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1. 发明公开

KR1020080029960A 기구에 의해 생성된 데이터 분석 기술 无效
标题翻译：用于分析仪器生成数据的技术
公开(公告)号：KR1020080029960A
公开(公告)日：2008-04-03
申请号：KR1020077027805
申请日：2006-04-19
申请人： 리베라 인코퍼레이티드
发明人： 오록제임스 , 라르슨토마스씨 , 쉴러브루노 , 보트로렌스 , 퀴글리제임스 , 규레르에미르
IPC分类号： G01N23/06 , G06F19/00
CPC分类号： G01N23/2273
摘要： According to one embodiment of the invention, a method for analyzing data from an instrument is disclosed. The raw data generated by the instrument, along with configuration data generated by a user, is packaged into a calling model. The raw data may include, for example, counts having a certain kinetic energy when analyzing photoelectron spectroscopy data. The configuration data may include several parameters selected by the user based on the composition and configuration of the structure being measured. The calling model may serve as an interface between the instrument and an engine for generating an algorithm for returning desired results to the user. The engine then generates the algorithm as well as the results specified by the user, and the calling model returns the results to the user. This allows a specific algorithm and results for a specific measured sample or structure to be generated using known algorithms and functions.
摘要翻译：根据本发明的一个实施例，公开了一种用于分析来自仪器的数据的方法。由仪器生成的原始数据以及用户生成的配置数据被打包成一个调用模型。原始数据可以包括例如在分析光电子能谱数据时具有一定动能的计数。配置数据可以包括基于所测量结构的组成和配置的用户选择的几个参数。呼叫模型可以用作仪器和引擎之间的接口，用于生成用于将期望结果返回给用户的算法。然后，引擎生成算法以及用户指定的结果，调用模型将结果返回给用户。这允许使用已知的算法和功能来生成特定的测量样本或结构的特定算法和结果。

2. 发明公开

KR1020080018173A 광전자 분광법을 이용한 레이어 두께 결정 有权
标题翻译：使用光电子光谱测定层厚度
公开(公告)号：KR1020080018173A
公开(公告)日：2008-02-27
申请号：KR1020077027804
申请日：2006-04-19
申请人： 리베라 인코퍼레이티드
发明人： 쉴러브루노
IPC分类号： H01J40/00 , H01J49/02
CPC分类号： G01B15/02 , H01J2237/2511 , H01J2237/2522 , H01J2237/2814
摘要： According to one embodiment of the invention, photoelectron spectroscopy is used to determine the thickness of one or more layers in a single or multi-layer structure on a substrate. The thickness may be determined by measuring the intensities of two photoelectron species or other atom-specific characteristic electron species emitted by the structure when bombarded with photons. A predictive intensity function that is dependent on the thickness of a layer is determined for each photoelectron species. A ratio of two predictive intensity functions is formulated, and the ratio is iterated to determine the thickness of a layer of the structure. According to one embodiment, two photoelectron species may be measured from a single layer to determine a thickness of that layer. According to another embodiment, two photoelectron species from different layers or from a substrate may be measured to determine a thickness of a layer.
摘要翻译：根据本发明的一个实施例，使用光电子能谱来确定衬底上单层或多层结构中一层或多层的厚度。可以通过测量当用光子轰击时由结构发射的两种光电子物质或其它原子特异性特征电子物质的强度来确定厚度。对于每个光电子物质确定取决于层的厚度的预测强度函数。制定两个预测强度函数的比率，并重复该比率以确定该结构层的厚度。根据一个实施例，可以从单个层测量两个光电子物质以确定该层的厚度。根据另一个实施例，可以测量来自不同层或来自衬底的两个光电子物质以确定层的厚度。

3. 发明授权

KR101264457B1 광전자 분광법을 이용한 레이어 두께 결정 有权
标题翻译：使用光电子光谱测定层厚度
公开(公告)号：KR101264457B1
公开(公告)日：2013-05-14
申请号：KR1020077027804
申请日：2006-04-19
申请人： 리베라 인코퍼레이티드
发明人： 쉴러브루노
IPC分类号： H01J40/00 , H01J49/02
CPC分类号： G01B15/02 , H01J2237/2511 , H01J2237/2522 , H01J2237/2814
摘要： 본발명의일 실시형태에따라, 기판상의단일의또는멀티-레이어구조에서하나이상의레이어의두께를결정하기위해광전자분광법이이용된다. 이두께는, 광자와충돌한경우기판에의해방출된 2 개의광전자종 또는다른원자-특정특성전자종의강도를측정함으로써결정될수도있다. 레이어의두께에의존하는예측강도함수는각각의광전자종에대해결정된다. 2 개의예측강도함수의비가공식화되어, 구조중 레이어의두께를결정하기위해이 비가반복된다. 일실시형태에따라, 2 개의광전자종이단일의레이어로부터측정되어이 레이어의두께를결정할수도있다. 또다른실시형태에따라, 레이어의두께를결정하기위해상이한레이어로부터또는기판으로부터의 2 개의광전자종이측정될수도있다.

4. 发明公开

KR1020080050567A 막에서의 구성요소의 비-파괴 분포 프로파일링에 대한 방법및 시스템 无效
标题翻译：电影中元素的非破坏性分布分布的方法和系统
公开(公告)号：KR1020080050567A
公开(公告)日：2008-06-09
申请号：KR1020087003155
申请日：2006-06-23
申请人： 리베라 인코퍼레이티드
发明人： 데세코파올라 , 쉴러브루노 , 리드데이비드 , 콴마이클 , 밸런스데이비드에스
IPC分类号： H03F1/26 , G06F15/00
CPC分类号： G01N23/2273 , H01J37/26 , H01J2237/24585 , H03F1/26
摘要： A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.
摘要翻译：确定胶片中元素的分布特征的方法。该方法包括激发沉积在第一膜中的元素的电子能量，获得与电子能量相关联的第一光谱，以及从第一光谱去除背景光谱。删除背景值会生成已处理的光谱。该方法还包括将经处理的光谱与具有与第一胶片相当的胶片中元素的已知模拟分布曲线进行匹配。基于所处理的光谱与从所述一组模拟光谱中选择的模拟光谱的匹配，为第一胶片中的元素获得分布曲线。

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