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1. 发明专利

JP2013036793A X-ray analyzing apparatus and method 有权
标题翻译： X射线分析装置和方法
公开(公告)号：JP2013036793A
公开(公告)日：2013-02-21
申请号：JP2011171595
申请日：2011-08-05
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： MATOBA YOSHITAKE , NAKATANI RINTARO , SATO TSUNEO
IPC分类号： G01N23/04 , G01N23/223
CPC分类号： G01N23/06 , G01N23/223 , G01N2223/076
摘要： PROBLEM TO BE SOLVED: To provide an X-ray analyzing apparatus capable of accurately and quickly performing elemental analysis on a position of a foreign matter detected by a transmitted X-ray device by using a fluorescent X-ray.SOLUTION: An X-ray analyzing apparatus 1 includes: a transmitted X-ray inspection unit 10 including a first X-ray source 12 and a transmitted X-ray detector 14 for detecting a transmitted X-ray 12x transmitted from the first X-ray source through a sample 100; a fluorescent X-ray inspection unit 20 including a second X-ray source 22 and a fluorescent X-ray detector 24 for detecting an X-ray 22y discharged from the sample when an X-ray from the second X-ray source is applied to the sample; a sample stage 50 for holding the sample; a moving mechanism 30 for relatively moving the sample stage between an irradiation position of the first X-ray source and an irradiation position of the second X-ray source; foreign matter position calculation means 60 for calculating a position of a foreign matter 101 detected in the sample by the transmitted X-ray detector; and moving mechanism control means 61 for controlling the moving mechanism so that the position of the foreign matter calculated by the foreign matter position calculation means coincides with an optical axis 22c of the second X-ray source.
摘要翻译：解决的问题：提供一种能够通过使用荧光X射线，准确，快速地对由透射的X射线装置检测到的异物的位置进行元素分析的X射线分析装置。解决方案：X射线分析装置1包括：透射X射线检查单元10，包括第一X射线源12和透射X射线检测器14，用于检测从第一X射线源12发射的透射X射线12x 通过样品100的X射线源; 荧光X射线检查单元20包括第二X射线源22和荧光X射线检测器24，用于检测当来自第二X射线源的X射线时从样品排出的X射线22y被施加到例子; 用于保持样品的样品台50; 用于在第一X射线源的照射位置和第二X射线源的照射位置之间使样本台相对移动的移动机构30; 异物位置计算装置60，用于计算由所发送的X射线检测器在样本中检测到的异物101的位置; 以及用于控制移动机构的移动机构控制装置61，使得由异物位置计算装置计算的异物的位置与第二X射线源的光轴22c重合。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP5146746B2 X-ray analyzer 有权
公开(公告)号：JP5146746B2
公开(公告)日：2013-02-20
申请号：JP2008127295
申请日：2008-05-14
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：啓一田中 , 哲中山
IPC分类号： G01N23/223 , G01N23/225 , G01T1/26 , H01L39/00

3. 发明专利

JP5135516B2 Thin sample preparation method 有权
公开(公告)号：JP5135516B2
公开(公告)日：2013-02-06
申请号：JP2008059553
申请日：2008-03-10
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：浩二岩崎
IPC分类号： G01N1/28 , H01J37/317
CPC分类号： H01J2237/208

5. 发明专利

JP5055594B2 Sample transfer method and a charged particle beam device in the charged particle beam device 有权
公开(公告)号：JP5055594B2
公开(公告)日：2012-10-24
申请号：JP2007063551
申请日：2007-03-13
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：正直宗兼 , 純一田代
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/3056 , H01J2237/2007 , H01J2237/20278 , H01J2237/31735 , H01L21/68707

6. 发明专利

JP5046039B2 Liquid during the observation for the sensor and the liquid in the observation apparatus 有权
公开(公告)号：JP5046039B2
公开(公告)日：2012-10-10
申请号：JP2008106897
申请日：2008-04-16
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：誠人伊與木 , 直哉渡邉 , 雅次繁野
IPC分类号： G01Q30/14 , G01Q60/00 , G01Q20/04
CPC分类号： G01Q20/04 , G01Q30/14

7. 发明专利

JP5044290B2 Micro-machining dust removing device and micro-processing equipment, as well as micro-machining dust removal method 有权
公开(公告)号：JP5044290B2
公开(公告)日：2012-10-10
申请号：JP2007147138
申请日：2007-06-01
申请人：エスアイアイ・ナノテクノロジー株式会社 , 国立大学法人静岡大学
发明人：卓哉中上 , 正敏安武 , 太岩田 , 修一菊池 , 修高岡
IPC分类号： B82B3/00 , B81C99/00 , B82Y40/00 , G01Q60/24 , G01Q80/00
CPC分类号： G03F1/82 , G03F7/0002

