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41. 发明授权

US08048515B2 Graphite material and a method of producing graphite material 有权
标题翻译：石墨材料和石墨材料的生产方法
公开(公告)号：US08048515B2
公开(公告)日：2011-11-01
申请号：US12132057
申请日：2008-06-03
申请人： Toshiyuki Nishiwaki , Masahiro Yasuda , Toshiki Ito
发明人： Toshiyuki Nishiwaki , Masahiro Yasuda , Toshiki Ito
IPC分类号： C01B31/00 , C01B31/02 , A61F13/15 , B32B3/00 , B32B3/26
CPC分类号： F16F1/022 , B23H1/06 , B28D1/16 , C01B32/20 , C04B35/522 , C04B35/532 , C04B38/0022 , C04B2111/00844 , C04B2235/422 , C04B2235/48 , C04B2235/5436 , C04B2235/5481 , C04B2235/77 , C04B2235/94 , C04B2235/96 , Y10T428/249922 , Y10T428/249975 , Y10T428/249977 , Y10T428/249978 , Y10T428/249979 , Y10T428/30 , C04B38/0054 , C04B38/0067 , C04B38/0074
摘要： A graphite material includes a plurality of graphite particles and a plurality of pores which form a microstructure. When a cross-section of the microstructure is observed with a scanning electron microscope, the number of the pores appearing on the cross-section is more than 250 or more per 6000 μm2, an average area of the pores appearing on the cross-section is 5 μm2 or less, and an average aspect ratio of the pores appearing on the cross-section is 0.55 or less.
摘要翻译：石墨材料包括多个石墨颗粒和多个形成微结构的孔。当用扫描电子显微镜观察显微结构的横截面时，截面上出现的孔数在6000μm2以上超过250以上，横截面上出现的孔的平均面积为 5μm以下，并且在截面上出现的孔的平均纵横比为0.55以下。

42. 发明申请

US20110259270A1 CARBON COMPONENT AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：碳组分及其制造方法
公开(公告)号：US20110259270A1
公开(公告)日：2011-10-27
申请号：US13090261
申请日：2011-04-20
申请人： Seiji MINOURA , Jun Ohashi , Toshiki Ito , Koji Ishida , Fumihito Ogawa
发明人： Seiji MINOURA , Jun Ohashi , Toshiki Ito , Koji Ishida , Fumihito Ogawa
IPC分类号： C30B25/12 , B32B38/06
CPC分类号： C04B41/009 , C04B37/005 , C04B37/008 , C04B41/5057 , C04B41/5059 , C04B41/5062 , C04B41/5064 , C04B41/87 , C04B2235/72 , C04B2237/08 , C04B2237/083 , C04B2237/086 , C04B2237/363 , C04B2237/64 , C04B2237/72 , C04B2237/86 , C23C14/505 , C23C16/458 , C23C16/4581 , C23C16/4582 , C23C16/4583 , C23C16/4584 , C23C16/4588 , C30B25/12 , C30B35/00 , Y10T156/1039 , C04B41/4531 , C04B41/4572 , C04B35/52
摘要： A carbon component having a hole therein and an outer surface covered with a ceramic coating, and a method for manufacturing the carbon component are provided. The carbon component includes two carbon plate members joined together. The hole is defined by a groove formed on a mating surface of at least one of the carbon plate members and a mating portion of the other of the carbon plate members, which opposes the groove. An inner surface of the hole including a surface of the groove is entirely covered with a ceramic coating.
摘要翻译：提供了其中具有孔的碳成分和被陶瓷涂层覆盖的外表面，以及制造碳成分的方法。碳组分包括连接在一起的两个碳板构件。孔由形成在碳板构件中的至少一个的配合表面上的槽和与槽相对的另一个碳板构件的配合部分限定。包括凹槽表面的孔的内表面完全被陶瓷涂层覆盖。

