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41. 发明授权

US07551361B2 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权
标题翻译：具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统
公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

42. 发明申请

US20090086338A1 High Aperture Folded Catadioptric Projection Objective 审中-公开
标题翻译：高孔径折射反射折射投影目标
公开(公告)号：US20090086338A1
公开(公告)日：2009-04-02
申请号：US11864490
申请日：2007-09-28
申请人： Alexander EPPLE
发明人： Alexander EPPLE
IPC分类号： G02B17/08
CPC分类号： G02B13/22 , G02B17/08 , G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective with telecentric image space has a first objective part configured to image the pattern from the object surface into a first intermediate image, and having a first pupil surface, a second objective part configured to image the first intermediate image into a second intermediate image, and having a second pupil surface optically conjugate to the first pupil surface, the second objective part including a concave mirror having a reflective mirror surface positioned at or close to the second pupil surface, and a third objective part configured to image the second intermediate image into the image surface, and having a third pupil surface optically conjugate to the first and second pupil surface. The concave mirror is arranged coaxial with the first objective part to receive radiation from the object surface, a first deflecting mirror is arranged to deflect radiation reflected from the concave mirror towards a second deflecting mirror, and the second deflecting mirror is arranged to deflect radiation from the first deflecting mirror towards the image surface such that the image surface is parallel to the object surface. The projection objective has an immersion lens group having a convex object-side entry surface bounding at a gas or vacuum and an image-side exit surface in contact with an immersion liquid in operation, wherein the immersion lens group is at least partly made of a high-index material with refractive index n≧1.6 at the operating wavelength.
摘要翻译：具有远心图像空间的反折射投影物镜具有第一物镜部分，被配置为将图案从物体表面成像为第一中间图像，并具有第一光瞳表面，第二物镜部分被配置为将第一中间图像成像为第二中间图像图像，并且具有与第一光瞳表面光学共轭的第二光瞳表面，第二物镜部分包括具有位于第二光瞳表面或接近第二瞳孔表面的反射镜表面的凹面镜，以及第三物镜部分，图像进入图像表面，并且具有与第一和第二光瞳表面光学共轭的第三光瞳表面。所述凹面镜与所述第一物镜部分同轴地布置以接收来自所述物体表面的辐射，第一偏转镜布置成将来自所述凹面镜的反射的辐射偏转到第二偏转镜，并且所述第二偏转镜被布置成使来自第一偏转镜朝向图像表面，使得图像表面平行于物体表面。投影物镜具有浸没透镜组，其具有在气体或真空处界定的凸面物体入射面和在操作中与浸没液体接触的像侧出射面，其中浸没透镜组至少部分地由在工作波长处折射率n> = 1.6的高折射率材料。

43. 发明申请

US20090034061A1 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US20090034061A1
公开(公告)日：2009-02-05
申请号：US11596868
申请日：2005-05-13
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反射折射投射物镜具有用于对物场进行成像以形成第一实际中间像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二目标部分是具有凹面镜的反射折射物镜部分。第一折叠镜，用于在凹面镜的方向上偏转来自物体平面的辐射;以及第二折叠镜，用于偏转来自凹面镜的辐射提供图像平面的方向。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

44. 发明申请

US20080198353A1 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射光罩
公开(公告)号：US20080198353A1
公开(公告)日：2008-08-21
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/54 , G02B9/34
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

45. 发明申请

US20080186567A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
公开(公告)号：US20080186567A1
公开(公告)日：2008-08-07
申请号：US12099882
申请日：2008-04-09
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

46. 发明申请

US20080002265A1 Catadioptric Projection Objective 有权
公开(公告)号：US20080002265A1
公开(公告)日：2008-01-03
申请号：US11578100
申请日：2005-04-07
申请人： Alexander Epple
发明人： Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis effective object field arranged in an object surface of the projection objective onto an off-axis effective image field arranged in an image surface of the projection objective has: an optical axis; an effective object field situated entirely outside the optical axis and having a length A in a first direction and a width B in a second direction perpendicular to the first direction such that a circular area of minimum size enclosing the effective object field defines a radius REOF of the effective object field according to: R EOF = ( A / 2 ) 2 + ( B / 2 ) 2 ; and a circular design object field centered around the optical axis having a design object field radius RDOF, where the projection objective is essentially corrected with respect to image aberrations in zones having radial coordinates smaller than RDOF and wherein the projection objective is not fully corrected in zones having radial coordinates larger than RDOF. The conditions: RDOF=γ REOF and 1≦γ 1 are possible with a compact design. Arcuate effective object fields are preferably used.

