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1. 发明专利

JP2006074065A Inspection device of sample 审中-公开
标题翻译：样品检验装置
公开(公告)号：JP2006074065A
公开(公告)日：2006-03-16
申请号：JP2005305912
申请日：2005-10-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , HONDA TOSHIFUMI , NAKAGAKI AKIRA , KUROSAKI TOSHISHIGE , OZAWA YASUHIKO
IPC分类号： H01L21/66 , G01N23/223 , G01N23/225 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To increase inspection efficiency in detailed inspection of defect which is performed on the basis of inspection information of defect inspection.
SOLUTION: For example, contaminations and defects which are detected with a defect inspection device 1 are inspected in detail with a detailed inspection device 3 using SEM and the like, and the cause of the occurrence and the like are clarified. Before performing the detailed inspection, contaminations and defects which are detected with the defect inspection device 1 are inspected with an attribute inspection device using optical microscope and the like, and each attribute is searched for. The defects and contaminations are classified into a type which needs the detailed inspection and a type which does not need the detailed inspection or a type which can not be performed the detailed inspection, based on the attributes. Only contaminations and defects which need the detailed inspection are inspected with the detailed inspection device 3.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：根据缺陷检查的检查信息进行的缺陷的详细检查，提高检查效率。解决方案：例如，使用SEM等详细检查装置3来详细检查用缺陷检查装置1检测的污染物和缺陷，并且说明发生的原因等。在进行详细检查之前，使用光学显微镜等用属性检查装置检查用缺陷检查装置1检测到的污染物和缺陷，并搜索每个属性。根据属性，将缺陷和污染分为需要详细检查的类型和不需要详细检查的类型或不能进行详细检查的类型。只需要详细检查的污染物和缺陷，请仔细检查。3.版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2010080969A Method and apparatus for observation of sample 有权
标题翻译：用于观察样品的方法和装置
公开(公告)号：JP2010080969A
公开(公告)日：2010-04-08
申请号：JP2009265869
申请日：2009-11-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , SHIMODA ATSUSHI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI , SHISHIDO CHIE
IPC分类号： H01L21/66 , G01N21/956 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for observation of a sample by which, upon detailed inspection of a defective part of the sample by means of magnification or the like, the amount of stage movement is reduced as little as possible to shorten image acquiring time thereby effectively observing defects. SOLUTION: The method for observation of the sample includes the steps of: acquiring a reference image not including a defect of the sample by imaging the sample on the basis of information of the defect of the sample detected by an inspection device; adjusting a position of the sample on the basis of the information of the defect of the sample detected by the inspection device so that the defect comes in sight of imaging; acquiring a defect image including the defect of the sample by imaging the sample whose position has been adjusted; detecting the defect in the defect image by comparing the reference image and the defect image; acquiring a magnified image of the defect by imaging a partial region including the detected defect in the sight of imaging; and displaying the magnified image of the defect on a screen. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于观察样品的方法和装置，通过这种方法和装置，通过借助于放大率等对样品的缺陷部分进行详细检查后，台架移动量减少到少至可能缩短图像获取时间，从而有效地观察缺陷。解决方案：用于观察样本的方法包括以下步骤：基于由检查装置检测到的样本的缺陷的信息，通过对样本进行成像来获取不包括样本缺陷的参考图像; 基于由检查装置检测到的样本的缺陷的信息来调整样本的位置，使得缺陷进入成像; 通过对已经调整了位置的样本进行成像来获取包括样本缺陷的缺陷图像; 通过比较参考图像和缺陷图像来检测缺陷图像中的缺陷; 通过在成像的视觉中成像包括检测到的缺陷的部分区域来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2004226328A Appearance inspection system, quality evaluation system using the same and quality evaluation information providing system 审中-公开
公开(公告)号：JP2004226328A
公开(公告)日：2004-08-12
申请号：JP2003016749
申请日：2003-01-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , HIROI TAKASHI , NAKAGAWA YASUO
IPC分类号： G01N21/956 , H01L21/66 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide a technology for miniaturizing an inspector installed at a point of production and easily configuring a process condition of a detected result. SOLUTION: An appearance inspection system for obtaining an image of an inspection object and inspecting an appearance is provided with an image detector 100 for detecting the image of the inspection object and an information processor 200 for processing the image detected by the image detector 100 and determining the existence of abnormality emerging in the image of the inspection object. The image detector 100 and the information processor 200 can be connected through a network 300. The image detector 100 adds a data identifier to at least one of the detected image and its processed data and transmits it to the information processor. The information processor 200 identifies the received image based on the identifier included in the received data and determines the existence of the abnormality. COPYRIGHT: (C)2004,JPO&NCIPI

