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21. 发明授权

US08810095B2 Spindle motor with fluid dynamic bearing and storage disk drive 有权
标题翻译：主轴电机带流体动力轴承和存储磁盘驱动器
公开(公告)号：US08810095B2
公开(公告)日：2014-08-19
申请号：US13198776
申请日：2011-08-05
申请人： Junya Mizukami , Takayuki Oe , Yoichi Sekii , Naoki Sabashi , Hideki Nishimura , Takehito Tamaoka , Takashi Yamamoto
发明人： Junya Mizukami , Takayuki Oe , Yoichi Sekii , Naoki Sabashi , Hideki Nishimura , Takehito Tamaoka , Takashi Yamamoto
IPC分类号： H02K5/167 , F16C17/10 , H02K7/08 , G11B33/14 , G11B19/20
CPC分类号： H02K7/085 , F16C17/105 , F16C17/107 , F16C33/745 , F16C2370/12 , G11B19/2036 , G11B33/1473
摘要： A dynamic pressure bearing is defined in a first gap between a shaft portion and a sleeve portion. An upper seal portion extending upward and a lower seal portion extending downward are arranged radially outward of the dynamic pressure bearing. Each of the upper seal portion and the lower seal portion includes a surface including a lubricating oil located therein. The upper seal portion and the lower seal portion are arranged in communication with each other through a communicating hole defined in the sleeve portion. The communicating hole and a space ranging from the upper seal portion to the lower seal portion through the first gap are filled with the lubricating oil. The axial distance between the surfaces of the lubricating oil in the upper seal portion and the lower seal portion is arranged to be shorter than the axial distance between an upper end and a lower end of the dynamic pressure bearing.
摘要翻译：在轴部和套筒部之间的第一间隙中限定动态压力轴承。向上延伸的上密封部分和向下延伸的下密封部分布置在动压轴承的径向外侧。上密封部分和下密封部分中的每一个包括其中包括润滑油的表面。上密封部分和下密封部分通过限定在套筒部分中的连通孔彼此连通。连通孔和通过第一间隙从上密封部到下密封部的空间填充有润滑油。上密封部中的润滑油的表面与下部密封部之间的轴向距离比动压轴承的上端和下端的轴向距离短。

22. 发明授权

US08703739B2 Intravascular indwelling catheter lock solution containing weak acid and container containing the same 失效
标题翻译：含有弱酸性的血管内留置导管锁溶液和含有相同的容器
公开(公告)号：US08703739B2
公开(公告)日：2014-04-22
申请号：US13133123
申请日：2008-12-05
申请人： Yuko Kimura , Koji Suzuki , Minoru Iwata , Sumika Iwamoto , Takashi Yamamoto
发明人： Yuko Kimura , Koji Suzuki , Minoru Iwata , Sumika Iwamoto , Takashi Yamamoto
IPC分类号： A61K31/727
CPC分类号： A61K31/194 , A61K31/727 , A61K33/42 , A61L29/14 , A61K2300/00
摘要： A catheter lock solution which is a catheter lock preparation having a bacteriostatic property at physiological osmotic pressure without practically containing a bacteriostatic component such as a preservative, an antimicrobial agent, or an antibiotic and having high safety, characterized in that the preparation contains a weak acid having an acid dissociation constant (pKa) of 3.0 to 6.5 as a buffer, a pH of the solution is less than 6.0, preferably from 3.0 to about 5.5, an osmotic pressure ratio is from 0.5 to 3.0, and a pH change (variation) can be suppressed to less than the 6.0 with the weak acid, and a container containing the catheter lock solution.
摘要翻译：一种导管锁定溶液，其是在生理渗透压下具有抑菌性质的导管锁定制剂，实际上不含抑菌组分如防腐剂，抗微生物剂或抗生素并具有高安全性，其特征在于所述制剂含有弱酸酸性解离常数（pKa）为3.0〜6.5作为缓冲液，溶液的pH值小于6.0，优选为3.0〜5.5，渗透压比为0.5〜3.0，pH变化（变化）可以用弱酸将其抑制到小于6.0，以及容纳导管锁定溶液的容器。

