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1. 发明专利

JP2014110359A Minimal manufacturing device, production line and method of rearranging production line 有权
标题翻译：最小制造装置，生产线及后期生产线的方法
公开(公告)号：JP2014110359A
公开(公告)日：2014-06-12
申请号：JP2012264850
申请日：2012-12-04
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所 , Design Network Co Ltd , 株式会社デザインネットワーク
发明人： HARA SHIRO , MAEKAWA HITOSHI , NAKANO ZEN , KUMPUAN SOMAWANG , FUTAGAWA SHINJI , IIDA MINORU
IPC分类号： H01L21/02
摘要： PROBLEM TO BE SOLVED: To quickly, safely and securely rearrange a production line using minimal manufacturing devices.SOLUTION: A pair of leg parts is provided in parallel in portions positioned right below a left side wall and a right side wall of a bottom plate 36 of a minimal manufacturing device body. A space to which a lifting mechanism 25 of a conveyance device 14 is inserted is formed in a portion sandwiched by the pair of leg parts right below the bottom plate 36. A fixing structure 16 for supporting the bottom plate 36 is provided on a floor surface. A position leg 42 and a connection mechanism 71 are provided on the pair of leg parts and the bottom plate. A V-groove base 66 is provided on the position facing the positioning leg 42 on the fixing structure 16. The positioning leg 42 is brought into contact with the V-groove base 66 to position and support the bottom plate 36 when the bottom plate 36 descends toward the fixing structure 16.
摘要翻译：要解决的问题：使用最少的制造装置快速，安全和安全地重新排列生产线。解决方案：一对腿部部件平行设置，位于底板36的左侧壁和右侧壁的正下方的最小制造装置主体。输送装置14的提升机构25的空间形成在底板36的正下方被夹在该对腿部之间的部分内。支撑底板36的固定结构16设置在地面。位置支腿42和连接机构71设置在该对腿部和底板上。 V形槽底座66设置在与固定结构16上的定位支脚42相对的位置上。定位支脚42与V形槽底座66接触，以便当底板36 下降到固定结构16。