4. 发明专利

JP2006189462A Inspection method and its device 有权
标题翻译：检验方法及其设备
公开(公告)号：JP2006189462A
公开(公告)日：2006-07-20
申请号：JP2006073725
申请日：2006-03-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： IKEDA YOKO , KONISHI JIYUNKO , IWATA HISAFUMI , TAKAGI YUJI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO
IPC分类号： G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To reduce an analysis time and to improve the analysis accuracy by improving a user interface.
SOLUTION: This device comprises an image pickup apparatus for photographing a plurality of images in a workpiece; a storage means for storing the pickup images picked by the image pickup apparatus; and a displaying means having a first area for displaying the plurality of pickup images stored in the storage means and a plurality of second areas classifying the images according to the feature of the pickup images. This device comprises an analysis unit constituted so as to move the plurality of pickup images from the first area to the second areas on the screen and classify the plurality of pickup images on the second areas.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过改进用户界面来缩短分析时间并提高分析精度。解决方案：该装置包括用于拍摄工件中的多个图像的图像拾取装置; 存储装置，用于存储由图像拾取装置拾取的拾取图像; 以及显示装置，具有用于显示存储在存储装置中的多个拾取图像的第一区域和根据拾取图像的特征对图像进行分类的多个第二区域。该装置包括分析单元，其被构造成将多个拾取图像从第一区域移动到屏幕上的第二区域，并将多个拾取图像分类在第二区域上。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005056907A Method for managing image data and image data service system 审中-公开
标题翻译：管理图像数据和图像数据服务系统的方法
公开(公告)号：JP2005056907A
公开(公告)日：2005-03-03
申请号：JP2003205920
申请日：2003-08-05
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , NINOMIYA TAKANORI , SUGIMOTO ARITOSHI , ISAHAYA KOJI , KANNO JIYUNJIRO , TANABE TORU , KANAMORI JUN
IPC分类号： H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a method for managing image data and an image data service system in which a semiconductor device manufacturer can sustain reliability of a client by prompt action.
SOLUTION: The image data service system comprises a storage device section 42 for accumulating and storing the image of a defect or a candidate of defect being transmitted at least from the review unit and the CD-SEM of a production division 20 through a communication means 30 and the feature amount (defect, or the like) of that image while imparting at least a semiconductor device ID, and a search engine section 43 for searching the defect, or the like, of a semiconductor device relative to the semiconductor device ID based on the defect, or the like, corresponding at least to the semiconductor device ID being inquired through a communication means. The image data service system is further provided with a data base center 40 for providing data of the defect, or the like, corresponding to a relevant semiconductor device searched by the search engine to a semiconductor device manufacturer, a design house or its client through a communication means.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于管理图像数据的方法和图像数据服务系统，其中半导体器件制造商可以通过迅速的行动来维持客户的可靠性。解决方案：图像数据服务系统包括存储装置部分42，用于至少通过审查单元和生产部门20的CD-SEM，通过一个或多个存储装置部分42累积和存储缺陷的图像或缺陷的候选者通信装置30以及至少赋予半导体装置ID的图像的特征量（缺陷等）以及用于搜索半导体装置相对于半导体装置的缺陷等的搜索引擎部43 基于缺陷等的ID，至少对应于通过通信装置查询的半导体器件ID。图像数据服务系统还设置有数据库中心40，用于将与由搜索引擎搜索的相关半导体器件对应的缺陷数据等提供给半导体器件制造商，设计公司或其客户端沟通方式。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2002090312A DEFECT ANALYSIS SYSTEM 失效
公开(公告)号：JP2002090312A
公开(公告)日：2002-03-27
申请号：JP2000287081
申请日：2000-09-21
申请人： HITACHI LTD
发明人： SHIMODA ATSUSHI , ISHIMARU ICHIRO , TAKAGI YUJI , OBARA KENJI , NAKAGAKI AKIRA , WATANABE KENJI
IPC分类号： G01N21/956 , G01N1/28 , G01N1/32 , G01N33/00 , G01N35/00 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To efficiently sort inspected objects having new defects hard to solve by conventional knowledge, out of a large number of objects to be inspected. SOLUTION: This analysis system for defects detected in a plurality of objects to be inspected has an appearance inspection device 100 for detecting defective parts in the inspected objects; a defect classifying device 200 for detecting detailed information in the defective parts and classifying the defects into known defects whose appearance is confirmed, and new defects whose appearance is not confirmed; and a defect analysis device 300 for accepting the assignment of the inspected objects and analyzing the assigned inspected objects. The appearance inspection device 100, the defect classifying device 200 and the defect analysis device 300 can have display devices for displaying the number of defects every classification including the new defects.

