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1. 发明申请

US20170287745A1 HEATER ELEMENTS WITH ENHANCED COOLING 审中-公开
公开(公告)号：US20170287745A1
公开(公告)日：2017-10-05
申请号：US15619568
申请日：2017-06-12
申请人： Arsalan Emami
发明人： Arsalan Emami
IPC分类号： H01L21/67 , H01L23/467 , F27D1/00 , F27B5/08
CPC分类号： H01L21/67098 , F27B5/08 , F27D1/0006 , F27D11/00 , F27D2009/0005 , H01L21/67109 , H01L23/467 , H01L2924/0002 , H01L2924/00
摘要： A heater assembly with enhanced cooling pursuant to various embodiments described herein makes use of fluidic flow in the insulation or in the space used for insulation. By creating a natural convection or forced convection flow, the heater cools down faster, it can operate at lower temperatures and/or higher temperature precision, and it can improve temperature controllability by generating higher heat loss rates.

2. 发明授权

US07019266B1 Substantially-uniform-temperature annealing 失效
标题翻译：基本均匀的温度退火
公开(公告)号：US07019266B1
公开(公告)日：2006-03-28
申请号：US10947912
申请日：2004-09-23
申请人： Shariar Motakef , Serhat Yesilyurt
发明人： Shariar Motakef , Serhat Yesilyurt
IPC分类号： F27B5/08 , F27B5/14 , F27B3/28 , F27D1/10
CPC分类号： C30B33/02 , C30B29/12 , F27B5/08 , F27B5/14 , F27B5/18 , F27D19/00 , F27D21/0014 , Y10T117/1016
摘要： A method of heating an optical member includes providing the optical member, directing heat from a heat source toward the optical member, and distributing the heat about the optical member through a high-thermal-conductivity apparatus disposed between the heat source and the optical member such that a surface of the apparatus defining a volume for receiving the optical member will have a substantially uniform temperature.
摘要翻译：一种加热光学构件的方法包括提供光学构件，将热量从热源引向光学构件，并且通过设置在热源和光学构件之间的高热导率装置在光学构件周围分布热量，例如限定用于接收光学构件的体积的装置的表面将具有基本均匀的温度。

3. 发明授权

US6072821A Method for heat treating materials at high temperatures, and a furnace bottom construction for high temperature furnaces 失效
标题翻译：高温处理材料的方法和高温炉的炉底结构
公开(公告)号：US6072821A
公开(公告)日：2000-06-06
申请号：US88919
申请日：1998-06-02
申请人： Niclas Axelsson
发明人： Niclas Axelsson
IPC分类号： F27B5/08 , F27B5/14 , F27D1/00 , F27D1/16 , F27D5/00 , H05B3/60
CPC分类号： F27B5/08 , F27D1/0043 , F27D5/00 , F27B2005/143
摘要： A method and apparatus for heat-treating a material at high temperatures wherein the material from which the bottom of a furnace chamber is made forms a eutectic with the material to be heat-treated, and does so at a temperature lower than the heat treatment temperature. A part of the furnace chamber bottom, which part can include the whole or a portion of the furnace chamber bottom, and on which the material to be heat-treated rests is formed at least in part of a material that has the same chemical composition as, or a chemical composition similar to, the chemical composition of the material to be heat-treated. The furnace bottom part on which the material to be heat-treated rests is positioned so that it has no physical contact with the remaining furnace bottom material within the furnace chamber. The furnace bottom part is positioned such that the contact location between the bottom part and the furnace lining material at which the bottom part is arranged, will assume during the heat-treatment process a temperature that is lower than the temperature at which a molten phase will be formed between the materials that are in contact with one another at the contact location.
摘要翻译：一种用于在高温下热处理材料的方法和装置，其中制造炉室的底部的材料与待热处理的材料形成共晶，并且在低于热处理温度的温度下进行。炉室底部的一部分，其部分可以包括炉室底部的整个或一部分，并且待热处理的材料搁置在其上的部分至少部分地由具有与，或类似于待热处理材料的化学成分的化学组成。被热处理的材料放置在其上的炉底部分被定位成使其与炉室内剩余的炉底材料没有物理接触。炉底部分被定位成使得底部部分与底部部分布置的炉衬材料之间的接触位置在热处理过程中将呈现出比熔融相温度低的温度形成在接触位置处彼此接触的材料之间。

