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1. 发明专利

JP2008177603A Electron beam drawing system and control method thereof 有权
标题翻译：电子束绘图系统及其控制方法
公开(公告)号：JP2008177603A
公开(公告)日：2008-07-31
申请号：JP2008094997
申请日：2008-04-01
申请人： Toshiba Corp , 株式会社東芝
发明人： SHIMIZU MITSUKO , ABE TAKAYUKI , YASUSE HIROTO , OKI SUSUMU , KAMIKUBO TAKASHI , MURAKAMI EIJI , HATTORI YOSHIAKI , IIJIMA TOMOHIRO , HIGURE HITOSHI , MATSUKI KAZUTO
IPC分类号： H01L21/027 , H01J37/30 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To diagnose the presence or absence of abnormality, such as a correction calculation error in proximity effect, and to locate an abnormal place easily. SOLUTION: An electron beam drawing system 60 comprises: an electron beam drawing means 2 for drawing a desired graphic pattern by irradiating the surface of a substrate with electron beams; a means 40 for computing a correction dosage for calculating a correction dosage for each small region in a drawing region, where the influence of the proximity effect is considered and the dosage of electron beams corresponding to the drawing graphic pattern is corrected; a control means 37 for calculating the amount of energy stored in the substrate when the electron beams having the corrected dosage are applied, calculating an error by comparing the amount of energy with a prescribed theoretical value, and determining precision in the operation of the means 40 for computing the correction dosage; a display means 67; and a data verification support means 61 for allowing the display means 67 to display information, where the corrected dosage is layered visibly, for each small region. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：诊断异常的存在或不存在，例如邻近效应中的校正计算误差，并且容易地定位异常位置。解决方案：电子束描绘系统60包括：电子束描绘装置2，用于通过用电子束照射衬底的表面来绘制所需的图形图案; 用于计算用于计算绘图区域中每个小区域的校正剂量的校正剂量的装置40，其中考虑到邻近效应的影响，并且校正与绘图图形相对应的电子束的剂量; 控制装置37，用于当应用具有校正剂量的电子束时，计算存储在基板中的能量的量，通过将能量与规定的理论值进行比较来计算误差，以及确定装置40的操作精度用于计算校正剂量; 显示装置67; 以及数据验证支持装置61，用于允许显示装置67针对每个小区域显示校正剂量被明显分层的信息。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2005079392A Method for generating image drawing data 审中-公开
标题翻译：生成图像数据的方法
公开(公告)号：JP2005079392A
公开(公告)日：2005-03-24
申请号：JP2003309139
申请日：2003-09-01
申请人： Toshiba Corp , Toshiba Mach Co Ltd , 東芝機械株式会社 , 株式会社東芝
发明人： HARA SHIGEHIRO , HIGURE HITOSHI , MURAKAMI EIJI , OGAWA YOJI , TSUCHIYA SEIICHI , KASAHARA ATSUSHI
IPC分类号： G03F1/20 , G03F1/68 , G03F7/20 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a method capable of preventing a step difference between patterns from being unnecessarily too small or too large after division of an image so as to reduce an image drawing time and enhance the image drawing accuracy in the case of generating image drawing data from design data. SOLUTION: In the image drawing data generating method wherein a pattern 11 with a slope whose angle is an optional angle other than an integer multiple of 45 degrees in the design data is slit into patterns 12 with a rectangle or a trapezoid with a slope with an angle of 45 degrees to generate the image drawing data, the direction of slit division and the kind of division graphics are specified in response to the optional angle and the division width is determined so that step differences between adjacent patterns after slit division are within a prescribed permissible range. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种能够防止图案之间的步进差异在分割图像之后不必要地太小或太大以致于减少图像绘制时间并提高图像绘制精度的方法从设计数据生成图像绘图数据。解决方案：在图形绘制数据生成方法中，其中在设计数据中具有角度为45度的整数倍以外的角度的斜率的图案11被切成具有矩形或梯形的图案12，以45度的角度倾斜以产生图像绘制数据，响应于可选角度来指定狭缝分割的方向和分割图形的种类，并且确定分割宽度，使得狭缝分割之后的相邻图案之间的阶梯差为在规定的允许范围内。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2008177604A Electron beam drawing system and control method thereof 有权
公开(公告)号：JP2008177604A
公开(公告)日：2008-07-31
申请号：JP2008095027
申请日：2008-04-01
申请人： Toshiba Corp , 株式会社東芝
发明人： SHIMIZU MITSUKO , ABE TAKAYUKI , YASUSE HIROTO , OKI SUSUMU , KAMIKUBO TAKASHI , MURAKAMI EIJI , HATTORI YOSHIAKI , IIJIMA TOMOHIRO , HIGURE HITOSHI , MATSUKI KAZUTO
IPC分类号： H01L21/027 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To diagnose the presence or absence of abnormality, such as a correction calculation error in proximity effect, and to locate an abnormal place easily. SOLUTION: An electron beam drawing system 60 comprises: an electron beam drawing means 2 for drawing a desired graphic pattern by irradiating the surface of a substrate with electron beams; a means 40 for computing a correction dosage for calculating a correction dosage for each small region in a drawing region, where the influence of the proximity effect is considered and the dosage of electron beams corresponding to the drawing graphic pattern is corrected; a control means 37 for calculating the amount of energy stored in the substrate when the electron beams having the corrected dosage are applied, calculating an error by comparing the amount of energy with a prescribed theoretical value, and determining precision in the operation of the means 40 for computing the correction dosage; a display means 67; and a data verification support means 61 for allowing the display means 67 to display information, where the corrected dosage is layered visibly, for each small region. COPYRIGHT: (C)2008,JPO&INPIT

