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1. 发明授权

US08592776B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08592776B2
公开(公告)日：2013-11-26
申请号：US12554577
申请日：2009-09-04
申请人： Momoyo Enyama , Hiroya Ohta , Osamu Kamimura
发明人： Momoyo Enyama , Hiroya Ohta , Osamu Kamimura
IPC分类号： H01J3/16
CPC分类号： H01J37/153 , H01J37/1472 , H01J2237/151 , H01J2237/1534
摘要： With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.
摘要翻译：使用多光束型带电粒子束装置和投影带电粒子束装置，在离轴像差校正器的情况下，需要准备多个多极，并且与数字对应的数量的电源的多极需要准备。为了解决上述问题，带电粒子束装置设置有至少一个像差校正器，其中通过在电子光学系统中设置静电镜，过去所需的多极数减少约一半。

2. 发明授权

US07385194B2 Charged particle beam application system 有权
标题翻译：带电粒子束应用系统
公开(公告)号：US07385194B2
公开(公告)日：2008-06-10
申请号：US11475934
申请日：2006-06-28
申请人： Osamu Kamimura , Tadashi Kanosue , Yasunari Sohda , Susumu Goto
发明人： Osamu Kamimura , Tadashi Kanosue , Yasunari Sohda , Susumu Goto
IPC分类号： H01J37/28 , G01N13/10
CPC分类号： H01J37/265 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3177 , H01J2237/24507 , H01J2237/24528 , H01J2237/28
摘要： An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle with the high SN ratio. In a transmission detector including two diaphragm plates (first and second diaphragms) and a detector, a detection angle determined by a distance between the first and second diaphragms and an aperture diameter of the second diaphragm is made equal to or smaller than the divergence angle of the electron beam to be measured, and the landing angle is determined based on the relation between a center of the fine hole of the first diaphragm and the center of the aperture of the second diaphragm at which the amount of detected current is maximum.
摘要翻译：本发明的目的是即使在多束电子束光刻系统中也测量着色角，其中每个光束的电流量都很小。其另一个目的是测量着陆角的绝对值和具有高SN比的相对着陆角。在包括两个隔膜板（第一和第二隔膜）和检测器的传输检测器中，由第一和第二隔膜之间的距离和第二隔膜的孔径确定的检测角度等于或小于基于第一膜片的细孔的中心与检测电流量最大的第二膜片的孔的中心之间的关系来确定待测量的电子束和着陆角。

3. 发明申请

US20080067376A1 CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：充电颗粒光束装置
公开(公告)号：US20080067376A1
公开(公告)日：2008-03-20
申请号：US11751094
申请日：2007-05-21
申请人： Sayaka Tanimoto , Osamu Kamimura , Yasunari Sohda , Hiroya Ohta
发明人： Sayaka Tanimoto , Osamu Kamimura , Yasunari Sohda , Hiroya Ohta
IPC分类号： G21K7/00
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/1205 , H01J2237/1534 , H01J2237/1536 , H01J2237/2446 , H01J2237/2448 , H01J2237/24592 , H02N13/00
摘要： This invention provides a charged particle beam apparatus that can makes reduction in off axis aberration and separate detection of secondary beams to be compatible. The charged particle beam apparatus has: an electron optics that forms a plurality of primary charged particle beams, projects them on a specimen, and makes them scan the specimen with a first deflector; a plurality of detectors that individually detect a plurality of secondary charged particle beams produced from the plurality of locations of the specimen by irradiation of the plurality of primary charged particle beams; and a voltage source for applying a voltage to the specimen. The charged particle beam apparatus further has: a Wien filter for separating paths of the primary charged particle beams and paths of the secondary charged particle beams; a second deflector for deflecting the secondary charged particle beams separated by the Wien filter; and control means for controlling the first deflector and the second deflector in synchronization, wherein the plurality of detectors detect the plurality of secondary charged particle beams separated by the Wien filter individually.
摘要翻译：本发明提供了一种带电粒子束装置，其可以减少离轴像差和将次级束的分离检测兼容。带电粒子束装置具有：形成多个初级带电粒子束的电子光学器件，将它们投射在样本上，并使它们用第一偏转器扫描样本; 多个检测器，通过多个初级带电粒子束的照射，分别检测从样本的多个位置产生的多个次级带电粒子束; 以及用于向样本施加电压的电压源。带电粒子束装置还具有：维纳滤波器，用于分离初级带电粒子束的路径和二次带电粒子束的路径; 用于偏转由维恩滤波器分离的二次带电粒子束的第二偏转器; 以及用于同步地控制第一偏转器和第二偏转器的控制装置，其中多个检测器分别检测由维恩过滤器分离的多个次级带电粒子束。

