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1. 发明申请

US20180261425A1 Charged Particle Detector and Charged Particle Beam Device Using the Same 审中-公开
公开(公告)号：US20180261425A1
公开(公告)日：2018-09-13
申请号：US15918464
申请日：2018-03-12
申请人： Hitachi, Ltd.
发明人： Yasuhiro SHIRASAKI , Momoyo ENYAMA , Kaori SHIRAHATA , Makoto SAKAKIBARA
IPC分类号： H01J37/244 , H01J37/20 , H01J37/10 , H01J37/28
CPC分类号： H01J37/244 , H01J37/10 , H01J37/20 , H01J37/28 , H01J2237/2443 , H01J2237/2446 , H01J2237/2448 , H01J2237/28
摘要： A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.

2. 发明申请

US20180240644A1 Scanning Electron Microscope 审中-公开
公开(公告)号：US20180240644A1
公开(公告)日：2018-08-23
申请号：US15902251
申请日：2018-02-22
申请人： JEOL Ltd.
发明人： Tatsuru Kuramoto , Yuichiro Ohori , Yoshinori Matsuda , Makoto Aoshima
IPC分类号： H01J37/244 , H01J37/147 , H01J37/10
CPC分类号： H01J37/244 , H01J37/10 , H01J37/147 , H01J37/28 , H01J2237/2443
摘要： A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is inserted; a light guide which guides light generated by the scintillator; a conductive layer provided on a sensitive surface of the scintillator; and a conductive member provided in the scintillator, wherein the shortest distance between the liner tube and the conductive member is shorter than the shortest distance between the liner tube and the conductive layer, a voltage for accelerating electrons is applied to the conductive layer, and the conductive layer and the conductive member have a same potential.

3. 发明申请

US20180059268A1 SCINTILLATION DETECTOR FOR DETECTION OF IONISING RADIATION 审中-公开
公开(公告)号：US20180059268A1
公开(公告)日：2018-03-01
申请号：US15541476
申请日：2016-02-08
申请人： CRYTUR, SPOL S R.O. , FYZIKÁLNÍ ÚSTAV AV CR, V.V.I.
发明人： Alice HOSPODKOVÁ , Karel BLAZEK , Eduaró HULICIUS , Jan TOUS , Martin NIKL
IPC分类号： G01T1/29 , G01T1/164 , G01T1/24 , G01T1/202 , H01J37/244 , H01J49/02
CPC分类号： G01T1/2985 , G01T1/1644 , G01T1/2023 , G01T1/24 , H01J37/244 , H01J49/025 , H01J2237/2443
摘要： The scintillation detector for the detection of ionising radiation, especially electron, X-ray or particle radiation, including a monocrystalline substrate (1), minimally one buffer layer (2), minimally one nitride semiconductor layer (3, 4, 5, 6) applied onto the substrate (1) with epitaxy which is described by the AlyInxGa1-x-yN general formula where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1 is valid, where minimally two nitride semiconductor layers (3, 4) are arranged in a layered heterostructure, whose structure contains minimally one potential well for radiant recombinations of electrons and holes. In the structure there is arranged minimally one active couple of nitride semiconductor layers (3, 4) of principally the same polarisation consisting of the barrier layer (4) of the AlybInxbGa1-xb-ybN type and from layer (5) of the AlywInxwGa1-xw-ywN type representing a potential well where xb≦xw and yb≦yw is valid, or there is minimally one carrier attracting layer (7) of the AlydInxdGa1-xd-ydN type with the thickness (t3) less than 2 nm in which yd≦yw and xd≧xw+0.3 inserted in minimally one active couple of nitride semiconductor layers (4, 5) to decrease the luminescence decay time.

