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1. 发明专利

JP2013257389A Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：JP2013257389A
公开(公告)日：2013-12-26
申请号：JP2012132235
申请日：2012-06-11
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： WATANABE KENJI
IPC分类号： G03F7/20 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus for which a pre-alignment is not required after inversion of a printed wiring board.SOLUTION: The exposure apparatus comprises: one surface side exposing part 1 for performing exposure to one surface side of a printed wiring board 99; a transfer part 2; and other side exposing part 3 for performing exposure to the other surface side. The exposing parts 1, 3 respectively include suction hands 5, 6. The suction hand 5 performs inversion of the printed wiring board in the transfer part 2 placed between the exposing part 1 and the exposing part 3 to transfer the printed wiring board to the suction hand 6 directly.
摘要翻译：要解决的问题：提供一种在印刷线路板倒转之后不需要预对准的曝光装置。解决方案：曝光装置包括：一个表面侧曝光部分1，用于对印刷的一个表面侧进行曝光接线板99; 转移部分2; 和另一侧曝光部分3用于对另一表面侧进行曝光。曝光部分1,3分别包括吸引针5,6。吸引手5在放置在曝光部分1和曝光部分3之间的转印部分2中执行印刷电路板的反转，以将印刷电路板转移到吸引手6直接。

2. 发明专利

JP2009031561A Projection exposure apparatus and division exposure method 审中-公开
标题翻译：投影曝光装置和部分曝光方法
公开(公告)号：JP2009031561A
公开(公告)日：2009-02-12
申请号：JP2007195879
申请日：2007-07-27
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： OTSUKA AKIRA , NAKAGAWA WATARU , MORIYA MASARU
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70066 , G03F7/70433 , G03F9/7076 , G03F9/7088 , H05K3/0082
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus performing division exposure with high alignment accuracy. SOLUTION: The position of a mask mark 20 overlaps the position of a substrate mark 30 upon exposure, the mask mark 20 being larger than the substrate mark 30 and blocking exposure light. The diameter ϕM of the circular mask mark 20 and the diameter ϕB of the circular substrate mark 30 satisfy ϕM>ϕB. The mask mark 20 has a light shielding film. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供以高对准精度进行分割曝光的曝光装置。解决方案：掩模标记20的位置在曝光时与衬底标记30的位置重叠，掩模标记20大于衬底标记30并阻挡曝光光。圆形掩模标记20的直径φM和圆形基板标记30的直径φB满足φM>φB。掩模标记20具有遮光膜。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2008216433A Exposure device 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2008216433A
公开(公告)日：2008-09-18
申请号：JP2007051260
申请日：2007-03-01
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： WATANABE YOSHIMITSU
IPC分类号： G03F7/20 , B08B1/02 , B08B1/04 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To achieve exposure in high yield by efficiently removing dust on a substrate, a photomask and a platen. SOLUTION: A first cleaning head touches the upper face of a platen to remove dust while a carry-in hand is operated to carry in and retreat. A second cleaning head removes dust on a photomask. Upon removing dust, a shaft 22 is loaded through a bearing 17 by a pressing device 16, and the load is transmitted through a hard linking collar 23, a soft linking collar 24, a roller core 21 to a cleaning section 20, and the cleaning section 20 is pressed to the face 8 to be cleaned. Although the shaft 22 is bent by the load of the pressing device 16, the bend of the shaft 22 is absorbed by the soft linking collar 24, which prevents the roller core 21 from bending but keeps a flat state. Thus, the pressure distribution on the face to be cleaned is made uniform, and efficient cleaning can be performed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过有效地去除基板，光掩模和压板上的灰尘，以高产率实现曝光。
解决方案：一个第一清洁头接触压板的上表面，以在操作携带手进行和退出时除去灰尘。第二个清洁头清除光掩模上的灰尘。在清除灰尘的同时，轴22通过加压装置16通过轴承17装载，并且负载通过硬连接套环23，软连接套环24，辊芯21传递到清洁部分20，并且清洁将部分20按压到要清洁的面8上。虽然轴22被加压装置16的负载弯曲，轴22的弯曲被软连接套环24吸收，这防止了辊芯21弯曲但保持平坦状态。因此，要清洁的面上的压力分布均匀，并且可以进行有效的清洁。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2007131424A Film peeling equipment 有权
标题翻译：胶膜设备
公开(公告)号：JP2007131424A
公开(公告)日：2007-05-31
申请号：JP2005327082
申请日：2005-11-11
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： IGARASHI AKIRA
IPC分类号： B65H41/00 , H05K3/06
摘要： PROBLEM TO BE SOLVED: To provide a film peeling equipment capable of peeling off a film securely and quickly even if there is a step in an object.