4. 发明专利

JPH11274036A Charged beam drawing apparatus 失效
标题翻译：充电光束绘图设备
公开(公告)号：JPH11274036A
公开(公告)日：1999-10-08
申请号：JP7388898
申请日：1998-03-23
申请人： Toshiba Corp , 株式会社東芝
发明人： HARA SHIGEHIRO , MURAKAMI EIJI , HIGURE HITOSHI , OKUZONO KAZUYUKI , YAMAGUCHI TOSHIO , MATSUKI KAZUTO , KOIKARI SOUJI , TAMAMUSHI SHUICHI
IPC分类号： H01J37/147 , G03F7/20 , H01J37/302 , H01L21/027
CPC分类号： G03F7/704 , H01J37/3026 , H01J2237/3175
摘要： PROBLEM TO BE SOLVED: To perform multi-drawing where deflection boundary is shifted, without increasing the amount of drawing data. SOLUTION: In this electron beam drawing apparatus for drawing a desired pattern on the surface of a specimen through deflection of an electron beam by means of deflectors, a magnetic disk 31 where drawing data divided into a plurality of frames is stored, a pattern region extracting unit 41 for extracting the drawing data of a frame unit in order which are inputted from the magnetic disk 31, a pattern data dividing unit 42 for dividing the extracted data into pattern data whose size is at most subfield size which can be deflected by a subdeflector 23d having a minimum deflection width, and a pattern data memory 32 for temporarily storing divided pattern data is installed. Stripes where deflection boundary is shifted are constituted by using stored pattern data, and drawing is performed by every constituted stripe.
摘要翻译：要解决的问题：在不增加绘图数据量的情况下进行偏移边界偏移的多次绘图。解决方案：在用于通过偏转器偏转电子束在试样表面上画出期望图案的电子束描绘装置中，存储分割成多个帧的绘图数据的磁盘31，提取图形区域单元41，用于从磁盘31输入的顺序提取帧单元的绘图数据;图形数据分割单元42，用于将提取的数据划分为尺寸最大为子字段尺寸的图形数据，该尺寸可以由子反转器偏转 23d具有最小的偏转宽度，以及用于临时存储划分的图案数据的图案数据存储器32。通过使用存储的图案数据构成偏移边界偏移的条纹，并且通过每个构成的条纹进行绘制。

