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    • 13. 发明申请
    • MAGNETIC ELECTRON MICROSCOPE
    • 磁电子显微镜
    • US20090078869A1
    • 2009-03-26
    • US11543787
    • 2006-10-06
    • Takao MatsumotoMasanari Koguchi
    • Takao MatsumotoMasanari Koguchi
    • G01N23/00G01N13/10
    • G01N23/04G03H5/00H01J37/26H01J2237/1514H01J2237/221H01J2237/2614
    • Below 50-nm-diameter extremely narrow electrically-conductive fiber is used instead of the electron beam biprism used in the conventional interference electron microscope method. A phenomenon is utilized where a focus-shifted shadow of this fiber is shifted from a straight line by a distance which is proportional to a differentiation of phase change amount of an electron beam due to a sample with respect to a direction perpendicular to the fiber. The phase change amount is quantified by calibrating this shift amount through its comparison with a shift amount caused by another sample in terms of which the corresponding phase change amount has been quantitatively evaluated in advance. The differentiation amount of the quantified phase change in the electron beam due to the sample is visualized, or eventually, is integrated thereby being transformed into absolute phase change amount to be visualized.
    • 使用低于50nm直径的非常窄的导电纤维来代替在常规干涉电子显微镜方法中使用的电子束双棱镜。 使用这种现象,其中该光纤的聚焦移动阴影从直线移位一定距离,该距离与由于样品相对于垂直于光纤的方向的样品的电子束的相变量的微分成正比。 通过与通过与预先对相应的相变量进行定量评价的另一个样品引起的移位量进行比较来校准该偏移量来量化相位变化量。 由于样品而导致的电子束的量化相变的微分量被可视化,或最终被积分,从而被转换为绝对相变量以被可视化。
    • 14. 发明授权
    • Defect inspection instrument and positron beam apparatus
    • 缺陷检测仪器和正电子束装置
    • US07141790B2
    • 2006-11-28
    • US10838207
    • 2004-05-05
    • Masanari KoguchiRuriko Tsuneta
    • Masanari KoguchiRuriko Tsuneta
    • G01N23/00G01N23/225G21K7/00
    • H01J37/256G01N23/2252H01J37/26H01J2237/2807
    • The purpose of the present invention is to inspect the position, number, and size of fine defects in a variety of solid state materials, including a semiconductor device and metallic materials, with a high spatial resolution of nanometer order. The positron irradiation function is installed in the converged electron beam apparatus. The defect location information is obtained from the converged electron beam location information, and the number and size of defects are obtained from the detected information of γ-rays created by pair annihilation of electrons and positrons, and this two-dimensional distribution information is displayed in the monitor. Information on ultra-fine defects in a crystal can be provided with high-speed and high-resolution, and nondestructively in the case of a semiconductor wafer.
    • 本发明的目的是以纳米级的高空间分辨率来检查包括半导体器件和金属材料在内的各种固态材料的精细缺陷的位置,数量和尺寸。 正电子照射功能安装在会聚电子束装置中。 从会聚的电子束位置信息获得缺陷位置信息,并且从检测到的由电子和正电子的湮灭产生的伽马射线的信息获得缺陷的数量和大小,并且将该二维分布信息显示在 监视器。 在半导体晶片的情况下,可以以高速,高分辨率和非破坏性的方式提供关于晶体中超细缺陷的信息。
    • 17. 发明授权
    • Autoadjusting electron microscope
    • 自动调整电子显微镜
    • US06570156B1
    • 2003-05-27
    • US09571976
    • 2000-05-16
    • Ruriko TsunetaMasanari KoguchiIsao NagaokiHiroyuki Kobayashi
    • Ruriko TsunetaMasanari KoguchiIsao NagaokiHiroyuki Kobayashi
    • G21K700
    • H01J37/26H01J37/28H01J2237/216H01J2237/221H01J2237/2487Y10S977/869Y10S977/881
    • An autoadjusting electron microscope in which an image processor derives a third image constituting an analysis image from first and second images of a specimen by Fourier-transforming the first and second images to produce Fourier-transformed first and second images, computing a phase variant image from the Fourier-transformed first and second images, and Fourier-transforming or inverse Fourier-transforming the phase variant image to obtain the third image. A computer determines an amount of displacement between the first image and the second image based on a peak appearing in the third image. An identifier determines whether a consistency between the first image and the second image is within a predetermined range based on a magnitude of the peak appearing in the third image. A transformer transforms results obtained by the computer and the identifier into an amount of defocus of an electron lens relative to the specimen.
    • 一种自动调整电子显微镜,其中图像处理器通过对第一和第二图像进行傅立叶变换来产生构图分析图像的第一图像和第二图像,以产生经傅立叶变换的第一和第二图像,计算来自 傅里叶变换的第一和第二图像,以及傅里叶变换或逆傅里叶变换相变图像以获得第三图像。 计算机基于出现在第三图像中的峰值来确定第一图像和第二图像之间的位移量。 标识符基于出现在第三图像中的峰值的大小来确定第一图像和第二图像之间的一致性是否在预定范围内。 变压器将由计算机和标识符获得的结果转换成电子透镜相对于样本的散焦量。