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91. 发明申请

US20090104376A1 GAS DIFFUSION SHOWER HEAD DESIGN FOR LARGE AREA PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 有权
标题翻译：气体扩散淋浴头设计用于大面积等离子体增强化学蒸气沉积
公开(公告)号：US20090104376A1
公开(公告)日：2009-04-23
申请号：US12254742
申请日：2008-10-20
申请人： SOO YOUNG CHOI , John M. White , Robert I. Greene
发明人： SOO YOUNG CHOI , John M. White , Robert I. Greene
IPC分类号： C23C16/513 , B08B6/00
CPC分类号： C23C16/45559 , B05B1/005 , C23C16/4405 , C23C16/45565 , H01J37/3244
摘要： Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. At least one of the gas passages has a right cylindrical shape for a portion of its length extending from the upstream side and a coaxial conical shape for the remainder length of the diffuser plate, the upstream end of the conical portion having substantially the same diameter as the right cylindrical portion and the downstream end of the conical portion having a larger diameter. The gas distribution plate is relatively easy to manufacture and provides good chamber cleaning rate, good thin film deposition uniformity and good thin film deposition rate. The gas distribution plate also has the advantage of reduced chamber cleaning residues on the diffuser surface and reduced incorporation of the cleaning residues in the thin film being deposited.
摘要翻译：提供了用于在处理室中分配气体的气体分配板的实施例。在一个实施例中，气体分配板包括具有上游侧和下游侧的扩散板和通过扩散板的上游侧和下游侧之间的多个气体通道。气体通道中的至少一个具有从上游侧延伸的一部分长度的右圆柱形状，并且对于扩散板的剩余长度为同轴圆锥形，锥形部分的上游端具有与锥形部分的右圆柱形部分和下游端具有较大的直径。气体分配板相对容易制造，提供良好的室清洁率，良好的薄膜沉积均匀性和良好的薄膜沉积速率。气体分配板还具有减小扩散器表面上的室清洁残留物的优点，并且减少了沉积在薄膜中的清洁残余物的结合。

92. 发明申请

US20090077805A1 PHOTOVOLTAIC PRODUCTION LINE 失效
标题翻译：光伏生产线
公开(公告)号：US20090077805A1
公开(公告)日：2009-03-26
申请号：US12202199
申请日：2008-08-29
申请人： Robert Z. BACHRACH , Yong-Kee Chae , Soo Young Choi , Nicholas G.J. De Vries , Yacov Elgar , Eric A. Englhardt , Michael R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J.B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
发明人： Robert Z. BACHRACH , Yong-Kee Chae , Soo Young Choi , Nicholas G.J. De Vries , Yacov Elgar , Eric A. Englhardt , Michael R. Frei , Charles Gay , Parris Hawkins , Choi (Gene) Ho , James Craig Hunter , Penchala N. Kankanala , Liwei Li , Wing Hoo (Hendrick) Lo , Danny Cam Toan Lu , Fang Mei , Stephen P. Murphy , Srujal (Steve) Patel , Matthew J.B. Saunders , Asaf Schlezinger , Shuran Sheng , Tzay-Fa (Jeff) Su , Jeffrey S. Sullivan , David Tanner , Teresa Trowbridge , Brice Walker , John M. White , Tae K. Won
IPC分类号： H01L31/18 , H05K13/00
CPC分类号： H01L21/67236 , B23K26/364 , B26F3/002 , B26F3/004 , B65G49/064 , B65G2249/02 , B65G2249/04 , C03B33/03 , C03B33/033 , H01L21/67132 , H01L21/67712 , H01L21/67715 , H01L21/67721 , H01L21/67727 , H01L21/6776 , H01L31/022425 , H01L31/03921 , H01L31/0504 , H01L31/075 , H02S50/00 , H02S50/10 , Y02E10/548 , Y02P40/57 , Y10T29/49002 , Y10T29/49355 , Y10T29/5196 , Y10T29/53113 , Y10T29/5313 , Y10T29/5317 , Y10T29/53187 , Y10T29/53365 , Y10T29/53417 , Y10T225/10 , Y10T225/325 , Y10T225/329
摘要： The present invention generally relates to a system that can be used to form a photovoltaic device, or solar cell, using processing modules that are adapted to perform one or more steps in the solar cell formation process. The automated solar cell fab is generally an arrangement of automated processing modules and automation equipment that is used to form solar cell devices. The automated solar fab will thus generally comprise a substrate receiving module that is adapted to receive a substrate, one or more absorbing layer deposition cluster tools having at least one processing chamber that is adapted to deposit a silicon-containing layer on a surface of the substrate, one or more back contact deposition chambers, one or more material removal chambers, a solar cell encapsulation device, an autoclave module, an automated junction box attaching module, and one or more quality assurance modules that are adapted to test and qualify the completely formed solar cell device.
摘要翻译：本发明一般涉及一种可用于形成光伏器件或太阳能电池的系统，该系统使用适于在太阳能电池形成过程中执行一个或多个步骤的处理模块。自动化太阳能电池制造厂通常是用于形成太阳能电池器件的自动化处理模块和自动化设备的布置。因此，自动化太阳能工厂将通常包括适于接收衬底的衬底接收模块，一个或多个吸收层沉积簇工具，其具有至少一个处理室，该处理室适于在衬底的表面上沉积含硅层，一个或多个背接触沉积室，一个或多个材料去除室，太阳能电池封装装置，高压釜模块，自动接线盒附接模块和一个或多个质量保证模块，其适于测试和限定完全形成太阳能电池装置。

