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1. 发明专利

JP2003004657A Support system for observation operation 审中-公开
标题翻译：用于观察操作的支持系统
公开(公告)号：JP2003004657A
公开(公告)日：2003-01-08
申请号：JP2001191519
申请日：2001-06-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ISOGAI SHIZUSHI , KOMURO HITOSHI , WADA HIDEO , SHODA KATSUJI
IPC分类号： G01N23/225 , G01N21/956 , G03F1/00 , G03F7/20 , G06T1/00 , G06T7/00 , H01L21/66
CPC分类号： G03F7/7065 , G03F1/84 , G06T7/0002 , G06T7/0004 , G06T2207/30148 , Y10T29/49131
摘要： PROBLEM TO BE SOLVED: To provide a support system which is made efficient by a method wherein an observation operation for confirming the shape of an external appearance defect is narrowed down properly from an enormous number of defects detected by the high sensitivity of a visual inspection apparatus. SOLUTION: In order to properly extract defect information from an inspection apparatus, a filtering function and a sampling function are prepared as a unit, and the defects as objects to be observed are narrowed down and extracted automatically by combining them. When the filtering function and the sampling function are sequenced and registered, a filtering operation and a sampling operation are performed automatically on the basis of information on a wafer as an object to be observed, and only the defect information on the object to be observed is extracted.
摘要翻译：要解决的问题：提供一种通过一种方法来提供有效的支撑系统，其中用于确认外观缺陷的形状的观察操作从目视检查装置的高灵敏度检测到的大量缺陷正确地变窄。解决方案：为了从检测设备中正确提取缺陷信息，将过滤功能和采样功能作为一个单位进行准备，并将作为观察对象的缺陷缩小并通过组合自动提取。当过滤功能和采样功能被排序并被注册时，基于作为待观察对象的晶片上的信息自动执行滤波操作和采样操作，并且仅关于待观察对象的缺陷信息是提取。