4. 发明授权

US4169408A Continuous pressure cooker and cooler with controlled liquid flow 失效
标题翻译：连续压力锅和冷却器，控制液体流动
公开(公告)号：US4169408A
公开(公告)日：1979-10-02
申请号：US781405
申请日：1977-03-25
申请人： Samuel A. Mencacci
发明人： Samuel A. Mencacci
IPC分类号： A23L3/36 , A23L3/00 , A23L3/02 , A23L3/12 , A23L3/14 , B65B55/04 , B65B55/06 , F25D1/02 , F27B5/08 , A47J27/08
CPC分类号： A23L3/025 , A23L3/003 , A23L3/02 , A23L3/12 , A23L3/14
摘要： Method and apparatus for continuously processing filled containers with liquid heat treatment mediums maintained under superatmospheric pressure by an overriding air pressure. A minimum of liquid is used during processing with the liquid level being maintained above the containers at all times. The liquid is controllably circulated through container filled tunnels defined within carts, from one end of the tunnel to the other, to assure equal heat treatment of all containers in the batch of containers in each tunnel. The carts may either be non-agitating or agitating carts. One embodiment of the continuous pressure cooker and cooler includes a pressure vessel having two pressure locks to provide a pressure cooking chamber with high pressure cooling being performed in a mini-cooler defined by the outlet pressure lock followed by additional atmospheric cooling. Another embodiment of the invention comprises three pressure lock means to positively divide the pressure vessel into cooking and cooling chambers; and a third embodiment substitutes a plurality of baffles for the intermediate pressure lock thereby effectively dividing the pressure vessel into a cooking chamber and cooling chamber.
摘要翻译：用于通过超压空气压力连续处理在超大气压下保持的液体热处理介质的填充容器的方法和装置。在处理过程中使用最少的液体，液面始终保持在容器上方。液体可控地循环通过在车内定义的容器填充的隧道，从隧道的一端到另一端，以确保在每个隧道中的批次容器中的所有容器的相等的热处理。推车可能是非搅拌或搅拌车。连续压力锅和冷却器的一个实施例包括具有两个压力锁的压力容器，以在由出口压力锁定以及额外的大气冷却所限定的微型冷却器中执行高压冷却以提供压力烹饪室。本发明的另一个实施例包括三个压力锁定装置，用于将压力容器正向分成烹饪和冷却室; 并且第三实施例将多个挡板代替中间压力锁定，从而有效地将压力容器分成烹饪室和冷却室。

5. 发明授权

US3405924A Furnace with variable effective insulation 失效
标题翻译：炉具有可变的有效绝缘
公开(公告)号：US3405924A
公开(公告)日：1968-10-15
申请号：US58372466
申请日：1966-10-03
申请人： BTU ENG CORP
发明人： HOWARD BECK JACOB
IPC分类号： C21D1/74 , F27B5/08
CPC分类号： F27B5/08 , C21D1/74

6. 发明申请

US20200224973A1 Waterless Portable Precision Heating Device 审中-公开
公开(公告)号：US20200224973A1
公开(公告)日：2020-07-16
申请号：US16833415
申请日：2020-03-27
申请人： Ardent LLC
发明人： Shanel A. Lindsay
IPC分类号： F27B5/14 , F27B5/08 , F27B5/18
摘要： A waterless portable precision heating device includes an ingredient container to contain a food-related, a health-related, or a crafting-related ingredient; a thin heating element configured to surround and contact the ingredient container; an insulation layer configured to surround and contact the heating element; an outer shell surrounding the insulation layer; a lid that encloses the product container and fluidly seals it from the environment; at least one sensor configured to detect the temperature of the device; and a circuit board with a controller that controls the heating of the heating in response to signals received from the at least one sensor indicating whether the product container has reached a threshold temperature.

7. 发明申请

US20190032998A1 ASSEMBLY OF A LINER AND A FLANGE FOR A VERTICAL FURNACE AS WELL AS THE LINER AND THE VERTICAL FURNACE 审中-公开
公开(公告)号：US20190032998A1
公开(公告)日：2019-01-31
申请号：US15660805
申请日：2017-07-26
申请人： ASM IP Holding B.V.
发明人： Lucian C. Jdira , Chris G.M. de Ridder , Theodorus G.M. Oosterlaken , Klaas P. Boonstra , Herbert Terhorst , Juul Keijser
IPC分类号： F27B5/04 , F27B1/14 , F27B1/28 , F27B5/08 , F27B5/12 , F27B5/16 , F27D3/00 , F27D11/00
摘要： An assembly of a liner and a flange for a vertical furnace for processing substrates is provided. The liner being configured to extend in the interior of a process tube of the vertical furnace, and the flange is configured to at least partially close a liner opening. The liner comprising a substantially cylindrical wall delimited by the liner opening at a lower end and closed at a higher end and being substantially closed for gases above the liner opening and defining an inner space. The flange comprising:an inlet opening configured to insert and remove a boat configured to carry substrates in the inner space of the liner;a gas inlet to provide a gas to the inner space. The assembly is constructed and arranged with a gas exhaust opening to remove gas from the inner space and a space between the liner and the low pressure tube.