93. 发明申请

US20090056743A1 METHOD OF CLEANING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER 审中-公开
标题翻译：清洁等离子体增强化学气相沉积室的方法
公开(公告)号：US20090056743A1
公开(公告)日：2009-03-05
申请号：US12199396
申请日：2008-08-27
申请人： Soo Young Choi , John M. White , Beom Soo Park , Liwei Li
发明人： Soo Young Choi , John M. White , Beom Soo Park , Liwei Li
IPC分类号： B08B6/00
CPC分类号： B08B7/0035 , C23C16/4405
摘要： A method and apparatus for cleaning a plasma enhanced chemical vapor deposition chamber is described. In one embodiment, the method includes providing a first cleaning gas to a processing region within the chamber; and then providing a second cleaning gas to the processing region. In another embodiment, the method includes providing a substantially pure fluorine gas to a processing chamber.
摘要翻译：描述了用于清洁等离子体增强化学气相沉积室的方法和装置。在一个实施例中，该方法包括向腔室内的处理区域提供第一清洁气体; 然后向处理区域提供第二清洁气体。在另一个实施方案中，该方法包括向处理室提供基本上纯的氟气。

94. 发明申请

US20080282982A1 APPARATUS AND METHOD FOR DEPOSITION OVER LARGE AREA SUBSTRATES 审中-公开
标题翻译：大面积沉积物沉积的装置和方法
公开(公告)号：US20080282982A1
公开(公告)日：2008-11-20
申请号：US12039613
申请日：2008-02-28
申请人： John M. White , Sanjay Yadav , Qunhua Wang , Soo Young Choi , Weijie Wang
发明人： John M. White , Sanjay Yadav , Qunhua Wang , Soo Young Choi , Weijie Wang
IPC分类号： C23C16/50
CPC分类号： C23C16/4485 , C23C16/509 , H01J37/321 , H01J37/32449
摘要： The present invention generally relates to an inductively coupled plasma apparatus. When depositing utilizing a plasma generated from a showerhead, the plasma may not be evenly distributed to the edge of the substrate. By inductively coupling plasma to the chamber in an area corresponding to the chamber walls, the plasma distribution within the chamber may be evenly distributed and deposition upon the substrate may be substantially even. By vaporizing the processing gas prior to entry into the processing chamber, the plasma may also be even and thus contribute to an even deposition on the substrate.
摘要翻译：本发明一般涉及电感耦合等离子体装置。当利用从喷头产生的等离子体进行沉积时，等离子体可能不均匀地分布到基板的边缘。通过在对应于室壁的区域中将等离子体电感耦合到腔室，室内的等离子体分布可以均匀分布，并且在衬底上的沉积可以基本上均匀。通过在进入处理室之前汽化处理气体，等离子体也可以是均匀的并且因此有助于在衬底上的均匀沉积。