4. 发明申请

US20170358420A1 METHOD FOR CHARACTERIZING TWO DIMENSIONAL NANOMATERIAL 审中-公开
公开(公告)号：US20170358420A1
公开(公告)日：2017-12-14
申请号：US15615310
申请日：2017-06-06
申请人： Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
发明人： PENG LIU , WEI ZHAO , XIAO-YANG LIN , DUAN-LIANG ZHOU , CHUN-HAI ZHANG , KAI-LI JIANG , SHOU-SHAN FAN
IPC分类号： H01J37/26 , H01J37/16 , H01J37/244
CPC分类号： H01J37/26 , H01J37/16 , H01J37/244 , H01J2237/2443 , H01J2237/24455 , H01J2237/24585 , H01J2237/2602
摘要： The disclosure relates to a method for characterizing a two-dimensional nanomaterial sample. The two-dimensional nanomaterial sample is placed in a vacuum chamber. An electron beam passes through the two-dimensional nanomaterial sample to form a diffraction electron beam and a transmission electron beam to form an image on an imaging device. An angle θ between the diffraction electron beam and the transmission electron is obtained. A lattice period d of the two-dimensional nanomaterial sample is calculated according to a formula d sin θ≅dθ=λ, where λ represents a wavelength of the electron beam.

5. 发明授权

US09779912B2 Inspection device and measurement device 有权
公开(公告)号：US09779912B2
公开(公告)日：2017-10-03
申请号：US15109726
申请日：2014-12-08
申请人： Hitachi High-Technologies Corporation
发明人： Masami Makuuchi , Takahiro Jingu
IPC分类号： H01J37/00 , H01J37/244 , G01N21/956 , G01N21/94 , G01N21/95 , H01J37/28 , A61B5/00 , H01J49/00
CPC分类号： H01J37/244 , A61B5/0059 , A61B5/0075 , G01N21/94 , G01N21/9501 , G01N21/956 , H01J37/28 , H01J49/00 , H01J2237/2443 , H01J2237/2444 , H01J2237/2445 , H01J2237/24495
摘要： A detection circuit for accurately detecting a very small foreign material and an inspection/measurement device using the same are provided. The inspection/measurement device includes: an irradiation section that irradiates a laser beam to a surface of a specimen; and a detection section that detects scattered light from the surface of the specimen and generates a detection signal. The detection section includes: a photon counting sensor that outputs M output signals from photo-detecting elements of N pixels (M and N are natural numbers, and M

6. 发明授权

US09778186B2 System for electron beam detection 有权
公开(公告)号：US09778186B2
公开(公告)日：2017-10-03
申请号：US14686308
申请日：2015-04-14
申请人： KLA-Tencor Corporation
发明人： Shinichi Kojima , Hamada Wahba , Michael R. Gluszczak , Joseph A. DiRegolo
IPC分类号： H01J37/22 , G01N21/64 , H01J37/244
CPC分类号： G01N21/64 , H01J37/226 , H01J37/244 , H01J2237/043 , H01J2237/2443 , H01J2237/2446 , H01J2237/24578
摘要： An electron beam detection apparatus includes a first aperture element including a first set of apertures. The apparatus includes a second aperture element including a second set of apertures. The second set of apertures is arranged in a pattern corresponding with the pattern of the first plurality of apertures. The detection apparatus includes an electron-photon conversion element configured to receive electrons of the electron beam transmitted through the first and second aperture elements. The electron-photon conversion element is configured to generate photons in response to the received electrons. The detection apparatus includes an optical assembly including one or more optical elements. The detection apparatus includes a detector assembly. The optical elements of the optical assembly are configured to direct the generated photons from the electron-photon conversion system to the detector assembly.

