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1. 发明专利

JP2008258108A Image display device, and manufacturing method thereof 审中-公开
标题翻译：图像显示装置及其制造方法
公开(公告)号：JP2008258108A
公开(公告)日：2008-10-23
申请号：JP2007101859
申请日：2007-04-09
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： KUSUNOKI TOSHIAKI , IKEDA MITSUHARU , AOTO KATSUHIDE , NAKAMURA TOMOKI , MIKAMI YOSHIAKI , NISHIMURA ETSUKO , UENO TAKAHIRO , SHIBA MITSUAKI
IPC分类号： H01J1/312 , H01J9/02 , H01J31/12
CPC分类号： H01J1/312 , B82Y10/00 , H01J29/04 , H01J31/127 , H01J2329/0484
摘要： PROBLEM TO BE SOLVED: To provide an image display device and a manufacturing method thereof in which an electron emission film containing an alkaline metal compound or the like is formed without causing alkaline corrosion of a metal wiring. SOLUTION: An FED display device is composed of an electron source having an electron emission film 13 on its surface and metal wirings 17, 18 to supply signals or the like to the electron source. After forming on a metal wiring surface 18 a corrosion resistance membrane 21 by a phosphorus reacted coating and an absorption coating, an alkaline metal or the like is coated and added on the electron emission film 13. An added amount of phosphorus is smaller than a chemical equivalent of salt with the alkaline metal or the like. As a result, the metal wiring is not corroded by the alkaline metal or the like, and an electron emission efficiency of the electron source can be improved. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种图像显示装置及其制造方法，其中形成含有碱金属化合物等的电子发射膜而不引起金属布线的碱性腐蚀。解决方案：FED显示装置由其表面上具有电子发射膜13的电子源和用于向电子源提供信号等的金属布线17,18组成。在金属布线表面18上形成耐磷膜21后，通过磷反应涂层和吸收涂层，碱金属等涂覆并添加到电子发射膜13上。磷的添加量小于化学品相当于碱金属等的盐。结果，金属布线不被碱金属等腐蚀，可以提高电子源的电子发射效率。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009059594A Image display device 审中-公开
标题翻译：图像显示设备
公开(公告)号：JP2009059594A
公开(公告)日：2009-03-19
申请号：JP2007226082
申请日：2007-08-31
申请人： Hitachi Displays Ltd , Hitachi Ltd , 株式会社日立ディスプレイズ , 株式会社日立製作所
发明人： KUNIYASU TSUTOMU , SUKIGARA YUICHI , SHIBA MITSUAKI , KUSUNOKI TOSHIAKI
IPC分类号： H01J31/12
摘要： PROBLEM TO BE SOLVED: To provide an image display device which can produce images of high quality with less effect from adsorption of unnecessary gas and without image quality failure such as brightness spots and impression of roughness.
SOLUTION: On the surface of an electron source array which emits electrons from the upper part electrode 13, oxide 20 of alkaline metal such as cesium, sodium, or potassium is diffused from an interface with an insulating layer 12 to the surface of the upper part electrode 13, especially in an electron emission part of the electron source array, alkaline density of the alkaline metal is lower about 20% or more than that in the surface except the electron emission part of the upper part electrode 13.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种图像显示装置，其可以产生高质量的图像，较少的吸收不需要的气体并且没有诸如亮度斑点和粗糙度的图像质量故障的影响。解决方案：在从上部电极13发射电子的电子源阵列的表面上，碱金属如铯，钠或钾的氧化物20从与绝缘层12的界面扩散到特别是在电子源阵列的电子发射部分中的上部电极13，碱金属的碱性密度比除了上部电极13的电子发射部分以外的表面的碱性密度低约20％以上。
版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2009043437A Image display device and its manufacturing method 审中-公开
标题翻译：图像显示装置及其制造方法
公开(公告)号：JP2009043437A
公开(公告)日：2009-02-26
申请号：JP2007204301
申请日：2007-08-06
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： SHIBA MITSUAKI , SUKIGARA YUICHI , UENO TAKAHIRO
IPC分类号： H01J29/86 , H01J9/24 , H01J29/92
摘要： PROBLEM TO BE SOLVED: To take countermeasures to a failure of a photo process due to an exhaust hole formed in a cathode substrate in an FED (field emission display).
SOLUTION: Only a hole 101 is formed on an exhaust hole 10 formed on a cathode substrate 1 while a cathode substrate 1 is going through a photo process. Furthermore, 103 is a chamfering. Therefore, the side on which a film is formed on the cathode substrate 1 is flat during the photo process. After the all photo process is completed, a hole 102 is formed and the exhaust hole 10 is made a through hole. By this structure, various kinds of failures due to a resist staying in the exhaust hole 10 at the photo process is prevented. Since a residue or the like of a metallic film is not formed in the vicinity of the exhaust hole 10, voltage withstanding of the display device is improved.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：采取在FED（场致发射显示）中由于在阴极基板中形成的排气孔而导致的照相处理失败的对策。解决方案：在阴极基板1正在进行照相处理的同时，在阴极基板1上形成的排气孔10上仅形成有孔101。此外，103是倒角。因此，在照相处理中，在阴极基板1上形成有膜的一面是平坦的。在完成所有照相处理之后，形成孔102，并且排气孔10形成通孔。通过这种结构，防止了由于在光刻处理期间留在排气孔10中的抗蚀剂引起的各种故障。由于在排气孔10附近没有形成金属膜的残留物等，所以能够提高显示装置的耐压性。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2006066089A Display device 审中-公开
