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1. 发明专利

JPH10197151A FILTER BOARD DRYER 失效
公开(公告)号：JPH10197151A
公开(公告)日：1998-07-31
申请号：JP35083096
申请日：1996-12-27
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： NAKAYAMA HIROTSUGU , SASAKI HARUO , KANESAKA KAZUMI
IPC分类号： G03F7/16 , F26B15/00 , F26B21/12 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide filter board dryer for automatically controlling air supply and exhaust amounts of a drying chamber 1 in response to a filter type of supplied undried filter board. SOLUTION: This dryer comprises a drying chamber 1 for drying by air supplying and exhausting, an exhaust fan 20 and a fan controller 11 for controlling the air supply and exhaust amounts of the chamber, a filter board conveyor coupled to the chamber 1, and a sequencer for deciding a filter type to generate type information indicating a decided result. Undried filter board coated with color resist in a previous step is conveyed into the chamber 1 via the sequencer. Dried filter board is conveyed out of the chamber 1, the information obtained by the sequencer is supplied to the controller 11 which controls a rotational speed of the fan 10, thereby controlling to regulate the supply and exhaust amounts of the chamber 1 in response to the type.

2. 发明专利

JPH0968804A RESIST COATING DEVICE 失效
公开(公告)号：JPH0968804A
公开(公告)日：1997-03-11
申请号：JP22641395
申请日：1995-09-04
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： NAMIKI JUNICHI , SHIBA MITSUAKI , SASAKI HARUO , TSUBOKA TOMOAKI , ICHIMURA YUKIO , KANESAKA KAZUMI
IPC分类号： G03F7/16 , B05C1/02 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To apply a resist with a specified film thickness on a glass substrate having variation of thickness. SOLUTION: This device is equipped with an elevating and lowering mechanism 10 to move a nip roller supporting member 8 near to or apart from a roll bar 3, a pulse motor 11 to drive the mechanism 10, an operational processing device 14, and a motor controller 15. The operational processing device 14 generates controlling pulses corresponding to the thickness data generated by a detecting device 13 for the thickness of a glass substrate which generates thickness data according to the output signals from a thickness sensor 12 to measure the thickness of a glass substrate 1 carried to a resist coating mechanism. The motor controller 15 outputs driving pulses to the pulse motor 11 based on the controlling pulses generated by the operational processing device 14. Thus, the distance between a nip roller 2 and a roll bar 3 is changed according to the thickness of the glass substrate 1.

3. 发明专利

JPH0962010A RESIST APPLYING DEVICE 失效
公开(公告)号：JPH0962010A
公开(公告)日：1997-03-07
申请号：JP21593395
申请日：1995-08-24
申请人： HITACHI LTD , HITACHI DEVICE ENG , FUJI PHOTO FILM CO LTD
发明人： SHIBA MITSUAKI , NAMIKI JUNICHI , SASAKI HARUO , TSUBOKA TOMOAKI , KANESAKA KAZUMI , YAO YASUYOSHI , EMOTO TATSUYA , KUMAGAI HIROFUMI , MATSUMOTO KENJI
IPC分类号： G03F7/16 , B05C11/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To form a film of uniform quality by preventing to the utmost an effect of the electric field and the intrusion of foreign matters which adversely affect the flastness of a resist film. SOLUTION: A resist applying device is equipped with a resist applying part 1 constituted of an applying device '1' having a nip roller 1a, a rod bar 1d and a resist receiving tray 1f, a pre-application substrate carrying part 1g and a post-application carrying part 1h and an inversion part 2 having a stopper 3 for once stopping a glass substrate 8 from the resist applying part 1 and a pre-inversion carrying part 2d constituted of an inversion arm 2a mounted a substrate chuck 2c and a post-inversion carrying part 2e. The device is composed of a conductive material to be so arranged as to come into proximity or contact with the glass substrate 8 after resist application.

