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1. 发明专利

JPH0962010A RESIST APPLYING DEVICE 失效
公开(公告)号：JPH0962010A
公开(公告)日：1997-03-07
申请号：JP21593395
申请日：1995-08-24
申请人： HITACHI LTD , HITACHI DEVICE ENG , FUJI PHOTO FILM CO LTD
发明人： SHIBA MITSUAKI , NAMIKI JUNICHI , SASAKI HARUO , TSUBOKA TOMOAKI , KANESAKA KAZUMI , YAO YASUYOSHI , EMOTO TATSUYA , KUMAGAI HIROFUMI , MATSUMOTO KENJI
IPC分类号： G03F7/16 , B05C11/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To form a film of uniform quality by preventing to the utmost an effect of the electric field and the intrusion of foreign matters which adversely affect the flastness of a resist film. SOLUTION: A resist applying device is equipped with a resist applying part 1 constituted of an applying device '1' having a nip roller 1a, a rod bar 1d and a resist receiving tray 1f, a pre-application substrate carrying part 1g and a post-application carrying part 1h and an inversion part 2 having a stopper 3 for once stopping a glass substrate 8 from the resist applying part 1 and a pre-inversion carrying part 2d constituted of an inversion arm 2a mounted a substrate chuck 2c and a post-inversion carrying part 2e. The device is composed of a conductive material to be so arranged as to come into proximity or contact with the glass substrate 8 after resist application.

2. 发明专利

JPH0962009A RESIST APPLYING DEVICE 失效
公开(公告)号：JPH0962009A
公开(公告)日：1997-03-07
申请号：JP21592895
申请日：1995-08-24
申请人： FUJI PHOTO FILM CO LTD , HITACHI LTD
发明人： YAO YASUYOSHI , EMOTO TATSUYA , YAMAZAKI SHINYA , OTSU MASAO , SHIBA MITSUAKI , NAMIKI JUNICHI , TSUBOKA TOMOAKI , SASAKI HARUO , ICHIMURA YUKIO
IPC分类号： G03F7/16 , B05C11/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist applying device capable of improving the working efficiency and simultaneously suppressing the lowering of the clean degree of the product floor area by reducing the standstill time when a resist of the resist applying device is switched. SOLUTION: In the resist applying device constituted of a glass substrate carrying part 1, a resist applying part 2, a resist piping system 4, a resist tray 5 and a pedestal 3 for constituting the resist applying device by suspending the glass substrate carrying part 1, resist applying part 2, resist piping system 4 and resist tray 5, the resist tray 5 and the resist piping system 4 are mounted on a truck 6, and the entire device is collectively detached, attached and exchanged together with the truck to the pedestal 3.

3. 发明专利

JPH0867468A MACHINE ROOM FLOOR OF ELEVATOR 失效
公开(公告)号：JPH0867468A
公开(公告)日：1996-03-12
申请号：JP20548894
申请日：1994-08-30
申请人： TAISEI CORP , HITACHI LTD , HITACHI BUILDING SYST ENG
发明人： MORINAGA TAKASHI , TADOKORO TOSHIYUKI , SASAKI HARUO
IPC分类号： B66B11/04
摘要： PURPOSE: To reduce cutting points of a reinforcing member and not to bury a machine beam in a concrete slab. CONSTITUTION: Pedestals 10 divided in a plural number, arranged with specified intervals between each of them, upper surfaces of which are at least exposed from a concrete slab 5 and supporting a machine beam are buried in the concrete slab 5. Consequently, it is possible to improve efficiency of work. Additionally, it is possible to improve productivity of the concrete slab and to reduce its production cost.

4. 发明专利

JPH04363169A WET TREATING DEVICE 失效
公开(公告)号：JPH04363169A
公开(公告)日：1992-12-16
申请号：JP10250991
申请日：1991-05-08
申请人： HITACHI LTD
发明人： HIROSE HIDEYUKI , HINOSUGI MITSURU , KOMATANI MASATOSHI , SASAKI HARUO
IPC分类号： B05C9/10 , B05C11/08 , B05D1/40 , G03F7/16 , H01L21/027 , H01L21/30
摘要： PURPOSE:To improve the uniformity of a photoresist application and to decrease the fluctuations in film thickness by providing a vacuum chuck and temp. regulator system which previously regulate the temp. of a wafer prior to spin coating of a photoresist. CONSTITUTION:A cooling unit 11 of the wafer 3 having the vacuum chuck, the temp. regulator 12 of a cooling water circulation type, and a circulating pipe 13 which connects the cooling unit 11 and the temp. regulator 12 and circulates cooling water to the cooling unit 11 are provided. The temp. of the wafer 3 is previously regulated by using the cooling unit 11, the temp. regulator 12 and the circulating pipe 13 prior to the spin coating of the photoresist. Consequently, the uniformity of the photoresist application is improved and the fluctuations in the film thickness are decreased.

5. 发明专利

JPH0437575B2 失效
公开(公告)号：JPH0437575B2
公开(公告)日：1992-06-19
申请号：JP2459183
申请日：1983-02-18
申请人： HITACHI LTD
发明人： HIROSE HIDEYUKI , KOMATANI MASATOSHI , SASAKI HARUO
IPC分类号： B05C11/08 , G03F7/16 , H01L21/027