4. 发明授权

US07341144B2 Case with hinged lid 失效
标题翻译：带铰链盖的外壳
公开(公告)号：US07341144B2
公开(公告)日：2008-03-11
申请号：US11060892
申请日：2005-02-18
申请人： Takeshi Tajiri , Osamu Kamimura , Yasushi Kimura
发明人： Takeshi Tajiri , Osamu Kamimura , Yasushi Kimura
IPC分类号： B65D43/16
CPC分类号： E05D5/10 , B65D43/165 , B65D2251/205 , E05D5/128 , E05D2005/102 , E05Y2900/602 , Y10T16/557
摘要： A case includes a case body, a lid, hinges supporting the lid on the case body and a waterproof seal placed on the joining surface of the case body. The lid can be turned for closing on the hinges so as to compress the waterproof seal perpendicularly to the joining surface of the case body. Each hinge is provided with a hinge pin having opposite cylindrical end parts and an offset middle part defining a groove together with the cylindrical end parts. The grooves of the hinges permit first knuckles formed integrally with the lid to sink therein so that the lid held with its joining surface parallel to the joining surface of the case body can be moved toward the case body perpendicularly to the joining surface of the case body to compress the waterproof seal perpendicularly between the joining surfaces of the lid and the case body. The hinge pin is restrained from coming off by the first knuckles when the first knuckles are engaged in the groove.
摘要翻译：壳体包括壳体，盖，支撑壳体上的盖的铰链和设置在壳体的接合表面上的防水密封件。盖可以转动以关闭铰链，以便垂直于壳体的接合表面压缩防水密封件。每个铰链设置有具有相对的圆柱形端部的铰链销和与圆柱形端部部分一起限定凹槽的偏移中间部分。铰链的凹槽允许与盖一体形成的第一铰链沉入其中，使得其与其主体的接合表面平行的接合表面保持的盖可以垂直于壳体的接合表面移动到壳体主体以在盖的接合表面和壳体之间垂直地压缩防水密封件。当第一个转向节接合在槽中时，铰链销被第一转向节所限制。

5. 发明授权

US5373112A Multilayered wiring board having printed inductor 失效
标题翻译：具有印刷电感器的多层布线板
公开(公告)号：US5373112A
公开(公告)日：1994-12-13
申请号：US21543
申请日：1993-02-24
申请人： Osamu Kamimura , Kunio Matsumoto
发明人： Osamu Kamimura , Kunio Matsumoto
IPC分类号： H01F17/00 , H05K1/00 , H05K1/16 , H05K3/42 , H05K3/46 , H05K1/02 , H01F5/00
CPC分类号： H01F17/0006 , H05K1/165 , H05K1/0298 , H05K2201/093 , H05K2201/09309 , H05K2201/0969 , H05K3/429
摘要： A multilayered wiring board having a printed inductor which is formed on a grounding layer or electric power supply layer through a dielectric layer inserted between them, wherein a removed portion is formed only in the grounding layer or electric power supply layer which is positioned right under the printed inductor and in the neighboring area and no removed portion is formed in the dielectric layer. According to this structure, without increasing the manufacture cost, the distance between the printed inductor and the grounding layer or electric power supply layer opposite to it spreads to the lower electric power supply layer or grounding layer and the stray capacity existing therebetween is reduced, and a reduction of the self-resonance frequency of the printed inductor is prevented, and the frequency characteristics improve.
摘要翻译：一种具有印刷电感器的多层布线板，其通过插入在它们之间的电介质层形成在接地层或电力供给层上，其中仅在位于正下方的接地层或电力供应层中形成去除部分印刷电感器和相邻区域，并且在电介质层中没有形成去除部分。根据该结构，在不增加制造成本的情况下，印刷电感器与其相对的接地层或电力供给层之间的距离扩展到下部电力供给层或接地层，并且其间存在的杂散电容减少，防止印刷电感器的自谐振频率的降低，并且频率特性得到改善。

