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1. 发明专利

JP2009192428A Composite charged particle beam apparatus, sample processing method using it and sample manufacturing method for transmission electron microscope 有权
标题翻译：复合充电颗粒光束装置，样品处理方法及其用于传输电子显微镜的样品制造方法
公开(公告)号：JP2009192428A
公开(公告)日：2009-08-27
申请号：JP2008035048
申请日：2008-02-15
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： TAKAHASHI HARUO , YAMAMOTO HIROSHI , ICHINOMIYA YUTAKA , IWASAKI KOJI
IPC分类号： G01N1/32 , G01N1/28 , G01N23/225 , H01J37/20 , H01J37/22 , H01J37/30 , H01J37/31 , H01J37/317
CPC分类号： H01J37/3056 , G01N1/286 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3005 , H01J37/3045 , H01J2237/31745 , H01J2237/31749
摘要： PROBLEM TO BE SOLVED: To provide a means for accurately subjecting a sample, which is easy to deteriorate by the irradiation with an electron beam, to ion beam etching without damaging operability or throughput.
SOLUTION: In a composite charged particle beam apparatus having an ion beam lens-barrel 1 and an electron beam lens-barrel 2 and capable of observing or measuring the state of a sample during the etching processing due to an ion beam by the electron beam, in the first place, an observation image by a secondary signal due to the electron beam containing the whole of a processed part is obtained and, in the second place, the irradiation enable region 7 and irradiation prohibiting region 8 in the observation image are set. In the third place, irradiation with the electron beam is restricted only to the irradiation enable region 7.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于通过电子束照射容易劣化的样品对离子束蚀刻进行精确地处理而不损害可操作性或生产量的装置。解决方案：在具有离子束透镜镜筒1和电子束透镜镜筒2的复合带电粒子束装置中，并且能够观察或测量由于离子束的蚀刻处理期间的样品的状态电子束首先获得了由于包含整个处理部分的电子束引起的二次信号的观察图像，并且在第二位置中，在观察图像中第二个是照射使能区域7和照射禁止区域8 被设置。第三，电子束的照射仅限于照射使能区域7.版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008047489A Focused ion beam device, sample cross section manufacturing method, and flake sample manufacturing method 有权
标题翻译：聚焦离子束装置，样品交叉部分制造方法和FLAKE样品制造方法
公开(公告)号：JP2008047489A
公开(公告)日：2008-02-28
申请号：JP2006224191
申请日：2006-08-21
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： FUJII TOSHIAKI , ICHINOMIYA YUTAKA , TASHIRO JUNICHI
IPC分类号： H01J37/32 , G01N1/28 , G01N1/32 , H01J37/305 , H01J37/317
CPC分类号： G01N23/2255 , G01N1/32 , G01N2223/104 , G01N2223/32 , G01N2223/611 , H01J37/3005 , H01J37/3045 , H01J37/3056 , H01J2237/30466 , H01J2237/30488 , H01J2237/31745 , H01J2237/31749
摘要： PROBLEM TO BE SOLVED: To provide a sample cross section manufacturing method capable of efficiently detecting a center position of a defective part or a contact hole by an FIB device without having an SEM observation function. SOLUTION: While executing etching work by scanning and irradiating the vicinity of a sample cross section region with a focused ion beam 1, secondary ions 2 generated by the irradiation of the focused ion beam 1 are detected. The etching work is ended by detecting a work end point by a work end point detection mechanism 16 from a detected secondary electron signal. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不具有SEM观察功能的情况下通过FIB装置有效地检测缺陷部或接触孔的中心位置的样本截面制造方法。解决方案：通过用聚焦离子束1扫描和照射样品横截面区域附近来执行蚀刻工作，检测通过聚焦离子束1的照射产生的二次离子2。通过检测到的二次电子信号通过工作终点检测机构16检测工作终点来结束蚀刻工作。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006236836A Sample height adjustment method, sample observation method, sample processing method, and charged particle beam device 有权
标题翻译：样本高度调整方法，样本观察方法，样本处理方法和充电粒子束装置
公开(公告)号：JP2006236836A
公开(公告)日：2006-09-07
申请号：JP2005051203
申请日：2005-02-25
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： ICHINOMIYA YUTAKA , SATO MAKOTO , TASHIRO JUNICHI
IPC分类号： H01J37/20 , H01J37/28 , H01J37/30 , H01J37/317
CPC分类号： G01N23/2251 , H01J37/20 , H01J37/28 , H01J37/304 , H01J37/3056 , H01J2237/20235 , H01J2237/216 , H01J2237/221 , H01J2237/31745
摘要： PROBLEM TO BE SOLVED: To carry out sample height adjustment in a short time with accuracy and ease without tilting a sample stand, by calculating a height of the sample for two charged particle beams to be focused on an identical observation point.
