会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 39. 发明公开
    • 강유전성 박막 및 그 제조방법
    • 微电解薄膜及其制备方法
    • KR1020040056660A
    • 2004-07-01
    • KR1020020083184
    • 2002-12-24
    • 삼성전자주식회사
    • 이용균박영수이준기
    • C04B35/491H01B3/12
    • C04B35/6264C01G23/002C01G25/006C01P2002/72C01P2004/03C01P2006/40C04B35/491C04B2235/3227C04B2235/3232C04B2235/3244C04B2235/3296C04B2235/3298C04B2235/3418C04B2235/3427C04B2235/44C04B2235/441C04B2235/449C04B2235/483H01L21/31691
    • PURPOSE: Provided is a composition for ferroelectric thin films with good storage stability and good electrical property by sol gel process. The resultant thin films are applied to highly integrated devices, nonvolatile memory devices. CONSTITUTION: The ferroelectric thin film expressed by the formula of Pb(ZrxTi1-x)O3 (x:0.001-1, y:0.0001-1) is prepared by the following steps of: (i) preparing a Pb-precursor solution by dissolving Pb-precursor such as PbO or Pb(OAc)2·3H2O (OAc:OC(=O)CH3) in a solvent such as acetic acid or n-propanol; (ii) preparing a Ti-precursor solution and Zr-precursor solution by dissolving Ti-precursor such as Ti(i-OPr)4, Ti(i-OPr)2(acetylacetonate)2 or Ti(OBu)4 (i-OPr:isopropyloxy, OBu:butoxy) and Zr-precursor such as Zr(i-OPr)4, Zr(OBu)4 or Zr(OET)4 (OEt:ethoxy) in a solvent such as acetylacetone, 2-methoxyethanol or n-propanol; (iii) mixing the Pb-precursor solution and stabilized solution of Zr- and Ti-precursor to get PZT solution; (iv) preparing a Bi-precursor solution by dissolving Bi(Ph)3 or Bi(tmhd)3 ((tmhd)3: 2,2,6,6-tetramethyl heptane-3,5-dionate) in C1-C10 alkoxyalcohol and refluxing; (v) preparing a Si-precursor solution by dissolving Si-precursor such as tetraethylorthosilicate(TEOS) in a solvent such as 2-methoxy ethanol or propanol and mixing Si-solution with Bi-solution obtained from the step (iv) to get Bi2SiO5 sol-gel solution; (vi) mixing the Bi2SiO5 solution with PZT solution obtained from the step (iii) and hydrolyzing the mixtures to get a composition containing PZT and BI2SiO5 sol-gel solution in a molar ratio of 1:0.0001-0.5; coating the composition(0.001-2M) on a substrate and thermal treating by baking the coated substrate at 100-450deg.C in the air and annealing at 450-700deg.C in O2 atmosphere.
    • 目的:通过溶胶凝胶法制备了具有良好储存稳定性和良好电性能的铁电薄膜组合物。 所得薄膜应用于高度集成的器件,非易失性存储器件。 构成:由Pb(Zr x Ti 1-x)O 3(x:0.001-1,y:0.0001-1)表示的铁电薄膜通过以下步骤制备:(i)通过溶解制备Pb前体溶液 铅前体如PbO或Pb(OAc)2·3H2O(OAc:OC(= O)CH3))在溶剂如乙酸或正丙醇中; (ii)通过将Ti(i-OPr)4,Ti(i-OPr)2(乙酰丙酮化物)2或Ti(OBu)4(i-OPr)的Ti-前体溶解制备Ti-前体溶液和Zr-前体溶液 :异丙氧基,OBu:丁氧基)和Zr-前体如Zr(i-OPr)4,Zr(OBu)4或Zr(OET)4(OEt:乙氧基)在乙酰丙酮,2-甲氧基乙醇或n- 丙醇; (iii)将铅前体溶液和稳定的Zr-和Ti-前体溶液混合,得到PZT溶液; (iv)通过将Bi(Ph)3或Bi(tmhd)3((tmhd)3:2,2,6,6-四甲基庚烷-3,5-二酸盐)溶解在C1-C10烷氧基醇中制备双前体溶液 并回流; (v)通过将诸如原硅酸四乙酯(TEOS)的Si前体溶解在诸如2-甲氧基乙醇或丙醇的溶剂中制备Si前体溶液,并将Si-溶液与步骤(iv)获得的Bi溶液混合,得到Bi 2 SiO 5 溶胶 - 凝胶溶液; (vi)将Bi 2 SiO 5溶液与步骤(iii)获得的PZT溶液混合并水解混合物,得到含有摩尔比为1:0.0001-0.5的PZT和BI2SiO5溶胶 - 凝胶溶液的组合物; 将组合物(0.001-2M)涂布在基材上,并通过在空气中在100-450℃下烘烤涂布的基材并在氧气氛中在450-700℃退火进行热处理。