7. 发明专利

JP2001256480A AUTOMATIC PICTURE CLASSIFYING METHOD AND ITS DEVICE 失效
公开(公告)号：JP2001256480A
公开(公告)日：2001-09-21
申请号：JP2000065151
申请日：2000-03-09
申请人： HITACHI LTD
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , OBARA KENJI , OZAWA YASUHIKO , KUROSAKI TOSHISHIGE , ISOGAI SHIZUSHI
IPC分类号： G01B11/30 , G01N21/956 , G06F17/30 , G06T1/00 , G06T7/00
摘要： PROBLEM TO BE SOLVED: To secure dassification performance for high fault by permitting instruction data for fault classification which is set at every fault attribute to follow the fluctuation of a manufacturing process. SOLUTION: Featured values are calculated from fault detected from a semi- conductor wafer and assigned in a featured values space, categories are assigned from a distribution in the space as shown in a figure 10(a) and instruction data for fault classification is generated. When fault detected from the wafer is classified into the respective fault attributes, the instruction data is used. When fault is classified, the same processing is performed concerning the fault to be classified, which is detected from the wafer, classification dealing data shown in a figure 10(b) is generated and, then, it is compared with instruction data shown in the figure 10(a). A difference occurs in these kinds of data when a fluctuation exists in the semi-conductor manufacturing process and obtained instruction data is corrected in accordance with the difference when the difference exists.

8. 发明专利

JP2001189358A HIGH-POWER IMAGE AUTOMATIC COLLECTION METHOD AND SYSTEM OF SEMICONDUCTOR WAFER DEFECT 失效
公开(公告)号：JP2001189358A
公开(公告)日：2001-07-10
申请号：JP37266199
申请日：1999-12-28
申请人： HITACHI LTD
发明人： SHISHIDO CHIE , TAKAGI YUJI , SHIMODA ATSUSHI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI
IPC分类号： G01B11/30 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To solve the problems, in which long time and labor are required to carry out review operation for improvement in quality and yield of a semiconductor because an inspection device indicates a large number of defects, and cope especially with the operation among the review operation to collect high magnification images by the use of a microscope system for strong desire for automation. SOLUTION: The inspection device detects defects in a semiconductor wafer through a comparison inspection in which repeated patterns are compared with each other taking advantage of the repeatability of the patterns formed on the semiconductor wafer, so that data as to what part of the defects shoud be compared with each other for detection of defects are stored in the check device. Then, not only the data on defects but also the data on objects of comparison are included in data on inspection result in a microscope system, the image of a defect and the image of an object of comparison are detected, based on the data on the object of comparison, and the images are compared with each other to locate the position of the defect.

9. 发明专利

JP2001156135A METHOD AND DEVICE FOR SORTING DEFECTIVE IMAGE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THEM 失效
公开(公告)号：JP2001156135A
公开(公告)日：2001-06-08
申请号：JP33719699
申请日：1999-11-29
申请人： HITACHI LTD
发明人： OBARA KENJI , TAKAGI YUJI , NAKAGAKI AKIRA , OZAWA YASUHIKO , KUROSAKI TOSHISHIGE , ISOGAI SHIZUSHI
IPC分类号： G01N21/88 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve efficiency of teaching in automatic sorting of defective image for carrying out image sorting, based on data taught in advance and to make the display method of automatic sorting result effective. SOLUTION: A computer supports user judgment, by displaying category candidate when a user rearranges and displays an untaught image group according to similarity degree of an image group designated as the same category or designates an untaught image. An image which is exceptional in a category can be readily found by displaying characteristic amount distribution and each image per category in coordination. Sorting is carried out automatically according to the size of the defect. When an image is picked up through by variable magnification, a display image size is changed and displayed to make the scale on a screen the same. A display method for automatic sorting result, two or more of a wafer map, a category list and defective size distribution are displayed simultaneously, and a plot point on a wafer map is made to change according to a category which is selected by a user and the defect size.

10. 发明专利

JP2002310962A SORTING METHOD AND OBSERVATION METHOD FOR IMAGE AND APPARATUS THEREFOR 失效
公开(公告)号：JP2002310962A
公开(公告)日：2002-10-23
申请号：JP2001120467
申请日：2001-04-19
申请人： HITACHI LTD
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , HIROI TAKASHI , WATANABE MASAHIRO , NOGUCHI MINORU , AOKI KAZUO
IPC分类号： G01N23/225 , G01N21/95 , G01N21/956 , G01Q10/00 , G01Q30/20 , H01J37/20 , H01J37/22 , H01L21/66 , H04N7/18
摘要： PROBLEM TO BE SOLVED: To provide an automatic image collector and a method thereof which enable to obtain and sort images of defective parts automatically at a higher speed as for defects generated in the production process of semiconductor wafers as detected with a defect inspection instrument. SOLUTION: In the image collector which automatically takes and collects images a plurality of parts to be observed on semiconductor wafers, there are arranged a scheduling part which determines the order of photographing defects and the moving speeds of stages based on the positional relationship of the plurality of parts to be observed on the wafers, and a control unit which feeds back the movement of the stages to the degree of deflection of beams. This enables to take and collect images in the optimum routes while moving the stages.

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