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    • 4. 发明公开
    • 광전자 분광법을 이용한 레이어 두께 결정
    • 使用光电子光谱测定层厚度
    • KR1020080018173A
    • 2008-02-27
    • KR1020077027804
    • 2006-04-19
    • 리베라 인코퍼레이티드
    • 쉴러브루노
    • H01J40/00H01J49/02
    • G01B15/02H01J2237/2511H01J2237/2522H01J2237/2814
    • According to one embodiment of the invention, photoelectron spectroscopy is used to determine the thickness of one or more layers in a single or multi-layer structure on a substrate. The thickness may be determined by measuring the intensities of two photoelectron species or other atom-specific characteristic electron species emitted by the structure when bombarded with photons. A predictive intensity function that is dependent on the thickness of a layer is determined for each photoelectron species. A ratio of two predictive intensity functions is formulated, and the ratio is iterated to determine the thickness of a layer of the structure. According to one embodiment, two photoelectron species may be measured from a single layer to determine a thickness of that layer. According to another embodiment, two photoelectron species from different layers or from a substrate may be measured to determine a thickness of a layer.
    • 根据本发明的一个实施例,使用光电子能谱来确定衬底上单层或多层结构中一层或多层的厚度。 可以通过测量当用光子轰击时由结构发射的两种光电子物质或其它原子特异性特征电子物质的强度来确定厚度。 对于每个光电子物质确定取决于层的厚度的预测强度函数。 制定两个预测强度函数的比率,并重复该比率以确定该结构层的厚度。 根据一个实施例,可以从单个层测量两个光电子物质以确定该层的厚度。 根据另一个实施例,可以测量来自不同层或来自衬底的两个光电子物质以确定层的厚度。