23. 发明授权

US08628676B2 Plasma etching method 有权
标题翻译：等离子蚀刻法
公开(公告)号：US08628676B2
公开(公告)日：2014-01-14
申请号：US13638144
申请日：2011-05-25
申请人： Naoya Ikemoto , Takashi Yamamoto , Yoshiyuki Nozawa
发明人： Naoya Ikemoto , Takashi Yamamoto , Yoshiyuki Nozawa
IPC分类号： H01L21/3065
CPC分类号： H01L21/3065 , H01L21/32137
摘要： A plasma etching method capable of forming a tapering etching structure having a smooth surface is provided. A fluorine-containing gas and a nitrogen gas are used and plasma is generated from these gases simultaneously, and a silicon substrate K is etched by the plasma while an etch-resistant layer is formed on the silicon substrate K by the plasma and then a fluorine-containing gas and an oxygen-containing gas are used and plasma is generated from these gases simultaneously, and the silicon substrate K is etched by the plasma while an etch-resistant layer is formed on the silicon substrate K by the plasma generated from the oxygen-containing gas, thereby forming a tapering etching structure H having a wide top opening width and a narrow bottom width.
摘要翻译：提供能够形成具有光滑表面的锥形蚀刻结构的等离子体蚀刻方法。使用含氟气体和氮气，同时从这些气体产生等离子体，并且通过等离子体蚀刻硅衬底K，同时通过等离子体在硅衬底K上形成耐蚀刻层，然后将氟使用含气体和含氧气体，并且同时从这些气体产生等离子体，并且通过等离子体蚀刻硅衬底K，同时通过由氧气产生的等离子体在硅衬底K上形成耐蚀刻层从而形成具有宽的顶部开口宽度和窄的底部宽度的锥形蚀刻结构H.

24. 发明授权

US08598541B2 Fluorescent image obtaining device, fluorescent image obtaining method and fluorescent image obtaining program 有权
标题翻译：荧光图像获取装置，荧光图像获取方法和荧光图像获取程序
公开(公告)号：US08598541B2
公开(公告)日：2013-12-03
申请号：US12868187
申请日：2010-08-25
申请人： Koichiro Kishima , Yu Hirono , Nobuhiro Hayashi , Takamichi Yamakoshi , Nobuhiro Kihara , Takashi Yamamoto , Fumiyasu Suzuki , Ryu Narusawa
发明人： Koichiro Kishima , Yu Hirono , Nobuhiro Hayashi , Takamichi Yamakoshi , Nobuhiro Kihara , Takashi Yamamoto , Fumiyasu Suzuki , Ryu Narusawa
IPC分类号： G01J1/58
CPC分类号： G01N21/6458 , G01N21/6428
摘要： A fluorescent image obtaining device includes a light source that irradiates light such that a fluorescent material marked on a target in a biological sample lies in a non-excited state and a fluorescent material marked on a control with the target lies in an excited state, and an imaging unit that takes an image including the entire biological sample.
摘要翻译：荧光图像获取装置包括照射光的光源，使得标记在生物样品中的靶上的荧光物质处于非激发状态，并且标记在靶上的荧光材料处于激发状态，并且拍摄包含整个生物样品的图像的成像单元。

25. 发明申请

US20130293833A1 SOFT CONTACT LENS APPLICATION METHOD, LIQUID FOR CONTACT LENSES AND SOFT CONTACT LENS PACKAGE 有权
标题翻译：软接触镜应用方法，液体接触镜和软接触镜套
公开(公告)号：US20130293833A1
公开(公告)日：2013-11-07
申请号：US13988016
申请日：2010-11-17
申请人： Yasunori Tanaka , Hiroyuki Yamaguchi , Takashi Yamamoto
发明人： Yasunori Tanaka , Hiroyuki Yamaguchi , Takashi Yamamoto
IPC分类号： G02C7/04
CPC分类号： G02C7/047 , A45C11/005 , B29D11/00067 , G02C7/024 , G02C7/049
摘要： An object of the invention is to provide an application method capable of facilitating the application of the soft contact lens without using any instrument, a liquid for contact lenses capable of being used for the application method, and a soft contact lens package. The present invention is a method for applying a soft contact lens, including a shrinkage step of shrinking a soft contact lens by contacting the soft contact lens with a liquid for contact lenses, the liquid for contact lenses being capable of shrinking the soft contact lens to a state of being more intensively shrunken than an equilibrium state thereof in a physiological saline; and an application step of applying the shrunken soft contact lens to the eye, in which after the application step, the size of the soft contact lens is restored.
摘要翻译：本发明的目的是提供一种能够方便使用软性隐形眼镜而不使用任何仪器的应用方法，能够用于该应用方法的隐形眼镜用液体和软性隐形眼镜包装。本发明是一种应用软性隐形眼镜的方法，包括收缩步骤，通过使软性隐形眼镜与隐形眼镜液体接触来收缩软性隐形眼镜，用于隐形眼镜的液体能够将软性隐形眼镜收缩到在生理盐水中比其平衡状态更加紧缩的状态; 以及将收缩的软性隐形眼镜应用于眼睛的应用步骤，其中在应用步骤之后恢复软性隐形眼镜的尺寸。

