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1. 发明申请

US20130063716A1 ILLUMINATION OPTICS FOR A METROLOGY SYSTEM FOR EXAMINING AN OBJECT USING EUV ILLUMINATION LIGHT AND METROLOGY SYSTEM COMPRISING AN ILLUMINATION OPTICS OF THIS TYPE 有权
标题翻译：用于使用EUV照明灯检查对象的计量系统的照明光学和包含该类型的照明光学的计量系统
公开(公告)号：US20130063716A1
公开(公告)日：2013-03-14
申请号：US13698552
申请日：2011-04-12
申请人： Hans-Jürgen Mann , Alois Herkommer
发明人： Hans-Jürgen Mann , Alois Herkommer
IPC分类号： G02B17/06
CPC分类号： G02B5/10 , G02B5/0891 , G02B17/0626 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F1/24 , G03F1/84
摘要： A metrology system serves to examine an object arranged in an object field using EUV illumination light. An illumination optics of the metrology system has a collector mirror which is arranged in the beam path directly downstream of an EUV light source. Downstream of the collector mirror, less than three additional illumination mirrors are arranged in the beam path between the collector mirror and the object field. An intermediate focus is arranged in the beam path between the collector mirror and the additional illumination mirror. The metrology system further includes a magnifying imaging optics for imaging the object field into an image field in an image plane. As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.
摘要翻译：计量系统用于检查使用EUV照明光排列在物场中的物体。计量系统的照明光学器件具有收集器反射镜，其被布置在EUV光源的直接下游的光束路径中。在集光镜的下游，在收集反射镜和物场之间的光束路径中布置少于三个附加照明反射镜。在聚光镜和附加照明镜之间的光束路径中布置中间焦点。测量系统还包括放大成像光学器件，用于将对象场成像到图像平面中的图像场。结果，获得了一种计量系统，其包括照明光学器件，其通过适合于当前EUV投影曝光设备的照明情况的照明参数来确保对物场的有效照明。

2. 发明授权

US07864429B2 Optical illumination system for creating a line beam 有权
标题翻译：用于创建线束的光学照明系统
公开(公告)号：US07864429B2
公开(公告)日：2011-01-04
申请号：US12414303
申请日：2009-03-30
申请人： Holger Muenz , Alois Herkommer , Rafael Egger
发明人： Holger Muenz , Alois Herkommer , Rafael Egger
IPC分类号： G02B27/10
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0732 , B23K26/0738 , G02B27/0966
摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.
摘要翻译：在一个方面，本公开的特征在于一种光学系统，其被配置为从光束产生表面上的强度分布，由此光学系统包括至少第一光学元件，其将入射光束分成多个光束，其中一些光束在所述表面上的第一方向上至少部分地重叠，由此所述光学系统还包括至少第二光学元件，所述第二光学元件在所述表面上沿第二方向移位所述光束中的至少一个。

3. 再颁专利

USRE41350E1 Catadioptric objective comprising two intermediate images 有权
标题翻译：反射折射物镜包括两个中间图像
公开(公告)号：USRE41350E1
公开(公告)日：2010-05-25
申请号：US11183303
申请日：2005-07-15
申请人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Füerter , Rudolph Von Büenau , Wilhelm Ulrich
发明人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Füerter , Rudolph Von Büenau , Wilhelm Ulrich
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
摘要翻译：包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。目标包括两个折射部分目标和一个反射折射部分目标。目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。部分目标中的至少一个纯粹是折射的。其中一个部分目标是纯粹的折射，一个纯粹是反射的。

4. 发明授权

US06600608B1 Catadioptric objective comprising two intermediate images 有权
标题翻译：反射折射物镜包括两个中间图像
公开(公告)号：US06600608B1
公开(公告)日：2003-07-29
申请号：US09434702
申请日：1999-11-05
申请人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
发明人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
摘要翻译：包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。目标包括两个折射部分目标和一个反射折射部分目标。目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。部分目标中的至少一个纯粹是折射的。其中一个部分目标是纯粹的折射，一个纯粹是反射的。

