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1. 发明授权

US12012487B2 In-situ alkylphenol-aldehyde resins 有权
公开(公告)号：US12012487B2
公开(公告)日：2024-06-18
申请号：US17407947
申请日：2021-08-20
申请人： SI GROUP, INC.
发明人： Timothy Edward Banach , John Morgan Whitney , Jeffrey M. Hiscock , Todd Scott Makenzie , Gennaro Barbiero
IPC分类号： C08G8/12 , C08G8/24 , C08G8/28 , C08G8/32 , C08L7/00 , C08L21/00 , C08L61/06 , C08L61/14
CPC分类号： C08G8/12 , C08G8/24 , C08G8/28 , C08G8/32 , C08L7/00 , C08L21/00 , C08L61/06 , C08L61/14 , C08L7/00 , C08L61/06 , C08L7/00 , C08L61/14 , C08L21/00 , C08L61/14 , C08L21/00 , C08L61/06 , C08L7/00 , C08L9/00 , C08L61/06 , C08L7/00 , C08L9/00 , C08L61/14
摘要： The invention relates to an in-situ process for preparing an alkylphenol-aldehyde resin. The process comprises the step of providing a raw alkylphenol composition. The raw alkylphenol composition comprises one or more alkylphenol compounds and at least about 1 wt % phenol. Each alkylphenol compound has one or more alkyl substituents. The raw alkylphenol composition is reacted directly, without pre-purification, with one or more aldehydes to form an in-situ alkylphenol-aldehyde resin. The invention also relates to an in-situ alkylphenol-aldehyde resin formed from the in-situ process, and its use in a tackifier composition and rubber composition. The tackifier composition and rubber composition containing the in-situ alkylphenol-aldehyde resin show, inter alia, improved tack performance.

2. 发明授权

US09725552B2 HMF-based phenol formaldehyde resin 有权
公开(公告)号：US09725552B2
公开(公告)日：2017-08-08
申请号：US14881993
申请日：2015-10-13
申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
发明人： Cheng-Han Hsieh , Hung-Jie Liou
IPC分类号： C08L63/04 , C08L77/02 , C08G8/32 , C09D163/00 , C08G8/04 , C08G8/06
CPC分类号： C08G8/32 , C08G8/04 , C08G8/06 , C08L63/04 , C08L77/02 , C09D163/00 , C08L61/14
摘要： A HMF-based phenol formaldehyde resin is provided. The HMF-based phenol formaldehyde resin has the formula In the formula, A includes non-substituted phenol, m-cresol, p-cresol, hydroquinone or disubstituted phenol, B includes phosphate ester, phosphate, phosphine oxide, phosphinate ester or phosphinate, and n is 3-20, wherein the disubstituted phenol has substituted groups including H, halide, C1-C20 alkyl group, C1-C20 alkenyl group, C1-C20 cycloalkyl group, C1-C20 cycloalkenyl group, homocyclic aromatic group or heterocyclic aromatic group.

3. 发明申请

US20160102165A1 HMF-BASED PHENOL FORMALDEHYDE RESIN 有权
标题翻译：基于HMF的苯酚甲醛树脂
公开(公告)号：US20160102165A1
公开(公告)日：2016-04-14
申请号：US14881993
申请日：2015-10-13
申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
发明人： Cheng-Han HSIEH , Hung-Jie LIOU
IPC分类号： C08G8/32 , C08L77/02 , C08L63/04
CPC分类号： C08G8/32 , C08G8/04 , C08G8/06 , C08L63/04 , C08L77/02 , C09D163/00 , C08L61/14
摘要： A HMF-based phenol formaldehyde resin is provided. The HMF-based phenol formaldehyde resin has the formula In the formula, A includes non-substituted phenol, m-cresol, p-cresol, hydroquinone or disubstituted phenol, B includes phosphate ester, phosphate, phosphine oxide, phosphinate ester or phosphinate, and n is 3-20, wherein the disubstituted phenol has substituted groups including H, halide, C1-C20 alkyl group, C1-C20 alkenyl group, C1-C20 cycloalkyl group, C1-C20 cycloalkenyl group, homocyclic aromatic group or heterocyclic aromatic group.
摘要翻译：提供了基于HMF的酚醛树脂。基于HMF的酚醛树脂具有下式：在该式中，A包括非取代苯酚，间甲酚，对甲酚，氢醌或二取代苯酚，B包括磷酸酯，磷酸酯，氧化膦，次膦酸酯或次膦酸酯，以及 n为3-20，其中二取代苯酚具有取代基，包括H，卤素，C 1 -C 20烷基，C 1 -C 20烯基，C 1 -C 20环烷基，C 1 -C 20环烯基，杂环芳族基或杂环芳基。