43. 发明授权

US07790049B2 Production process of structure 失效
标题翻译：结构生产过程
公开(公告)号：US07790049B2
公开(公告)日：2010-09-07
申请号：US11843873
申请日：2007-08-23
申请人： Atsunori Terasaki , Junichi Seki , Toshiki Ito
发明人： Atsunori Terasaki , Junichi Seki , Toshiki Ito
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： H01L21/02126 , C03C17/42 , C03C2218/33 , H01L21/02164 , H01L21/022 , H01L21/02282 , H01L21/02356 , H01L21/31144 , H01L21/3121 , H01L21/316
摘要： A process for producing a structure containing silicon oxide includes a step of forming a first layer of organic spin-on glass on a substrate and a step of forming a second layer of inorganic spin-on glass on the first layer. Thereafter, the first layer is etched by using a pattern formed on the second layer as a mask and then the first layer and the second layer are calcined to prepare the structure containing silicon oxide.
摘要翻译：制造含有氧化硅的结构体的方法包括在基材上形成第一层有机旋涂玻璃的步骤和在第一层上形成第二层无机旋涂玻璃的步骤。此后，通过使用形成在第二层上的图案作为掩模来蚀刻第一层，然后将第一层和第二层煅烧以制备含有氧化硅的结构。

44. 发明申请

US20090311633A1 PATTERN FORMING METHOD 有权
标题翻译：图案形成方法
公开(公告)号：US20090311633A1
公开(公告)日：2009-12-17
申请号：US11913922
申请日：2007-10-10
申请人： Toshiki Ito
发明人： Toshiki Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/265 , G03F7/022 , G03F7/0755
摘要： A pattern forming method includes a step of forming a photosensitive organic material layer by providing, on a substrate, a photosensitive organic material which is protected by a hydrophobic photodegradable group and is capable of generating a hydrophilic group selected from the group consisting of amino group, hydroxyl group, carboxyl group, and sulfo group by light irradiation; a step of selectively exposing the photosensitive organic material layer to light in a pattern to generate the hydrophilic group at an exposed portion; a step of providing a block polymer having a hydrophilic segment and a hydrophobic segment, on the photosensitive organic material layer after the exposure, to separate segments of the block polymer into the hydrophilic segment at a portion where the hydrophilic group generated by the exposure is present and the hydrophobic segment at a portion where the hydrophilic group is not present; and a step of removing one of the separated segments to form a pattern of the other segment.
摘要翻译：图案形成方法包括通过在基板上设置受疏水性光降解性基团保护的感光性有机材料并且能够产生选自氨基，羟基，羧基和磺基; 将感光有机材料层选择性地暴露于图案中的光以在暴露部分产生亲水基团的步骤; 在曝光后的光敏有机材料层上提供具有亲水性链段和疏水链段的嵌段聚合物的步骤，在存在通过曝光产生的亲水基团的部分将嵌段聚合物的片段分离成亲水链段和亲水基团不存在部分的疏水链段; 以及去除分离的片段之一以形成另一片段的图案的步骤。

45. 发明授权

US07622243B2 Photosensitive element, resist pattern formation method and printed wiring board production method 有权
标题翻译：感光元件，抗蚀剂图案形成方法和印刷线路板制造方法
公开(公告)号：US07622243B2
公开(公告)日：2009-11-24
申请号：US10572859
申请日：2004-09-17
申请人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
发明人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
IPC分类号： G03F7/00 , G03F7/04
CPC分类号： G03F7/029 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： The present invention is a photosensitive element including a support and a photosensitive resin composition layer composed of a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, wherein, the photosensitive resin composition contains a thioxanthone-based compound represented by the following general formula (I) as the component (C), and when the parts by weight of the thioxanthone-based compound relative to 100 parts by weight for the total weight of the component (A) and the component (B) is taken to be P, and the film thickness of the photosensitive resin composition layer is taken to be Q (μm), then R, which is the product of P and Q, satisfies the condition of the following formula (1). In the following general formula (I), R1to R8 represent a hydrogen atom, halogen atom or hydrocarbon group. 25.5≦R≦79.0 (1) [Chemical Formula I]
摘要翻译：本发明是一种感光性元件，其特征在于，包含支持体和感光性树脂组合物层，所述感光性树脂组合物含有（A）粘合剂聚合物，（B）光聚合性化合物和（C）光聚合引发剂，组合物含有作为组分（C）的由以下通式（I）表示的噻吨酮基化合物，并且当相对于组分（A）的总重量相对于100重量份的噻吨酮系化合物的重量份），成分（B）为P，感光性树脂组合物层的膜厚取为Q（母体），则P和Q的乘积R满足以下条件公式1）。在下列通式（I）中，R 1至R 8表示氢原子，卤素原子或烃基。 25.5 [化学式I]