8. 发明专利

JP5039961B2 Three-dimensional image construction method 有权
公开(公告)号：JP5039961B2
公开(公告)日：2012-10-03
申请号：JP2007114001
申请日：2007-04-24
申请人：エスアイアイ・ナノテクノロジー株式会社
发明人：浩二岩崎
IPC分类号： H01J37/22 , G01N1/28 , G01N23/225 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To construct an accurate and clear three-dimensional image of a sample by superposing a plurality of continuously-acquired cross-sectional images without being affected by drift. SOLUTION: A three-dimensional image construction method executes the following steps, that is, a step for forming a deposition film DP on the surface of a sample 2, a step for forming a correction mark M, linearly extending toward one direction, on the deposition film, a step for executing etching so as to cross the correction mark and exposing the cross-section of the deposition film and that of the sample, a step for acquiring an exposed cross-sectional image of the deposition film and that of the sample, a step for continuously acquiring a plurality of cross-sectional images by repeatedly executing each of the above steps, and a step for constructing a basic three-dimensional image by superposing the plurality of cross-sectional images in the acquisition order on the basis of the correction mark. COPYRIGHT: (C)2009,JPO&INPIT

9. 发明专利

JP2012185037A Friction force microscope 有权
标题翻译：摩擦力显微镜
公开(公告)号：JP2012185037A
公开(公告)日：2012-09-27
申请号：JP2011048198
申请日：2011-03-04
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： YASUTAKE MASATOSHI , WATANABE MASASHI
IPC分类号： G01Q60/26
CPC分类号： G01Q60/24 , G01Q60/22 , G01Q60/26
摘要： PROBLEM TO BE SOLVED: To enable quantitative measurement of a friction force by a cantilever in a friction force microscope.SOLUTION: A friction force microscope includes a calculation mechanism which calculates the effective probe height and twist spring constant of a cantilever in the friction force microscope by bending sensitivity obtained from displacement information of the cantilever in the bending direction and twisting sensitivity obtained from displacement information in the twisting direction, respectively, and calculates a friction force using the calculation values.

10. 发明专利

JP2012181107A Method and device for evaluating mechanical characteristic 审中-公开
标题翻译：用于评估机械特性的方法和装置
公开(公告)号：JP2012181107A
公开(公告)日：2012-09-20
申请号：JP2011044289
申请日：2011-03-01
申请人： Sii Nanotechnology Inc , エスアイアイ・ナノテクノロジー株式会社
发明人： KITAJIMA SHU , YASUTAKE MASATOSHI
IPC分类号： G01N3/42 , G01N3/46 , G01Q60/34
摘要： PROBLEM TO BE SOLVED: To provide a method and device for evaluating a mechanical characteristic, which can preliminarily set the magnitude of impact force and friction force to be loaded and properly evaluate a mechanical characteristic, such as impact resistance and abrasion resistance of a sample.SOLUTION: Impact force and friction force to be mechanically loaded on a sample are preliminarily set, a probe is vibrated in a direction (Z direction) perpendicular to the sample arranged opposedly from the probe, the probe and the sample are relatively vibrated in a direction (XY direction) horizontal to the sample, the vibrated probe and sample are brought into contact with each other to load impact force and friction force, the depth of a trace by the impact force and friction force is measured, and the impact resistance and abrasion resistance of the sample are evaluated from data of the measured depth of the trace, data of the set impact force and data of the set friction force.
摘要翻译：要解决的问题：提供一种用于评估机械特性的方法和装置，其可以预先设定要加载的冲击力和摩擦力的大小，并适当地评估诸如耐冲击性和耐磨性的机械特性一个样品。
解决方案：预先设定机械负载在样品上的冲击力和摩擦力，探针沿垂直于与探针相对布置的样品的方向（Z方向）振动，探针和样品相对振动在与样品水平的方向（XY方向）上，振动的探针和样品彼此接触以承受冲击力和摩擦力，测量由冲击力和摩擦力引起的痕迹深度，并且影响根据测量的迹线深度，设定的冲击力的数据和设定的摩擦力的数据的数据，对样品的耐电阻和耐磨性进行评估。版权所有（C）2012，JPO＆INPIT

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