6. 发明申请

US20100065753A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20100065753A1
公开(公告)日：2010-03-18
申请号：US12554577
申请日：2009-09-04
申请人： Momoyo ENYAMA , Hiroya Ohta , Osamu Kamimura
发明人： Momoyo ENYAMA , Hiroya Ohta , Osamu Kamimura
IPC分类号： H01J3/16
CPC分类号： H01J37/153 , H01J37/1472 , H01J2237/151 , H01J2237/1534
摘要： With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.
摘要翻译：使用多光束型带电粒子束装置和投影带电粒子束装置，在离轴像差校正器的情况下，需要准备多个多极，并且与数字对应的数量的电源的多极需要准备。为了解决上述问题，带电粒子束装置设置有至少一个像差校正器，其中通过在电子光学系统中设置静电镜，过去所需的多极数减少约一半。

7. 发明授权

US06969862B2 Charged-particle-beam exposure apparatus and method of controlling same 有权
标题翻译：带电粒子束曝光装置及其控制方法
公开(公告)号：US06969862B2
公开(公告)日：2005-11-29
申请号：US10730814
申请日：2003-12-08
申请人： Masato Muraki , Osamu Kamimura , Masaki Takakuwa
发明人： Masato Muraki , Osamu Kamimura , Masaki Takakuwa
IPC分类号： G03F7/20 , H01J37/04 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/30433
摘要： In a charged-particle-beam exposure apparatus for exposing a wafer using a charged-particle beam, an electron beam emitted from an electron source serving as a source of charged particles is substantially collimated by a collimator lens and irradiates an aperture array (3), which has apertures for forming a plurality of electron beams used to expose a wafer. A current detector array has current detectors for measuring the intensities (currents) of electron beams at portions of the-aperture array other than where the apertures are present. During the wafer exposure operation, each current detector of the current detector array measures the intensity of the electron beam. The electron-beam intensity distribution is evaluated based upon the results of measurement and, when necessary, the optical power of electrostatic lenses that construct the collimator lens (2) is adjusted to uniformalize the electron-beam intensity distribution.
摘要翻译：在使用带电粒子束曝光晶片的带电粒子束曝光装置中，从作为带电粒子源的电子源发射的电子束基本上被准直透镜准直，并照射孔径阵列（3），其具有用于形成用于暴露晶片的多个电子束的孔。电流检测器阵列具有电流检测器，用于测量孔径阵列除存在孔的部分之外的电子束的强度（电流）。在晶片曝光操作期间，电流检测器阵列的每个电流检测器测量电子束的强度。基于测量结果评价电子束强度分布，并且根据需要调整构成准直透镜（2）的静电透镜的光学功率，使电子束强度分布均匀化。

8. 发明申请

US20050224508A1 Case with hinged lid 失效
标题翻译：带铰链盖的外壳
公开(公告)号：US20050224508A1
公开(公告)日：2005-10-13
申请号：US11060892
申请日：2005-02-18
申请人： Takeshi Tajiri , Osamu Kamimura , Yasushi Kimura
发明人： Takeshi Tajiri , Osamu Kamimura , Yasushi Kimura
IPC分类号： F16C11/04 , B65D43/16 , B65D51/04 , H05K5/03
CPC分类号： E05D5/10 , B65D43/165 , B65D2251/205 , E05D5/128 , E05D2005/102 , E05Y2900/602 , Y10T16/557
摘要： A case includes a case body, a lid, hinges supporting the lid on the case body and a waterproof seal placed on the joining surface of the case body. The lid can be turned for closing on the hinges so as to compress the waterproof seal perpendicularly to the joining surface of the case body. Each hinge is provided with a hinge pin having opposite cylindrical end parts and an offset middle part defining a groove together with the cylindrical end parts. The grooves of the hinges permit first knuckles formed integrally with the lid to sink therein so that the lid held with its joining surface parallel to the joining surface of the case body can be moved toward the case body perpendicularly to the joining surface of the case body to compress the waterproof seal perpendicularly between the joining surfaces of the lid and the case body. The hinge pin is restrained from coming off by the first knuckles when the first knuckles are engaged in the groove.
摘要翻译：壳体包括壳体，盖，支撑壳体上的盖的铰链和设置在壳体的接合表面上的防水密封件。盖可以转动以关闭铰链，以便垂直于壳体的接合表面压缩防水密封件。每个铰链设置有具有相对的圆柱形端部的铰链销和与圆柱形端部部分一起限定凹槽的偏移中间部分。铰链的凹槽允许与盖一体形成的第一铰链沉入其中，使得其与其主体的接合表面平行的接合表面保持的盖可以垂直于壳体的接合表面移动到壳体主体以在盖的接合表面和壳体之间垂直地压缩防水密封件。当第一个转向节接合在槽中时，铰链销被第一转向节所限制。