4. 发明申请

US20140151094A1 ACTIVE ESTER RESIN, METHOD FOR PRODUCING THE SAME, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE THERMOSETTING RESIN COMPOSITION, SEMICONDUCTOR ENCAPSULATING MATERIAL, PRE-PREG, CIRCUIT BOARD, AND BUILD-UP FILM 有权
标题翻译：活性酯树脂，其生产方法，热固性树脂组合物，固化树脂组合物固化产物，半导体封装材料，PRE-PREG，电路板和建筑薄膜
公开(公告)号：US20140151094A1
公开(公告)日：2014-06-05
申请号：US13824821
申请日：2012-05-25
申请人： Kan Takeuchi , Etsuko Suzuki , Kunihiro Morinaga , Kazuo Arita
发明人： Kan Takeuchi , Etsuko Suzuki , Kunihiro Morinaga , Kazuo Arita
IPC分类号： H05K1/03 , C09D167/00 , H05K3/00 , C08G63/60
CPC分类号： H05K3/00 , C08G8/32 , C08G59/4223 , C08G63/133 , C08G63/605 , C08J5/24 , C09D161/14 , C09D167/00 , H01L23/29 , H01L2924/0002 , H05K1/0353 , Y10T428/2915 , Y10T428/31529 , Y10T442/2475 , C08L63/00 , H01L2924/00
摘要： A low dielectric constant, a low dielectric loss tangent, and heat resistance are achieved. An active ester resin that has a resin structure produced by reacting a polyfunctional phenolic compound (a1) with a monofunctional aromatic carboxylic acid or its chloride (a2) and an aromatic dicarboxylic acid or its chloride (a3). The polyfunctional phenolic compound (a1) is represented by structural formula (1) below: (where Ar represents a benzene ring, a naphthalene ring, a benzene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, or a naphthalene ring nuclear-substituted by an alkyl group having 1 to 4 carbon atoms, X represents a methylene group, a divalent cyclic aliphatic hydrocarbon group, a phenylene dimethylene group, or a biphenylene-dimethylene group, and n represents the number of repeating units and the average thereof is in a range of 0.5 to 10).
摘要翻译：实现了低介电常数，低介电损耗角正切和耐热性。具有通过使多官能性酚化合物（a1）与单官能芳族羧酸或其氯化物（a2）和芳香族二羧酸或其氯化物（a3）反应而制造的树脂结构的活性酯树脂。多官能酚类化合物（a1）由下述结构式（1）表示：（其中Ar表示苯环，萘环，被碳原子数1〜4的烷基核取代的苯环或萘环被具有1至4个碳原子的烷基核取代，X表示亚甲基，二价环状脂族烃基，亚苯基二亚甲基或亚联苯基 - 二亚甲基，n表示重复单元的数量和平均在0.5〜10的范围内。

5. 发明授权

US07932014B2 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process 有权
标题翻译：感光性化合物，感光性组合物，抗蚀剂图案形成方法和元件制造方法
公开(公告)号：US07932014B2
公开(公告)日：2011-04-26
申请号：US12067898
申请日：2008-02-14
申请人： Toshiki Ito
发明人： Toshiki Ito
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/095 , C07C69/753
CPC分类号： G03F7/039 , C07D311/84 , C08G8/32
摘要： A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.
摘要翻译：光敏化合物在分子中具有两个以上的结构单元，由以下通式（1）表示：其中R 1至R 8选自氢原子，卤素原子，烷基，烷氧基，乙酰氧基，苯基，萘基和其中一部分或全部氢原子任选被氟原子取代的烷基; R9为氢原子或羟基; X是取代或未取代的亚苯基或取代或未取代的萘基; Y为氧原子或单键。

