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41. 发明申请

US20080213703A1 Imaging System With Mirror Group 有权
标题翻译：镜组成像系统
公开(公告)号：US20080213703A1
公开(公告)日：2008-09-04
申请号：US11578098
申请日：2005-03-22
申请人： David Shafer , Aurelian Dodoc , Alexander Epple
发明人： David Shafer , Aurelian Dodoc , Alexander Epple
IPC分类号： G02B17/08 , G03F7/00
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.
摘要翻译：用于将布置在成像系统的物体表面中的离轴对象场成像到设置在成像系统的图像表面中的离轴图像场同时创建至少一个中间图像的成像系统具有：光轴; 具有对象侧反射镜组入口的直列式反射镜组，横向对准轴对准的像侧反射镜组出射口和反射镜组平面，并且几何地布置在反射镜组入口与反射镜组出口之间，镜组包括：第一反射镜，具有第一反射镜表面，用于在与光轴不对称的第一反射区域中接收来自物体表面的辐射; 至少一个第二反射镜，具有面向第一镜面的第二镜面，用于在不对称于光轴的第二反射区域中接收来自第一反射镜的辐射; 所述第一和第二反射镜中的至少一个是凹面镜，所述凹面镜具有在光轴上限定反射镜轴的凹面镜面; 其中反射镜组的反射镜被布置成使得来自反射镜组入口的辐射通过镜组平面至少四次，并且在离开镜组之前在镜组的凹面镜表面上反射至少两次镜组退出。可以在轴向紧凑的设计中实现图像场曲率的强过度校正。

42. 发明授权

US08004755B2 Catoptric objectives and systems using catoptric objectives 有权
标题翻译：使用反射目标的目标和系统
公开(公告)号：US08004755B2
公开(公告)日：2011-08-23
申请号：US12700169
申请日：2010-02-04
申请人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B17/06
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

43. 发明授权

US08317345B2 Catoptric objectives and systems using catoptric objectives 有权
标题翻译：使用反射目标的目标和系统
公开(公告)号：US08317345B2
公开(公告)日：2012-11-27
申请号：US13183823
申请日：2011-07-15
申请人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

44. 发明授权

US07511890B2 Refractive optical imaging system, in particular projection objective for microlithography 有权
$Refractive optical imaging system, in particular projection objective for microlithography$
标题翻译：折射光学成像系统，特别是用于微光刻的投影物镜
公开(公告)号：US07511890B2
公开(公告)日：2009-03-31
申请号：US11347316
申请日：2006-02-06
申请人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
发明人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
IPC分类号： G02B9/00
CPC分类号： G02B13/143 , G02B27/0025 , G03F7/703
摘要： A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.
摘要翻译：一种用于将布置在成像系统的物体表面中的物体区域成像为在成像系统的图像表面上布置在缩小成像刻度上的图像场域的折射光学成像系统具有多个光学元件，其被构造和布置成使得将成像系统的限定的有限场曲率设定为使得相对于成像系统凹入弯曲的物体表面成像为平坦的图像表面。

45. 发明申请

US20060198028A1 Refractive optical imaging system, in particular projection objective for microlithography 有权
$Refractive optical imaging system, in particular projection objective for microlithography$
公开(公告)号：US20060198028A1
公开(公告)日：2006-09-07
申请号：US11347316
申请日：2006-02-06
申请人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
发明人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
IPC分类号： G02B3/00
CPC分类号： G02B13/143 , G02B27/0025 , G03F7/703
摘要： A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

46. 发明申请

US20060082905A1 Catadioptric projection objective with an in-line, single-axis configuration 审中-公开
标题翻译：反射折射投影物镜具有直列，单轴配置
公开(公告)号：US20060082905A1
公开(公告)日：2006-04-20
申请号：US10965664
申请日：2004-10-14
申请人： David Shafer , Alexander Epple , Wilhelm Ulrich
发明人： David Shafer , Alexander Epple , Wilhelm Ulrich
IPC分类号： G02B17/00
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0808 , G02B17/0856 , G02B17/0892
摘要： A catadioptric objective for a microlithography projection system has an in-line single-axis arrangement of lenses and reflectors. The catadioptric portion of the objective includes a catadioptric lens element with at least one reflective surface or surface portion reflecting light back into the lens, so that the catadioptric lens element interacts with light rays through reflection as well as refraction.
摘要翻译：用于微光刻投影系统的反射折射物镜具有透镜和反射器的直列单轴布置。物镜的折反射部分包括具有至少一个将光反射回透镜的反射表面或反射面的反射折射透镜元件，使得反射折射透镜元件通过反射和折射与光线相互作用。

