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21. 发明授权

US08143595B2 Ion implanter 有权
标题翻译：离子注入机
公开(公告)号：US08143595B2
公开(公告)日：2012-03-27
申请号：US12547195
申请日：2009-08-25
申请人： Junichi Tatemichi , Masatoshi Onoda , Kohichi Orihira
发明人： Junichi Tatemichi , Masatoshi Onoda , Kohichi Orihira
IPC分类号： C23C14/50
CPC分类号： H01L21/67213 , H01J37/20 , H01J2237/2007 , H01J2237/201 , H01J2237/204 , H01J2237/31701 , H01L21/68764 , H01L21/68771
摘要： An ion implanter includes an implantation chamber into which an ion beam is introduced, a holder for holding substrates on two columns of a first column and a second column in an X-direction, and a holder driving unit having a function of setting the holder in a horizontal state and then positioning the holder in a substrate exchange position and a function of setting the holder in a standing state and then driving reciprocally and linearly the holder along the X-direction in an irradiation area of the ion beam. Also, the ion implanter includes two load lock mechanisms, and two substrate carrying units equipped with arms, which carry the substrates between the load lock mechanisms and a substrate exchange position respectively, every two arms.
摘要翻译：离子注入机包括：入射离子束的注入室，用于将基板保持在X方向上的第一列和第二列的两列的保持器，以及具有将所述保持器设置为的功能的保持器驱动单元水平状态，然后将保持器定位在基板更换位置中，并且具有将支架设置在立起状态，然后在离子束的照射区域沿X方向往复并直线地驱动保持器的功能。此外，离子注入机还包括两个装载锁定机构，以及两个装有臂的基板承载单元，每个臂分别在两个载荷锁定机构和基板更换位置之间承载基板。

22. 发明申请

US20120060353A1 MECHANISM AND METHOD FOR ENSURING ALIGNMENT OF A WORKPIECE TO A MASK 审中-公开
标题翻译：保证工件对准面板的机制和方法
公开(公告)号：US20120060353A1
公开(公告)日：2012-03-15
申请号：US12881653
申请日：2010-09-14
申请人： Jeffrey E. Krampert
发明人： Jeffrey E. Krampert
IPC分类号： B23Q7/00 , B23Q3/00
CPC分类号： H01L21/682 , H01J37/20 , H01J37/3171 , H01J2237/2007 , H01J2237/204 , H01J2237/31711 , H01L21/68 , Y10T29/49998
摘要： A workpiece support having alignment features to allow the proper alignment of the shadow mask to the workpiece is provided. The alignment features include tactile sensors, so as to measure the pressure being applied to each alignment feature. Based on these pressure readings, a determination can be made as to whether the workpiece is properly aligned with the shadow mask. In some embodiments, corrective actions may be initiated if a determination is made that the workpiece is not properly aligned.
摘要翻译：提供具有对准特征以允许荫罩与工件正确对准的工件支撑件。对准特征包括触觉传感器，以便测量施加到每个对准特征的压力。基于这些压力读数，可以确定工件是否与荫罩正确对准。在一些实施例中，如果确定工件未正确对准，则可以启动校正动作。

23. 发明授权

US08110818B2 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system 有权
标题翻译：控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
公开(公告)号：US08110818B2
公开(公告)日：2012-02-07
申请号：US12247536
申请日：2008-10-08
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/04 , H01J37/26
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

24. 发明授权

US08053726B2 Inspection system by charged particle beam and method of manufacturing devices using the system 有权
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US08053726B2
公开(公告)日：2011-11-08
申请号：US12216233
申请日：2008-07-01
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： H01J37/28
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在迷你环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

