专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US08876453B2 Substrate processing apparatus and method of manufacturing semiconductor device 有权
标题翻译：基板处理装置及半导体装置的制造方法
公开(公告)号：US08876453B2
公开(公告)日：2014-11-04
申请号：US13004495
申请日：2011-01-11
申请人： Yukinori Aburatani , Masakazu Shimada , Osamu Morita
发明人： Yukinori Aburatani , Masakazu Shimada , Osamu Morita
IPC分类号： H01L21/31 , H01L21/67
CPC分类号： H01L21/67109
摘要： A substrate processing apparatus suppresses vibration of a cover when unloading a boat from a process pipe. The apparatus comprises a boat for placing a substrate, a process pipe configured to accommodate the boat, a cover having the boat placed thereon, the cover configured to open and close a furnace port installed on a lower end of the process pipe, a motor to drive an elevation mechanism which moves the cover upward and downward, a sealing member to seal a space between the cover and the process pipe, and a controller to control motor speed and limit motor torque while the cover moves from the furnace port to a predetermined position. The substrate is maintained at a rest position in the boat during a recovery from a deformation of the cover occurring when separating the sealing member from the cover surface or the process pipe surface.
摘要翻译：基板处理装置在从处理管卸载船时抑制盖的振动。该装置包括用于放置基板的船，配置成容纳船的加工管，具有放置在其上的船的盖，盖构造成打开和关闭安装在加工管的下端的炉口，马达驱动上下移动盖的升降机构，用于密封盖和加工管之间的空间的密封构件，以及控制器，当盖从炉口移动到预定位置时控制马达速度并限制马达扭矩。在将密封构件从盖表面或工艺管表面分离时，在从盖的变形恢复期间，基板保持在船的静止位置。

22. 外观设计

USD651990S1 Semiconductor manufacturing equipment 有权
公开(公告)号：USD651990S1
公开(公告)日：2012-01-10
申请号：US29371214
申请日：2010-11-29
申请人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata
设计人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata

23. 发明授权

US06563634B2 Microscope with aberration correcting function 有权
标题翻译：具有像差校正功能的显微镜
公开(公告)号：US06563634B2
公开(公告)日：2003-05-13
申请号：US09951871
申请日：2001-09-13
申请人： Masakazu Shimada , Yoshihiro Shimada , Hisao Kitagawa
发明人： Masakazu Shimada , Yoshihiro Shimada , Hisao Kitagawa
IPC分类号： G02B2100
CPC分类号： G02B21/241
摘要： A microscope according to the invention comprises an aberration correcting objective lens facing a specimen and having an aberration correcting lens correcting an aberration due to an error in the thickness of a cover, a Petri dish or a slide glass; a moving amount detector detecting moving amount of the aberration correcting lens; a focusing unit moving the specimen; a driver unit driving the focusing unit; and an arithmetic unit obtaining a defocus amount based on a moving amount detected by the moving amount detector. When the aberration correcting lens is moved, the specimen is put out of focus. On the basis of a defocus amount obtained by the arithmetic unit, the driver unit drives the focusing unit so that the lens may focus on the specimen.
摘要翻译：根据本发明的显微镜包括面向样本的像差校正物镜，并且具有校正由盖，培养皿或载玻片的厚度误差引起的像差的像差校正透镜; 移动量检测器，检测像差校正透镜的移动量; 移动样本的聚焦单元; 驱动聚焦单元的驱动单元; 以及算术单元，基于由移动量检测器检测到的移动量获得散焦量。当像差校正透镜移动时，样本失焦。基于由运算单元获得的散焦量，驱动单元驱动聚焦单元，使得透镜可以聚焦在样本上。

24. 发明授权

US5735961A Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide 失效
标题翻译：半导体制造装置，用于控制负载锁定室内的氧浓度的方法和用于产生天然氧化物的方法
公开(公告)号：US5735961A
公开(公告)日：1998-04-07
申请号：US648541
申请日：1996-05-16
申请人： Masakazu Shimada
发明人： Masakazu Shimada
IPC分类号： C23C14/56 , C23C16/44 , H01L21/00 , H01L21/02 , H01L21/205 , H01L21/22 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67757 , C23C16/4401 , H01L21/67115 , Y10S414/137 , Y10S414/139 , Y10T29/41
摘要： A semiconductor fabricating apparatus comprises a reaction tube defining a space for heat treating a silicon wafer, heater means disposed to extend around the reaction tube, a load-lock chamber connected to the reaction tube by means of a gate valve, a supply pipe communicating with the load-lock chamber for supplying an inert gas and a gas including oxygen thereto, an oxygen concentration meter, an inert gas flow rate adjuster and an oxygen flow rate regulator. Based on the results detected by the oxygen concentration meter the flow rate of the inert gas and the gas including oxygen are controlled by means of the flow rate adjuster and the flow rate regulator to maintain the oxygen concentration within the load-lock chamber at a desired value.
摘要翻译：半导体制造装置包括限定用于硅晶片热处理的空间的反应管，设置成围绕反应管延伸的加热器装置，通过闸阀连接到反应管的加载锁定室，与用于供给惰性气体的负载锁定室和包含氧的气体，氧浓度计，惰性气体流量调节器和氧气流量调节器。基于由氧浓度计检测到的结果，通过流量调节器和流量调节器来控制惰性气体和包括氧的气体的流量，以将负载锁定室内的氧浓度保持在期望值值。