46. 发明申请

US20070105036A1 Photosensitive element, resist pattern formation method and printed wiring board production method 有权
标题翻译：感光元件，抗蚀剂图案形成方法和印刷线路板制造方法
公开(公告)号：US20070105036A1
公开(公告)日：2007-05-10
申请号：US10572859
申请日：2004-09-17
申请人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
发明人： Takashi Kumaki , Masahiro Miyasaka , Yasuhisa Ichihashi , Toshiki Ito , Makoto Kaji
IPC分类号： G03C1/00
CPC分类号： G03F7/029 , C08F2/50 , G03F7/031 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： The present invention is a photosensitive element including a support and a photosensitive resin composition layer composed of a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, wherein, the photosensitive resin composition contains a thioxanthone-based compound represented by the following general formula (I) as the component (C), and when the parts by weight of the thioxanthone-based compound relative to 100 parts by weight for the total weight of the component (A) and the component (B) is taken to be P, and the film thickness of the photosensitive resin composition layer is taken to be Q (μm), then R, which is the product of P and Q, satisfies the condition of the following formula (1). In the following general formula (I), R1 to R8 represent a hydrogen atom, halogen atom or hydrocarbon group. 25.5≦R≦79.0 (1) [Chemical Formula I]
摘要翻译：本发明是一种感光性元件，其特征在于，包含支持体和感光性树脂组合物层，所述感光性树脂组合物含有（A）粘合剂聚合物，（B）光聚合性化合物和（C）光聚合引发剂，组合物含有作为组分（C）的由以下通式（I）表示的噻吨酮基化合物，并且当相对于组分（A）的总重量相对于100重量份的噻吨酮系化合物的重量份），成分（B）为P，感光性树脂组合物层的膜厚取为Q（母体），则P和Q的乘积R满足以下条件公式1）。在下列通式（I）中，R 1至R 8表示氢原子，卤素原子或烃基。 <？in-line-formula description =“In-line Formulas”end =“lead”？> 25.5 <= R <= 79.0（1）<？in-line-formula description =“In-line Formulas”end = 尾“？> [化学式I]

47. 发明申请

US20110242672A1 LENS AND METHOD FOR PRODUCING LENS 失效
标题翻译：镜头和镜片的制造方法
公开(公告)号：US20110242672A1
公开(公告)日：2011-10-06
申请号：US13077759
申请日：2011-03-31
申请人： Toshiki Ito
发明人： Toshiki Ito
IPC分类号： G02B3/00 , G02B1/12
CPC分类号： G02B3/0087 , B29D11/00355 , G02B1/041 , C08L33/08 , C08L33/10
摘要： A lens includes a transparent member, wherein the transparent member contains a plurality of polymers formed from organic monomers; the transparent member has a refractive index distribution due to the plurality of polymers; and particles having a lower thermal expansion coefficient than the transparent member are dispersed in the transparent member.
摘要翻译：透镜包括透明构件，其中透明构件包含由有机单体形成的多个聚合物; 透明构件由于多种聚合物而具有折射率分布; 并且具有比透明构件更低的热膨胀系数的颗粒分散在透明构件中。