标题翻译：显示设备
公开(公告)号：JP2006066089A
公开(公告)日：2006-03-09
申请号：JP2004243881
申请日：2004-08-24
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： TSURUOKA KOICHI , SUNAHARA KAZUO , SHIBA MITSUAKI
IPC分类号： H01J31/12 , H01J29/87
摘要： PROBLEM TO BE SOLVED: To prevent a short circuit between layers with a scanning line and a data line, and a short circuit between the scanning lines in an electron emission display device.
SOLUTION: The recess of a spacer 30 is arranged in the intersecting part of a lower electrode 11 becoming the data line and a bus electrode 20 used as the scanning line, an upper electrode 17, and a thick film electrode 22. The projection of the spacer 30 is arranged in the part which does not intersect. The flow-out of a silver paste when the thick film electrode 22 is formed is absorbed by the recess of this spacer 30. The projection of the spacer 30 does not force directly the data line and the scanning line.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了防止在扫描线和数据线之间的层之间的短路以及电子发射显示装置中的扫描线之间的短路。解决方案：间隔物30的凹部布置在下电极11成为数据线的交叉部分中，总线电极20用作扫描线，上电极17和厚膜电极22。间隔件30的突出部布置在不相交的部分中。当形成厚膜电极22时，银浆的流出被该间隔件30的凹部吸收。间隔物30的突起不直接迫使数据线和扫描线。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2009043480A Manufacturing method of image display device 审中-公开
标题翻译：图像显示装置的制造方法
公开(公告)号：JP2009043480A
公开(公告)日：2009-02-26
申请号：JP2007205436
申请日：2007-08-07
申请人： Hitachi Displays Ltd , 株式会社日立ディスプレイズ
发明人： TERAKADO MASAMICHI , UENO TAKAHIRO , SUKIGARA YUICHI , SHIBA MITSUAKI , OKAWA NAOYUKI
IPC分类号： H01J31/12 , H01J1/312 , H01J9/02
摘要： PROBLEM TO BE SOLVED: To manufacture a tunnel insulation layer in an MIM electron source in high quality and stability, in an FED (a field emission display) using the MIM electron source. SOLUTION: The MIM electron source includes a lower electrode, a tunnel insulation layer, and an upper electrode. A signal wire plays a role as the lower electrode at a part of the MIM electron source. The signal wire has an AlNd alloy used for lowering electric resistance and preventing hillocks. However, an Nd alloy is segregated on the surface of the signal wire. Although the tunnel insulation layer is formed as the lower electrode is put under anodic oxidation, but a good-quality tunnel insulation layer can not be formed when the Nd is segregated on the surface of the signal wire. After an AlNd film 111 is formed on a cathode substrate 10 by sputtering, a pure Al film 112 is sputtered in a thickness exceeding 10 nm. With this, the Nd is prevented or alleviated from segregating on the surface of the signal wire or the lower electrode, hence, a tunnel insulation film of good quality can be formed. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：在使用MIM电子源的FED（场发射显示）中，以高质量和稳定的方式制造MIM电子源中的隧道绝缘层。解决方案：MIM电子源包括下电极，隧道绝缘层和上电极。信号线作为MIM电子源的一部分的下电极起作用。信号线具有用于降低电阻并防止小丘的AlNd合金。然而，Nd合金在信号线的表面上分离。虽然在下电极被放置在阳极氧化下形成隧道绝缘层，但是当Nd分离在信号线的表面上时，不能形成质量好的隧道绝缘层。在通过溅射在阴极基板10上形成AlNd膜111之后，以超过10nm的厚度溅射纯Al膜112。由此，可以防止或减轻Nd在信号线或下电极的表面上分离，因此可以形成质量好的隧道绝缘膜。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2004037595A Method for manufacturing liquid crystal panel 有权
公开(公告)号：JP2004037595A
公开(公告)日：2004-02-05
申请号：JP2002191585
申请日：2002-07-01
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKASU NOBUAKI , MATSUURA HIROYASU , KOSHIMO TOSHIYUKI , SHIBA MITSUAKI , AZUMA HITOSHI , TOMIZUKA YOSHITERU , OKADA TSUNEO
IPC分类号： G02F1/13 , G02F1/1339
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal panel with little display unevenness by suppressing gap unevenness between a pair of glass substrates constituting the liquid crystal panel. SOLUTION: A pair of the glass substrates 1a, 1b with an uncured thermosetting sealant 2 arranged in between is wrapped in sheets 3a, 3b. The inside of the sheets 3a, 3b is nearly shut tight and depressurized. The glass substrates 1a, 1b and the sealant 2 are pressurized with differential pressure from atmospheric pressure via the sheets 3a, 3b maintaining a specified gap, and simultaneously the sheets 3a, 3b, the glass substrates 1a, 1b and the sealant 2 are heated with heaters 9a, 9b on positions separated from the sheets 3a, 3b and the sealant is cured. Thereby the gap between a pair of the glass substrates 1a, 1b is maintained. COPYRIGHT: (C)2004,JPO