2. 发明专利

JP2005089273A Crystal defect restoration method, crystal production method, pattern formation method, and x-ray dose detection body 有权
标题翻译：晶体缺陷恢复方法，晶体生产方法，图案形成方法和X射线剂量检测体
公开(公告)号：JP2005089273A
公开(公告)日：2005-04-07
申请号：JP2003328437
申请日：2003-09-19
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： OGISO HISATO , NAKANO ZEN , AKETO JUN
IPC分类号： C30B33/04 , C30B31/22 , H01L21/265
摘要： PROBLEM TO BE SOLVED: To provide a method by which a crystal defect can be restored without causing temperature rise, and a method by which the crystal defect of nonmetal can be easily controlled.
SOLUTION: Ions are implanted into the central part 12 of a substrate 1 consisting of a magnesium oxide single crystal. Thereby, the ion implanted part becomes a colored area 2. The surface of the substrate 1 where the colored area 2 is formed is irradiated with X-rays in such a state that a mask having a circular hole at its center is mounted on the substrate. Thereby, the color of the circular part irradiated with X-ray of the colored area 2 is thinned, and a circular pattern 3 is formed.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供可以在不引起温度升高的情况下恢复晶体缺陷的方法，以及可以容易地控制非金属的晶体缺陷的方法。解决方案：将离子注入到由氧化镁单晶构成的衬底1的中心部分12中。由此，离子注入部分成为着色区域2.在形成有着色区域2的基板1的表面上，在其中心具有圆形孔的掩模安装在基板上的状态下被照射X射线。由此，用着色区域2的X射线照射的圆形部分的颜色变薄，并且形成圆形图案3。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2008298528A Optical film thickness monitor and coating device using the same 审中-公开
标题翻译：光学薄膜厚度监测器和涂层设备
公开(公告)号：JP2008298528A
公开(公告)日：2008-12-11
申请号：JP2007143674
申请日：2007-05-30
申请人： National Institute Of Advanced Industrial & Technology , Nec Corp , 日本電気株式会社 , 独立行政法人産業技術総合研究所
发明人： NAKADA MASABUMI , AKETO JUN , TSUDA HIROKI , IWATA ATSUSHI , NAKANO ZEN
IPC分类号： G01B11/06 , G01N21/45
摘要： PROBLEM TO BE SOLVED: To provide an optical film thickness monitor which is suitable for aerosol deposition (AD method) and is used for on-the-spot measurement, and to provide a coating device that uses the same.
SOLUTION: This optical film thickness monitor is used for a coating device, wherein ultrafine-particle brittle materials supplied onto a substrate 49, are loaded with a mechanical impact force to cause the brittle materials to join to each other, and a compact is formed. White light is inputted into the compact from an end face of a measuring probe 410, to measure the reflectance spectra coming from the compact, and the film thickness and reflectance of the compact are derived from the interfering state of the reflectance spectrum, under conditions where the wavelength band of the reflectance spectrum is larger than the particle diameters of the brittle materials.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供适用于气溶胶沉积的光学膜厚度监测器（AD方法）并用于现场测量，并提供使用它的涂覆装置。解决方案：该光学膜厚度监视器用于涂覆设备，其中提供到基底49上的超微粒脆性材料被加载机械冲击力以使脆性材料彼此接合，并且紧凑形成了。将白光从测量探头410的端面输入到压缩体中，以测量来自压块的反射光谱，并且压片的膜厚度和反射率源自反射光谱的干涉状态，反射光谱的波长带大于脆性材料的粒径。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2005353344A Extraction electrode and analysis method using it 有权
标题翻译：提取电极及其分析方法
公开(公告)号：JP2005353344A
公开(公告)日：2005-12-22
申请号：JP2004170881
申请日：2004-06-09
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAKANO ZEN , OGISO HISATO , AKETO JUN
IPC分类号： H01J27/26 , H01J49/16 , G01N13/10
摘要： PROBLEM TO BE SOLVED: To provide an extraction electrode capable of improving stability and accuracy of observation and measurement, in relation to an extraction electrode incorporated in a device for observing and measuring a sample of a scanning atom probe (SAP), an electric field ion type microscope or the like as an ion source or an electron source.
SOLUTION: This extraction electrode 1 comprises an electrode part 2 and an insulating layer 3, is formed into a funnel-like shape as a whole, and has a hole 4 for passing ions vaporized from a sample formed at a tip. The electrode part 2 is formed by using platinum, tungsten or the like as a material; the insulating layer 3 is formed by an aerosol deposition method by using a material having a low dielectric constant such as alumina; the insulating layer 3 is slightly projected from the tip of the electrode part 2; and a space is formed between the tip of the extraction electrode 1 and a surface of the sample by the projecting amount thereof.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供能够提高观察和测量的稳定性和精度的提取电极，关于结合在用于观察和测量扫描原子探针（SAP）的样品的装置中的提取电极，电场离子型显微镜等作为离子源或电子源。解决方案：该引出电极1包括电极部分2和绝缘层3，整体形成为漏斗状，并且具有用于使从形成在尖端处的样品蒸发的离子通过的孔4。电极部2通过使用铂，钨等作为材料形成; 通过使用具有低介电常数的材料如氧化铝，通过气溶胶沉积法形成绝缘层3; 绝缘层3从电极部分2的尖端略微突出; 并且在引出电极1的尖端和样品的表面之间形成有其突出量的空间。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2014212303A ステージ式のプラズマエッチング装置有权
标题翻译：阶段式等离子体蚀刻装置
公开(公告)号：JP2014212303A
公开(公告)日：2014-11-13
申请号：JP2014035553
申请日：2014-02-26
申请人：独立行政法人産業技術総合研究所 , National Institute Of Advanced Industrial & Technology
发明人： SHIMIZU SADAKI , NAKANO ZEN , OGISO HISATO , HARA SHIRO , TANAKA HIROYUKI , FUTAGAWA SHINJI , YOSHIOKA HIDEAKI , FUKUDA TAKAHIRO , UCHIYAMA YOSHINORI , KUMPUAN SOMAWANG
IPC分类号： H01L21/3065 , H05H1/46
CPC分类号： H01L21/30 , H05H1/46
摘要：【課題】小さなウェハであっても精度良くエッチングすることができるプラズマエッチング装置を提供する。【解決手段】本発明は、ウェハWが設置されるステージ6と、ステージ6を覆うチャンバ5と、チャンバ5内を真空引きする真空形成装置11と、チャンバ5のステージ6に対向する位置に設けられエッチングガスGをウェハWに吹き付けるための管状のガス供給管5dと、ステージ6に設けられこのステージ6に設置されるウェハWを含む領域にプラズマを発生させてエッチングガスGをイオン化およびラジカル化させるRF印可板6dとを具備した構成とされている。【選択図】図1
摘要翻译：要解决的问题：提供能够精确地蚀刻甚至小晶片的等离子体蚀刻装置。解决方案：本发明的等离子体蚀刻装置包括：设置有晶片W的载物台6; 覆盖舞台6的腔室5; 真空成型装置11抽空室5的内部; 用于将蚀刻气体G喷射到晶片W的管状气体供给管5d，管状气体供给管设置在与腔室5的台部6相对的位置; 以及设置在载物台6上并在区域中产生等离子体的RF施加板6d，使得蚀刻气体G被离子化并转化成自由基，包括设置在载物台6上的晶片W的区域。