6. 发明授权

US07498371B2 Modified phenolic novolak resins and applications thereof 有权
标题翻译：改性酚醛清漆树脂及其应用
公开(公告)号：US07498371B2
公开(公告)日：2009-03-03
申请号：US11234423
申请日：2005-09-23
申请人： Raj B. Durairaj , C. Michael Walkup , Mark A. Lawrence
发明人： Raj B. Durairaj , C. Michael Walkup , Mark A. Lawrence
IPC分类号： C08K3/04 , C08K5/09
CPC分类号： C08L21/00 , C08G8/10 , C08G8/20 , C08G8/22 , C08G8/32 , C08K5/053 , C08L61/12 , C08L61/32 , C08L2666/16 , C08L2666/08
摘要： A modified phenolic novolak resin is prepared by reacting a phenolic compound (e.g., resorcinol) with an aliphatic polyol. The reaction mixture further reacts with a formaldehyde to produce a modified phenolic novolak resin. The reaction is typically carried out in the presence of an acid or a base catalyst. The resulting resin is characterized by a relatively low level of free resorcinol; and rubber compounds containing the resin exhibit low fuming, lower Mooney viscosity (which means better processing), better dynamic stiffness properties (G′), and/or good tear properties. Therefore, the resulting resin can be used as a methylene acceptor compound in a vulcanizable rubber composition.
摘要翻译：通过使酚类化合物（例如间苯二酚）与脂族多元醇反应制备改性酚醛清漆树脂。反应混合物进一步与甲醛反应以产生改性酚醛清漆树脂。反应通常在酸或碱催化剂的存在下进行。所得树脂的特征在于游离间苯二酚含量相对较低; 和含有树脂的橡胶化合物显示低发烟，较低的门尼粘度（这意味着更好的加工），更好的动态刚度性能（G'）和/或良好的撕裂性能。因此，所得树脂可用作可硫化橡胶组合物中的亚甲基受体化合物。

7. 发明申请

US20070251411A1 ROSIN PHENOLIC RESINS FOR PRINTING INKS 有权
标题翻译：罗辛酚醛树脂印刷墨水
公开(公告)号：US20070251411A1
公开(公告)日：2007-11-01
申请号：US11741536
申请日：2007-04-27
申请人： Thomas Fontana
发明人： Thomas Fontana
IPC分类号： C08G8/34 , C09D109/00 , C09D11/08
CPC分类号： C09D11/103 , C08G8/32 , C08G8/34 , C09D11/08
摘要： Rosin modified phenolic resins are prepared by reacting together rosin, fatty acid, phenol and aldehyde. The fatty acid may be Monomer (derived from the fatty acid dimerization process). The reaction mixture may optionally include α,β-olefinically unsaturated carboxylic acid(s) or anhydride(s), and polyol(s). The resin may be dissolved in a solvent to form a varnish. The resin may be used as a component of inks for lithographic or gravure printing.
摘要翻译：松香改性酚醛树脂通过使松香，脂肪酸，酚和醛反应而制备。脂肪酸可以是单体（衍生自脂肪酸二聚过程）。反应混合物可以任选地包括α，β-烯属不饱和羧酸或多种酸酐和多元醇。树脂可以溶解在溶剂中以形成清漆。树脂可以用作用于平版印刷或凹版印刷的油墨的组分。

