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1. 发明专利

JP2006030017A Probe and minute sample pickup mechanism 审中-公开
标题翻译：探索和分钟抽样机制
公开(公告)号：JP2006030017A
公开(公告)日：2006-02-02
申请号：JP2004210199
申请日：2004-07-16
申请人： Aoi Electronics Co Ltd , Sii Nanotechnology Inc , アオイ電子株式会社 , エスアイアイ・ナノテクノロジー株式会社
发明人： MUNEKANE MASANAO , IWASAKI KOJI , KONNO TAKASHI , HAYASHI HIROKI
IPC分类号： G01N1/00 , G01N1/28 , H01J37/20
CPC分类号： H01J37/20 , B25J7/00 , B25J15/12 , G01N1/32 , H01J2237/20264
摘要： PROBLEM TO BE SOLVED: To provide a mechanism having a contact sensing function of a sample and a probe applying no damage to the sample at the time of the approach to the sample, capable of rapidly and certainly handling the minute sample, not selecting the material of the sample and having a simple structure.
SOLUTION: This probe mechanism and the sample pickup mechanism have a leading end member comprising a needle-like body which achieves the contact with the sample provided to an observation device or an analyzer and is equipped with a driving electrostatic actuator and a means for monitoring the change in the electrostatic capacity between the electrodes of the electrostatic actuator. The contact of the probe with the sample can be detected by the monitor means.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供具有样品接触感应功能的机构和在接近样品时不对样品造成伤害的探针，能够快速且肯定地处理微小样品，而不是选择样品的材料并具有简单的结构。解决方案：该探针机构和样品拾取机构具有前端构件，其包括针状体，其实现与提供给观察装置或分析器的样品的接触，并且配备有驱动静电致动器和装置用于监测静电致动器的电极之间的静电容量的变化。探头与样品的接触可由监视器检测。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2008311521A Particle removal method, minute tweezer apparatus, atomic force microscope, and charged particle beam apparatus 审中-公开
标题翻译：颗粒去除方法，微型二极管装置，原子力显微镜和充电颗粒光束装置
公开(公告)号：JP2008311521A
公开(公告)日：2008-12-25
申请号：JP2007159230
申请日：2007-06-15
申请人： Aoi Electronics Co Ltd , Sii Nanotechnology Inc , アオイ電子株式会社 , エスアイアイ・ナノテクノロジー株式会社
发明人： HAYASHI HIROKI , KONNO TAKASHI , IWASAKI KOJI , YASUTAKE MASATOSHI , TASHIRO JUNICHI
IPC分类号： H01L21/304 , H01L21/027
CPC分类号： B25J7/00 , G01Q80/00
摘要： PROBLEM TO BE SOLVED: To prevent particles stuck to minute tweezers from sticking to a test piece again.
SOLUTION: Nano tweezers 1 with a pair of freely openable and closable arms are brought closer to a test piece surface, clamp the particle P stuck to the test sample surface, the nano tweezers 1 clamping the particle P are moved onto an adhesive member 3, the particle P is brought into contact with the adhesive member 3, then the nano tweezers 1 are separated from the adhesive member 3 while opened, and thus the particle is surely removed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了防止粘附在微小镊子上的颗粒再次粘到试验片上。解决方案：将具有一对可自由打开和关闭的臂的纳米镊子1靠近测试件表面，夹持粘附到测试样品表面上的颗粒P，将夹持颗粒P的纳米镊子1移动到粘合剂构件3，使颗粒P与粘合构件3接触，然后将纳米镊子1打开时与粘合构件3分离，从而可靠地除去颗粒。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2006026826A Nano-gripper device 有权
标题翻译： NANO-GRIPPER设备
公开(公告)号：JP2006026826A
公开(公告)日：2006-02-02
申请号：JP2004210566
申请日：2004-07-16
申请人： Aoi Electronics Co Ltd , Sii Nanotechnology Inc , アオイ電子株式会社 , エスアイアイ・ナノテクノロジー株式会社
发明人： KONNO TAKASHI , HAYASHI HIROKI , TANI TOSHIHIDE , MUNEKANE MASANAO , IWASAKI KOJI
IPC分类号： B81B3/00 , B25J7/00 , B25J15/08 , H02N1/00
CPC分类号： B25J7/00 , B25J15/00
摘要： PROBLEM TO BE SOLVED: To provide a nano-gripper device which allows the operator to positively and easily check whether a sample is gripped or not, and can grip the sample in a suitable state.