5. 发明授权

US09110225B2 Illumination optics for a metrology system for examining an object using EUV illumination light and metrology system comprising an illumination optics of this type 有权
标题翻译：用于使用EUV照明光检查物体的计量系统的照明光学器件和包括这种类型的照明光学器件的计量系统
公开(公告)号：US09110225B2
公开(公告)日：2015-08-18
申请号：US13698552
申请日：2011-04-12
申请人： Hans-Jürgen Mann , Alois Herkommer
发明人： Hans-Jürgen Mann , Alois Herkommer
IPC分类号： G02B17/06 , G02B5/10 , G02B5/08 , G03F1/84 , G02B19/00 , G03F1/24
CPC分类号： G02B5/10 , G02B5/0891 , G02B17/0626 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F1/24 , G03F1/84
摘要： A metrology system serves to examine an object arranged in an object field using EUV illumination light. An illumination optics of the metrology system has a collector mirror which is arranged in the beam path directly downstream of an EUV light source. Downstream of the collector mirror, less than three additional illumination mirrors are arranged in the beam path between the collector mirror and the object field. An intermediate focus is arranged in the beam path between the collector mirror and the additional illumination mirror. The metrology system further includes a magnifying imaging optics for imaging the object field into an image field in an image plane. As a result a metrology system is obtained which comprises an illumination optics that ensures an efficient illumination of the object field by means of illumination parameters which are well adapted to the illumination situation of current EUV projection exposure apparatuses.
摘要翻译：计量系统用于检查使用EUV照明光排列在物场中的物体。计量系统的照明光学器件具有收集器反射镜，其被布置在EUV光源的直接下游的光束路径中。在集光镜的下游，在收集反射镜和物场之间的光束路径中布置少于三个附加照明反射镜。在聚光镜和附加照明镜之间的光束路径中布置中间焦点。测量系统还包括放大成像光学器件，用于将对象场成像到图像平面中的图像场。结果，获得了一种计量系统，其包括照明光学器件，其通过适合于当前EUV投影曝光设备的照明情况的照明参数来确保对物场的有效照明。

6. 发明申请

US20100079765A1 METHOD FOR MEASURING A SPECTRUM OF A NARROWBAND LIGHT SOURCE, AND SPECTROMETER ARRANGEMENT 有权
标题翻译：用于测量窄带光源的光谱的方法和光谱仪布置
公开(公告)号：US20100079765A1
公开(公告)日：2010-04-01
申请号：US12558874
申请日：2009-09-14
申请人： Johannes Kraus , Alois Herkommer , Bernhard Weigl , Michel Le Maire , Holger Muenz
发明人： Johannes Kraus , Alois Herkommer , Bernhard Weigl , Michel Le Maire , Holger Muenz
IPC分类号： G01J3/45
CPC分类号： G01J3/26 , G01J3/36
摘要： A spectrometer arrangement for measuring a spectrum of a light beam emitted by a narrowband light source, such as a bandwidth-narrowed laser, includes at least one etalon, a beam splitter for splitting the light beam into a first partial beam and a second partial beam, one or more optical directing elements for directing the first partial beam n times and the second partial beam (n+k) times through the at least one etalon, wherein n and k are integers ≧1. The spectrometer arrangement further has at least one light-sensitive detector and an evaluation device for evaluating the spectra—recorded by the at least one detector—of the first partial beam that has passed through the at least one etalon n times and of the second partial beam that has passed through the at least one etalon (n+k) times in order to determine the light spectrum corrected for the apparatus function of the at least one etalon.
摘要翻译：用于测量由窄带光源（例如带宽变窄的激光器）发射的光束的光谱的光谱仪装置包括至少一个标准具，用于将光束分成第一部分光束的分束器和第二部分光束一个或多个用于通过至少一个标准具指导第一部分光束n次和第二部分光束（n + k）的光学引导元件，其中n和k是整数≥1。光谱仪布置还具有至少一个光敏检测器和评估装置，用于评估已经通过至少一个标准具的第一部分光束的至少一个检测器记录的光谱n次和第二部分光束已经通过至少一个标准具（n + k）次的光束，以便确定校正了至少一个标准具的装置功能的光谱。

7. 发明授权

US07321468B2 Method and optical arrangement for beam guiding of a light beam with beam delay 有权
标题翻译：具有光束延迟的光束的光束引导的方法和光学布置
公开(公告)号：US07321468B2
公开(公告)日：2008-01-22
申请号：US11013188
申请日：2004-12-15
申请人： Alois Herkommer , Holger Muenz , Wolfgang Seifert
发明人： Alois Herkommer , Holger Muenz , Wolfgang Seifert
IPC分类号： G02B27/10 , G02B27/12 , G02B5/08 , H01S3/081 , H01S3/08
CPC分类号： G03F7/70041 , G02B27/126 , G02B27/144 , G02B27/145 , G03F7/7055
摘要： A method for beam guiding of a light beam generated by a light source to a target location along a path distance LS, comprises splitting the light beam on the path distance LS at least once into a first partial beam and a second partial beam, guiding the first partial beam additionally at least once along a delay line, the first partial beam thereby covering an additional path distance LD, guiding the second partial beam only along the path distance LS, combining the first and second partial beams after the first partial beam having passed through the delay line and guiding the combined beam to the target location, wherein the light beam is guided along the path distance LS and LD in such a way that the light beam generated by the light source has a predetermined beam width B at the target location, expanding the light beam between the light source and the target location at least once to a beam width B′>B and comprising the light beam again at least once in such a way that the light beam has the predetermined beam width B at the target location.
摘要翻译：将由光源产生的光束沿着路径距离L S>的光束引导到目标位置的方法包括将光束分开在路径距离L S S上，至少一次进入第一部分光束和第二部分光束，沿着延迟线另外引导第一部分光束至少一次，从而第一部分光束覆盖附加路径距离L D D，引导第二部分光束仅沿着路径距离L S S，在第一部分光束已经通过延迟线并将组合光束引导到目标位置之后组合第一和第二部分光束，其中光束沿着路径距离L S S和L D D被引导，使得由光源产生的光束在目标位置具有预定的光束宽度B，扩展在光源和目标位置之间的光束至少一束到波束宽度B'> B并且包括光束再次至少一次，使得光束在目标位置具有预定的光束宽度B.

