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    • 4. 发明授权
    • Laser diode
    • 激光二极管
    • US08514905B2
    • 2013-08-20
    • US12805876
    • 2010-08-23
    • Yuji MasuiRintaro KodaTomoyuki OkiTakahiro ArakidaNaoki JoganYoshinori Yamauchi
    • Yuji MasuiRintaro KodaTomoyuki OkiTakahiro ArakidaNaoki JoganYoshinori Yamauchi
    • H01S5/00
    • H01S5/18311H01S5/1833H01S5/18358H01S2301/173
    • A laser diode with which separation of a current narrowing layer is able to be prevented is provided. The laser diode includes a mesa that has a first multilayer film reflector, an active layer, and a second multilayer film reflector in this order, and has a current narrowing layer for narrowing a current injected into the active layer and a buffer layer adjacent to the current narrowing layer. The current narrowing layer is formed by oxidizing a first oxidized layer containing Al. The buffer layer is formed by oxidizing a second oxidized layer whose material and a thickness are selected so that an oxidation rate is higher than that of the first multilayer film reflector and the second multilayer film reflector and is lower than that of the first oxidized layer. A thickness of the buffer layer is 10 nm or more.
    • 提供了能够防止电流变窄层分离的激光二极管。 激光二极管包括依次具有第一多层膜反射器,有源层和第二多层膜反射器的台面,并且具有用于使注入到有源层的电流变窄的电流变窄层和与该有源层相邻的缓冲层 目前变窄层。 通过氧化含有Al的第一氧化层形成电流变窄层。 通过氧化选择材料和厚度的第二氧化层使得氧化速率高于第一多层膜反射器和第二多层膜反射器的氧化速率并且低于第一氧化层的氧化速率而形成缓冲层。 缓冲层的厚度为10nm以上。