6. 发明专利

JP2014108744A Transporter for minimal device 有权
标题翻译：最小装置运输机
公开(公告)号：JP2014108744A
公开(公告)日：2014-06-12
申请号：JP2012264853
申请日：2012-12-04
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所 , Design Network Co Ltd , 株式会社デザインネットワーク
发明人： HARA SHIRO , MAEKAWA HITOSHI , NAKANO ZEN , KUMPUAN SOMAWANG , IIDA MINORU
IPC分类号： B62B3/06 , B66F9/06
摘要： PROBLEM TO BE SOLVED: To provide a transporter utilizing speciality of a minimal device.SOLUTION: The transporter has a frame 48 supported by a wheel to a floor surface and a pair of first arms 72 for lifting up and down a first supporting arm 80 to a floor surface with one point on the frame 48 serving as a supporting point and which are bar-shaped and a pair of second arms 74 for lifting up and down a second supporting arm 82 to a floor surface with one point on the frame 48 serving as a supporting point and which are bar-shaped. They support a lifting plate 42. On the frame 48, a wedge guide 78 moving toward a cross direction to the frame 48 with a wedge-shaped inclined plane contacting with a lower surface of the first supporting arm 80 of the first arms 72 is supported. The wedge guide 78 lifts up the first supporting arm 80 when it moves to one direction while contacting with the lower surface of the first supporting arm 80 of the first arms 72, and lifts down the first supporting arm 80 when it moves to the other direction.
摘要翻译：要解决的问题：提供利用最小装置的特性的运输机。解决方案：运输机具有由车轮支撑到地板表面的框架48和用于将第一支撑臂80上升和下降的一对第一臂72 框架48上的一个点作为支撑点并且是棒状的地板表面和用于将第二支撑臂82上升和下降到地板表面上的一对第二臂74，其中一个点在框架48上服务作为支撑点，是棒状的。它们支撑提升板42.在框架48上，楔形引导件78以与第一臂72的第一支撑臂80的下表面接触的楔形倾斜平面朝向框架48的横向方向移动，。楔形引导件78在第一支撑臂80向第一臂72的第一支撑臂80的下表面移动同时向一个方向移动时提升第一支撑臂80，并且当第一支撑臂80向另一方向。