8. 发明申请

US20120274917A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：US20120274917A1
公开(公告)日：2012-11-01
申请号：US13482794
申请日：2012-05-29
申请人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
发明人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
IPC分类号： G03B27/70 , G03B27/32 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free imaging of a reflective object in an object field in an object plane into an image field in an image plane. An object field point has a central ray angle which is smaller than 3°. At least one of the mirrors is a near-field mirror. The imaging optics which can allow for high-quality imaging of a reflective object.
摘要翻译：提供了一种用于光刻投影曝光的成像光学装置，用于通过多个反射镜引导波长短于193nm的成像光束，用于在物体平面中的物体场中的反射物体成像成图像场中的图像平面。物体场点具有小于3°的中心射线角度。至少一个镜子是近场镜。成像光学元件可以允许反射物体的高质量成像。

9. 发明授权

US08141785B2 Optical delay module for lengthening the propagation path of a light beam and pulse multiplication or elongation module 有权
标题翻译：光延迟模块，用于延长光束的传播路径和脉冲倍增或延伸模块
公开(公告)号：US08141785B2
公开(公告)日：2012-03-27
申请号：US12341576
申请日：2008-12-22
申请人： Alois Herkommer , Holger Muenz
发明人： Alois Herkommer , Holger Muenz
IPC分类号： G02B26/00
CPC分类号： G03F7/70075 , G02B27/126 , G02B27/143 , G02B27/144 , G02B27/145 , G03F7/7055
摘要： The invention relates to an optical delay module for lengthening the propagation path of a light beam comprises a first spherical mirror and a second spherical mirror, the first spherical mirror and the second spherical mirror having equal radii of curvature, the first and the second mirror being arranged on a common axis of symmetry with concave sides of the first and second mirrors being situated opposite one another at a distance from one another which corresponds to the radii of curvature of the first and second mirrors. The module also includes a coupling-in area for coupling the light beam into a space between the first and second mirrors and a coupling-out area for coupling the light beam out of the space between the first and second mirrors. The propagation path of the light beam between the coupling-in area and the coupling-out area corresponding at least approximately to quadruple the mirror distance, at least one optical arrangement arranged between the first and second mirrors, the optical arrangement being arranged to transfer the light beam between the first and second mirrors in such a way that the propagation path of the light beam without masking out of beam parts between the coupling-in area and the coupling-out area corresponds approximately to 2N times the mirror distance, where N is an integer >2.
摘要翻译：本发明涉及一种用于延长光束传播路径的光学延迟模块，包括第一球面镜和第二球面镜，第一球面镜和第二球面镜具有相等的曲率半径，第一和第二镜是布置在共同的对称轴上，第一和第二反射镜的凹面彼此相对设置，彼此相距一定距离，对应于第一和第二反射镜的曲率半径。该模块还包括用于将光束耦合到第一和第二反射镜之间的空间的耦合入区域和用于将光束耦合到第一和第二反射镜之间的空间的耦合输出区域。在耦合入区域和耦合输出区域之间的光束的传播路径至少对应于反射镜距离的四倍，布置在第一和第二反射镜之间的至少一个光学布置，光学布置被布置成将在第一和第二反射镜之间的光束，使得光束的传播路径在耦合入射区域和耦合输出区域之间的光束部分之外不被掩蔽，对应于反射镜距离的2N倍，其中N是一个整数> 2。

10. 发明申请

US20060209310A1 Optical illumination system for creating a line beam 失效
公开(公告)号：US20060209310A1
公开(公告)日：2006-09-21
申请号：US11318127
申请日：2005-12-22
申请人： Holger Muenz , Alois Herkommer , Rafael Egger
发明人： Holger Muenz , Alois Herkommer , Rafael Egger
IPC分类号： G01B9/02
CPC分类号： G02B27/0927 , B23K26/0604 , B23K26/0608 , B23K26/066 , B23K26/067 , B23K26/0732 , B23K26/0738 , G02B27/0966
摘要： In one aspect, the disclosure features an optical system configured to create from a beam of light an intensity distribution on a surface, whereby the optical system comprises at least a first optical element which splits the incident beam into a plurality of beams some of which at least partially overlap in a first direction on said surface and whereby the optical system further comprises at least a second optical element which displaces at least one of said beams in a second direction on said surface.

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