95. 发明申请

US20080142481A1 IN-SITU PARTICLE COLLECTOR 审中-公开
标题翻译：现场颗粒收集器
公开(公告)号：US20080142481A1
公开(公告)日：2008-06-19
申请号：US11612066
申请日：2006-12-18
申请人： John M. White , Soo Young Choi
发明人： John M. White , Soo Young Choi
IPC分类号： H01L21/306 , C03C15/00
CPC分类号： C23C16/4401 , H01J37/32871 , H01J2237/022
摘要： A plasma-processing chamber is configured with a particle collection conductor to remove charged particles from the chamber during plasma processing of substrates. The particle collection conductor is positioned in a processing region of the chamber and a power supply applies a DC bias to the conductor when plasma is present in the processing region. The conductor may comprise aluminum, and the power supply may be controlled by a plasma controller of the plasma-processing chamber. In one aspect, the conductor may be configured to translate through the processing region during substrate processing. A method is also provided for removing particles from the processing region of a plasma-processing chamber, comprising positioning a substrate in a processing chamber, flowing a processing gas into the processing chamber, generating a plasma in the processing chamber, and applying a DC bias to a particle collection conductor positioned in the processing chamber.
摘要翻译：等离子体处理室配置有粒子收集导体，以在衬底的等离子体处理期间从腔室去除带电粒子。颗粒收集导体位于室的处理区域中，并且当处理区域中存在等离子体时，电源向导体施加DC偏压。导体可以包括铝，并且电源可以由等离子体处理室的等离子体控制器控制。在一个方面，导体可以被配置成在衬底处理期间平移通过处理区域。还提供了一种用于从等离子体处理室的处理区域去除颗粒的方法，包括将处理室中的基板定位在处理室中，使处理气体流入处理室，在处理室中产生等离子体，并施加DC偏压到位于处理室中的颗粒收集导体。

96. 发明申请

US20070178810A1 Particle reduction on surfaces of chemical vapor deposition processing apparatus 有权
标题翻译：化学气相沉积处理装置表面的减少颗粒
公开(公告)号：US20070178810A1
公开(公告)日：2007-08-02
申请号：US11498606
申请日：2006-08-02
申请人： Soo Young Choi , John M. White , Beom Soo Park , Dong Kil Yim
发明人： Soo Young Choi , John M. White , Beom Soo Park , Dong Kil Yim
IPC分类号： B24C1/00
CPC分类号： B24C1/003 , B24C3/322
摘要： A method of reducing the amount of particulates generated from the surface of a processing component used during plasma enhanced chemical vapor deposition of thin films. The body of the processing component comprises an aluminum alloy, and an exterior surface of said processing component is texturized to increase the amount of surface area present on the exterior surface. The texturizing process includes at least one step in which the surface to be texturized is bead blasted or chemically grained, so that the surface roughness of the texturized surface ranges from about 50 μ-inch Ra to about 1,000 μ-inch Ra.
摘要翻译：一种减少在等离子体增强化学气相沉积薄膜期间使用的处理部件表面产生的微粒量的方法。处理部件的主体包括铝合金，并且所述处理部件的外表面被组织化以增加外表面上存在的表面积的量。该组织化工艺包括至少一个步骤，其中待组织的表面被喷砂或化学颗粒化，使得织构表面的表面粗糙度范围为约50英寸Ra至约1,000μm英寸Ra。