4. 发明专利

JPH02245705A PRODUCTION OF COLOR FILTER 失效
公开(公告)号：JPH02245705A
公开(公告)日：1990-10-01
申请号：JP6615689
申请日：1989-03-20
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： WATANABE HISAMITSU , MATSUYAMA SHIGERU , ISHII AKIRA , WATANABE YOSHIKI , SASAKI HARUO
IPC分类号： G02B5/20
摘要： PURPOSE:To inhibit the sticking of dust and foreign matter to a substrate and to improve the quality of a color filter by spraying a developer, dyestuff or fixing soln. on a base material layer on the substrate. CONSTITUTION:A developer, dyestuff or fixing soln. is sprayed or allowed to flow down from nozzles 5 on a substrate 3 to develop, dye or fix a base material layer for a color filter on the substrate 3. The used soln. 2 is recovered in a recovery vessel 7, heated to the optimum temp. with a heater 8 and sent again to the nozzles 5 by a pump 9. Dust and foreign matter generated in the developing, dyeing or fixing stage and entering the soln. 2 are removed with a filter 10 before the soln. 2 reaches the nozzles 5. The sticking of dust and foreign matter to the resulting color filter are inhibited and the quality of the filter is improved.

5. 发明专利

JPS6441231A DIE BONDER 失效
公开(公告)号：JPS6441231A
公开(公告)日：1989-02-13
申请号：JP19793087
申请日：1987-08-06
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： ITO SHUICHI , WATANABE YOSHIHISA , NAKANO TOSHIO , SASAKI HARUO
IPC分类号： H01L21/68 , B23K3/06 , H01L21/52
摘要： PURPOSE:To improve the reproducibility of the position of an adhesive applying unit by installing a position control section specifying the position of a nozzle main body in the adhesive applying unit in the direction vertical to an adhesive surface to a holding member and mounting a section, a position of which is controlled, abutted against the position control section to the nozzle main body. CONSTITUTION:With an adhesive applicator 5 for a die bonder 1, position control sections 5D1-5D3 specifying the position of a nozzle main body 5B in an adhesive applying unit 5C in the direction of rotation and the direction of a plane in the surface parallel with the surface of a cavity in a package member 11 are set up to a holding member 5D, and sections 5B1-5B3, positions of which are controlled, abutted against the position control section 5D3 are fitted to the nozzle main body 5B in the adhesive applying unit 5C. Accordingly, the reproducibility of the position of the nozzle main body 5B of the adhesive applying unit 5C can be improved in the direction vertical to an adhesive surface, thus shortening the time of the exchange work of a syringe.

6. 发明专利

JPS6115773A Coating apparatus 失效
标题翻译：涂装装置
公开(公告)号：JPS6115773A
公开(公告)日：1986-01-23
申请号：JP13514684
申请日：1984-07-02
申请人： Hitachi Device Eng Co Ltd , Hitachi Ltd
发明人： NAGASHIMA MASAHARU , HIROSE HIDEYUKI , SASAKI HARUO , YASUTOME TAKESHI
IPC分类号： B05C11/08 , H01L21/027 , H01L21/30
摘要： PURPOSE: To obtain a highly accurate film, by moving a coating nozzle to the radius direction of an article to be coated and controlling the speed of the coating nozzle in matching relation to the rotation of the article to be coated.
CONSTITUTION: The spin chuck 11 for sucking and holding an article 10 to be coated is made rotatable by a spin chuck rotating motor 12 and a coating nozzle 14 is also made horizontally movable along a guide 16 by a driving motor 15. The coating driving motor 15 receives rotational control by a coating nozzle speed control means 17 in matching relation to the rotation of the spin chuck driving motor 12. By this method, a coating solution can be uniformly and quickly dripped on the article 10 to be coated before the viscosity of a solvent is changed and a highly accurate film is obtained.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：为了获得高精度的膜，通过将涂布喷嘴移动到待涂覆的物品的半径方向，并且控制涂布喷嘴的速度与被涂物的旋转相匹配。构成：用于吸附和保持待涂覆物品10的旋转卡盘11通过旋转卡盘旋转电动机12旋转，并且喷嘴14也通过驱动电动机15沿引导件16水平移动。涂覆驱动电机 15通过涂布喷嘴速度控制装置17接收与旋转卡盘驱动电动机12的旋转相匹配的旋转控制。通过这种方法，可以将涂布溶液均匀且快速地滴在要涂布的物品10上，改变溶剂并获得高精度的膜。