SOLUTION: Each drive section 6 of the nano-gripper device has a fixed electrode and a movable electrode for driving an arm 3. The fixed electrode 60a and the movable electrode 61a function to drive the left arm 3, and the movable electrode 61a is elastically supported on a base stand 7 by a support section 62. Similarly the arm 3 is elastically supported on the base stand 7 by a support section 63. When voltage is supplied to a gap between the electrodes 60a, 61a, the movable electrode 61a moves rightward by Coulomb force to drive the arm 3 in a closing direction. Then determination as to whether or not the sample is gripped is made based on an electric capacity between the electrodes 60a, 61a, detected by detection circuits 91A, 91B, and a change in the electric capacity between the electrodes 60b, 61b.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种纳米夹具装置，其允许操作者积极和容易地检查样品是否被夹持，并且可以以合适的状态夹持样品。解决方案：纳米夹持装置的每个驱动部分6具有固定电极和用于驱动臂3的可动电极。固定电极60a和可动电极61a用于驱动左臂3和可动电极 61a通过支撑部分62弹性地支撑在基座7上。类似地，臂3通过支撑部分63弹性地支撑在基座7上。当电压被提供给电极60a，61a之间的间隙时，可动电极 61a通过库仑力向右移动以沿闭合方向驱动臂3。然后基于由检测电路91A，91B检测的电极60a，61a之间的电容和电极60b，61b之间的电容的变化，确定是否夹持样品。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2008185338A Micro sample stand, its production method, micro sample stand assembly, and sample holder 有权
标题翻译：微型样品台，其生产方法，微型样品架组件和样品架
公开(公告)号：JP2008185338A
公开(公告)日：2008-08-14
申请号：JP2007016366
申请日：2007-01-26
申请人： Aoi Electronics Co Ltd , Sii Nanotechnology Inc , アオイ電子株式会社 , エスアイアイ・ナノテクノロジー株式会社
发明人： IKEDA DAISUKE , IWASAKI KOJI
IPC分类号： G01N1/28
摘要： PROBLEM TO BE SOLVED: To avoid breakage of a micro sample piece S during conveyance of a sample holder.
SOLUTION: This micro sample stand 10 the whole of which is made of silicon has a base part 11, fixing parts 12 and guard parts 13. The micro sample piece S is erected on the top of the fixing part 12 and fixed. The micro sample stand 10 has an integrated structure wherein two fixing parts 12 and three guard parts 13 are projected alternately on the upper surface 11A of the base part 11. The sample stand 10 is manufactured so that the thickness of the guard part 13 is thicker than that of the fixing part 12, and that the height (length in the Z-direction) of the guard part 13 is higher than that of the fixing part 12.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了避免在样品架的输送期间微样品S的破损。解决方案：该微型样品台10全部由硅制成，具有基部11，固定部12和防护部13.微型样品S竖立在固定部12的顶部并固定。微型样品台10具有一体的结构，其中两个固定部分12和三个防护部分13交替地突出在基部11的上表面11A上。样品台10被制造成使得防护部分13的厚度更厚保护部13的高度（Z方向的长度）高于固定部12的高度。（C）2008，JPO＆INPIT

5. 发明专利

JP2006026827A Nano-gripper device with length measuring function 审中-公开
标题翻译：具有长度测量功能的NANO-GRIPPER设备
公开(公告)号：JP2006026827A
公开(公告)日：2006-02-02
申请号：JP2004210567
申请日：2004-07-16
申请人： Aoi Electronics Co Ltd , Sii Nanotechnology Inc , アオイ電子株式会社 , エスアイアイ・ナノテクノロジー株式会社
发明人： KONNO TAKASHI , HAYASHI HIROKI , TANI TOSHIHIDE , OI MASAMICHI , MUNEKANE MASANAO , IWASAKI KOJI
IPC分类号： B81B3/00 , B81B7/02 , G01B7/00 , G01M99/00
CPC分类号： G01B7/02
摘要： PROBLEM TO BE SOLVED: To provide a nano-gripper device with a length measuring function, which can grip a sample, and can measure the size of the sample by gripping the same.
SOLUTION: Each drive section 6 of the nano-gripper device has a fixed electrode and a movable electrode for driving an arm 3. The fixed electrode 60a and the movable electrode 61a function to drive the left arm 3, and the movable electrode 61a is elastically supported on a base stand 7 by a support section 62. Similarly the arm 3 is elastically supported on the base stand 7 by a support section 63. When voltage is supplied to a gap between the electrodes 60a, 61a, the movable electrode 61a moves rightward by Coulomb force to drive the arm 3 in a closing direction. Then the dimension of the sample can be measured based on an electric capacity between the electrodes 60a, 61a and an electric capacity between the electrodes 60b, 61b assumed when the arms 3 grip the sample, and a relationship between an interval between the arms 3 and the electric capacity stored in a memory circuit 93.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有可以抓住样品的长度测量功能的纳米夹具装置，并且可以通过夹持样品来测量样品的尺寸。解决方案：纳米夹持装置的每个驱动部分6具有固定电极和用于驱动臂3的可动电极。固定电极60a和可动电极61a用于驱动左臂3和可动电极 61a通过支撑部分62弹性地支撑在基座7上。类似地，臂3通过支撑部分63弹性地支撑在基座7上。当电压被提供给电极60a，61a之间的间隙时，可动电极 61a通过库仑力向右移动以沿闭合方向驱动臂3。然后可以基于电极60a，61a之间的电容和当臂3夹持样品时假设的电极60b，61b之间的电容以及臂3和3之间的间隔之间的关系来测量样品的尺寸存储在存储器电路93中的电容。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005044843A Defect correcting method of original form for nano imprint lithography 审中-公开
标题翻译： NANO IMPRINT LITHOGRAPHY的原始形式的缺陷修正方法
公开(公告)号：JP2005044843A
公开(公告)日：2005-02-17
申请号：JP2003200276
申请日：2003-07-23
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： TAKAOKA OSAMU , IWASAKI KOJI
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To correct defects in an original plate (photo-mask) used for nano imprint lithography so as to provide a defect-free original plate.