9. 发明申请

US20050072941A1 Method of charged particle beam lithography and equipment for charged particle beam lithography 有权
标题翻译：带电粒子束光刻方法及带电粒子束光刻设备
公开(公告)号：US20050072941A1
公开(公告)日：2005-04-07
申请号：US10958141
申请日：2004-10-05
申请人： Sayaka Tanimoto , Yasunari Sohda , Yoshinori Nakayama , Osamu Kamimura , Haruo Yoda , Masaki Hosoda
发明人： Sayaka Tanimoto , Yasunari Sohda , Yoshinori Nakayama , Osamu Kamimura , Haruo Yoda , Masaki Hosoda
IPC分类号： G21K5/04 , G03F7/20 , H01J37/04 , H01J37/09 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/302
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/04 , H01J37/317
摘要： Disclosed is equipment for charged-particle beam lithography capable of executing exposure even when an electron beam with a bad property is produced due to a failure in some multibeam forming element, without replacing the failing multibeam forming element and without reducing the exposure accuracy. The equipment includes means for forming a plurality of charged-particle beams arranged at predetermined intervals; a plurality of blankers which act on the plurality of charged-particle beams individually; a common blanker which acts on all of the plurality of charged-particle beams; and a blanking restriction for causing those charged-particle beams which are given predetermined deflection by the plurality of blankers to reach onto a sample, with a signal applied to the common blanker, and blocking those charged-particle beams which are not given the predetermined deflection by the plurality of blankers to the sample. The equipment blocks beams with bad properties to the sample and executes exposure using only those beams which have bad properties.
摘要翻译：本发明公开了即使由于某些多波束形成元件的故障而产生具有不良特性的电子束也能够进行曝光的带电粒子束光刻设备，而不更换故障多波束形成元件而不降低曝光精度。该设备包括用于形成以预定间隔布置的多个带电粒子束的装置; 分别作用在多个带电粒子束上的多个阻挡器; 作用于所有多个带电粒子束的常见消隐器; 以及消隐限制，用于使得由多个消隐器给予预定偏转的那些带电粒子束到达样本，信号施加到公共消隐器，并且阻挡未被给予预定偏转的那些带电粒子束通过多个消隐器到样品。设备阻挡样品性能不良的光束，并仅使用具有不良特性的光束执行曝光。

10. 发明授权

US06838682B2 Electron beam exposure equipment and electron beam exposure method 失效
标题翻译：电子束曝光设备和电子束曝光方法
公开(公告)号：US06838682B2
公开(公告)日：2005-01-04
申请号：US10634878
申请日：2003-08-06
申请人： Yasunari Sohda , Osamu Kamimura , Hiroya Ohta , Susumu Gotoh
发明人： Yasunari Sohda , Osamu Kamimura , Hiroya Ohta , Susumu Gotoh
IPC分类号： G03F7/20 , G03F9/02 , H01J37/04 , H01J37/141 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： H01J37/1471 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3045 , H01J37/3174 , H01J37/3177 , H01J2237/1501
摘要： There is provided an electron beam exposure technique which permits optical adjustment in an electron optics system using a doublet lens necessary for large field projection.Electron beam exposure equipment having a part forming one image by at least two electromagnetic lenses, has means measuring the position of an electron beam near an image plane with changing excitation of at least two lenses at the same time; and control means feeding back the measured result to aligners or the intensity of the lenses.
摘要翻译：提供了一种使用电子光学系统进行光学调节的电子束曝光技术，该系统使用大场投影所需的双重透镜。具有通过至少两个电磁透镜形成一个图像的部分的电子束曝光设备具有测量位置同时改变至少两个透镜的激发的图像平面附近的电子束; 并且控制装置将测量结果反馈到对准器或透镜的强度。

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