7. 发明授权

US09336982B2 Method of detecting electrons, an electron-detector and an inspection system 有权
标题翻译：检测电子的方法，电子检测器和检查系统
公开(公告)号：US09336982B2
公开(公告)日：2016-05-10
申请号：US14498290
申请日：2014-09-26
申请人： Carl Zeiss Microscopy GmbH
发明人： Dirk Zeidler , Jörg Jacobi
IPC分类号： H01J37/26 , H01J37/244 , H01J37/22 , H01J37/28 , H01J37/285
CPC分类号： H01J37/244 , H01J37/226 , H01J37/28 , H01J37/285 , H01J2237/15 , H01J2237/2443 , H01J2237/24507 , H01J2237/2857
摘要： An electron-detector comprises a scintillator plate 207, electron optics 204 for directing a plurality of electron beams 9 onto the scintillator plate so that the electron beams are incident onto the scintillator plate at locations of incidence disposed at a distance from each other, a light detector 237 comprising a plurality of light receiving areas 235 disposed at a distance from each other, and light optics for generating a first light-optical image of at least a portion of the scintillator plate at a region 243 where the light receiving areas of the light detector are disposed so that, by the imaging, each of the locations of incidence is associated with a light receiving area; and wherein the electron optics comprise an electron beam deflector 255 for displacing the locations of incidence of the electron beams on the scintillator plate in a direction orthogonal to a normal 249 of a surface 208 of the scintillator plate.
摘要翻译：电子检测器包括闪烁体板207，用于将多个电子束9引导到闪烁体板上的电子光学器件204，使得电子束在彼此间隔一定距离的入射位置处入射到闪烁体板上，检测器237包括彼此间隔设置的多个光接收区域235，以及用于在区域243处产生闪烁体板的至少一部分的第一光学图像的光学光学器件，其中光的光接收区域检测器被设置成使得通过成像，每个入射位置与光接收区域相关联; 并且其中电子光学器件包括电子束偏转器255，用于将闪烁体板上的电子束的入射位置沿与闪烁体板的表面208的法线249正交的方向移位。

8. 发明申请

US20150301196A1 HYBRID ENERGY CONVERSION AND PROCESSING DETECTOR 有权
标题翻译：混合能量转换和加工检测器
公开(公告)号：US20150301196A1
公开(公告)日：2015-10-22
申请号：US14688081
申请日：2015-04-16
申请人： Gatan, Inc.
发明人： Alexander Jozef Gubbens , Paul Mooney , Matthew Lent
IPC分类号： G01T1/20
CPC分类号： G01T1/2018 , H01J37/244 , H01J2237/2441 , H01J2237/2443 , H01J2237/2446 , H01J2237/24485
摘要： There is disclosed a hybrid arrangement of more than one electron energy conversion mechanism in a detector arranged physically such that the electron image can be acquired from both energy converters in such a manner that selected high-illumination parts of the image can be imaged with an indirectly coupled scintillator detector and the remainder of the image acquired with the high-sensitivity/direct electron portion of the detector without readjustments in the beam position or mechanical positioning of the detector parts.Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.
摘要翻译：公开了一种在物理上布置的多于一个电子能量转换机构的混合布置，使得能够以两种能量转换器获得电子图像，使得图像的所选择的高照度部分可以间接成像耦合闪烁体检测器和用检测器的高灵敏度/直接电子部分获取的图像的其余部分，而不需要在光束位置进行重新调整或检测器部件的机械定位。此外，允许从图像的每个像素进行动态切换或同时线性和计数的信号处理的机制，使得可以线性地获取高照度区域，而不用计数就能获得计数和低照明区域的严重剂量率限制，切换点由线性和计数模式之间的信号质量破坏时的剂量率决定。

9. 发明授权

US09153415B2 Charged particle lithography system with sensor assembly 有权
标题翻译：带传感器组件的带电粒子光刻系统
公开(公告)号：US09153415B2
公开(公告)日：2015-10-06
申请号：US14581728
申请日：2014-12-23
申请人： Mapper Lithography IP B.V.
发明人： Paul IJmert Scheffers
IPC分类号： G21K5/10 , G21K5/00 , G21K4/00 , H01J37/22 , H01J37/20
CPC分类号： H01J37/22 , H01J37/20 , H01J37/244 , H01J37/3177 , H01J2237/10 , H01J2237/202 , H01J2237/2443 , H01J2237/24507
摘要： The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.
摘要翻译：本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元，调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光元件到所述传感器。

10. 发明申请

US20150179398A1 CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH SENSOR ASSEMBLY 有权
标题翻译：带有传感器组件的充电颗粒平移系统
公开(公告)号：US20150179398A1
公开(公告)日：2015-06-25
申请号：US14581728
申请日：2014-12-23
申请人： Mapper Lithography IP B.V.
发明人： Paul IJmert Scheffers , Jan Andries Meijer , Carel Ferdinand Daudey
IPC分类号： H01J37/22 , H01J37/20
CPC分类号： H01J37/22 , H01J37/20 , H01J37/244 , H01J37/3177 , H01J2237/10 , H01J2237/202 , H01J2237/2443 , H01J2237/24507
摘要： The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.
摘要翻译：本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元，调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光元件到所述传感器。

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