7. 发明专利

JPS63245934A SUCTION DEVICE FOR PELLET 失效
公开(公告)号：JPS63245934A
公开(公告)日：1988-10-13
申请号：JP7744787
申请日：1987-04-01
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： SHIBA MITSUAKI , SASAKI HARUO , WATANABE YOSHIHISA , ITO SHUICHI
IPC分类号： H01L21/52 , H01L21/677 , H01L21/68
摘要： PURPOSE:To relax a shock at the time of suction, and to prevent the suck-in of a foreign matter into a collet by forming the suction surface of the collet sucking a pellet by an elastic material, ejecting air from a fine clearance between the suction surface and the pellet and sucking the pellet. CONSTITUTION:When a collet 6 is moved to a section just above a guide 10, a push-up needle 11 is shifted upward, and a semiconductor pellet 1 is peeled from an adhesive tape 2. The pellet 1 is pushed against the suction surface 7a of the collet 6 while air is ejected from the suction surface of the collet 6. Air passes through a fine clearance 7b, and the pellet 1 is sucked by a Bernoulli's phenomenon. The pellet 1 is abutted against the suction surface 7a of the elastic material of the collet 6 on suction, thus relaxing a shock, then preventing the generation of cracking. Suck-in to the collet 6 and falling to the pellet 1 of a foreign matter are obviated by the blow-off of air. Accordingly, the quality of a semiconductor is improved.

8. 发明专利

JPS62195118A PHOTORESIST DEVELOPING DEVICE 失效
公开(公告)号：JPS62195118A
公开(公告)日：1987-08-27
申请号：JP3516886
申请日：1986-02-21
申请人： HITACHI LTD , HITACHI DEVICE ENG
发明人： HIROSE HIDEYUKI , SASAKI HARUO , YASUTOME TAKESHI
IPC分类号： H01L21/30 , G03F7/00 , G03F7/30 , H01L21/027
摘要： PURPOSE:To increase the processing capability of a developing line as well as to contrive improvement in through put of the device as a whole by a method wherein a plurality of developing units are provided in series and a buffer, wherein wafers are temporarily housed, is provided between the developing unit on the side of a baking furnace and the baking furnace. CONSTITUTION:Two positions are formed by providing two developing units 7k and 7l in series, and a buffer 7m is provided. Wafers are fed from a loader 7g by a belt units 16 and 17, and they are developed at the same time by the developing units 7k and 7l. After they have been developed, they are temporarily housed in the buffer 7m, and then they are housed in an unloader 7j by a belt unit 19 passing through a baking furnace 7i by the belt unit 18.

9. 发明专利

JPH0867468A MACHINE ROOM FLOOR OF ELEVATOR 失效
公开(公告)号：JPH0867468A
公开(公告)日：1996-03-12
申请号：JP20548894
申请日：1994-08-30
申请人： TAISEI CORP , HITACHI LTD , HITACHI BUILDING SYST ENG
发明人： MORINAGA TAKASHI , TADOKORO TOSHIYUKI , SASAKI HARUO
IPC分类号： B66B11/04
摘要： PURPOSE: To reduce cutting points of a reinforcing member and not to bury a machine beam in a concrete slab. CONSTITUTION: Pedestals 10 divided in a plural number, arranged with specified intervals between each of them, upper surfaces of which are at least exposed from a concrete slab 5 and supporting a machine beam are buried in the concrete slab 5. Consequently, it is possible to improve efficiency of work. Additionally, it is possible to improve productivity of the concrete slab and to reduce its production cost.

10. 发明专利

JPH04363169A WET TREATING DEVICE 失效
公开(公告)号：JPH04363169A
公开(公告)日：1992-12-16
申请号：JP10250991
申请日：1991-05-08
申请人： HITACHI LTD
发明人： HIROSE HIDEYUKI , HINOSUGI MITSURU , KOMATANI MASATOSHI , SASAKI HARUO
IPC分类号： B05C9/10 , B05C11/08 , B05D1/40 , G03F7/16 , H01L21/027 , H01L21/30
摘要： PURPOSE:To improve the uniformity of a photoresist application and to decrease the fluctuations in film thickness by providing a vacuum chuck and temp. regulator system which previously regulate the temp. of a wafer prior to spin coating of a photoresist. CONSTITUTION:A cooling unit 11 of the wafer 3 having the vacuum chuck, the temp. regulator 12 of a cooling water circulation type, and a circulating pipe 13 which connects the cooling unit 11 and the temp. regulator 12 and circulates cooling water to the cooling unit 11 are provided. The temp. of the wafer 3 is previously regulated by using the cooling unit 11, the temp. regulator 12 and the circulating pipe 13 prior to the spin coating of the photoresist. Consequently, the uniformity of the photoresist application is improved and the fluctuations in the film thickness are decreased.

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