2. 发明专利

JP2006189462A Inspection method and its device 有权
标题翻译：检验方法及其设备
公开(公告)号：JP2006189462A
公开(公告)日：2006-07-20
申请号：JP2006073725
申请日：2006-03-17
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： IKEDA YOKO , KONISHI JIYUNKO , IWATA HISAFUMI , TAKAGI YUJI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO
IPC分类号： G01N21/956 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To reduce an analysis time and to improve the analysis accuracy by improving a user interface.
SOLUTION: This device comprises an image pickup apparatus for photographing a plurality of images in a workpiece; a storage means for storing the pickup images picked by the image pickup apparatus; and a displaying means having a first area for displaying the plurality of pickup images stored in the storage means and a plurality of second areas classifying the images according to the feature of the pickup images. This device comprises an analysis unit constituted so as to move the plurality of pickup images from the first area to the second areas on the screen and classify the plurality of pickup images on the second areas.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过改进用户界面来缩短分析时间并提高分析精度。解决方案：该装置包括用于拍摄工件中的多个图像的图像拾取装置; 存储装置，用于存储由图像拾取装置拾取的拾取图像; 以及显示装置，具有用于显示存储在存储装置中的多个拾取图像的第一区域和根据拾取图像的特征对图像进行分类的多个第二区域。该装置包括分析单元，其被构造成将多个拾取图像从第一区域移动到屏幕上的第二区域，并将多个拾取图像分类在第二区域上。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005252304A Defect analysis apparatus, inspection system, and inspection method 审中-公开
标题翻译：缺陷分析装置，检验系统和检验方法
公开(公告)号：JP2005252304A
公开(公告)日：2005-09-15
申请号：JP2005142074
申请日：2005-05-16
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： FUJITA HIROMI , KAMIMOTO SHUJI , ISOGAI SHIZUSHI , ONO MAKOTO , SAEKI KEIICHI
IPC分类号： H01L21/66
摘要： PROBLEM TO BE SOLVED: To make an analysis of a defect easy and to prevent cause investigation of the defect from becoming difficult. SOLUTION: A plurality of pieces of classification information for a plurality of inspection data about one defect are allowed to be registered, and classification information of a defect which is an object for analysis is allowed to be arbitrarily selected. Moreover, inspection data by a plurality of inspection devices about one defect are allowed to be registered, and classification information of a defect which is an object for analysis is allowed to be arbitrarily selected. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：易于分析缺陷，防止缺陷的发生变得困难。解决方案：允许登记关于一个缺陷的多个检查数据的多个分类信息，并允许任意选择作为分析对象的缺陷的分类信息。此外，允许多个检查装置关于一个缺陷的检查数据被登记，并允许任意选择作为分析对象的缺陷的分类信息。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005195607A Defect inspection method and defect inspection system 有权
标题翻译：缺陷检查方法和缺陷检查系统
公开(公告)号：JP2005195607A
公开(公告)日：2005-07-21
申请号：JP2005058321
申请日：2005-03-03
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NINOMIYA TAKANORI , ISOGAI SHIZUSHI , MATSUI SHIGERU , KUROSAKI TOSHISHIGE
IPC分类号： G01N21/956
摘要： PROBLEM TO BE SOLVED: To perform a defect observation work, a defect image collecting work and a defect analyzing work with an increased efficiency and a shortened time by detecting a defect of a substrate such as a semiconductor wafer in an inspection device and precisely performing the positioning of the defect in an observation device.
SOLUTION: Based on position coordinates and attributes of a plurality of defects detected by the inspection device, a defect easily detectable by the observation device is selected, this defect is detected and observed as an index by the observation device, and a coordinate conversion equation showing the correlation of the position coordinate of the defect between both the devices is generated. The position coordinate of the defect is converted in the observation device to observe the defect.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过检测检查装置中的半导体晶片等基板的缺陷，进行缺陷观察工作，缺陷图像采集作业和缺陷分析工作，其效率提高和时间缩短，以及精确地执行在观察装置中的缺陷的定位。解决方案：根据由检查装置检测到的多个缺陷的位置坐标和属性，选择由观察装置容易检测到的缺陷，该缺陷被检测并被观察作为观察装置的索引，并且坐标生成表示两个装置之间的缺陷的位置坐标的相关性的转换方程式。在观察装置中转换缺陷的位置坐标以观察缺陷。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2010080969A Method and apparatus for observation of sample 有权
标题翻译：用于观察样品的方法和装置
公开(公告)号：JP2010080969A
公开(公告)日：2010-04-08
申请号：JP2009265869
申请日：2009-11-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OBARA KENJI , TAKAGI YUJI , SHIMODA ATSUSHI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI , SHISHIDO CHIE
IPC分类号： H01L21/66 , G01N21/956 , H01J37/22
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for observation of a sample by which, upon detailed inspection of a defective part of the sample by means of magnification or the like, the amount of stage movement is reduced as little as possible to shorten image acquiring time thereby effectively observing defects. SOLUTION: The method for observation of the sample includes the steps of: acquiring a reference image not including a defect of the sample by imaging the sample on the basis of information of the defect of the sample detected by an inspection device; adjusting a position of the sample on the basis of the information of the defect of the sample detected by the inspection device so that the defect comes in sight of imaging; acquiring a defect image including the defect of the sample by imaging the sample whose position has been adjusted; detecting the defect in the defect image by comparing the reference image and the defect image; acquiring a magnified image of the defect by imaging a partial region including the detected defect in the sight of imaging; and displaying the magnified image of the defect on a screen. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于观察样品的方法和装置，通过这种方法和装置，通过借助于放大率等对样品的缺陷部分进行详细检查后，台架移动量减少到少至可能缩短图像获取时间，从而有效地观察缺陷。解决方案：用于观察样本的方法包括以下步骤：基于由检查装置检测到的样本的缺陷的信息，通过对样本进行成像来获取不包括样本缺陷的参考图像; 基于由检查装置检测到的样本的缺陷的信息来调整样本的位置，使得缺陷进入成像; 通过对已经调整了位置的样本进行成像来获取包括样本缺陷的缺陷图像; 通过比较参考图像和缺陷图像来检测缺陷图像中的缺陷; 通过在成像的视觉中成像包括检测到的缺陷的部分区域来获取缺陷的放大图像; 并在屏幕上显示缺陷的放大图像。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2005317984A Inspecting system and defect analysis apparatus 审中-公开
标题翻译：检查系统和缺陷分析装置
公开(公告)号：JP2005317984A
公开(公告)日：2005-11-10
申请号：JP2005142078
申请日：2005-05-16
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： FUJITA HIROMI , KAMIMOTO SHUJI , ISOGAI SHIZUSHI , ONO MAKOTO , SAEKI KEIICHI
IPC分类号： H01L21/66 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To prevent the cause investigation of a defect becoming difficult by facilitating the analysis of the defect.
SOLUTION: A plurality of pieces of sorting information to a plurality of inspecting data can be registered to one defect. The sorting information of the defect to be analyzed can be arbitrarily selected. Moreover, the inspecting data by a plurality of inspecting devices can be registered to one defect. The sorting information of the defect to be analyzed can be arbitrarily selected.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过便于对缺陷的分析来防止缺陷的原因调查变得困难。解决方案：可以向多个检查数据分配多条分类信息到一个缺陷。要分析的缺陷的排序信息可以任意选择。此外，可以将多个检查装置的检查数据登记到一个缺陷。要分析的缺陷的排序信息可以任意选择。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2002162366A DEFECT INSPECTION METHOD AND ITS SYSTEM, AND DEFECTIVE AREA DETECTION METHOD FOR AUTOMATIC DEFECT CLASSIFICATION 失效
公开(公告)号：JP2002162366A
公开(公告)日：2002-06-07
申请号：JP2000359608
申请日：2000-11-27
申请人： HITACHI LTD
发明人： HONDA TOSHIFUMI , TAKAGI YUJI , ISOGAI SHIZUSHI
IPC分类号： G01N21/956 , G01N21/958 , G02F1/13 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To make high-precision flaw detection possible by utilizing minute patterns of an inspected object regularly-repeated in an optional direction, as well as avoidance of circuit scale enlargement. SOLUTION: From an appearance image of a chip on a semiconductor wafer 1 read through a linear sensor 5, an inspection area having regular patterns in the chip detects any flaw by in-chip comparing a delay memory 8, buffer memory 9, a comparator 14, a binary circuit 16, etc., while another inspection area having no such regular patterns detects any flaw by in-chip comparing a chip delay memory 7, a comparator 13, binary circuit 15, etc. An address delay map 19 for each inspection area is formed at the semiconductor wafer 1 based on the data stored in a data generator 20, which allows a multiplexer 17 to select either output from the binary circuit 15 or 16. Also delay time due to the buffer memory 9 is controlled depending on the pitch or repetitive direction of the above patterns.