25. 发明授权

US08303712B2 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube 有权
标题翻译：基板处理装置，半导体装置的制造方法以及处理管
公开(公告)号：US08303712B2
公开(公告)日：2012-11-06
申请号：US12363045
申请日：2009-01-30
申请人： Seiyo Nakashima , Tomoyuki Yamada , Masakazu Shimada
发明人： Seiyo Nakashima , Tomoyuki Yamada , Masakazu Shimada
IPC分类号： C23C16/455 , C23C16/458 , C23C16/46 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C16/45591 , C23C16/4584 , H01L21/67017 , H01L21/67303 , H01L21/68792
摘要： In a substrate processing apparatus, a process vessel is configured to accommodate and process a substrate held at a horizontal position. A gas introduction port is installed at a periphery of a first side of the process vessel and configured to introduce gas into the process vessel from a lateral direction of the substrate. A gas exhaust port is installed at a second side of the process vessel which is opposite to the first side, and is configured to exhaust gas inside the process vessel from a lateral direction of the substrate. A slope part is installed between the gas introduction port and the gas exhaust port inside the process vessel, and is configured to guide a flow path of the gas introduced into the process vessel.
摘要翻译：在基板处理装置中，处理容器构造成容纳并处理保持在水平位置的基板。气体导入口安装在处理容器的第一侧的周边，并被构造成从衬底的横向方向将气体引入处理容器。排气口安装在与第一侧相对的处理容器的第二侧，并且构造成从衬底的横向方向排出处理容器内的气体。倾斜部分安装在处理容器内的气体导入口和排气口之间，构成为引导导入处理容器的气体的流路。

26. 发明申请

US20090197402A1 SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESS TUBE 有权
标题翻译：基板加工装置，制造半导体装置的方法和工艺管
公开(公告)号：US20090197402A1
公开(公告)日：2009-08-06
申请号：US12363045
申请日：2009-01-30
申请人： Seiyo NAKASHIMA , Tomoyuki Yamada , Masakazu Shimada
发明人： Seiyo NAKASHIMA , Tomoyuki Yamada , Masakazu Shimada
IPC分类号： H01L21/02 , C23C16/54
CPC分类号： C23C16/45591 , C23C16/4584 , H01L21/67017 , H01L21/67303 , H01L21/68792
摘要： In a substrate processing apparatus, a process vessel is configured to accommodate and process a substrate held at a horizontal position. A gas introduction port is installed at a periphery of a first side of the process vessel and configured to introduce gas into the process vessel from a lateral direction of the substrate. A gas exhaust port is installed at a second side of the process vessel which is opposite to the first side, and is configured to exhaust gas inside the process vessel from a lateral direction of the substrate. A slope part is installed between the gas introduction port and the gas exhaust port inside the process vessel, and is configured to guide a flow path of the gas introduced into the process vessel.
摘要翻译：在基板处理装置中，处理容器构造成容纳并处理保持在水平位置的基板。气体导入口安装在处理容器的第一侧的周边，并被构造成从衬底的横向方向将气体引入处理容器。排气口安装在与第一侧相对的处理容器的第二侧，并且构造成从衬底的横向方向排出处理容器内的气体。倾斜部分安装在处理容器内的气体导入口和排气口之间，构成为引导导入处理容器的气体的流路。