SOLUTION: A charged particle beam is used for correcting black defects or white defects in the original plate used for nano imprint lithography. When black defects are corrected, assist gas or etching gas is introduced through an etching gas introduction system 6, and only a black defect region 3 is selectively irradiated with an charged particle beam 4 and etched as high as the height of a recess of the original plate for correction. When white defects are corrected, material gas is introduced through a deposition gas introduction system 9, and only a white defect region 7 is selectively irradiated with the charged particle beam 4 to deposit a white defect correcting film 8 as high as the height of a projection of the original form. Or, the black defect region 3 is physically removed as high as the height of the recess of the original plate with the probe 5 of an inter-atomic force microscope harder than the material of the work piece.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：纠正用于纳米压印光刻的原版（光掩模）中的缺陷，以提供无缺陷的原版。
解决方案：带电粒子束用于校正用于纳米压印光刻的原始板中的黑色缺陷或白色缺陷。当黑色缺陷被校正时，通过蚀刻气体引入系统6引入辅助气体或蚀刻气体，并且只有黑色缺陷区域3被选择性地照射带电粒子束4并且被蚀刻成原始的凹部的高度修正板。当白色缺陷被校正时，通过沉积气体引入系统9引入原料气体，并且只有白色缺陷区域7被选择性地照射带电粒子束4以沉积高达投影高度的白色缺陷校正膜8 的原始形式。或者，原子力显微镜的探针5比工件的材料硬，黑色缺陷区域3被物理去除与原版的凹部的高度一样高。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004361140A Film thickness control method in film thinning and system for executing the method 有权
公开(公告)号：JP2004361140A
公开(公告)日：2004-12-24
申请号：JP2003157121
申请日：2003-06-02
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： IWASAKI KOJI , ICHINOMIYA YUTAKA
IPC分类号： G01N1/28 , G01N1/32 , H01J37/20 , H01J37/30 , H01J37/317
CPC分类号： G01N1/32 , H01J2237/3174
摘要： PROBLEM TO BE SOLVED: To provide a method capable of performing film thickness control set by FIB processing without a processing recipe for film thinning, and performing simply fine processing of a TEM sample or the like by a skill in some degree, and a system for executing the method.
SOLUTION: In this fine processing method of the TEM sample or the like, the one-line processing quantity by an FIB under a prescribed condition is grasped, and the film thinning residual width on the sample upper face is measured by a microscope length measuring function, and the number of scanning lines necessary for processing until acquiring a prescribed width value is determined by operation, and processing is continued until acquiring the set thickness. In the method for grasping the one-line processing quantity by the FIB under the prescribed condition, the sample is processed by performing scanning of a plurality of lines, and the etching size at that time is measured by the microscope length measuring function, and the average processing quantity by one-line scanning is calculated.
COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2004354371A Micro sample taking-out device and method 审中-公开
公开(公告)号：JP2004354371A
公开(公告)日：2004-12-16
申请号：JP2004129376
申请日：2004-04-26
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： IWASAKI KOJI , YAMAMOTO HIROSHI
IPC分类号： G01N23/225 , G01N1/28 , G01N1/32 , H01J37/20 , H01J37/305
CPC分类号： H01J37/20 , G01N1/32 , H01J2237/208
摘要： PROBLEM TO BE SOLVED: To surely take out a micro sample using a microscope with a manipulator. SOLUTION: An XYZ-driving mechanism 5 for rotating a probe using a low-vibration stepping motor drives a supported object three-dimensional-directionally. The low-vibration stepping motor 4 is provided between the driving mechanism and a probe holding tool 3 to be fixed respectively thereto. The probe holding tool has a cylindrical or columnar shape, and holds the probe 2. The probe holding tool is attached to a rotary shaft of the low-vibration stepping motor. After the micro sample 1 is taken out by the probe, the low-vibration stepping motor is rotated to rotate the whole probe holding tool. A state of a probe tip is observed therein by an optical microscope, an electron microscope or an ion microscope, and the rotation of the low-vibration stepping motor is stopped when the micro sample is directed along a desired direction. Regulation is executed precisely without contacting with the probe holding tool, by this manner. COPYRIGHT: (C)2005,JPO&NCIPI

9. 发明专利

JP2010190808A Focused ion beam device, and processing method of sample using the same 有权
标题翻译：聚焦离子束装置及其使用方法的处理方法
公开(公告)号：JP2010190808A
公开(公告)日：2010-09-02
申请号：JP2009037307
申请日：2009-02-20
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： MITSU KIN , IWASAKI KOJI , TASHIRO JUNICHI
IPC分类号： G01N1/28 , G01N1/32 , H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , G01N1/32 , H01J37/3056 , H01J2237/208
摘要： PROBLEM TO BE SOLVED: To provide a focused ion beam device for fixing a sample on a sample holder by changing its direction without requiring a tilting mechanism by using a fine pincette and its rotation mechanism as a manipulator, when performing processing by the focused ion beam device. SOLUTION: This focused ion beam device 100 includes: a sample holder 62 having a fixing surface 62s for fixing the sample 20; a sample stand 61 on which the sample holder is installed; a focused ion beam irradiation mechanism 120 for irradiating the sample with a focused ion beam; the fine pincette 50 for clamping the sample, wherein its axial direction L forms a prescribed angle θ with the surface of the sample stand; an opening/closing mechanism 53 for opening/closing the fine pincette; the rotation mechanism 54 for rotating the fine pincette around the axial direction; and a moving mechanism 55 for moving the position of the fine pincette. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种聚焦离子束装置，用于通过改变其方向而将样品固定在样品架上，而不需要通过使用细小的卡扣及其旋转机构作为机械手的倾斜机构，当通过聚焦离子束装置。解决方案：该聚焦离子束装置100包括：具有用于固定样品20的固定表面62s的样品保持器62; 其上安装有样品架的样品台61; 用于用聚焦离子束照射样品的聚焦离子束照射机构120; 用于夹持样品的细小的卡钳50，其轴向方向L与样品台的表面形成规定的角度θ; 用于打开/关闭精细卡钳的打开/关闭机构53; 旋转机构54，用于使细小的卡扣围绕轴向旋转; 以及用于移动精细卡钳的位置的移动机构55。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2007066710A Charged particle beam device 有权
标题翻译：充电颗粒光束装置
公开(公告)号：JP2007066710A
公开(公告)日：2007-03-15
申请号：JP2005251415
申请日：2005-08-31
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： TAKAHASHI HARUO , FUJII TOSHIAKI , ICHINOMIYA YUTAKA , IWASAKI KOJI , YAMAMOTO HIROSHI
IPC分类号： H01J37/30 , G01N1/28 , G01N1/32 , H01J37/20 , H01J37/28 , H01J37/317
CPC分类号： H01J37/304 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of controlling an irradiation angle of a gas ion beam accurately and easily according to an arrangement state of a sliced specimen.
SOLUTION: This charged particle beam device is provided with: a focused ion beam device 3 for fabricating the sliced specimen 2 by processing a specimen as well as observing the sliced specimen 2; a scanning electron microscope 4 for observing the sliced specimen 2, a gas-ion beam irradiation device 5 for carrying out finish processing by irradiating a gas-ion beam 12 onto the surface of the sliced specimen 2; a specimen stage 6 onto which the sliced specimen 2 is fixed and which has at least one or more rotation axis; a specimen posture recognition means 7 for recognizing a positional relationship of the sliced specimen 2 against the specimen stage 6; and a specimen stage control means 8 for controlling the specimen stage 6 based on a specimen posture recognized by the posture recognition means 7 and an installation angle of the gas-ion beam irradiation device 5 in order to make the incident angle of the gas-ion beam 12 against the surface or the rear surface of the sliced specimen 2 to have a desired value.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够根据切片试样的排列状态精确而容易地控制气体离子束的照射角度的带电粒子束装置。该带电粒子束装置具有：聚焦离子束装置3，用于通过加工试样以及观察切片样品2来制造切片样品2; 用于观察切片试样2的扫描电子显微镜4，用于通过将气体离子束12照射到切片试样2的表面上进行精加工的气体离子束照射装置5; 切片试样2固定在其上并具有至少一个或多个旋转轴线的试样台6; 用于识别切片试样2与样品台6的位置关系的试样姿态识别装置7; 以及用于基于由姿势识别装置7识别的样本姿势和气体离子束照射装置5的安装角度来控制样本台6的样本台控制装置8，以便使气体离子的入射角梁12相对于切片试样2的表面或后表面具有期望值。版权所有（C）2007，JPO＆INPIT

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