SOLUTION: From magnification of a secondary electron image by ion beam 2b irradiation and a secondary electron image by electron beam 12b irradiation, and a distance of an observation point of the secondary electron image by the ion beam 2b irradiation and that of secondary electron image by the electron beam 12b irradiation, a height of the sample for the ion beam 2b and the electron beam 12b to focus on the identical observation point is calculated with a calculating means 14.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过计算要聚焦在相同观察点上的两个带电粒子束的样品的高度，在准确和容易的情况下，在不倾斜样品台的情况下，在短时间内进行样品高度调节。解决方案：通过离子束2b照射的二次电子图像的放大和通过电子束12b照射的二次电子图像和通过离子束2b照射的二次电子图像的观察点的距离和二次电子通过电子束12b照射的电子图像，用计算装置14计算用于离子束2b的样品的高度和聚焦在相同观察点上的电子束12b。（C）2006年，JPO＆NCIPI

4. 发明专利

JP2006177896A Method and device for specifying observation or processing position, and method and device for processing sample 有权
标题翻译：用于指定观察或处理位置的方法和装置，以及处理样品的方法和装置
公开(公告)号：JP2006177896A
公开(公告)日：2006-07-06
申请号：JP2004373916
申请日：2004-12-24
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： ICHINOMIYA YUTAKA , TASHIRO JUNICHI , SATO MAKOTO
IPC分类号： G01N23/225 , G01R31/302 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： H01J37/222 , H01J37/28 , H01J37/3056 , H01J2237/24592 , H01J2237/2487 , Y10S707/99943 , Y10S707/99945
摘要： PROBLEM TO BE SOLVED: To provide a method or the like for specifying an observation or processing position capable of specifying the observation or processing position accurately and easily.
SOLUTION: A desired position is indicated by one of a first screen 12 and a second screen 13, and a corresponding position is specified by the other screen using a transformation function for transforming the coordinate system of the first screen 12 and the coordinate system of the second screen 13 to each other. Thus, a position on the other screen corresponding to the desired position indicated by the one screen can be specified.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于指定能够准确且容易地指定观察或处理位置的观察或处理位置的方法等。解决方案：通过第一屏幕12和第二屏幕13中的一个指示期望的位置，并且使用用于变换第一屏幕12的坐标系的变换功能和坐标的另一个屏幕来指定对应的位置第二屏幕13的系统彼此。因此，可以指定对应于由一个屏幕指示的期望位置的另一屏幕上的位置。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2004361140A Film thickness control method in film thinning and system for executing the method 有权
公开(公告)号：JP2004361140A
公开(公告)日：2004-12-24
申请号：JP2003157121
申请日：2003-06-02
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： IWASAKI KOJI , ICHINOMIYA YUTAKA
IPC分类号： G01N1/28 , G01N1/32 , H01J37/20 , H01J37/30 , H01J37/317
CPC分类号： G01N1/32 , H01J2237/3174
摘要： PROBLEM TO BE SOLVED: To provide a method capable of performing film thickness control set by FIB processing without a processing recipe for film thinning, and performing simply fine processing of a TEM sample or the like by a skill in some degree, and a system for executing the method.