7. 发明专利

JP2005129370A Cell for solid oxide fuel battery and its manufacturing method 有权
标题翻译：固体氧化物燃料电池及其制造方法
公开(公告)号：JP2005129370A
公开(公告)日：2005-05-19
申请号：JP2003364009
申请日：2003-10-24
申请人： National Institute Of Advanced Industrial & Technology , Nissan Motor Co Ltd , 日産自動車株式会社 , 独立行政法人産業技術総合研究所
发明人： KUSHIBIKI KEIKO , SATO NORITOSHI , AKETO JUN , NAKANO ZEN
IPC分类号： H01M8/02 , H01M8/12
CPC分类号： Y02P70/56
摘要： PROBLEM TO BE SOLVED: To provide a cell for a solid oxide fuel battery superior in thermal shock resistance and a manufacturing method by which such cell for fuel battery can be manufactured at low cost and with superior productivity. SOLUTION: This is the cell for the solid oxide fuel battery in which an electrolyte layer 2 composed of a solid oxide such as, for example, stabilized zirconia, ceria based solid solution, bismuth oxide is formed on a substrate 1 which is made of a heat-resistant metal containing, for example, nickel and chromium and has a porous portion having a dense gas non-permeable portion and a porous portion having gas permeability so as to cover the above porous portion 1a, and an air electrode 4 and a fuel electrode 5 are formed interposing this electrolyte layer 2 in between. The above electrolyte layer 2 is formed by an aerosol deposition method. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种耐热冲击性优异的固体氧化物燃料电池的电池，并且可以以低成本和优异的生产率制造这种燃料电池用电池。解决方案：这是用于固体氧化物燃料电池的电池，其中在基板1上形成由固体氧化物（例如稳定的氧化锆），二氧化铈基固溶体，氧化铋构成的电解质层2，其为由含有例如镍和铬的耐热金属制成，具有密闭的气体不可渗透部分的多孔部分和具有透气性的多孔部分以覆盖上述多孔部分1a，空气电极4 并且在该电解质层2之间形成有燃料电极5。上述电解质层2由气溶胶沉积法形成。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2003080084A Surface of catalyst supporting body and manufacturing method therefor 有权
标题翻译：催化剂表面支撑体及其制造方法
公开(公告)号：JP2003080084A
公开(公告)日：2003-03-18
申请号：JP2001272028
申请日：2001-09-07
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： ISHIZUKA MASANORI , NAKANO ZEN , OGISO HISATO
IPC分类号： B01J37/00 , B01J23/52
摘要： PROBLEM TO BE SOLVED: To provide a technique for dispersing and fixing nano-scale sized catalystic metal particles on a minute optional region of the surface of a supporting body in an optional shape.
SOLUTION: The surface of the catalyst supporting body is formed by etching a surface layer part 16 of a substrate into which the catalyst metal is ion- implanted to expose the catalyst metal. Or the catalyst metal is ion-implanted on the surface layer part 16 of the substrate 12, and next, the surface layer part 16 is etched to expose the implanted catalyst metal. Further, the surface of the catalyst supporting body 14 formed by etching the surface layer part 16 of the substrate in which the catalyst metal is ion-implanted to expose the catalyst metal is etched to be regenerated.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种将纳米尺寸的催化剂金属颗粒分散并固定在支撑体表面的微小任意区域上的技术，其任意形状。解决方案：催化剂载体的表面通过蚀刻离子注入催化剂金属以暴露催化剂金属的基底的表面层16形成。或者将催化剂金属离子注入到基板12的表面层16上，然后蚀刻表面层16以露出注入的催化剂金属。此外，通过蚀刻通过蚀刻催化剂金属被离子注入以暴露催化剂金属的衬底的表面层部分16形成的催化剂支撑体14的表面被蚀刻以被再生。