26. 发明授权

US08576483B2 Microscope and focusing method 有权
标题翻译：显微镜和聚焦法
公开(公告)号：US08576483B2
公开(公告)日：2013-11-05
申请号：US13157718
申请日：2011-06-10
申请人： Norihiro Tanabe , Takashi Yamamoto , Nobuhiro Hayashi , Ryu Narusawa
发明人： Norihiro Tanabe , Takashi Yamamoto , Nobuhiro Hayashi , Ryu Narusawa
IPC分类号： G02B21/00
CPC分类号： G02B21/0032 , G02B21/06
摘要： Disclosed herein is a microscope, including: an illumination optical system; a first image creation optical system; a second image creation optical system; an illumination-field-diaphragm focus adjustment section; and a characteristic-quantity computation block, wherein the illumination-field-diaphragm focus adjustment section adjusts the image creation position for the illumination field diaphragm on the basis of the characteristic quantity computed by the characteristic-quantity computation block.
摘要翻译：本文公开了一种显微镜，包括：照明光学系统; 第一图像创建光学系统; 第二图像创建光学系统; 照明场光阑聚焦调节部; 以及特征量计算块，其中，所述照明场光阑聚焦调整部基于由所述特征量计算块计算的特征量来调整所述照明场光阑的图像创建位置。

27. 发明授权

US08549526B2 Access control apparatus and access control method 有权
标题翻译：访问控制装置和访问控制方法
公开(公告)号：US08549526B2
公开(公告)日：2013-10-01
申请号：US12046740
申请日：2008-03-12
申请人： Takashi Yamamoto , Yoshiaki Horinouchi , Manabu Tsukada , Takayuki Uchihira , Shinichi Hayashi
发明人： Takashi Yamamoto , Yoshiaki Horinouchi , Manabu Tsukada , Takayuki Uchihira , Shinichi Hayashi
IPC分类号： G06F9/46
CPC分类号： G06F9/4881
摘要： The disclosed access control apparatus and method controls an I/O device to perform processing of access requests in a predetermined order including inputting access requests from multiple tasks to cause the I/O device to perform file processing, storing and managing information about file priorities, obtaining a file priority corresponding to an access request, managing a queue having multiple queues for which the processing priorities corresponding to the file priorities are set and causing the access request to be stored in any of the queues corresponding to the file priority, and obtaining the access requests stored in the queues in an order based on the processing priorities set for the queues and sends the access requests to the I/O device.
摘要翻译：所公开的访问控制装置和方法控制I / O设备以预定顺序执行访问请求的处理，包括输入来自多个任务的访问请求，以使I / O设备执行文件处理，存储和管理关于文件优先级的信息，获取对应于访问请求的文件优先级，管理具有多个队列的队列，为此，具有与文件优先级相对应的处理优先级的队列被设置，并且使访问请求存储在与文件优先级对应的任何队列中，并获得基于针对队列设置的处理优先级，按照顺序存取队列中存储的请求，并将访问请求发送到I / O设备。