47. 发明申请

US20060198018A1 Imaging system 审中-公开
标题翻译：成像系统
公开(公告)号：US20060198018A1
公开(公告)日：2006-09-07
申请号：US11347315
申请日：2006-02-06
申请人： David Shafer , Aurelian Dodoc , Karl-Heinz Schuster
发明人： David Shafer , Aurelian Dodoc , Karl-Heinz Schuster
IPC分类号： G02B17/00 , G02B23/00 , G02B21/00
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0848 , G02B17/0892 , G02B27/0025 , G03F7/70275
摘要： An imaging system for imaging an object field arranged in an object surface of the imaging system onto an image field arranged in an image surface of the optical system while creating at least one intermediate image including: a first imaging subsystem for creating the intermediate image from radiation coming from the object surface, the first imaging subsystem having a first optical axis; and a second imaging subsystem different in construction from the first imaging subsystem for imaging the intermediate image onto the image surface, the second imaging subsystem having a second optical axis; wherein the first optical axis is offset with respect to the second optical axis by an axis offset at the intermediate image and wherein the intermediate image has a correction status adapted to the axis-offset such that the correction status of the image field is essentially free from aberrations caused by the axis-offset.
摘要翻译：一种成像系统，用于将布置在成像系统的物体表面中的物体场成像到布置在光学系统的图像表面中的图像场，同时创建至少一个中间图像，所述中间图像包括：第一成像子系统，用于从辐射创建中间图像来自物体表面的第一成像子系统具有第一光轴; 以及与所述第一成像子系统不同的第二成像子系统，用于将所述中间图像成像到所述图像表面上，所述第二成像子系统具有第二光轴; 其中所述第一光轴相对于所述第二光轴偏移在所述中间图像处的偏移，并且其中所述中间图像具有适于所述轴偏移的校正状态，使得所述图像场的校正状态基本上不含轴偏移造成的像差。

48. 发明申请

US20130050671A1 IMAGING OPTICSIIMAGING OPTICS, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING SAME AND RELATED METHODS 有权
标题翻译：成像光学光学，具有相同方法的微结构投影曝光装置
公开(公告)号：US20130050671A1
公开(公告)日：2013-02-28
申请号：US13602553
申请日：2012-09-04
申请人： Hans-Juergen Mann , David Shafer
发明人： Hans-Juergen Mann , David Shafer
IPC分类号： G03B27/54 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G02B17/0663 , G03F7/70233
摘要： An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
摘要翻译：成像光学元件具有多个反射镜，用于将物平面中的物场映像成图像平面中的图像场。成像光学器件包括将对象场成像到中间图像上的第一部分目标，并且成像光学器件包括将中间图像成像到图像场上的第二部分目标。第二部分目标包括在物场和图像场之间的成像光束的光束路径中的倒数第二反射镜，并且第二部分物镜包括光束路径中的最后一个反射镜。倒数第二个镜像将中间图像映射到另一个中间图像上，最后一个镜像将另外的中间图像映像到图像场上。

49. 发明申请

US20120274917A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：US20120274917A1
公开(公告)日：2012-11-01
申请号：US13482794
申请日：2012-05-29
申请人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
发明人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
IPC分类号： G03B27/70 , G03B27/32 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free imaging of a reflective object in an object field in an object plane into an image field in an image plane. An object field point has a central ray angle which is smaller than 3°. At least one of the mirrors is a near-field mirror. The imaging optics which can allow for high-quality imaging of a reflective object.
摘要翻译：提供了一种用于光刻投影曝光的成像光学装置，用于通过多个反射镜引导波长短于193nm的成像光束，用于在物体平面中的物体场中的反射物体成像成图像场中的图像平面。物体场点具有小于3°的中心射线角度。至少一个镜子是近场镜。成像光学元件可以允许反射物体的高质量成像。

50. 发明授权

US09013677B2 Imaging optics, microlithography projection exposure apparatus having same and related methods 有权
标题翻译：成像光学，具有相同方法的微光刻投影曝光装置
公开(公告)号：US09013677B2
公开(公告)日：2015-04-21
申请号：US13602553
申请日：2012-09-04
申请人： Hans-Juergen Mann , David Shafer
发明人： Hans-Juergen Mann , David Shafer
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20 , G02B17/06
CPC分类号： G03F7/702 , G02B17/0657 , G02B17/0663 , G03F7/70233
摘要： An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
摘要翻译：成像光学元件具有多个反射镜，用于将物平面中的物场映像成图像平面中的图像场。成像光学器件包括将对象场成像到中间图像上的第一部分目标，并且成像光学器件包括将中间图像成像到图像场上的第二部分目标。第二部分目标包括在物场和图像场之间的成像光束的光束路径中的倒数第二反射镜，并且第二部分物镜包括光束路径中的最后一个反射镜。倒数第二个镜像将中间图像映射到另一个中间图像上，最后一个镜像将另外的中间图像映像到图像场上。

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