5. 发明专利

JPH11274025A Method of forming pattern writing data 失效
标题翻译：形成图案数据的方法
公开(公告)号：JPH11274025A
公开(公告)日：1999-10-08
申请号：JP6988198
申请日：1998-03-19
申请人： Toshiba Corp , 株式会社東芝
发明人： MURAKAMI EIJI , HIGURE HITOSHI , HARA SHIGEHIRO
IPC分类号： H01L21/027 , G03F1/20 , G03F1/68 , G03F7/20 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To reduce the data quantity for forming a pattern on a sample, using a multiple stage deflection writing apparatus by doing a process of re-expressing with a new writing pattern by joining a plurality of adjacent patterns in the same minimum sub-scanning region after forming sub-scanning data. SOLUTION: After applying a hierarchical graphic arithmetic operation to hierarchically optimized design pattern data, a cell larger than the sub-deflection scanning region (sub-field) B size is divided into sub-fields, a plurality of adjacent patterns a-g in the sub-field B are joined so as to determine if they can be expressed with new patterns, and if possible, compression is done to replace with new patterns g-y. Finally, cells are sorted in frames to finish forming writing data. In this way, by expressing figures in a sub-field B adjacent figures to be joined with new figures, compression of the figures which could not be compressed is made possible.
摘要翻译：要解决的问题：为了减少用于在样品上形成图案的数据量，通过使用多级偏转写入装置，通过在相同的最小子级中连接多个相邻图案，通过使用新的写入模式重新表达的处理来减少形成副扫描数据后的扫描区域。解决方案：在对分级优化的设计图案数据应用分层图形运算操作之后，将大于副偏转扫描区域（子场）B大小的单元划分为子场，子区域中的多个相邻图案ag，字段B被连接以确定它们是否可以用新的模式表达，并且如果可能的话，压缩被替换为新的模式。最后，单元格以框架排序以完成写入数据。以这种方式，通过在与新图连接的相邻图形的子场B中表示图形，使得不能压缩的图形的压缩成为可能。

6. 发明专利

JP2005072055A Charged particle beam writing method, charged particle beam writing apparatus, writing data forming method, and writing control program 审中-公开
标题翻译：充电颗粒光束写入方法，充电颗粒光束写入装置，写入数据形成方法和写入控制程序
公开(公告)号：JP2005072055A
公开(公告)日：2005-03-17
申请号：JP2003209069
申请日：2003-08-27
申请人： Toshiba Corp , Toshiba Mach Co Ltd , 東芝機械株式会社 , 株式会社東芝
发明人： HATTORI YOSHIAKI , HIGURE HITOSHI , MURAKAMI EIJI , HORIUCHI TOMOYUKI
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To enhance writing throughput by dividing writing data while taking account of a shot division system of hardware.
SOLUTION: In an electron beam writing method where a writing area on the surface of a sample is divided into a plurality of fields dependent on the deflection width of a beam scanning deflector, mask data of the entire writing area is divided while imparting a specified margin to each field, and a pattern is written on the basis of the divided mask data by a shot division system for each field, an optimal figure size is calculated in each field area when a pattern included in the mask data is divided at the field boundary, a figure dividing position is determined from the optimal figure size, and the pattern is divided at the figure dividing position if it exists in the boundary margin of the field area otherwise divided at the field boundary.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过在考虑到硬件的分割系统的同时分割写入数据来提高写入吞吐量。解决方案：在电子束写入方法中，将样品表面上的写入区域分成取决于束扫描偏转器的偏转宽度的多个场，整个写入区域的掩模数据被分割，同时赋予对于每个场指定的余量，并且通过用于每个场的拍摄分割系统基于划分的掩码数据写入模式，当包括在掩码数据中的模式被划分为每个场区域时，在每个场区域中计算最佳图形大小场边界，数字分割位置是根据最佳图形大小确定的，并且如果图形存在于场区域的边界，否则在图形划分位置被划分，否则在场边界被划分。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JPH11273854A Automatic welding method and apparatus thereof, and welded structure 失效
标题翻译：自动焊接方法及其设备及焊接结构
公开(公告)号：JPH11273854A
公开(公告)日：1999-10-08
申请号：JP7925798
申请日：1998-03-26
申请人： Toshiba Corp , 株式会社東芝
发明人： HONDA KEIZO , MURAKAMI EIJI , HINATAYA HIROSHI
IPC分类号： H05B7/20 , B23K9/02 , B23K9/16 , H05B7/148
CPC分类号： Y02P10/256 , Y02P10/259
摘要： PROBLEM TO BE SOLVED: To perform horizontal-attitude and all-attitude welding, with high quality and high efficiency a welded structure. SOLUTION: In welding, when a molten pool is formed on a welded structure 20 by generating a welding arc between a welding torch 24 and the welded structure 20, a welding wire 28 is melted by the welding arc, and a globule thereof is transferred to the molten pool, the welding torch 24 is caused to make weaving motion in a direction substantially normal to the direction of a welding joint 21 of the welded structure 20 and a peak period of welding current supplied to the welding torch 24 is caused to coincide with an upward motion period of the weaving motion of the welding torch 24.
摘要翻译：要解决的问题：进行水平姿态和全姿态焊接，具有高质量和高效率的焊接结构。解决方案：在焊接中，当通过在焊炬24与焊接结构20之间产生焊接电弧而在焊接结构体20上形成熔池时，焊丝28被焊接电弧熔化，并将其小球转移到熔池，使焊炬24沿与焊接结构体20的焊接接头21的方向大致正交的方向进行编织运动，使供给到焊炬24的焊接电流的高峰期间与焊炬24的织造运动的向上运动周期。