27. 发明授权

US6043475A Focal point adjustment apparatus and method applied to microscopes 失效
标题翻译：焦点调节装置和方法应用于显微镜
公开(公告)号：US6043475A
公开(公告)日：2000-03-28
申请号：US839658
申请日：1997-04-15
申请人： Masakazu Shimada , Takashi Nagano , Takashi Yoneyama , Nobuyuki Nagasawa , Hideaki Endo , Jitsunari Kojima , Atsuhiro Tsuchiya , Yukiko Saeki
发明人： Masakazu Shimada , Takashi Nagano , Takashi Yoneyama , Nobuyuki Nagasawa , Hideaki Endo , Jitsunari Kojima , Atsuhiro Tsuchiya , Yukiko Saeki
IPC分类号： G02B21/24 , G02B7/04
CPC分类号： G02B21/241
摘要： A focal point adjustment apparatus applied to an optical apparatus with a projection optical system, comprises, an object lens, a stage on which a plate member on which a subject is put for measurement is placed, provision unit for providing the thickness of the plate member for measurement, determining unit for determining data on the distance between the object lens and the stage on the basis of the thickness of the plate member for measurement provided by the provision unit, and focusing unit for adjusting the distance between the object lens and the stage on the basis of the data on the distance between the object lens and the stage determined by the determining unit.
摘要翻译：一种应用于具有投影光学系统的光学装置的焦点调节装置，包括：物镜，放置有被测体放置用于测量的板构件的台，提供单元，用于提供板构件的厚度用于测量的确定单元，用于基于由提供单元提供的用于测量的板构件的厚度来确定物镜与台架之间的距离的数据;以及聚焦单元，用于调整物镜与舞台之间的距离基于由所述确定单元确定的所述物镜与所述台阶之间的距离的数据。

28. 外观设计

USD652395S1 Semiconductor manufacturing equipment 有权
标题翻译：半导体制造设备
公开(公告)号：USD652395S1
公开(公告)日：2012-01-17
申请号：US29371213
申请日：2010-11-29
申请人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata
设计人： Masakazu Shimada , Takashi Nogami , Satoshi Aizawa , Seiyo Nakashima , Tomoyuki Yamada , Shinobu Sugiura , Yukinori Aburatani , Mitsuhiro Nagata

29. 发明授权

US08030599B2 Substrate processing apparatus, heating device, and semiconductor device manufacturing method 有权
标题翻译：基板加工装置，加热装置以及半导体装置的制造方法
公开(公告)号：US08030599B2
公开(公告)日：2011-10-04
申请号：US12429462
申请日：2009-04-24
申请人： Masakazu Shimada
发明人： Masakazu Shimada
IPC分类号： F27B5/00 , F27B5/08 , F27B5/14 , C23C16/00
CPC分类号： H01L21/67109
摘要： Provided are a substrate processing apparatus, a heating device, and a semiconductor device manufacturing method. The substrate processing apparatus comprises a process chamber configured to process a substrate. A heating element is installed at a peripheral side of the process chamber. An annular inner wall is installed at a peripheral side of the heating element. An annular outer wall is installed at a peripheral side of the inner wall with a space being formed therebetween. An annular cooling member is installed at the space for cooling. An actuating mechanism moves the cooling member between a contacting position where the cooling member makes contact with at least one of the inner wall and the outer wall and a non-contacting position where the cooling member does not make contact with any one of the inner wall and the outer wall. A control unit controls at least the actuating mechanism.
摘要翻译：提供了一种基板处理装置，加热装置和半导体装置的制造方法。基板处理装置包括被配置为处理基板的处理室。加热元件安装在处理室的周边。环形内壁安装在加热元件的周边。环形外壁安装在内壁的周边，其间形成有空间。环形冷却件安装在冷却空间。致动机构将冷却部件移动到冷却部件与内壁和外壁之中的至少一个接触的接触位置和冷却部件不与内壁中的任何一个接触的非接触位置和外墙。控制单元至少控制致动机构。

30. 发明授权

US6025956A Incident-light fluorescence microscope 失效
标题翻译：入射光荧光显微镜
公开(公告)号：US6025956A
公开(公告)日：2000-02-15
申请号：US766132
申请日：1996-12-16
申请人： Takashi Nagano , Keiji Shimizu , Kenji Kawasaki , Kiyonobu Kurata , Masakazu Shimada
发明人： Takashi Nagano , Keiji Shimizu , Kenji Kawasaki , Kiyonobu Kurata , Masakazu Shimada
IPC分类号： G02B21/08 , G02B21/16 , G02B21/06
CPC分类号： G02B21/082 , G02B21/16
摘要： An incident-light fluorescence microscope including: (i) a transmission illuminating optical system which has a first optical member for receiving light emitted from a light source and extracting transmitted light and which irradiates the transmitted light onto a sample, and (ii) an observation optical system which has an objective lens and a second optical member and which is positioned closer to the objective lens than the sample. An incident-light fluorescence illuminating optical system is provided in the observation optical system, wherein the first optical member has a peak of transmittance at a wavelength longer than the fluorescent wavelength, and the second optical member selectively modulates only a wavelength transmitted through the first optical member.
摘要翻译：一种入射光荧光显微镜，包括：（i）透射照明光学系统，其具有用于接收从光源发射的光并提取透射光并将透射光照射到样品上的第一光学部件，以及（ii）观察光学系统，其具有物镜和第二光学构件，并且位于比样品更靠近物镜的位置。入射光荧光照明光学系统设置在观察光学系统中，其中第一光学构件具有比荧光波长更长的波长的透射峰，而第二光学构件仅选择性地仅调制透过第一光学会员。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式