7. 发明专利

JPH09244250A RESIST COATING DEVICE 失效
公开(公告)号：JPH09244250A
公开(公告)日：1997-09-19
申请号：JP5053496
申请日：1996-03-07
申请人： HITACHI LTD , HITACHI DEVICE ENG , HITACHI CHIBA ELECTRON KK
发明人： ICHIMURA YUKIO , OFUJI YOSHIHIRO , KONO KAZUHIRO , KATAOKA SHINYA , TANIGUCHI HIDEAKI , YOSHIDA KAZUTOSHI , SHIBA MITSUAKI , NAMIKI JUNICHI
IPC分类号： G03F7/16 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To prevent the soiling at the end part of a glass substrate by minimizing the difference of the level of a resist solution film directly after coating and scooping up a resist at the end part of a resist coating roller. SOLUTION: A device is provided with a substrate sending part for successively sending the glass substrate 1 and a resist coating part composed of a press roller 2 and the resist coating roller 3 oppositely arranged below the press roller 2 and the resist is applied on one surface of the resist coating roller 3 side of the glass substrate 1 by catching the resist by the resist roller 3 at the time of passing the glass substrate 1 between the press roller 2 and the resist coating roller 3. In such a case, the surface of the resist coating roller 3 is constituted so that a large diameter wire 3a is closely wound on the surface as an under layer and a small diameter wire 3b is wound so as to bury a part or all of valley parts produced by closely winding the large diameter wire 3a as an upper layer.

