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    • 47. 发明授权
    • Light-emitting device and method of manufacturing the same
    • 发光装置及其制造方法
    • US08792160B2
    • 2014-07-29
    • US13614646
    • 2012-09-13
    • Rintaro KodaHideki WatanabeMasaru KuramotoShunsuke KonoTakao Miyajima
    • Rintaro KodaHideki WatanabeMasaru KuramotoShunsuke KonoTakao Miyajima
    • H01S5/22
    • H01S5/22B82Y20/00H01S5/0218H01S5/0655H01S5/2031H01S5/34333H01S5/50H01S2301/166
    • Provided is a light-emitting device including (a) a layer structure obtained by sequentially growing on a base substrate a first compound semiconductor layer of a first conductivity type, (b) an active layer formed of a compound semiconductor, and (c) a second compound semiconductor layer of a second conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer. The layer structure formed of at least a part of the second compound semiconductor layer in a thickness direction of the second compound semiconductor layer. The first compound semiconductor layer has a thickness greater than 0.6 μm. A high-refractive index layer formed of a compound semiconductor material having a refractive index higher than a refractive index of a compound semiconductor material of the first compound semiconductor layer is formed in the first compound semiconductor layer.
    • 提供一种发光器件,其包括(a)通过在基底衬底上依次生长第一导电类型的第一化合物半导体层,(b)由化合物半导体形成的有源层,以及(c) 第二导电类型的第二化合物半导体层; 形成在第二化合物半导体层上的第二电极; 和与第一化合物半导体层电连接的第一电极。 所述层结构由所述第二化合物半导体层的至少一部分在所述第二化合物半导体层的厚度方向上形成。 第一化合物半导体层的厚度大于0.6μm。 在第一化合物半导体层中形成由折射率高于第一化合物半导体层的化合物半导体材料的折射率的化合物半导体材料形成的高折射率层。
    • 48. 发明授权
    • Semiconductor optical amplifier
    • 半导体光放大器
    • US08786941B2
    • 2014-07-22
    • US13166900
    • 2011-06-23
    • Masaru KuramotoMasao IkedaRintaro KodaTomoyuki OkiHideki WatanabeTakao MiyajimaHiroyuki Yokoyama
    • Masaru KuramotoMasao IkedaRintaro KodaTomoyuki OkiHideki WatanabeTakao MiyajimaHiroyuki Yokoyama
    • H01S5/00
    • H01S5/1064H01S5/0425H01S5/0602H01S5/0657H01S5/16H01S5/22H01S5/32341H01S5/34333H01S5/50
    • A semiconductor optical amplifier includes: a laminated structure sequentially including a first compound semiconductor layer composed of GaN compound semiconductor and having a first conductivity type, a third compound semiconductor layer having a light amplification region composed of GaN compound semiconductor, and a second compound semiconductor layer composed of GaN compound semiconductor and having a second conductivity type; a second electrode formed on the second compound semiconductor layer; and a first electrode electrically connected to the first compound semiconductor layer. The laminated structure has a ridge stripe structure. When widths of the ridge stripe structure in a light output end face and the ridge stripe structure in a light incident end face are respectively Wout, and Win, Wout>Win is satisfied. A carrier non-injection region is provided in an internal region of the laminated structure from the light output end face along an axis line of the semiconductor optical amplifier.
    • 半导体光放大器包括:依次包括由GaN化合物半导体构成的第一化合物半导体并具有第一导电类型的层压结构,具有由GaN化合物半导体构成的光放大区域的第三化合物半导体层和第二化合物半导体层 由GaN化合物半导体构成并具有第二导电类型; 形成在第二化合物半导体层上的第二电极; 和与第一化合物半导体层电连接的第一电极。 层叠结构具有脊形条纹结构。 当光输出端面中的棱条结构的宽度和光入射端面中的脊条纹结构的宽度分别为Wout时,满足Win,Wout> Win。 载体非注入区域沿着半导体光放大器的轴线从光输出端面设置在层叠结构的内部区域中。
    • 49. 发明授权
    • Laser diode
    • 激光二极管
    • US08514905B2
    • 2013-08-20
    • US12805876
    • 2010-08-23
    • Yuji MasuiRintaro KodaTomoyuki OkiTakahiro ArakidaNaoki JoganYoshinori Yamauchi
    • Yuji MasuiRintaro KodaTomoyuki OkiTakahiro ArakidaNaoki JoganYoshinori Yamauchi
    • H01S5/00
    • H01S5/18311H01S5/1833H01S5/18358H01S2301/173
    • A laser diode with which separation of a current narrowing layer is able to be prevented is provided. The laser diode includes a mesa that has a first multilayer film reflector, an active layer, and a second multilayer film reflector in this order, and has a current narrowing layer for narrowing a current injected into the active layer and a buffer layer adjacent to the current narrowing layer. The current narrowing layer is formed by oxidizing a first oxidized layer containing Al. The buffer layer is formed by oxidizing a second oxidized layer whose material and a thickness are selected so that an oxidation rate is higher than that of the first multilayer film reflector and the second multilayer film reflector and is lower than that of the first oxidized layer. A thickness of the buffer layer is 10 nm or more.
    • 提供了能够防止电流变窄层分离的激光二极管。 激光二极管包括依次具有第一多层膜反射器,有源层和第二多层膜反射器的台面,并且具有用于使注入到有源层的电流变窄的电流变窄层和与该有源层相邻的缓冲层 目前变窄层。 通过氧化含有Al的第一氧化层形成电流变窄层。 通过氧化选择材料和厚度的第二氧化层使得氧化速率高于第一多层膜反射器和第二多层膜反射器的氧化速率并且低于第一氧化层的氧化速率而形成缓冲层。 缓冲层的厚度为10nm以上。