6. 发明专利

JPH0278244A SEMICONDUCTOR PELLET PICK-UP DEVICE 失效
公开(公告)号：JPH0278244A
公开(公告)日：1990-03-19
申请号：JP22866488
申请日：1988-09-14
申请人： HITACHI LTD
发明人： SASAKI HARUO , SHIBA MITSUAKI , ITO SHUICHI
IPC分类号： H01L21/67 , H01L21/68
摘要： PURPOSE:To reduce the unsatisfactory picking up of a semiconductor pellet by a method wherein an adhesive type adsorption means is provided on the pellet thrust-up surface of a thrust-up block and on the inclined surface which retains the semiconductor pellet. CONSTITUTION:On a semiconductor pellet pick-up device, a pyramid-shaped vacuum attracting collet 16 is arranged at the position opposing to the thrust-up surface 3A of a thrust-up block 3. An adhesive tape, on which a plurality of solid-state image pick-up elements 2 are fixed to the surface, is arranged between the thrust-up surface 3A and the attraction collet 16. The inclined surface 3B of the thrust-up block 3 is constituted in such a manner that the other adjacent solidstate image pickup element 2 will be maintained at the prescribed angle against the solid-state image pickup element 2 to be thrusted up by the thrust-up surface 3A. A suction hole 3C is provided on the inclined surface 3B, and the suction hole 3C is connected to a vacuum source 5 through a vacuum guide hole 3D. The solid-state image pickup element 2, which is thrust up by the thrust-up surface 3A and a thrust-up needle 4, is adsorbed and retained by the vacuum collet 16. Through these procedures, unsatisfactory picking up of the semiconductor pellet can be reduced.

7. 发明专利

JPS63241928A VERTICAL HEATING APPARATUS 失效
公开(公告)号：JPS63241928A
公开(公告)日：1988-10-07
申请号：JP7405087
申请日：1987-03-30
申请人： HITACHI LTD
发明人： SASAKI HARUO , HIROSE HIDEYUKI
IPC分类号： H01L21/027 , H01L21/22 , H01L21/30
摘要： PURPOSE:To heat-treating wafers while upwardly or downwardly moving the wafers one by one by fixing the first transfer rods relative to the axial direction, and making the second transfer rods upwardly and downwardly movable. CONSTITUTION:Three or more first and second transfer rods 10, 11 are respectively provided extending to the up and down directions of a heating space 3. And on these transfer rods 10, 11, a plurality of wafer receivers 12, 13 are disposed along the length direction thereof at a predetermined pitch size interval, each transfer rod is made rotatable, and the second transfer rods 11 are enabled to upwardly and downwardly move relative to the other first rods 10 with a stroke equal to or larger than the predetermined pitch size. As a result, by the relative upward and downward motions of the second transfer rods and the rotational motions of both rods in synchronism therewith, it will be enabled to sequentially move a wafer W from the lower position to the upper or lower position of the heating space 3 while causing the wafer to alternately be supported by the wafer receivers 12, 13 of the respective transfer rods, and with this, it is possible to accomplish a heat treatment with wafers W being upwardly or downwardly moved one by one.

8. 发明专利

JPS60171728A DRY ETCHING UNIT 失效
公开(公告)号：JPS60171728A
公开(公告)日：1985-09-05
申请号：JP2707284
申请日：1984-02-17
申请人： HITACHI LTD
发明人： SASAKI HARUO , NISHIMURA KAZUYUKI
IPC分类号： H01L21/302
摘要： PURPOSE:To enable a wafer to be etched at a uniform speed for improving the pattern precision, by arranging a parallel-plate electrode consisting of upper and lower electrodes within a chamber while burying a plurality of ring-shaped temperature control pipes in the lower electrode, any by circulating temperature controlled liquids independently in each of the pipes. CONSTITUTION:A chamber 1 is mounted on a stage 3 while it is hermatically sealed by means of an O ring 2. A parallel-plate electrode consisting of an upper electrode 4 and a lower electrode 5 is arranged within the chamber 1. The upper and lower electrodes 4 and 5 are grounded. A plurality of ring-shaped temperature control pipes 7 are buried in the lower electrode 5, and temperature controlled liquids 8a, 8b, 8c and 8d which are constantly temperature controlled by a temperature control unit (not shown) are independently circulated in each of the pipes. The temperature controlled liquids 8a-8d are independently controlled so as to have different temperatures from one another. Further, the temperature control pipes 7 are surrounded by a heat insulating material 9 so that the temperature precision of each pipe 7 is maintained by preventing the pipes from dissipating heat to or receiving it from the outside.

9. 发明专利

JPH10197151A FILTER BOARD DRYER 失效
公开(公告)号：JPH10197151A
公开(公告)日：1998-07-31
申请号：JP35083096
申请日：1996-12-27
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： NAKAYAMA HIROTSUGU , SASAKI HARUO , KANESAKA KAZUMI
IPC分类号： G03F7/16 , F26B15/00 , F26B21/12 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide filter board dryer for automatically controlling air supply and exhaust amounts of a drying chamber 1 in response to a filter type of supplied undried filter board. SOLUTION: This dryer comprises a drying chamber 1 for drying by air supplying and exhausting, an exhaust fan 20 and a fan controller 11 for controlling the air supply and exhaust amounts of the chamber, a filter board conveyor coupled to the chamber 1, and a sequencer for deciding a filter type to generate type information indicating a decided result. Undried filter board coated with color resist in a previous step is conveyed into the chamber 1 via the sequencer. Dried filter board is conveyed out of the chamber 1, the information obtained by the sequencer is supplied to the controller 11 which controls a rotational speed of the fan 10, thereby controlling to regulate the supply and exhaust amounts of the chamber 1 in response to the type.

10. 发明专利

JP2591360B2 失效
公开(公告)号：JP2591360B2
公开(公告)日：1997-03-19
申请号：JP10250991
申请日：1991-05-08
申请人： HITACHI LTD
发明人： HIROSE HIDEYUKI , HINOSUGI MITSURU , KOMATANI MASATOSHI , SASAKI HARUO
IPC分类号： B05C9/10 , B05C11/08 , B05D1/40 , G03F7/16 , H01L21/027 , H01L21/30

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