28. 发明授权

US08518283B2 Plasma etching method capable of detecting end point and plasma etching device therefor 有权
标题翻译：能够检测端点和等离子体蚀刻装置的等离子体蚀刻方法
公开(公告)号：US08518283B2
公开(公告)日：2013-08-27
申请号：US12089474
申请日：2007-07-27
申请人： Takashi Yamamoto , Masahiko Tanaka , Yoshiyuki Nozawa , Shoichi Murakami
发明人： Takashi Yamamoto , Masahiko Tanaka , Yoshiyuki Nozawa , Shoichi Murakami
IPC分类号： G01R31/00
CPC分类号： H01J37/32963 , H01J37/32935 , H01J2237/3343 , H01L21/3065 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： The present invention relates to a plasma etching method in which a special area for detecting an end point needs not to be set and an equipment therefor. At an etching step of forming SF6 gas into plasma to etch an etching ground on a Si film, the step is configured by two steps of: a large-amount supply step of supplying a large amount of SF6 gas; and a small-amount supply step of supplying a small amount of SF6 gas. An end-point detecting processor 34 measures an emission intensity of Si or SiFx in the plasma at the small-amount supply step, and determines that an etching end point is reached when the measured emission intensity becomes equal to or less than a previously set reference value.
摘要翻译：本发明涉及一种等离子体蚀刻方法，其中不需要设置用于检测终点的特殊区域及其设备。在将SF 6气体形成等离子体以蚀刻Si膜上的蚀刻研磨的蚀刻步骤中，该步骤由以下两个步骤构成：供给大量SF 6气体的大量供给步骤; 以及供给少量的SF 6气体的小量供给工序。终点检测处理器34在小量供给步骤中测量等离子体中的Si或SiFx的发射强度，并且当测量的发射强度变得等于或小于预先设定的参考值时，确定达到蚀刻终点值。

29. 发明授权

US08499125B2 Control device for snoop tag 失效
标题翻译：窥探标签控制装置
公开(公告)号：US08499125B2
公开(公告)日：2013-07-30
申请号：US11790272
申请日：2007-04-24
申请人： Makoto Hataida , Toshikazu Ueki , Takaharu Ishizuka , Takashi Yamamoto , Yuka Hosokawa , Takeshi Owaki , Daisuke Itou
发明人： Makoto Hataida , Toshikazu Ueki , Takaharu Ishizuka , Takashi Yamamoto , Yuka Hosokawa , Takeshi Owaki , Daisuke Itou
IPC分类号： G06F12/00 , G06F13/00 , G06F13/28
CPC分类号： G06F12/0822 , G06F12/123
摘要： To prevent a decrease in performance of controlling a snoop tag. A queue is stored with REPLACE target WAY information and an index as an entry associated with a REPLACE request received from a processor, the index stored in the queue is compared with an index of a subsequent READ request, and, as a result of the comparison, a process based on the index-coincident READ request is executed with respect to the snoop tag corresponding to a content of a cache memory of the processor. Further, the REPLACE target WAY information of the READ request is replaced with the WAY information in the index-coincident entry within the queue.
摘要翻译：以防止控制snoop标签的性能下降。存储REPLACE目标WAY信息和索引作为与从处理器接收到的REPLACE请求相关联的条目的队列，将存储在队列中的索引与后续READ请求的索引进行比较，并且作为比较的结果相对于与处理器的高速缓冲存储器的内容相对应的窥探标签，执行基于索引一致的READ请求的处理。此外，READ请求的REPLACE目标WAY信息被队列中符合条件的条目中的WAY信息所替代。

30. 发明申请

US20130151952A1 DISPLAY PROCESSING DEVICE, CONTROL PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM STORING THE CONTROL PROGRAM 审中-公开
标题翻译：显示处理设备，控制程序和计算机可读记录媒体存储控制程序
公开(公告)号：US20130151952A1
公开(公告)日：2013-06-13
申请号：US13498959
申请日：2010-12-28
申请人： Takashi Yamamoto , Jiro Kiyama
发明人： Takashi Yamamoto , Jiro Kiyama
IPC分类号： G06F17/21
CPC分类号： G06F17/21 , G06F17/211
摘要： The content display processing device (1a) includes a display control section (133a) configured to control a display section to display, on a display area of the display section, character string data which is selected out of text data by a display target range which moves in order of characters contained in the text data, and the character string data is displayed in accordance with the move of the display target range. The display control section (133a) sets, in the display area, a display avoidance area (Rb) in which the character string data is not displayed.
摘要翻译：内容显示处理装置（1a）包括显示控制部（133a），其被配置为控制显示部，在显示部的显示区域上显示由文本数据选择的字符串数据，显示目标范围以包含在文本数据中的字符的顺序移动，并且根据显示目标范围的移动来显示字符串数据。显示控制部（133a）在显示区域中设定不显示字符串数据的显示回避区域（Rb）。

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