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1. 发明授权

US09925797B2 Lift printing system 有权
公开(公告)号：US09925797B2
公开(公告)日：2018-03-27
申请号：US15326498
申请日：2015-08-02
申请人： ORBOTECH LTD.
发明人： Zvi Kotler , Michael Zenou , Itay Peled
IPC分类号： B41J2/455
CPC分类号： B41J2/455 , B23K26/0676 , C23C14/04 , C23C14/28 , G03F7/2014
摘要： Printing apparatus (20) includes a donor supply assembly (30), which provides a transparent donor substrate (26) having opposing first and second surfaces and a donor film formed on the second surface so as to position the donor film in proximity to a target area (28) on an acceptor substrate (22). An optical assembly (24) directs multiple output beams of laser radiation simultaneously in a predefined spatial pattern to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate according, thereby writing the predefined pattern onto the target area of the acceptor substrate.

2. 发明授权

US09855730B2 Methods of making articles using structured tapes 有权
公开(公告)号：US09855730B2
公开(公告)日：2018-01-02
申请号：US14968362
申请日：2015-12-14
申请人： 3M INNOVATIVE PROPERTIES COMPANY
发明人： Martin B. Wolk , Michael Benton Free , Margaret M. Vogel-Martin , Evan L. Schwartz , Mieczyslaw H. Mazurek , Terry O. Collier
IPC分类号： B29C65/52 , B32B37/00 , B29C35/08 , B29C59/02 , G03F7/00 , G03F7/20 , B29C41/24 , B32B27/06 , B32B38/10 , C23C16/455 , B29K83/00 , B29L9/00 , B29C37/00 , B29L31/34 , B32B38/00
CPC分类号： B32B37/025 , B29C35/0805 , B29C35/0894 , B29C37/0067 , B29C41/24 , B29C59/026 , B29C65/528 , B29C2035/0827 , B29C2035/0833 , B29C2059/023 , B29K2083/00 , B29L2009/005 , B29L2031/3475 , B32B27/06 , B32B38/10 , B32B2038/0076 , B32B2383/00 , B32B2457/20 , C23C16/455 , G03F7/0002 , G03F7/2014
摘要： Methods of making articles using structured tapes are disclosed. The structured tapes may include a structured template layer having a structured surface and an opposed second surface and an uncured backfill layer, the uncured backfill layer has a lower refractive index than the structured template layer, and the uncured backfill layer has a structured surface conforming to the structured surface of the structured template layer and an opposed second surface. The structured tapes may include a structured template layer having a structured surface and an opposed second surface and an uncured backfill layer, the uncured backfill layer has a higher refractive index than the structured template layer, and the uncured backfill layer has a structured surface conforming to the structured surface of the structured template layer and an opposed second surface. The structure tapes may be laminated via the uncured backfill layer to a receptor substrate to form an article.

3. 发明申请

US20170183798A1 NANOFIBROUS CARBON MICROSTRUCTURES 审中-公开
公开(公告)号：US20170183798A1
公开(公告)日：2017-06-29
申请号：US15301620
申请日：2015-04-02
申请人： University of Florida Research Foundation, Inc.
发明人： Yong-Kyu YOON , Pit Fee JAO
IPC分类号： D04H1/728 , B06B1/02 , A61N1/04 , D01D5/38 , B82Y40/00 , H01L51/44
CPC分类号： D04H1/728 , A61B5/04001 , A61B2562/125 , A61N1/04 , A61N1/05 , B06B1/02 , B82Y20/00 , B82Y40/00 , C01B32/16 , D01D5/38 , G03F7/0035 , G03F7/0037 , G03F7/038 , G03F7/2014 , G03F7/2022
摘要： Various examples of methods and systems related to nanofibrous microstructures including carbon nanofibrous microelectrode arrays are provided. In one example, a method includes electrospinning photosensitive nanofibers on a patterned substrate; immersing the photosensitive nanofibers in a refractive index matching medium; and exposing the immersed photosensitive nanofibers to ultraviolet (UV) light through the patterned substrate or through a front side photomask. In another example, a microelectrode array includes a carbon thin film (CTF) trace pattern including a plurality of CTF electrode pads; and a plurality of carbon nanofiber (CNF) pillars disposed on the plurality of CTF electrode pads.