8. 发明授权

US06699958B1 Colorless phenol-formaldehyde resins that cure colorless 失效
标题翻译：无色酚醛树脂固化无色
公开(公告)号：US06699958B1
公开(公告)日：2004-03-02
申请号：US10365873
申请日：2003-02-13
申请人： William D. Detlefsen
发明人： William D. Detlefsen
IPC分类号： C08G1408
CPC分类号： C08G8/32
摘要： The present invention is directed to compositions and a process leading to colorless or light colored aqueous phicinol-formaldelhyde resoles. Unlike previous technologies, these compositions lead to clear storage stable fast curing, high molecular weight resins. These materials are also capable of producing composite wood panels with superior water absorption and thickness swell test results when soaked in water. The invention essentially consists of an aqueous copolymer of phenol, formaldehyde, and a phenolic carboxylate (e.g. salicylic acid). Methylol phenols are formed under alkaline conditions in the presence of metal chelating agents. These are then condensed into a polymer under alkaline, neutral or acidic conditions. The finished aqueous polymer solution is then acidified to the desired pH using a benzoic acid or a phelnol-carboxylic acid.
摘要翻译：本发明涉及组合物和一种导致无色或浅色的含有精氨酸 - 正癸醛水溶液的方法。与以前的技术不同，这些组合物导致清晰的储存稳定快速固化，高分子量树脂。这些材料也可以生产复合木板，当浸泡在水中时具有优异的吸水性和厚度溶胀试验结果。本发明基本上由苯酚，甲醛和酚羧酸酯（例如水杨酸）的含水共聚物组成。在金属螯合剂存在下，在碱性条件下形成羟甲基酚。然后将它们在碱性，中性或酸性条件下浓缩成聚合物。然后使用苯甲酸或吡咯烷羧酸将最终的聚合物水溶液酸化至所需的pH。

9. 发明授权

US06416932B1 Waterless lithographic plate 失效
标题翻译：无水平版印版
公开(公告)号：US06416932B1
公开(公告)日：2002-07-09
申请号：US09669991
申请日：2000-09-26
申请人： Kevin Barry Ray , Christopher David McCullough
发明人： Kevin Barry Ray , Christopher David McCullough
IPC分类号： G03F726
CPC分类号： B41C1/1041 , B41C2210/16 , C08G8/32
摘要： A method of producing a resist pattern on a substrate using a precursor which comprises a coating composition which includes a heat sensitive polymeric substance having functional groups Q thereon (wherein groups Q may be siloxane or optionally substituted fluoroalkyl groups) wherein groups Q cause the polymeric substance to have a reduced adhesive interaction with ink for use in waterless lithographic printing compared to aid polymeric substance in the absence of said groups, the method including the step of causing the patternwise application of heat to said coating composition and optional development thereby to define ink accepting areas in heat exposed areas and non-ink accepting areas in non-exposed areas.
摘要翻译：一种使用前体制备抗蚀剂图案的方法，该前体包括包含其上具有官能团Q（其中基团Q可以是硅氧烷或任选取代的氟烷基）的热敏聚合物质的涂料组合物，其中基团Q引起聚合物质与没有所述基团的帮助聚合物质相比，与无水平版印刷中使用的油墨具有降低的与油墨的相互作用，该方法包括对所述涂料组合物进行图案加热以及任选的显影步骤，从而定义油墨接受非暴露地区的曝光区域和非油墨接收区域的区域。

10. 发明授权

US5032642A Phenolic resin compositions 失效
公开(公告)号：US5032642A
公开(公告)日：1991-07-16
申请号：US511750
申请日：1990-04-20
申请人： Peter H. R. B. Lemon , Derek W. Baker , John Ireland
发明人： Peter H. R. B. Lemon , Derek W. Baker , John Ireland
IPC分类号： B22C1/22 , C08G8/10 , C08G8/20 , C08G8/32 , C08G8/36 , C08K5/101 , C08L61/04 , C08L61/10
CPC分类号： C08G8/32 , B22C1/2253 , C08G8/10 , C08K5/101
摘要： A phenolic resin composition comprises an ester-curable phenol-aldehyde resin in alkaline aqueous solution wherein the phenol-aldehyde resin is a methylolated phenolic novolak resin. Preferably, during manufacture of the methylolated phenolic novolak resin, unreacted phenol is removed. The composition may be employed, for reaction with an organic ester hardener, as a binder in the production of foundry moulds and cores having high strength. The further incorporation of an aryloxy alcohol in the novolak resin binder additionally improves the final strength of products obtained by a gas curing technique using ester vapor, such as that of methyl formate.

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