25. 发明申请

US20110240881A1 SPECIMEN HOLDER AND SPECIMEN HOLDER MOVEMENT DEVICE 有权
标题翻译：标本夹具和标本夹持器移动装置
公开(公告)号：US20110240881A1
公开(公告)日：2011-10-06
申请号：US13047018
申请日：2011-03-14
申请人： Hiroya Miyazaki
发明人： Hiroya Miyazaki
IPC分类号： G21K5/08
CPC分类号： H01J37/20 , H01J2237/026 , H01J2237/2001 , H01J2237/202 , H01J2237/204 , H01J2237/26 , H01J2237/2802
摘要： The present disclosure significantly reduces the waiting time from inserting a specimen holder into an electron microscope until high quality data acquisition is possible. Characterizing the present disclosure, it is a specimen holder partly made of low thermal expansion material. The low thermal expansion material can be any of group 4, 5 or 6 in the periodic table of the elements.
摘要翻译：本公开显着地减少了将样品架插入电子显微镜直到高质量数据采集成为可能的等待时间。表征本公开，它是部分由低热膨胀材料制成的试样保持器。低热膨胀材料可以是元素周期表中的4,5,6族中的任何一种。

26. 发明授权

US07888661B2 Methods for in situ surface treatment in an ion implantation system 有权
标题翻译：离子注入系统中原位表面处理方法
公开(公告)号：US07888661B2
公开(公告)日：2011-02-15
申请号：US12030306
申请日：2008-02-13
申请人： Ivan L. Berry, III
发明人： Ivan L. Berry, III
IPC分类号： H01J37/317 , H01L21/265
CPC分类号： H01J37/32431 , H01J2237/16 , H01J2237/184 , H01J2237/204 , H01J2237/31701
摘要： A system and methods are provided for mitigating or removing workpiece surface contaminants or conditions. Methods of the invention provide treatment of the wafer surface to provide a known surface condition. The surface condition can then be maintained during and following implantation of the workpiece surface with a dopant.
摘要翻译：提供了减轻或去除工件表面污染物或条件的系统和方法。本发明的方法提供晶片表面的处理以提供已知的表面状态。然后可以在用掺杂剂注入工件表面期间和之后维持表面状态。

27. 发明申请

US20100090107A1 METHOD AND HANDLING APPARATUS FOR PLACING PATTERNING DEVICE ON SUPPORT MEMBER FOR CHARGED PARTICLE BEAM IMAGING 有权
标题翻译：用于放置装载成像装置的装载装置的方法和处理装置
公开(公告)号：US20100090107A1
公开(公告)日：2010-04-15
申请号：US12249640
申请日：2008-10-10
申请人： You-Jin WANG , Hsuan-Bin HUANG , Chung-Shih PAN
发明人： You-Jin WANG , Hsuan-Bin HUANG , Chung-Shih PAN
IPC分类号： G21K5/10 , G01N23/00
CPC分类号： H01L21/68707 , H01J2237/204
摘要： A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.
摘要翻译：公开了一种用于带电粒子束成像的图案形成装置处理装置。所公开的图案形成装置处理装置包括第一夹持构件和第二夹持构件。第一夹持构件配备有多个第一定位突起，并且第二夹持构件配备有多个第二定位突起。当图案形成装置保持一角度时，第一定位突起抵靠图案形成装置的一个边缘，并且第二定位突起抵靠图案形成装置的相对边缘。当图案形成装置保持在另一个角度时，第一定位突起邻接图案形成装置的两个相邻边缘，并且第二定位突起抵靠图案形成装置的另外两个相邻的边缘。因此，所公开的图案形成装置处理装置可以以不同的角度保持图案装置。

28. 发明授权

US07679056B2 Metrology system of fine pattern for process control by charged particle beam 失效
标题翻译：带电粒子束过程控制精细模式计量系统
公开(公告)号：US07679056B2
公开(公告)日：2010-03-16
申请号：US11687002
申请日：2007-03-16
申请人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
发明人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
IPC分类号： H01J27/02 , G01R31/26
CPC分类号： G01N23/2258 , H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/204 , H01J2237/221 , H01J2237/2817 , H01L21/67207 , H01L21/67253
摘要： The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.
摘要翻译：本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。