9. 发明专利

JP2014212302A ノズル式のプラズマエッチング装置有权
标题翻译：喷嘴类型等离子体蚀刻装置
公开(公告)号：JP2014212302A
公开(公告)日：2014-11-13
申请号：JP2014035544
申请日：2014-02-26
申请人：独立行政法人産業技術総合研究所 , National Institute Of Advanced Industrial & Technology
发明人： SHIMIZU SADAKI , NAKANO ZEN , OGISO HISATO , HARA SHIRO , TANAKA HIROYUKI , FUTAGAWA SHINJI , YOSHIOKA HIDEAKI , FUKUDA TAKAHIRO , UCHIYAMA YOSHINORI , KUMPUAN SOMAWANG
IPC分类号： H01L21/3065 , H05H1/46
CPC分类号： H01L21/30 , H05H1/46
摘要：【課題】小さなウェハであっても精度良くエッチングできるプラズマエッチング装置を提供する。【解決手段】本発明は、ウェハWが設置されるステージ6と、ステージ6を覆うチャンバ5と、チャンバ5内を真空引きする真空形成装置11と、チャンバ5に対向する位置に設けられたガス供給管5dと、ガス供給管5dの先端側の内部に取り付けられ、このガス供給管5dから供給されるエッチングガスGをウェハWへ略均等に吹き付けさせるノズル7と、ガス供給管5dに取り付けられガス供給管5d内のエッチングガスG中にマイクロプラズマを発生させるとともにラジカルを生成させるLF印加部8とを具備した構成とされている。【選択図】図1
摘要翻译：要解决的问题：提供能够精确地蚀刻甚至小晶片的等离子体蚀刻装置。解决方案：本发明的等离子体蚀刻装置包括：设置有晶片W的载物台6; 覆盖舞台6的腔室5; 真空成型装置11抽空室5的内部; 设置在面向室5的位置的气体供给管5d; 安装在气体供给管5d的前端侧的喷嘴7，在晶片W上大致均匀地喷射蚀刻气体G，通过气体供给管5d供给蚀刻气体G; 以及安装在气体供给管5d上的LF施加部8，在气体供给管5d内的蚀刻气体G中产生支原体，形成自由基。

10. 发明专利

JP2009045706A On-demand type manufacturing device 有权
标题翻译：需求类型制造设备
公开(公告)号：JP2009045706A
公开(公告)日：2009-03-05
申请号：JP2007214759
申请日：2007-08-21
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： NAKANO ZEN , ASHIDA KIWAMU , AKETO JUN , BOKU SAIKAKU
IPC分类号： B23Q41/02
摘要： PROBLEM TO BE SOLVED: To provide an on-demand type manufacturing device which enables manufacturing of a small component by a small device, and can effectively produce small amounts and multiple kinds of products.
SOLUTION: A production line 1 is constituted by placing processing devices A, B, C, D and E in a row which are used for performing different processing, heat treatment, and inspection as shown in Fig. 1(a). After performing processing for manufacturing a specific product in sequence by using the production line 1, the production line 1 is disassembled for the production of other products as shown in (b). Then an intermediate product is manufactured by a production line 2 constituted by placing processing devices F, A, E in a row while adding additional processing device F as shown in (c). Then processing of the intermediate product is performed by a production line 3 constituted by placing processing devices D, E, C in a row. On the other hand, a second product is manufactured from the same intermediate product by processing devices C, F, B in another production line 4. The positions of installation platforms of work of each processing device are unified. Then the work is transferred to a certain position regardless of what the adjacent processing device is, and the next processing device processes it.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够通过小型装置制造小型部件的按需型制造装置，能够有效地生产少量和多种产品。解决方案：生产线1通过将处理装置A，B，C，D和E放置在用于进行不同处理，热处理和检查的行中来构成，如图1所示。 1（a）。在通过使用生产线1进行制造特定产品的处理之后，如（b）所示，生产线1被分解以生产其他产品。然后，如（c）所示，通过将处理装置F，A，E配置成一行而添加附加处理装置F的生产线2制造中间产品。然后，通过将处理装置D，E，C排列成一行的生产线3进行中间制品的加工。另一方面，通过在另一条生产线4中的加工装置C，F，B由相同的中间产品制造第二产品。每个加工装置的工作安装平台的位置是统一的。然后将工作转移到某个位置，而不管相邻的处理装置是什么，下一个处理装置处理它。版权所有（C）2009，JPO＆INPIT

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