97. 发明授权

US09068262B2 Tightly fitted ceramic insulator on large area electrode 有权
标题翻译：在大面积电极上紧密配合陶瓷绝缘子
公开(公告)号：US09068262B2
公开(公告)日：2015-06-30
申请号：US13110184
申请日：2011-05-18
申请人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
发明人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
IPC分类号： C23C16/455 , C23C16/509 , H01J37/32
CPC分类号： B05B1/185 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32651 , Y10T137/6851
摘要： Embodiments of the invention generally include shield frame assembly for use with a showerhead assembly, and a showerhead assembly having a shield frame assembly that includes an insulator that tightly fits around the perimeter of a showerhead in a vacuum processing chamber. In one embodiment, a showerhead assembly includes a gas distribution plate and a multi-piece frame assembly that circumscribes a perimeter edge of the gas distribution plate. The multi-piece frame assembly allows for expansion of the gas distribution plate without creating gaps which may lead to arcing. In other embodiments, the insulator is positioned to be have the electric fields concentrated at the perimeter of the gas distribution plate located therein, thereby reducing arcing potential.
摘要翻译：本发明的实施例通常包括用于喷头组件的屏蔽框架组件和具有屏蔽框架组件的喷头组件，所述屏蔽框架组件包括紧密配合在真空处理室中的喷头周边周围的绝缘体。在一个实施例中，喷头组件包括气体分配板和环绕气体分布板的周边边缘的多片框架组件。多件式框架组件允许气体分配板的膨胀而不产生可能导致电弧的间隙。在其它实施例中，绝缘体被定位成具有集中在位于其中的气体分配板的周边的电场，从而减少电弧电势。

98. 发明申请

US20130126331A1 Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber 有权
标题翻译：用于等离子室的非气体介质的导波涂敷器
公开(公告)号：US20130126331A1
公开(公告)日：2013-05-23
申请号：US13360652
申请日：2012-01-27
申请人： Jozef Kudela , Tsutomu Tanaka , Carl A. Sorensen , Suhail Anwar , John M. White
发明人： Jozef Kudela , Tsutomu Tanaka , Carl A. Sorensen , Suhail Anwar , John M. White
IPC分类号： H01P3/16 , H05H1/46 , H01L21/02
CPC分类号： H01P3/16 , H01J37/32229 , H01L21/02 , H01L21/02104 , H05H1/46 , H05H2001/4622
摘要： A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric.
摘要翻译：导波装置，其包括两个导电波导壁和波导电介质。波导介质的体积由非气体电介质材料构成，并且位于两个波导壁之间。波导电介质包括第一和第二纵向端部，并且包括在两个纵向端部之间纵向延伸的第一，第二，第三和第四侧面。第一波导壁被定位成使得其覆盖波导电介质的第一侧，并且第二波导壁被定位成使得其覆盖波导电介质的第二侧。在操作中，可以向波导介质的一个或两个纵向端提供电力，由此可以通过波导电介质的暴露侧将功率耦合到等离子体。

99. 发明授权

US08438990B2 Multi-electrode PECVD source 有权
标题翻译：多电极PECVD源
公开(公告)号：US08438990B2
公开(公告)日：2013-05-14
申请号：US12353638
申请日：2009-01-14
申请人： Jozef Kudela , John M. White
发明人： Jozef Kudela , John M. White
IPC分类号： C23C16/00 , H01L21/00
CPC分类号： C23C16/5096 , C23C16/54 , H01J37/32091 , H01J37/32183 , H01J37/3244 , H01J37/32568 , H01J37/32752
摘要： Embodiments of the present invention generally relate to methods and apparatus for plasma generation in plasma processes. The methods and apparatus generally include a plurality of electrodes. The electrodes are connected to a RF power source, which powers the electrodes out of phase from one another. Adjacent electrodes are electrically isolated from one another by electrically insulating members disposed between and coupled to the electrodes. Processing gas may be delivered and/or withdrawn through the electrodes and/or the electrically insulating members. The substrate may remain electrically floating because the plasma may be capacitively coupled to it through a differential RF source drive.
摘要翻译：本发明的实施例一般涉及等离子体工艺中等离子体产生的方法和装置。所述方法和装置通常包括多个电极。电极连接到RF电源，该电源使电极彼此相位不相位。相邻的电极通过设置在电极之间并耦合到电极的电绝缘构件彼此电隔离。处理气体可以通过电极和/或电绝缘构件传送和/或抽出。由于等离子体可以通过差分RF源驱动电容耦合到其上，基板可能保持电浮置。

100. 发明授权

US08365682B2 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US08365682B2
公开(公告)日：2013-02-05
申请号：US11140777
申请日：2005-05-31
申请人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
发明人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
IPC分类号： B65G49/07
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

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