29. 发明授权

US07626166B2 Electron microscope 有权
标题翻译：电子显微镜
公开(公告)号：US07626166B2
公开(公告)日：2009-12-01
申请号：US12038076
申请日：2008-02-27
申请人： Hiroyuki Saito , Katsuhiro Sasada
发明人： Hiroyuki Saito , Katsuhiro Sasada
IPC分类号： H01J37/16 , H01J3/14 , G01N23/04
CPC分类号： G01N23/225 , H01J37/10 , H01J37/18 , H01J37/265 , H01J37/28 , H01J2237/022 , H01J2237/204 , H01J2237/2817
摘要： An object of the present invention is to prevent foreign bodies attracted by a magnetic field of an objective lens or an electric field of an electrode plate and adhered to a surface of the objective lens or electrode plate from dropping onto the surface of a sample and adhering there during observation of the sample.To achieve the above object, an electron microscope in which, when a sample to be measured is moved away from below an objective lens, an exciting current to the objective lens of a scanning electron microscope is turned off or excitation thereof is made weaker than before the sample to be measured being moved away, or an applied voltage to an acceleration cylinder for accelerating an electron beam is turned off or made lower than before the sample to be measured being moved away is proposed.
摘要翻译：本发明的目的是防止被物镜的磁场或电极板的电场所吸引的异物附着在物镜或电极板的表面上，从而落在样品的表面上并粘附在样品观察期间。为了实现上述目的，一种电子显微镜，其中当待测量的样品从物镜的下方移开时，扫描电子显微镜的物镜的激励电流被关闭或使其激发弱于之前要测量的样本被移开，或提供加速电子束的加速气缸的施加电压被关闭或低于被测量样品移开之前。

30. 发明申请

US20090119807A1 METHOD OF PREPARING A TRANSMISSION ELECTRON MICROSCOPE SAMPLE AND A SAMPLE PIECE FOR A TRANSMISSION ELECTRON MICROSCOPE 有权
标题翻译：传输电子显微镜样品的制备方法和传输电子显微镜的样品片
公开(公告)号：US20090119807A1
公开(公告)日：2009-05-07
申请号：US12264750
申请日：2008-11-04
申请人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
发明人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
IPC分类号： G01N13/10
CPC分类号： H01J37/3056 , B82Y15/00 , G01N1/286 , H01J37/20 , H01J37/26 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/206 , H01J2237/2067 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a method of preparing a sample piece for a transmission electron microscope, the sample piece for a transmission electron microscope including a substantially planar finished surface which can be observed with the transmission electron microscope and a grabbing portion which microtweezers can grab without contacting the finished surface. The method of preparing a sample piece for a transmission electron microscope is characterized by including: a first step of cutting out the sample piece from a sample body Wa with a charged particle beam, the sample piece being coupled to the sample body at a coupling portion; a second step of grabbing with the microtweezers the grabbing portion of the sample piece with the finished surface of the sample piece cut out in the first step being covered with the microtweezers; a third step of detaching the sample piece grabbed with the microtweezers in the second step from the sample body by cutting the coupling portion with the charged particle beam with a grabbed state of the sample piece being maintained; and a fourth step of transferring and fixing with the microtweezers the sample piece detached in the third step onto a sample holder.
摘要翻译：提供了一种制备透射电子显微镜样品的方法，用于透射电子显微镜的样品片，其包括可透射电子显微镜观察的基本上平面的成品表面，以及微型加工者可以在不接触成品的情况下抓取的抓取部分表面。制备透射电子显微镜样品的方法的特征在于包括：第一步骤，利用带电粒子束从样品体Wa切出样品片，样品片以耦合部分 ; 第二步骤是用微型加湿器抓住样品的抓取部分，其中在第一步骤中切出的样品的成品表面被微型加工机覆盖; 第三步骤，通过用保持样品的抓取状态的带电粒子束切割耦合部分，将样品从第二步骤中剥离出来; 以及第四步骤，用微型加工机将第三步骤中拆卸的样品片转移和固定到样品架上。

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