47. 发明授权

US07289279B2 Lithographic objective having a first lens group including only lenses having a positive refractive power 有权
$Lithographic objective having a first lens group including only lenses having a positive refractive power$
标题翻译：具有仅具有正屈光力的透镜的第一透镜组的平版印刷物镜
公开(公告)号：US07289279B2
公开(公告)日：2007-10-30
申请号：US11350941
申请日：2006-02-10
申请人： Karl-Heinz Schuster , Alexander Epple
发明人： Karl-Heinz Schuster , Alexander Epple
IPC分类号： G02B3/00 , G02B9/00 , G02B9/34
CPC分类号： G03F7/70241 , G02B9/14 , G02B13/0095 , G02B13/143 , G02B13/24 , G02B27/0043
摘要： A projection objective includes a first lens group (G1) of positive refractive power, a second lens group (G2) of negative refractive power and at least one further lens group of positive refractive power in which a diaphragm is mounted. The first lens group (G1) includes exclusively lenses of positive refractive power. The number of lenses of positive refractive power (L101 to L103; L201, L202) of the first lens group (G1) is less than the number of lenses of positive refractive power (L116 to L119; L215 to L217) which are mounted forward of the diaphragm of the further lens group (G5).
摘要翻译：投影物镜包括正折射光焦度的第一透镜组（G 1），负折射光焦度的第二透镜组（G 2）和安装有光阑的至少一个正屈光力透镜组。第一透镜组（G 1）仅包括具有正屈光力的透镜。第一透镜组（G 1）的正屈光力量的透镜数（L 101〜L 103; L 201，L 202）的数量小于正折射力透镜的数量（L 116〜L 119; L 215 至L 217），其安装在另一透镜组（G 5）的隔膜的前方。

48. 发明授权

US07130129B2 Reticle-masking objective with aspherical lenses 有权
标题翻译：带非球面透镜的掩模掩模物镜
公开(公告)号：US07130129B2
公开(公告)日：2006-10-31
申请号：US10735172
申请日：2003-12-12
申请人： Jorg Schultz , Johannes Wangler , Karl-Heinz Schuster , Alexander Sohmer , Alexander Epple , Christa Müller, legal representative , Janosch Müller, legal representative
发明人： Jurgen Grunwald, deceased
IPC分类号： G02B3/02 , G02B9/00
CPC分类号： G03F7/70891 , G02B13/143 , G02B13/18 , G03F7/70066 , G03F7/70075
摘要： A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.
摘要翻译：用于将物平面成像到图像平面上的掩模版掩模（REMA）物镜具有聚光部分，中间部分和场透镜部分。三个部分一起不超过10个透镜，总共不超过五个非球面透镜表面。 REMA物镜的三个部分中的每一个具有一个或两个非球面透镜表面。

49. 发明申请

US20060132931A1 Catadioptric projection objective 审中-公开
标题翻译：反射折射投影物镜
公开(公告)号：US20060132931A1
公开(公告)日：2006-06-22
申请号：US11237749
申请日：2005-09-29
申请人： Alexander Epple , Aurelian Dodoc
发明人： Alexander Epple , Aurelian Dodoc
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging a pattern arranged in the object plane (102) of the projection objective into the image plane (104) of the projection objective has a catadioptric first objective part (105) having at least one concave mirror (106), and a dioptric second objective part (108) in which there is situated a pupil surface (111) near the image. At least one concave lens (140, 145) with a concave surface (140′, 145′) directed towards the pupil surface (111) is arranged in a near zone (160) of the pupil surface. There are no lenses with a strongly curved concave surface directed towards the image plane between the pupil surface and the image plane. Such projection objectives can be produced in a way which saves material in conjunction with good optical correction, and are relatively insensitive to production-induced deviations from the ideal design.
摘要翻译：用于将布置在投影物镜的物平面（102）中的图案成像到投影物镜的像平面（104）中的反射折射投射物镜具有反射折射的第一物镜部分（105），其具有至少一个凹面镜（106），以及其中在图像附近设置瞳孔表面（111）的屈光度第二目标部分（108）。具有指向瞳孔表面（111）的凹表面（140'，145'）的至少一个凹透镜（140,145）被布置在瞳孔表面的近区域（160）中。没有透镜具有朝向瞳孔表面和图像平面之间的图像平面的强弯曲凹面。这样的投影物镜可以以与良好的光学校正相结合的方式产生，并且对生产诱导的与理想设计的偏差相对不敏感。

50. 发明授权

US06995930B2 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US06995930B2
公开(公告)日：2006-02-07
申请号：US10734623
申请日：2003-12-15
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

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