4. 发明申请

US20170108770A1 THIN-FILM MASK, FITTING AIDS, FITTING AND EXPOSURE DEVICE AND FITTING METHOD FOR THE THIN-FILM MASK PASTED ON A CURVED SUBSTRATE 审中-公开
公开(公告)号：US20170108770A1
公开(公告)日：2017-04-20
申请号：US15293619
申请日：2016-10-14
申请人： Ming-An HSU , Wen-Fu LIN
发明人： Ming-An HSU , Wen-Fu LIN
IPC分类号： G03F1/42 , G03F1/60
CPC分类号： G03F1/42 , G03F1/00 , G03F1/60 , G03F7/2014 , G03F7/24
摘要： A thin-film mask, fitting aids, fitting and exposure assistant device and fitting method for the thin-film mask paste on a curved substrate is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the curved substrate. After the template device had formed, send the template device to the exposure machine, and the high resolution color photoresist pattern is made on the curved substrate.

5. 发明申请

US20160041468A1 EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT 审中-公开
标题翻译：曝光装置和曝光感光元件的方法和从感光元件制备印刷形式的方法
公开(公告)号：US20160041468A1
公开(公告)日：2016-02-11
申请号：US14922478
申请日：2015-10-26
申请人： E I DU PONT DE NEMOURS AND COMPANY
发明人： Volker STRUEWE , Helmut LUETKE , Rolf SCHWAN
IPC分类号： G03F7/20 , B41C1/00
CPC分类号： G03F7/201 , B41C1/00 , G03F7/20 , G03F7/2002 , G03F7/2008 , G03F7/2014 , G03F7/2041 , G03F7/2051 , G03F7/70558 , G03F7/70858 , G03F7/70875
摘要： The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.
摘要翻译：本发明涉及一种曝光装置，一种使用该曝光装置将光敏元件暴露于辐射的方法，以及一种从感光元件制备印刷形式的方法。曝光装置包括具有支撑感光元件的曝光床的基座组件和具有两个或更多个灯的灯壳体组件。灯壳体组件包括空气分配组件，该空气分配组件具有邻近灯并且被加压的空气室，以提供离开空气室的空气的均匀分布，以撞击每个灯的背面。通过监视灯的温度和/或从灯发出的辐照度来控制离开室并撞击灯的空气。

6. 发明申请

US20150160563A1 EXPOSURE METHOD AND EXPOSURE DEVICE 有权
标题翻译：曝光方法和曝光装置
公开(公告)号：US20150160563A1
公开(公告)日：2015-06-11
申请号：US14382435
申请日：2013-06-14
申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
发明人： Changgang Huang , Hongjiang Wu , Song Wang , Jiyu Wan , Gyuhyun Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/707 , G03F7/2014
摘要： Embodiments of the disclosure provide an exposure method and an exposure device. The exposure method comprises: placing at least two transparent substrates coated with photoresist under one mask, wherein all of the at least two substrates are in parallel with the mask; irradiating the mask vertically with parallel exposure light to respectively expose the photoresist on the at least two substrates along a propagation direction of the exposure light.
摘要翻译：本公开的实施例提供曝光方法和曝光装置。曝光方法包括：在一个掩模下放置涂覆有光致抗蚀剂的至少两个透明基板，其中所述至少两个基板全部与掩模平行; 以平行的曝光光垂直照射掩模，以分别在曝光光的传播方向上暴露至少两个基板上的光致抗蚀剂。

7. 发明申请

US20150093707A1 MASK FORMING IMAGEABLE MATERIAL AND USE 有权
标题翻译：掩蔽形成图像材料和使用
公开(公告)号：US20150093707A1
公开(公告)日：2015-04-02
申请号：US14564214
申请日：2014-12-09
申请人： Kevin M. Kidnie
发明人： Kevin M. Kidnie
IPC分类号： G03F7/16 , G03F7/20
CPC分类号： G03F7/16 , B41C1/00 , B41M5/00 , G03F7/004 , G03F7/11 , G03F7/2002 , G03F7/2014 , G03F7/2016 , G03F7/202 , G03F7/24 , G03F7/325 , G03F7/343 , G03F7/38
摘要： An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing compound is provided in the transparent polymeric carrier sheet or the barrier layer. A non-silver halide thermally sensitive imageable layer is disposed on the barrier layer and comprises a second infrared radiation absorbing compound and a second ultraviolet radiation absorbing compound. A relief image is formed by imaging the imageable material to form an imaged mask material, exposing a relief-forming material with curing radiation through the imaged mask material to form exposed regions and non-exposed regions, and developing the imaged relief-forming material to form a relief image by removing its non-exposed regions.
摘要翻译：可成像材料可用于形成用于提供浮雕图像的掩模图像。该可成像材料具有简化的结构，并且基本上由以下组成：透明聚合物载体片和包含第一红外辐射吸收化合物的阻挡层。在透明聚合物载体片材或阻挡层中提供第一种紫外线辐射吸收化合物。非卤化银热敏可成像层设置在阻挡层上，并且包括第二红外辐射吸收化合物和第二紫外线吸收化合物。通过成像可成像材料以形成成像的掩模材料形成浮雕图像，通过成像的掩模材料将具有固化辐射的凸版形成材料暴露以形成曝光区域和未曝光区域，并将成像的浮雕形成材料显影成通过去除其未暴露的区域形成浮雕图像。