8. 发明授权

US09803925B2 Thermal shielding system 有权
公开(公告)号：US09803925B2
公开(公告)日：2017-10-31
申请号：US14654611
申请日：2013-12-19
申请人： PLANSEE SE
发明人： Christian Grohs , Karl Huber , Arno Plankensteiner , Karl Raggl , Bernhard Valentini
IPC分类号： C30B35/00 , F27D1/00 , C21D9/00 , C04B35/48 , F27B1/14 , F27B3/12 , F27B5/08 , F27B14/10 , F27D1/02
CPC分类号： F27D1/0033 , C04B35/48 , C21D9/00 , F27B1/14 , F27B3/12 , F27B5/08 , F27B14/10 , F27D1/0006 , F27D1/02
摘要： A thermal shielding system for thermally shielding a batch space of high-temperature furnaces includes at least one shielding element. The shielding element has an encasing wall formed of refractory metal sheet(s) and a ceramic material accommodated in the wall. The ceramic material is present in a particulate and/or fibrous structure and it is based on zirconium oxide (ZrO2)

9. 发明申请

US20170073786A1 HEAT TREATMENT APPARATUS 审中-公开
标题翻译：热处理设备
公开(公告)号：US20170073786A1
公开(公告)日：2017-03-16
申请号：US15343355
申请日：2016-11-04
申请人： IHI Corporation , IHI Machinery and Furnace Co., Ltd.
发明人： Kazuhiko KATSUMATA , Kaoru ISOMOTO , Takahiro NAGATA , Akira NAKAYAMA , Yuusuke SHIMIZU , Gen NISHITANI
IPC分类号： C21D9/00 , F27B5/14 , F27B5/08 , F27D1/18 , F27D1/00
摘要： A heat treatment apparatus includes: a heat treatment chamber that performs heating treatment for a treatment object thereinside; and a thermal insulator disposed inside the heat treatment chamber and surrounding a receiving area for the treatment object. The heat treatment chamber includes a side wall portion and a lid portion configured to be attachable to and detachable from the side wall portion. The thermal insulator includes a ceiling disposed on the inside of the lid portion. The ceiling includes a thermal insulator lid that is at least part of the ceiling and is united to the lid portion.
摘要翻译：热处理设备包括：对其内部的处理对象进行加热处理的热处理室; 以及热绝缘体，其设置在所述热处理室的内部并且围绕所述处理对象的接收区域。热处理室包括侧壁部分和盖部分，盖部分被构造成可附接到侧壁部分并从侧壁部分拆卸。绝热体包括设置在盖部内侧的顶棚。天花板包括至少部分天花板并与盖部分结合的绝热盖。

10. 发明授权

US08030599B2 Substrate processing apparatus, heating device, and semiconductor device manufacturing method 有权
标题翻译：基板加工装置，加热装置以及半导体装置的制造方法
公开(公告)号：US08030599B2
公开(公告)日：2011-10-04
申请号：US12429462
申请日：2009-04-24
申请人： Masakazu Shimada
发明人： Masakazu Shimada
IPC分类号： F27B5/00 , F27B5/08 , F27B5/14 , C23C16/00
CPC分类号： H01L21/67109
摘要： Provided are a substrate processing apparatus, a heating device, and a semiconductor device manufacturing method. The substrate processing apparatus comprises a process chamber configured to process a substrate. A heating element is installed at a peripheral side of the process chamber. An annular inner wall is installed at a peripheral side of the heating element. An annular outer wall is installed at a peripheral side of the inner wall with a space being formed therebetween. An annular cooling member is installed at the space for cooling. An actuating mechanism moves the cooling member between a contacting position where the cooling member makes contact with at least one of the inner wall and the outer wall and a non-contacting position where the cooling member does not make contact with any one of the inner wall and the outer wall. A control unit controls at least the actuating mechanism.
摘要翻译：提供了一种基板处理装置，加热装置和半导体装置的制造方法。基板处理装置包括被配置为处理基板的处理室。加热元件安装在处理室的周边。环形内壁安装在加热元件的周边。环形外壁安装在内壁的周边，其间形成有空间。环形冷却件安装在冷却空间。致动机构将冷却部件移动到冷却部件与内壁和外壁之中的至少一个接触的接触位置和冷却部件不与内壁中的任何一个接触的非接触位置和外墙。控制单元至少控制致动机构。

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