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    • 3. 发明专利
    • Method for manufacturing wafer with few surface defects, wafer obtained by said method, and electronic component made of the wafer
    • 用于制造具有较少表面缺陷的波形的方法,由该方法获得的波形和该波形的电子元件
    • JP2005260225A
    • 2005-09-22
    • JP2005055622
    • 2005-03-01
    • Schott Agショット アーゲーSchott AG
    • BLAUM PETERSPEIT BURKHARDKOEHLER INGORUDINGER BERNDBEIER WOLFRAM
    • B24B1/00B24B37/04H01L21/304H01S5/02
    • B24B37/30B24B37/042
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing wafer substrates, which allows semiconductor components of which semiconductor layers have low-level defects at most and which have no pits especially on their surfaces.
      SOLUTION: A method for manufacturing wafer substrates comprises: a process (a) of polishing at least one of active surfaces, which is to be coated, of a wafer by using a polishing means including polishing components in order to smooth the at least one of the active surfaces; and a process (b) of changing the polishing direction of a polishing tool which polishes the at least one of the active surfaces so that each area or each position of the at least one of the active surfaces is uniformly polished by polishing action of the polishing tool which covers 360° statistically during polishing operation. To eliminate almost all of the surface defects on the at least one of the active surfaces, the at least one of the active surfaces is coated.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种制造晶片基板的方法,其允许半导体层最多具有低水平缺陷并且其表面上没有凹坑的半导体元件。 解决方案:一种用于制造晶片衬底的方法包括:通过使用包括抛光组分的抛光装置来抛光晶片的待涂覆的活性表面中的至少一个的工艺(a),以使光滑 至少一个活动表面; 以及改变研磨工具的抛光方向的方法(b),抛光工具抛光至少一个活性表面,使得至少一个活性表面的每个区域或每个位置通过抛光的抛光作用被均匀抛光 在抛光操作期间统计地覆盖360°的工具。 为了消除至少一个活性表面上的几乎所有的表面缺陷,至少一个活性表面被涂覆。 版权所有(C)2005,JPO&NCIPI
    • 8. 发明专利
    • Beam shaping composite
    • 束形成复合材料
    • JP2006113588A
    • 2006-04-27
    • JP2005297141
    • 2005-10-12
    • Schott Agショット アクチエンゲゼルシャフトSchott AG
    • SCHNELL RUPERTPAWLOWSKI EDGARBEIER WOLFRAM
    • G02B3/00G02B5/18G02B5/32
    • B29D11/00125B29L2011/005
    • PROBLEM TO BE SOLVED: To provide beam shaping elements, such as lenses, diffractive elements or mirrors, which exists as composites, comprising an inorganic substrate and an organic substrate in the form of a polymer, which can be thermally cured at temperature between 0 and 180°C.
      SOLUTION: Preferably, the organic polymer is selected from the group consisting of polyurethanes and silicones. According to a preferred embodiment, it is a polyurethane. The beam forming element in accordance with this invention has advantageous characteristics in precision, rigidity and durability and the element is easily manufactured by a low cost method which is the further objective of this invention.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供作为复合材料存在的诸如透镜,衍射元件或反射镜的束形成元件,包括无机基底和聚合物形式的有机基底,其可以在温度下热固化 在0和180℃之间。

      解决方案:优选地,有机聚合物选自聚氨酯和聚硅氧烷。 根据优选实施方案,它是聚氨酯。 根据本发明的梁形成元件在精度,刚性和耐久性方面具有有利的特性,并且通过本发明的另一目的的低成本方法容易地制造元件。 版权所有(C)2006,JPO&NCIPI