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1. 发明申请

US20100136372A1 GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING THE SAME 失效
标题翻译：用于磁盘的玻璃基板及其制造方法
公开(公告)号：US20100136372A1
公开(公告)日：2010-06-03
申请号：US12628484
申请日：2009-12-01
申请人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
发明人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
IPC分类号： G11B5/706 , B24B1/00
CPC分类号： G11B5/8404 , B24B37/24 , B24D3/32
摘要： The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
摘要翻译：本发明涉及一种用于制造磁盘用玻璃基板的方法，所述方法包括以下步骤：向所述圆形玻璃板的主表面进行抛光，同时向所述抛光材料供给包含抛光材料的抛光浆料通过使用具有：形成研磨面的第一树脂发泡层的研磨垫，进行敷料处理，包括孔径在20μm以上，厚度为400μm以下的孔的树脂发泡体 ; 以及第二树脂泡沫层，其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间，包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体，以及其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下，通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。

2. 发明申请

US20120251760A1 GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING THE SAME 审中-公开
标题翻译：用于磁盘的玻璃基板及其制造方法
公开(公告)号：US20120251760A1
公开(公告)日：2012-10-04
申请号：US13245252
申请日：2011-09-26
申请人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
发明人： Mizuho ISHIDA , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
IPC分类号： G11B5/84 , G11B5/82
CPC分类号： G11B5/8404 , B24B37/24 , B24D3/32
摘要： A method for producing a glass substrate for a magnetic disk involving the use of a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
摘要翻译：一种用于制造用于磁盘的玻璃基板的方法，其涉及使用具有：形成所述抛光表面的第一树脂发泡层的抛光垫，所述抛光垫包括具有孔径大于20μm的孔的树脂泡沫，并且具有厚度 400μm以下; 以及第二树脂泡沫层，其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间，包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体，以及其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下，通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。

3. 发明授权

US08092280B2 Glass substrate for magnetic disk and method for producing the same 失效
标题翻译：磁盘用玻璃基板及其制造方法
公开(公告)号：US08092280B2
公开(公告)日：2012-01-10
申请号：US12628484
申请日：2009-12-01
申请人： Mizuho Ishida , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
发明人： Mizuho Ishida , Norihito Shida , Katsuhiro Matsumoto , Kazuo Mannami
IPC分类号： B24B7/19 , C03B17/00 , G11B5/65
CPC分类号： G11B5/8404 , B24B37/24 , B24D3/32
摘要： The present invention relates to a method for producing a glass substrate for a magnetic disk, the method including a step of polishing a main surface of a circular glass plate while supplying a polishing slurry containing a polishing material, in which polishing is performed, after a polishing surface is subjected to dressing treatment, by using a polishing pad having: a first resin foam layer which forms the polishing surface, includes a resin foam having pores with a pore diameter of more than 20 μm and has a thickness of 400 μm or less; and a second resin foam layer which is provided between a platen for fixing the polishing pad and the first resin foam layer, includes a resin foam having pores with a pore diameter of 20 μm or less and has a thickness of 50 to 250 μm, and in which a total thickness of the first resin foam layer and the second resin foam layer is 550 μm or less, and a international rubber hardness degree of the polishing pad measured by the M method according to JIS K6253 is 40 IRHD or more.
摘要翻译：本发明涉及一种用于制造磁盘用玻璃基板的方法，所述方法包括以下步骤：向所述圆形玻璃板的主表面进行抛光，同时向所述抛光材料供给包含抛光材料的抛光浆料通过使用具有：形成研磨面的第一树脂发泡层的研磨垫，进行敷料处理，包括孔径在20μm以上，厚度为400μm以下的孔的树脂发泡体 ; 以及第二树脂泡沫层，其设置在用于固定所述抛光垫的台板和所述第一树脂发泡层之间，包括具有孔径为20μm以下且具有50〜250μm的厚度的孔的树脂发泡体，以及其中第一树脂发泡层和第二树脂发泡层的总厚度为550μm以下，通过根据JIS K6253的M法测定的研磨垫的国际橡胶硬度为40IRHD以上。

4. 发明申请

US20110189506A1 GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：用于磁记录介质的玻璃基板及其制造方法
公开(公告)号：US20110189506A1
公开(公告)日：2011-08-04
申请号：US13017609
申请日：2011-01-31
申请人： Kazuo Mannami , Hitoshi Mishiro , Norihito Shida , Masabumi Ito , Hiroyuki Masuda , Toru Momose
发明人： Kazuo Mannami , Hitoshi Mishiro , Norihito Shida , Masabumi Ito , Hiroyuki Masuda , Toru Momose
IPC分类号： G11B5/82 , B24B1/00 , G11B5/73
CPC分类号： C10M169/04 , C10M133/00 , C10M2203/1025 , C10M2215/064 , C10M2215/065 , C10M2215/28 , C10N2230/04 , C10N2230/10 , C10N2230/42 , C10N2230/45 , C10N2240/10 , C10N2240/103 , C10N2240/104 , C10N2240/121 , C10N2260/14
摘要： The present invention relates to a glass substrate for a magnetic recording medium, which is a disk-shaped glass substrate for a magnetic recording medium having a circular hole at the center thereof, in which the glass substrate for a magnetic recording medium has an inner peripheral side surface, an outer peripheral side surface and both main surfaces, and the both main surfaces have parallelism of 3.2 μm or less in at least a recording and reproducing region thereof.
摘要翻译：本发明涉及一种用于磁记录介质的玻璃基板，该玻璃基板是用于磁记录介质的圆盘形玻璃基板，该磁性记录介质在其中心具有圆形孔，其中用于磁记录介质的玻璃基板具有内周侧表面，外周侧表面和两个主表面，并且两个主表面在至少其记录和再现区域中具有3.2μm或更小的平行度。

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