8. 发明专利

JPH08211623A RESIST COATING DEVICE 失效
公开(公告)号：JPH08211623A
公开(公告)日：1996-08-20
申请号：JP1951995
申请日：1995-02-07
申请人： HITACHI LTD
发明人： ICHIMURA YUKIO , SHIBA MITSUAKI , MITOBE KOICHI
IPC分类号： G03F7/16 , B05C1/02 , B05C11/00 , H01L21/027
摘要： PURPOSE: To always form a uniform resist film while preventing the vaporization of the component of the resist soln. CONSTITUTION: This resist coating device is equipped with a roll bar 2 which rotates while at least a part of the surface is dipped in a resist soln. 4 reserved in a tray 5, a roll bar holding member 6 mounted on the tray 5 to hold the roll bar 2 so that the roll bar can rotate, and a nip roller above the roll bar 2 to press the roll bar 2. A glass substrate is carried at a specified speed between the roll bar 2 and the nip roller so that the resist soln. 4 is brought into contact with the lower surface of the substrate by the roll bar 2. Further, an excess amt. of the resist soln. 4 is wiped off to form a resist film of specified thickness. This device is also equipped with closing members 5a, 5b which cover the liquid surface of the resist soln. 4 to prevent the vaporization of the structural component of the resist soln. 4.

9. 发明专利

JPS63245934A SUCTION DEVICE FOR PELLET 失效
公开(公告)号：JPS63245934A
公开(公告)日：1988-10-13
申请号：JP7744787
申请日：1987-04-01
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： SHIBA MITSUAKI , SASAKI HARUO , WATANABE YOSHIHISA , ITO SHUICHI
IPC分类号： H01L21/52 , H01L21/677 , H01L21/68
摘要： PURPOSE:To relax a shock at the time of suction, and to prevent the suck-in of a foreign matter into a collet by forming the suction surface of the collet sucking a pellet by an elastic material, ejecting air from a fine clearance between the suction surface and the pellet and sucking the pellet. CONSTITUTION:When a collet 6 is moved to a section just above a guide 10, a push-up needle 11 is shifted upward, and a semiconductor pellet 1 is peeled from an adhesive tape 2. The pellet 1 is pushed against the suction surface 7a of the collet 6 while air is ejected from the suction surface of the collet 6. Air passes through a fine clearance 7b, and the pellet 1 is sucked by a Bernoulli's phenomenon. The pellet 1 is abutted against the suction surface 7a of the elastic material of the collet 6 on suction, thus relaxing a shock, then preventing the generation of cracking. Suck-in to the collet 6 and falling to the pellet 1 of a foreign matter are obviated by the blow-off of air. Accordingly, the quality of a semiconductor is improved.

10. 发明专利

JPH0962009A RESIST APPLYING DEVICE 失效
公开(公告)号：JPH0962009A
公开(公告)日：1997-03-07
申请号：JP21592895
申请日：1995-08-24
申请人： FUJI PHOTO FILM CO LTD , HITACHI LTD
发明人： YAO YASUYOSHI , EMOTO TATSUYA , YAMAZAKI SHINYA , OTSU MASAO , SHIBA MITSUAKI , NAMIKI JUNICHI , TSUBOKA TOMOAKI , SASAKI HARUO , ICHIMURA YUKIO
IPC分类号： G03F7/16 , B05C11/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist applying device capable of improving the working efficiency and simultaneously suppressing the lowering of the clean degree of the product floor area by reducing the standstill time when a resist of the resist applying device is switched. SOLUTION: In the resist applying device constituted of a glass substrate carrying part 1, a resist applying part 2, a resist piping system 4, a resist tray 5 and a pedestal 3 for constituting the resist applying device by suspending the glass substrate carrying part 1, resist applying part 2, resist piping system 4 and resist tray 5, the resist tray 5 and the resist piping system 4 are mounted on a truck 6, and the entire device is collectively detached, attached and exchanged together with the truck to the pedestal 3.

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