8. 发明专利

JP2001256480A AUTOMATIC PICTURE CLASSIFYING METHOD AND ITS DEVICE 失效
公开(公告)号：JP2001256480A
公开(公告)日：2001-09-21
申请号：JP2000065151
申请日：2000-03-09
申请人： HITACHI LTD
发明人： NAKAGAKI AKIRA , TAKAGI YUJI , OBARA KENJI , OZAWA YASUHIKO , KUROSAKI TOSHISHIGE , ISOGAI SHIZUSHI
IPC分类号： G01B11/30 , G01N21/956 , G06F17/30 , G06T1/00 , G06T7/00
摘要： PROBLEM TO BE SOLVED: To secure dassification performance for high fault by permitting instruction data for fault classification which is set at every fault attribute to follow the fluctuation of a manufacturing process. SOLUTION: Featured values are calculated from fault detected from a semi- conductor wafer and assigned in a featured values space, categories are assigned from a distribution in the space as shown in a figure 10(a) and instruction data for fault classification is generated. When fault detected from the wafer is classified into the respective fault attributes, the instruction data is used. When fault is classified, the same processing is performed concerning the fault to be classified, which is detected from the wafer, classification dealing data shown in a figure 10(b) is generated and, then, it is compared with instruction data shown in the figure 10(a). A difference occurs in these kinds of data when a fluctuation exists in the semi-conductor manufacturing process and obtained instruction data is corrected in accordance with the difference when the difference exists.

9. 发明专利

JP2001189358A HIGH-POWER IMAGE AUTOMATIC COLLECTION METHOD AND SYSTEM OF SEMICONDUCTOR WAFER DEFECT 失效
公开(公告)号：JP2001189358A
公开(公告)日：2001-07-10
申请号：JP37266199
申请日：1999-12-28
申请人： HITACHI LTD
发明人： SHISHIDO CHIE , TAKAGI YUJI , SHIMODA ATSUSHI , OBARA KENJI , NAKAGAKI AKIRA , ISOGAI SHIZUSHI , OZAWA YASUHIKO , BABA HIDEHARU , WATANABE KENJI
IPC分类号： G01B11/30 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To solve the problems, in which long time and labor are required to carry out review operation for improvement in quality and yield of a semiconductor because an inspection device indicates a large number of defects, and cope especially with the operation among the review operation to collect high magnification images by the use of a microscope system for strong desire for automation. SOLUTION: The inspection device detects defects in a semiconductor wafer through a comparison inspection in which repeated patterns are compared with each other taking advantage of the repeatability of the patterns formed on the semiconductor wafer, so that data as to what part of the defects shoud be compared with each other for detection of defects are stored in the check device. Then, not only the data on defects but also the data on objects of comparison are included in data on inspection result in a microscope system, the image of a defect and the image of an object of comparison are detected, based on the data on the object of comparison, and the images are compared with each other to locate the position of the defect.

10. 发明专利

JP2001156135A METHOD AND DEVICE FOR SORTING DEFECTIVE IMAGE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THEM 失效
公开(公告)号：JP2001156135A
公开(公告)日：2001-06-08
申请号：JP33719699
申请日：1999-11-29
申请人： HITACHI LTD
发明人： OBARA KENJI , TAKAGI YUJI , NAKAGAKI AKIRA , OZAWA YASUHIKO , KUROSAKI TOSHISHIGE , ISOGAI SHIZUSHI
IPC分类号： G01N21/88 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve efficiency of teaching in automatic sorting of defective image for carrying out image sorting, based on data taught in advance and to make the display method of automatic sorting result effective. SOLUTION: A computer supports user judgment, by displaying category candidate when a user rearranges and displays an untaught image group according to similarity degree of an image group designated as the same category or designates an untaught image. An image which is exceptional in a category can be readily found by displaying characteristic amount distribution and each image per category in coordination. Sorting is carried out automatically according to the size of the defect. When an image is picked up through by variable magnification, a display image size is changed and displayed to make the scale on a screen the same. A display method for automatic sorting result, two or more of a wafer map, a category list and defective size distribution are displayed simultaneously, and a plot point on a wafer map is made to change according to a category which is selected by a user and the defect size.

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