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11. 发明授权

US08888561B2 Nonwoven abrasive wheel 有权
标题翻译：无纺砂轮
公开(公告)号：US08888561B2
公开(公告)日：2014-11-18
申请号：US13805622
申请日：2011-06-27
申请人： James L. McArdle , Alice B. Moris , Ann M. Hawkins , Carl P. Erickson
发明人： James L. McArdle , Alice B. Moris , Ann M. Hawkins , Carl P. Erickson
IPC分类号： B24D11/00 , B24B29/02 , B24D3/00 , B24D3/32 , B24D13/08 , B24D13/12 , B24D13/14 , B24B1/00
CPC分类号： B24D11/00 , B24B1/00 , B24B29/02 , B24D3/002 , B24D3/32 , B24D13/08 , B24D13/12 , B24D13/147
摘要： A nonwoven abrasive wheel comprising one or more layers of a nonwoven fiber web, a plurality of super abrasive particles having a Vickers hardness greater than 40 GPa, a polyurethane binder adhering the plurality of super abrasive particles to the nonwoven fibers and adhering the layers of the nonwoven fiber web to each other, and wherein the nonwoven abrasive wheel comprises a Flexural Modulus from 4.0 to 128.0 lb/inch of thickness per inch of displacement.
摘要翻译：一种非织造砂轮，包括一层或多层非织造纤维网，维氏硬度大于40GPa的多种超级磨料颗粒，将多种超级磨料颗粒粘附到非织造纤维上的聚氨酯粘合剂，非织造纤维网彼此相对，并且其中非织造砂轮包括每英寸位移为4.0至128.0磅/英寸厚度的弯曲模量。

12. 发明申请

US20140020304A1 Bonded Abrasive Tool and Method of Forming 审中-公开
标题翻译：粘合磨具和成型方法
公开(公告)号：US20140020304A1
公开(公告)日：2014-01-23
申请号：US13972665
申请日：2013-08-21
申请人： Konstantin S. Zuyev , Walter Strandgaard , Joel A. Fife , Muthu Jeevanantham
发明人： Konstantin S. Zuyev , Walter Strandgaard , Joel A. Fife , Muthu Jeevanantham
IPC分类号： B24D3/32
CPC分类号： B24D3/32
摘要： A bonded abrasive tool includes a bonded abrasive body having a bond matrix material comprising an organic bond material, abrasive grains contained within the bond matrix material, and chopped fiber bundles within the bond matrix material. The tool further has a porosity within the bonded abrasive body, wherein a majority of the porosity comprises pores surrounding the chopped fiber bundles.
摘要翻译：粘合研磨工具包括具有包含有机粘合材料的粘合基质材料，包含在粘结基质材料内的磨料颗粒和粘结基质材料内的短切纤维束的粘结研磨体。该工具在结合的研磨体内还具有孔隙率，其中大部分孔隙率包括围绕短切纤维束的孔。

13. 发明授权

US08533895B2 Methods and materials for making a monolithic porous pad cast onto a rotatable base 有权
标题翻译：用于制造整体式多孔垫的方法和材料铸造到可旋转的底座上
公开(公告)号：US08533895B2
公开(公告)日：2013-09-17
申请号：US13190191
申请日：2011-07-25
申请人： Briant Enoch Benson
发明人： Briant Enoch Benson
IPC分类号： B08B1/04 , H01L21/304
CPC分类号： B29C44/12 , A46B13/008 , A46B13/02 , A46B2200/3086 , B08B1/04 , B24D3/32 , B24D5/10 , B29C37/0078 , B29C44/005 , B29C44/1209 , B29C44/1214 , B29K2029/04 , H01L21/02074 , Y10S134/902 , Y10S438/906
摘要： The present invention includes methods and materials for making a brush or pad for removing materials, particles, or chemicals from a substrate. The brush or pad includes a rotatable base for supporting a porous pad material. The base include an inner surface and an outer surface and a plurality of channels in the base for interlocking the porous pad material with the base. A porous pad material covers at least a portion of the outer surface of the base and is used for removing material from various substrates. The porous pad material fills one or more of the channels in the base and interlocks the porous pad material with the base. Preferably the channels fluidly connect said inner surface with the outer surface of the base and aid in the alignment of porous pad nodes and the distribution of fluid within the porous pad.
摘要翻译：本发明包括用于制造用于从基材去除材料，颗粒或化学品的刷子或垫的方法和材料。刷子或垫包括用于支撑多孔垫材料的可旋转底座。基座包括内表面和外表面以及在基座中的多个通道，用于将多孔垫材料与基座互锁。多孔垫材料覆盖基底的外表面的至少一部分，并用于从各种基底去除材料。多孔垫材料填充基底中的一个或多个通道并将多孔垫材料与基底互锁。优选地，通道将所述内表面与基底的外表面流体连接，并有助于多孔垫节点的排列和多孔垫内的流体分布。

14. 发明申请

US20130212951A1 POLISHING PAD AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20130212951A1
公开(公告)日：2013-08-22
申请号：US13761338
申请日：2013-02-07
申请人： KPX CHEMICAL CO., LTD. , SAMSUNG ELECTRONICS CO., LTD.
发明人： Bong-Su AHN , Young-Jun JANG , Sang-Mok LEE , Hwi-Kuk CHUNG , Kee-Cheon SONG , Seung-Geun KIM , Jang-Won SEO , Jeong-Seon CHOO
IPC分类号： B24D3/32
CPC分类号： B24D3/32 , B24B37/24 , B24D3/34 , B24D11/003
摘要： Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
摘要翻译：抛光垫及其制造方法，该方法包括：（a）混合用于形成抛光层的材料; （b）混合来自惰性气体，胶囊型发泡剂，化学发泡剂和能够控制孔尺寸的液体微量元素中的至少两种，（a）中的混合物形成两种或更多种的毛孔; （c）进行（b）中生成的混合物的凝胶化和硬化，以形成包含两种或多种类型的孔的抛光层; 以及（d）处理抛光层以便在抛光层的表面上分布通过打开两种或多种类型的孔所限定的微孔。