8. 发明申请

US20140313493A1 EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT 审中-公开
标题翻译：曝光装置和曝光感光元件的方法和从感光元件制备印刷形式的方法
公开(公告)号：US20140313493A1
公开(公告)日：2014-10-23
申请号：US14244176
申请日：2014-04-03
申请人： E I DU PONT DE NEMOURS AND COMPANY
发明人： VOLKER STRUEWE , HELMUT LUETKE
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , B41C1/00 , G03F7/20 , G03F7/2002 , G03F7/2008 , G03F7/2014 , G03F7/2041 , G03F7/2051 , G03F7/70558 , G03F7/70858 , G03F7/70875
摘要： The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having one or more lamps. The base assembly includes an assembly for controlling the temperature of the exposure bed to heat and cool the bed; and an assembly configured to remove air between the photosensitive element and an exterior top surface of the exposure bed.
摘要翻译：本发明涉及一种曝光装置，一种使用该曝光装置将光敏元件暴露于辐射的方法，以及一种从感光元件制备印刷形式的方法。曝光装置包括具有支撑感光元件的曝光床的基座组件和具有一个或多个灯的灯壳体组件。基座组件包括用于控制曝光床的温度以加热和冷却床的组件; 以及构造成去除感光元件和曝光床的外部顶表面之间的空气的组件。

9. 发明授权

US08784930B2 Transparent conductive film having high optical transmittance and method for manufacturing the same 失效
标题翻译：具有高透光率的透明导电膜及其制造方法
公开(公告)号：US08784930B2
公开(公告)日：2014-07-22
申请号：US13243328
申请日：2011-09-23
申请人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
发明人： Da-Ren Chiou , Wei-Che Hung , Shih-Yueh Lin , Chiu-Fang Chen , Tzu-Ying Chen
IPC分类号： B05D5/12 , B05D5/00
CPC分类号： B82Y30/00 , G03F7/0048 , G03F7/027 , G03F7/2014 , G03F7/26
摘要： The present invention pertains to a transparent conductive film including a conductive layer having different thicknesses so as to increase the optical transmittance while maintaining the conductivity of the transparent conductive film. The present invention also pertains to a process for the preparation of the above-mentioned transparent conductive film.
摘要翻译：本发明涉及包括具有不同厚度的导电层的透明导电膜，以便在保持透明导电膜的导电性的同时增加光透射率。本发明还涉及制备上述透明导电膜的方法。

10. 发明申请

US20140047992A1 OPTIMIZATION OF UV CURING 有权
标题翻译：紫外线固化的优化
公开(公告)号：US20140047992A1
公开(公告)日：2014-02-20
申请号：US13979848
申请日：2012-10-25
申请人： Ed S. Ramakrishnan
发明人： Ed S. Ramakrishnan
IPC分类号： B41N1/06 , G03F7/20
CPC分类号： G03F7/2022 , B41M2205/14 , B41N1/00 , B41N1/06 , G03F7/20 , G03F7/2002 , G03F7/2014
摘要： A system and method of preparing a flexoplate so it is suitable for the printing of high resolution patterns. The method includes controlling the curing conditions of the flexoplate, thereby controlling the properties of said flexoplate such as floor thickness, pattern cross-sectional geometry, repeatability of printed features during the printing process, and durability of the flexoplate during the printing process.
摘要翻译：一种制备柔版印版的系统和方法，因此适用于高分辨率图案的印刷。该方法包括控制柔性板的固化条件，从而控制柔性板的性能，例如底板厚度，图案横截面几何形状，印刷过程中印刷特征的重复性，以及柔印板在印刷过程中的耐久性。

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