8. 发明专利

JP2000156342A ELECTRON BEAM LITHOGRAPHY SYSTEM AND METHOD FOR CONTROLLING THE SAME 失效
公开(公告)号：JP2000156342A
公开(公告)日：2000-06-06
申请号：JP37531198
申请日：1998-12-14
申请人： TOSHIBA CORP
发明人： SHIMIZU MITSUKO , ABE TAKAYUKI , YASUSE HIROTO , OKI SUSUMU , KAMIKUBO TAKASHI , MURAKAMI EIJI , HATTORI YOSHIAKI , IIJIMA TOMOHIRO , HIGURE HITOSHI , MATSUKI KAZUTO
IPC分类号： H01J37/305 , G03F1/76 , G03F1/78 , G03F7/20 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide an electron beam lithography system which self-diagnoses the presence/absence of abnormality, such as the proximity effect correction calculating error, etc., and, at the same time, makes abnormal spot specification easier and a method for controlling the system. SOLUTION: An electron beam lithography system 60 is provided with an electron beam lithography means 2 which plots a desired graphic pattern by projecting an electron beam upon the surface of a substrate, and a corrected emitting quantity calculating means 40 which is obtained by correcting the emitting quantity of the electron beam corresponding to the plotted graphic pattern at every small area in a plotting area by taking the influence of proximity effects into account. The system 60 is also provided with a control means 37 which discriminates the operational accuracy of the calculating means 40 by calculating the quantity of the energy stored in the substrate, when the substrate is irradiated with the electron beam with the corrected emitting quantity and an error by comparing the quantity of the energy with a prescribed theoretical value, a displaying means 67, and a data verification supporting means 61 which causes the displaying means 67 to display the visually hierarchized information of the corrected emitting quantity at every small area.

9. 发明专利

JP2000021747A METHOD OF CHARGED-BEAM DRAWING 失效
公开(公告)号：JP2000021747A
公开(公告)日：2000-01-21
申请号：JP19951198
申请日：1998-06-30
申请人： TOSHIBA CORP
发明人： MURAKAMI EIJI , HARA SHIGEHIRO , HIGURE HITOSHI
IPC分类号： G03F1/76 , G03F7/20 , H01J37/305 , H01J37/317 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To determine optimum stage movement speed that is free from drawing error for each frame region by defining stage movement speed for drawing of a frame region by the slowest speed among block drawing speeds of block units that are extracted from a specified number of continuing small regions. SOLUTION: A frame region is divided, starting from its frame origin, into small regions of specified widths, and drawing time for each is obtained. Then, a specified number of small regions continuously positioned from a starting one are extracted from block units to form a block (S3). In the next step, drawing time for each block is obtained, and is denoted as the block drawing time (S4). After the final small region is extracted (S7), speed calculation is performed (S9). This speed calculation is done by dividing the block width by the longest time among the block drawing times. This calculated speed is adopted as the stage movement speed for drawing process of the frame region.

10. 发明专利

JPH10261568A METHOD FOR PREPARING CHARGED BEAM LITHOGRAPHY DATA 失效
公开(公告)号：JPH10261568A
公开(公告)日：1998-09-29
申请号：JP6514997
申请日：1997-03-18
申请人： TOSHIBA CORP
发明人： MURAKAMI EIJI , HIGURE HITOSHI , HARA SHIGEHIRO , KOYAMA KIYOMI , ABE TAKAYUKI
IPC分类号： G03F1/20 , G03F1/68 , H01J37/302 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To reduce data without increasing conversion time from the design data of lithography data that are supplied to an electron beam lithography device. SOLUTION: A method is a technique for drawing a pattern using an electron beam lithography device in multiple-stage polarization system with a main polarizer 33 and sub polarizer 34 and electron beam data are prepared to prepare lithography data from design data. At this time, before a pattern with a size exceeding the minimum sub polarization scanning region size is divided when preparing sub polarization data, the pattern with this size is divided into a pattern that is equal to or less than the polarization scanning region size and is expressed before preparing the sub-polarization lithography data. Also, after an overwrapping cell array existing in the design data is changed to the structure of a non-overwrapping cell array, a hierarchical figure operation processing and a format processing are performed.

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