseph Armstrong
IPC分类号： G02B1314
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B17/0896 , G02B21/04 , G02B21/16 , G03F1/84 , G03F7/70275 , G03F7/70483 , G03F7/70616 , G03F7/7065
摘要： A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately. The objective designs presented have the optical axis of the Mangin mirror image relay at ninety degrees to the optical axis defined by the focusing lenses, or an in-line or straight objective having one ninety degree bend of light rays.
摘要翻译：提供了用于检查样品的设计，例如光掩模，用于不想要的颗粒和诸如图案缺陷的特征。该系统不提供中心遮蔽，用于打开和傅立叶滤波的外部光瞳，以及相对放松的制造公差，并且适用于波长低于365nm的宽带亮场和激光暗场成像和检查。在许多情况下，所使用的透镜可以使用单一材料来制造或制造。公开了物镜设计的多个实施例，全部包括至少一个小折叠镜和Mangin镜。系统离轴实现，使得返回的第二图像从第一图像横向移位，使得横向分离允许分别对每个图像进行光学接收和操纵。所提出的目标设计具有与由聚焦透镜限定的光轴90度的Mangin镜像继电器的光轴，或具有一个九十度光线弯曲的直列或直线物镜。

60. 发明授权

US06665126B2 Projection exposure lens with aspheric elements 有权
公开(公告)号：US06665126B2
公开(公告)日：2003-12-16
申请号：US09751352
申请日：2000-12-27
申请人： David R. Shafer , Wilhelm Ulrich , Helmut Beierl
发明人： David R. Shafer , Wilhelm Ulrich , Helmut Beierl
IPC分类号： G02B900
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/70241
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式