15. 发明授权

US08500932B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08500932B2
公开(公告)日：2013-08-06
申请号：US13294835
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/18 , B32B37/15
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

16. 发明申请

US20130005228A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20130005228A1
公开(公告)日：2013-01-03
申请号：US13607125
申请日：2012-09-07
申请人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Atsushi Kazuno , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： B24D3/00 , B24D11/00
CPC分类号： B24B37/24 , B24D3/28 , B24D3/32 , C08G18/12 , C08G18/4238 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G2101/0066 , C08J9/30 , C08J2375/08 , C08G18/3814 , C08G18/48 , C08G18/3865
摘要： A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.
摘要翻译：抛光垫在抛光对象的表面上产生很少的划痕，并且平坦化性能优异。抛光垫具有高的抛光速率，并且平坦化性能优异。抛光垫槽在抛光过程中变得很少被磨粒或抛光屑堵塞，并且即使长时间连续使用，抛光速率几乎不降低。

17. 发明授权

US08309466B2 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US08309466B2
公开(公告)日：2012-11-13
申请号：US12065219
申请日：2006-08-22
申请人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
发明人： Kazuyuki Ogawa , Tetsuo Shimomura , Yoshiyuki Nakai , Masahiko Nakamori , Takatoshi Yamada
IPC分类号： H01L21/302 , H01L21/461 , B32B5/00 , B32B3/26
CPC分类号： B24B37/24 , B24D3/32 , C08G18/36 , C08G2101/00 , Y10T428/24 , Y10T428/249953
摘要： A polishing pad has an excellent polishing rate and is superior in longevity without generating center slow. A method of manufacturing a semiconductor device with the polishing pad is also provided. The polishing pad has a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight.
摘要翻译：抛光垫具有优异的抛光速率，寿命长，不会产生中心慢。还提供了一种制造具有抛光垫的半导体器件的方法。抛光垫具有由具有细小细胞的聚氨酯泡沫构成的抛光层，其中作为聚氨酯泡沫的起始成分的高分子量多元醇成分含有具有数均分子量的疏水性高分子量多元醇A 重量为550〜800的疏水性高分子量多元醇B，A / B比为10/90〜50/50的数均分子量为950〜1300的疏水性高分子量多元醇B.

18. 发明申请

US20120251760A1 GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：用于磁盘的玻璃基板及其制造方法
公开(公告)号：US20120251760A1
公开(公告)日：2012-10-04
申请号：US13245252
申请日：2011-09-26
申请人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
发明人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
IPC分类号： G11B5/84 , G11B5/82
CPC分类号： G11B5/8404 , B24B37/24 , B24D3/32
摘要： A method for producing a glass substrate for a magnetic disk involving the use of a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
摘要翻译：一种用于制造用于磁盘的玻璃基板的方法，其涉及使用具有：形成所述抛光表面的第一树脂发泡层的抛光垫，所述抛光垫包括具有孔径大于20μm的孔的树脂泡沫，并且具有厚度 400μm以下; 以及第二树脂泡沫层，其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间，包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体，以及其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下，通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。

19. 发明授权

US08092280B2 Glass substrate for magnetic disk and method for producing the same 失效
标题翻译：磁盘用玻璃基板及其制造方法
公开(公告)号：US08092280B2
公开(公告)日：2012-01-10
申请号：US12628484
申请日：2009-12-01
申请人： Mizuho Ishida , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
发明人： Mizuho Ishida , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
IPC分类号： B24B7/19 , C03B17/00 , G11B5/65
CPC分类号： G11B5/8404 , B24B37/24 , B24D3/32
摘要： The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
摘要翻译：本发明涉及一种用于制造磁盘用玻璃基板的方法，所述方法包括以下步骤：向所述圆形玻璃板的主表面进行抛光，同时向所述抛光材料供给包含抛光材料的抛光浆料通过使用具有：形成研磨面的第一树脂发泡层的研磨垫，进行敷料处理，包括孔径在20μm以上，厚度为400μm以下的孔的树脂发泡体 ; 以及第二树脂泡沫层，其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间，包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体，以及其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下，通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。

20. 发明授权

US08070842B2 Dental polishing article which contains spherical resin particles 有权
标题翻译：含有球形树脂颗粒的牙科抛光制品
公开(公告)号：US08070842B2
公开(公告)日：2011-12-06
申请号：US11920133
申请日：2006-05-10
申请人： Syuji Sonoi , Osamu Asao
发明人： Syuji Sonoi , Osamu Asao
IPC分类号： C09K3/14 , B24D3/00 , B24D11/00
CPC分类号： A61C3/06 , B24D3/32
摘要： The present invention provides a dental polishing article having excellent polishability, which can polish dental composite resin, porcelain, dental restorative and prosthetic materials and teeth at a low cost, conveniently in a short time. More specifically, the present invention provides a dental polishing article which comprises a polishing portion formed by compounding polishing grains in an elastomer binder, and the polishing portion further comprising spherical resin particles.
摘要翻译：本发明提供了一种具有优异的抛光性的牙科研磨制品，其可以在短时间内方便地以低成本抛光牙科复合树脂，瓷器，牙修复材料和修复材料和牙齿。更具体地，本发明提供一种牙科研磨制品，其包括通过将弹性体粘合剂中的研磨颗粒配混而形成的抛光部分和进一步包含球形树脂颗粒的抛光部分。

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