SOLUTION: In this fine processing method of the TEM sample or the like, the one-line processing quantity by an FIB under a prescribed condition is grasped, and the film thinning residual width on the sample upper face is measured by a microscope length measuring function, and the number of scanning lines necessary for processing until acquiring a prescribed width value is determined by operation, and processing is continued until acquiring the set thickness. In the method for grasping the one-line processing quantity by the FIB under the prescribed condition, the sample is processed by performing scanning of a plurality of lines, and the etching size at that time is measured by the microscope length measuring function, and the average processing quantity by one-line scanning is calculated.
COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2009277536A Cross section image acquiring method using combined charged particle beam device, and combined charged particle beam device 有权
标题翻译：使用组合充电粒子束装置的交叉部分图像获取方法和组合充电粒子束装置
公开(公告)号：JP2009277536A
公开(公告)日：2009-11-26
申请号：JP2008128335
申请日：2008-05-15
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： ICHINOMIYA YUTAKA
IPC分类号： H01J37/147 , H01J37/22 , H01J37/317 , H01L21/66
CPC分类号： G01N23/2208
摘要： PROBLEM TO BE SOLVED: To provide an image acquiring method enabling to acquire a plurality of cross section images where cross sections and cross sections to be observed are arranged at predetermined positions. SOLUTION: The image acquiring method includes a cross section image pickup step S52 which follows a mark image pick-up step S42 of picking up a reference mark image while EB-scanning another region than the cross section to be observed, a drift amount calculating step S44 of calculating a current SEM drift amount at a predetermined time while comparing the picked-up reference mark image with a reference mark reference image, and an offset amount calculating step S46 for calculating the offset amount of the current cross section to be observed at a predetermined time. In the cross section image pick-up step S52, the EB scanned region at a predetermined time is corrected in accordance with the SEM drift amount and the offset amount and then the cross section image is picked up. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够获取多个横截面图像的图像获取方法，其中待观察的横截面和横截面布置在预定位置。解决方案：图像获取方法包括：横截面图像拾取步骤S52，其跟随标记图像拾取步骤S42，其拾取参考标记图像，同时EB扫描比要观察的横截面的另一区域，漂移计算当前扫描参考标记图像与参考标记参考图像比较时在预定时间计算当前SEM漂移量的量计算步骤S44;以及偏移量计算步骤S46，用于计算当前横截面的偏移量为在预定时间观察。在横截面图像拾取步骤S52中，根据SEM漂移量和偏移量来校正在预定时间的EB扫描区域，然后拾取横截面图像。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2009031168A X-ray tube and x-ray analyzer 有权
标题翻译： X射线管和X射线分析仪
公开(公告)号：JP2009031168A
公开(公告)日：2009-02-12
申请号：JP2007196819
申请日：2007-07-28
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： MATOBA YOSHITAKE , ICHINOMIYA YUTAKA
IPC分类号： G01N23/223
CPC分类号： H01J35/18 , G01N23/223 , G01N2223/076 , H01J2235/087
摘要： PROBLEM TO BE SOLVED: To achieve further miniaturization and weight reduction while more efficiently detecting fluorescent X rays or the like to enhance sensitivity in an X-ray tube and an X-ray analyzer. SOLUTION: The X-ray analyzer is equipped with a vacuum housing 2 internally held in a vacuum state and having a window part 1 formed of an X-ray transmitting film through which X rays are transmitted, an electron beam source 3 installed in the vacuum housing 2 to emit an electron beam (e), a target T irradiated with the electron beam (e) to emit primary X