48. 发明授权

US07923201B2 Near-field exposure method 失效
标题翻译：近场曝光法
公开(公告)号：US07923201B2
公开(公告)日：2011-04-12
申请号：US12048767
申请日：2008-03-14
申请人： Akira Terao , Toshiki Ito
发明人： Akira Terao , Toshiki Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/70325 , G03F1/50 , G03F7/2014
摘要： A near-field exposure method in which an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used, and an object is exposed by near-field light produced at the opening of the exposure mask based on the exposure light from the exposure light source. A width of the opening is determined to satisfy equations (1), (2) and (3) below, wherein the width of the opening of the exposure mask is denoted by s (nm), a processing pitch of the object to be exposed is denoted by p (nm) and coefficients are denoted by a and b: s=ap−b (1) 0.46≦a≦0.58 (2) 3≦b≦13 (3) The exposure mask having the opening with the determined width is provided, and the exposure light is projected to the exposure mask to thereby expose the object to be exposed.
摘要翻译：使用具有开口小于来自曝光光源的光的波长的遮光膜的曝光掩模的近场曝光方法，并且通过在曝光开始时产生的近场光曝光物体基于来自曝光光源的曝光光的掩模。确定开口的宽度以满足下面的等式（1），（2）和（3），其中曝光掩模的开口的宽度由s（nm）表示，被曝光物体的处理间距由p（nm）表示，系数由a和b表示：s = ap-b（1）0.46＆nlE; a＆nlE; 0.58（2）3＆nlE; b＆nlE; 13（3）曝光掩模具有确定的开口提供宽度，并且曝光光被投射到曝光掩模，从而暴露待曝光的物体。

49. 发明申请

US20100221656A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS 有权
标题翻译：感光性化合物，感光性组合物，电阻图案形成方法和装置生产方法
公开(公告)号：US20100221656A1
公开(公告)日：2010-09-02
申请号：US12067898
申请日：2008-02-14
申请人： Toshiki Ito
发明人： Toshiki Ito
IPC分类号： G03F7/004 , C07D311/80 , C07C69/74 , C08G14/04 , G03F7/20
CPC分类号： G03F7/039 , C07D311/84 , C08G8/32
摘要： A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.
摘要翻译：光敏化合物在分子中具有两个以上的结构单元，由以下通式（1）表示：其中R 1至R 8选自氢原子，卤素原子，烷基，烷氧基，乙酰氧基，苯基，萘基和其中一部分或全部氢原子任选被氟原子取代的烷基; R9为氢原子或羟基; X是取代或未取代的亚苯基或取代或未取代的萘基; Y是氧原子或单键。

50. 发明申请

US20100147796A1 METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, METHOD FOR MANUFACTURING METAL STRUCTURAL BODY-CONTAINING POLYMER FILM, AND METHOD FOR MANUFACTURING PATTERNED STRUCTURAL BODY 审中-公开
标题翻译：含金属结构体含聚合物膜，制造含金属结构体含聚合物膜的方法，以及制造图案结构体的方法
公开(公告)号：US20100147796A1
公开(公告)日：2010-06-17
申请号：US12632944
申请日：2009-12-08
申请人： Wataru Kubo , Kazuhiro Yamauchi , Kenji Yamada , Mamiko Kumagai , Kyoko Kumagai , Toshiki Ito , Norishige Kakegawa
发明人： Wataru Kubo , Kazuhiro Yamauchi , Kenji Yamada , Mamiko Kumagai , Kyoko Kumagai , Toshiki Ito , Norishige Kakegawa
IPC分类号： C23F1/00 , B32B3/10 , C25D5/02
CPC分类号： C23F1/00 , B32B15/08 , B32B27/30 , B32B27/32 , B32B27/36 , B32B2255/10 , B32B2255/205 , B32B2307/202 , B32B2307/302 , B32B2307/718 , B41M3/00 , C25D5/02 , C25D13/04 , Y10T428/24917
摘要： A method for manufacturing a patterned structural body by which a patterned structural body having a micropattern can be manufactured, a metal structural body-containing polymer film that can be used in the manufacture of the patterned structural body, and a method for manufacturing the polymer film are provided. The metal structural body-containing polymer film comprises a polymer film that includes a block copolymer having an ion-conductive segment and a non-ion-conductive segment and has a microphase-separated structure including ion-conductive domains and non-ion-conductive domains, and a metal structural body localized at the ion-conductive domains.
摘要翻译：可以制造具有微图案的图案化结构体的图案化结构体的制造方法，可用于制造图案结构体的含金属结构体的聚合物膜，以及制造聚合物膜的方法被提供。含金属结构体的聚合物膜包括聚合物膜，其包含具有离子传导性区段和非离子传导性区段的嵌段共聚物，并且具有包含离子导电区域和非离子导电区域的微相分离结构和位于离子传导区域的金属结构体。

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