rays and installed in the vacuum housing 2 to emit the primary X rays to an external sample S through the window part 1, an X-ray detecting element 4 housed in the vacuum housing 2 to detect the fluorescent X rays and scattered X rays discharged from the sample S to enter from the window part 1 and outputting a signal containing the energy data of the fluorescent X rays and the scattered X rays, and a metal guard member 10 arranged between the X-ray detecting element 4 and the irradiation region of the electron beam (e) of the target T. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了进一步小型化和减轻重量，同时更有效地检测荧光X射线等，以提高X射线管和X射线分析仪的灵敏度。解决方案：X射线分析仪装备有内部保持在真空状态的真空壳体2，并且具有由透射X射线的X射线透射膜形成的窗口部分1，安装有电子束源3 在真空壳体2中发射电子束（e），用电子束（e）照射的靶T发射初级X射线，并安装在真空壳体2中，以通过以下方式向外部样品S发射主X射线窗口部分1，容纳在真空壳体2中的X射线检测元件4，用于检测从窗口部分1进入的样品S放出的荧光X射线和散射的X射线，并输出含有荧光体的能量数据的信号 X射线和散射的X射线以及布置在X射线检测元件4与靶T的电子束（e）的照射区域之间的金属保护构件10.版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2009031167A X-ray tube and x-ray analyzer 有权
标题翻译： X射线管和X射线分析仪
公开(公告)号：JP2009031167A
公开(公告)日：2009-02-12
申请号：JP2007196817
申请日：2007-07-28
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： MATOBA YOSHITAKE , ICHINOMIYA YUTAKA
IPC分类号： G01N23/223
CPC分类号： H01J35/08 , H01J35/12 , H01J35/18 , H01J2235/087 , H01J2235/1291
摘要： PROBLEM TO BE SOLVED: To achieve further miniaturization and weight reduction while more efficiently detecting fluorescent X rays or the like to enhance sensitivity in an X-ray tube and an X-ray analyzer. SOLUTION: The X-ray analyzer is equipped with a vacuum housing 2 internally held in a vacuum state and having a window part 1 formed of an X-ray transmitting film through which X rays are transmitted, an electron beam source 3 installed in the vacuum housing 2 to emit an electron beam (e), a target T irradiated with the electron beam (e) to emit primary X rays and provided on the central part of the window part 1 to emit the primary X rays to an external sample S through the window part 1 and having an outer diameter smaller than that of the window part 1, an X-ray detecting element 4 housed in the vacuum housing 2 to detect the fluorescent X rays and scattered X rays discharged from the sample S to enter from the window part 1 and outputting a signal containing the energy data of the fluorescent X rays and the scattered X rays, and a heat and electricity conducting part 10 made of a metal extending to the vacuum housing 2 from the target T provided to a part on the window part 1. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了进一步小型化和减轻重量，同时更有效地检测荧光X射线等，以提高X射线管和X射线分析仪的灵敏度。解决方案：X射线分析仪装备有内部保持在真空状态的真空壳体2，并且具有由透射X射线的X射线透射膜形成的窗口部分1，安装有电子束源3 在真空壳体2中发射电子束（e），用电子束（e）照射的靶T发射初级X射线并设置在窗口部分1的中心部分上以将外部X射线发射到外部样品S通过窗口部分1，外径小于窗口部分1的外径; X射线检测元件4，容纳在真空壳体2中，以检测荧光X射线和从样品S排出的散射X射线从窗口部分1进入并输出含有荧光X射线和散射X射线的能量数据的信号，以及从设置到真空壳体2的目标T延伸到真空壳体2的金属制成的导热部分10 部分在窗口部分1 P>版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2004361138A Fib device for tem sample processing equipped with function for automatically recognizing bending 有权
标题翻译：用于自动识别弯曲功能的TEM样品处理的FIB装置
公开(公告)号：JP2004361138A
公开(公告)日：2004-12-24
申请号：JP2003157119
申请日：2003-06-02
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： IWASAKI KOJI , ICHINOMIYA YUTAKA
IPC分类号： G01N1/32 , G01N1/28 , H01J37/30 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a technology capable of TEM sample automatic finishing by being equipped with a function for recognizing automatically a bending phenomenon generated in TEM sample processing by an FIB device.
SOLUTION: In a bending automatic recognition method in the TEM sample processing, secondary electron detection is performed by a secondary charged particle detector at a thinning time of the TEM sample, and the sample is determined to be bent when detecting a sudden change in a detection signal. In a TEM sample processing method, the secondary electron detection is performed by the secondary charged particle detector at the thinning time of the TEM sample, and the sample is determined to be bent when detecting the sudden change in the detection signal, and thinning is discontinued. Cutting by the FIB is performed to straighten the bending, and thinning is proceeded in this state.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够进行TEM样品自动精加工的技术，其具有自动识别由FIB器件在TEM样品处理中产生的弯曲现象的功能。解决方案：在TEM样品处理中的弯曲自动识别方法中，在TEM样品的稀疏时间通过二次带电粒子检测器进行二次电子检测，并且在检测到突变时确定样品弯曲在检测信号中。在TEM样品处理方法中，在TEM样品的稀疏时间，通过二次带电粒子检测器进行二次电子检测，并且在检测到检测信号的突然变化时确定样品弯曲，并且中断稀释。通过FIB进行切割以使弯曲变直，并且在该状态下进行变薄。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2012052817A Fluorescent x-ray analysis apparatus and fluorescent x-ray analysis method 有权
标题翻译：荧光X射线分析装置和荧光X射线分析方法
公开(公告)号：JP2012052817A
公开(公告)日：2012-03-15
申请号：JP2010193167
申请日：2010-08-31
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： HASEGAWA KIYOSHI , ICHINOMIYA YUTAKA , TAKIGUCHI HIDEKI
IPC分类号： G01N23/223
CPC分类号： G01N23/223 , G01N2223/076
摘要： PROBLEM TO BE SOLVED: To provide a fluorescent x-ray analysis apparatus and a fluorescent x-ray analysis method having excellent operation efficiency and capable of safely measuring a sample.SOLUTION: A fluorescent x-ray analysis apparatus 100 includes: a radiation source 2 for applying radial rays to an irradiation point P1 on a sample S; an x-ray detector 3; a moving mechanism 8 capable of relatively moving the sample S, the radiation source 2 and the x-ray detector 3; a housing 10; a door 20 for opening/closing an opening 10a for inserting/ejecting the sample S to the inside/outside of the casing 10; a height measurement mechanism 7 capable of measuring the height of the irradiation point P1; a moving mechanism control part 9 for adjusting distances between the sample S and the radiation source 2 and the x-ray detector 3 based on the measured height of the irradiation point P1; a laser part 7 for applying visible light laser to the irradiation point P1; a laser part operation control part 9 which, when the door 20 is in an opened state, operates the laser part 7 to apply the visible light laser, and when the door is in a closed state, stops the laser part 7; and a height measurement mechanism operation control part 9 which, when the door 20 is in the opened state, operates the height measurement mechanism 7 to measure the height of the irradiation point P1.
摘要翻译：要解决的问题：提供具有优异的操作效率并且能够安全地测量样品的荧光X射线分析装置和荧光X射线分析方法。解决方案：荧光X射线分析装置100包括：用于向样品S上的照射点P1施加径向射线的辐射源2; x射线检测器3; 能够相对移动样品S，辐射源2和X射线检测器3的移动机构8; 外壳10; 用于打开/关闭用于将样品S插入/排出到壳体10的内部/外部的开口10a的门20; 能够测量照射点P1的高度的高度测量机构7; 移动机构控制部分9，用于根据测得的照射点P1的高度来调节样本S与辐射源2和X射线检测器3之间的距离; 用于向照射点P1施加可见光激光的激光部7; 激光部分操作控制部分9，当门20处于打开状态时，操作激光部分7以施加可见光激光，并且当门处于关闭状态时，停止激光部分7; 以及高度测量机构操作控制部分9，当门20处于打开状态时，操作高度测量机构7以测量照射点P1的高度。版权所有（C）2012，JPO＆INPIT

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