SOLUTION: A roller device A is provided with four knurling rollers 1, and a pair of knurling rollers 1 are supported on respective swinging supporting bodies 11. Two swinging supporting bodies 11 are supported on one swinging base 13. The swinging supporting body 11 turns for the swinging base 13 by the center 12 of swing and can swing. The swinging base 13 is turnably attached to a supporting base 3 by the center 14 of swing and can swing. Consequently, the knurling roller 1 can swing greatly by the center 14 of swing and can swing closely by the center 12 of swing, and each of four knurling rollers 1 can move individually in the vertical direction. Each knurling roller 1 is arranged by deviating its position in the longitudinal direction of a board W and can correspond to a step of the board W existent in the longitudinal direction.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供即使在物体中存在台阶的情况下也能够牢固而快速地剥离膜的胶片剥离设备。解决方案：辊装置A设有四个滚花滚轮1，一对滚花滚轮1支撑在相应的摆动支撑体11上。两个摆动支撑体11支撑在一个摆动基座13上。摆动支撑体摆动基座13由摆动的中心12转动11转，并可摆动。摆动基座13通过摆动的中心14可转动地附接到支撑基座3并且能摆动。因此，滚花滚筒1可以通过摆动中心14大幅摆动，并且可以通过摆动中心12紧密地摆动，并且四个滚花滚轮1中的每一个可以在垂直方向上分别移动。每个滚花滚轮1通过偏离其在板W的纵向方向上的位置而布置，并且可以对应于在纵向方向上存在的板W的台阶。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2005274687A Exposing device and positioning method 有权
标题翻译：曝光装置和定位方法
公开(公告)号：JP2005274687A
公开(公告)日：2005-10-06
申请号：JP2004084615
申请日：2004-03-23
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： HASHIMOTO KAZUNORI
IPC分类号： G01B11/00 , G03F7/00 , G03F9/00 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide an exposing device in which optimum positioning can be performed.
SOLUTION: Primary positioning is carried out first (S1), deviation Dp between a substrate mark 10 and a mask mark 20 are detected at P1, P2, P3, and P4 (S2), and a maximum value MPd among them is stored (S3). The above processing is repeated N times (S4) to detect N maximum values MDp and a minimum value MDpmin among them is found (S5). It is discriminated whether MDpmin
摘要翻译：要解决的问题：提供可以进行最佳定位的曝光装置。解决方案：首先执行主要定位（S1），在P1，P2，P3和P4（S2）处检测到基板标记10和掩模标记20之间的偏差Dp，并且其中的最大值MPd为存储（S3）。重复上述处理N次（S4）以检测N个最大值MDp和其中的最小值MDpmin（S5）。鉴别MDpmin <指定值（S6），当判断为是否检测到最小值MDpmin时的第（n）个定位的位置为最佳位置（S7）。否则，判断基板是有缺陷的（S8）。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2005062706A Exposure apparatus 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2005062706A
公开(公告)日：2005-03-10
申请号：JP2003295746
申请日：2003-08-20
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： KUMAGAI KENICHI , HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of aligning with high accuracy and a small variance of errors.
SOLUTION: A platen 3 is moved for aligning and the positions of a substrate mark 10 and a mask mark 20 are identified to detect the error ΔD between the marks. Whether the ΔD is less than a tolerance D1 or not is decided by a deciding device 7, and if ΔD D1, aligning and deciding are repeated for specified times. If the error remains as ΔD>D1 even after repeating the procedure for the specified times, whether ΔD is less than D2 or not is decided. If ΔD D2, the substrate W is ejected out of the system.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够以高精度和小误差变化对准的曝光装置。
解决方案：移动台板3以进行对准，并且识别基板标记10和掩模标记20的位置以检测标记之间的误差ΔD。决定装置7决定ΔD是否小于公差D1，如果ΔD D1，则在指定时间内重复对准和判定。如果即使重复了规定时间后的ΔD> D1，则判断ΔD是否小于D2。如果ΔD D2，衬底W被排出系统。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2003186209A EXPOSURE DEVICE 审中-公开
公开(公告)号：JP2003186209A
公开(公告)日：2003-07-03
申请号：JP2001382887
申请日：2001-12-17
申请人： ADTEC ENGINEENG CO LTD
发明人： HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure device which attains alignment with high precision. SOLUTION: When a base plate 4 is turned by θ° and -θ° before alignment, the relative coordinates of a mask mark 30 and a base plate mark 40 are obtained. From the relative coordinates, the coordinate of the mask mark 30 against the coordinate axis 90 of the exposure device is obtained. Based upon the coordinate, the alignment is carried out. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2003029414A Exposure device 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2003029414A
公开(公告)日：2003-01-29
申请号：JP2001218886
申请日：2001-07-19
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： ASAMI MASATOSHI
IPC分类号： G03B27/20 , G03F7/20 , G03F9/00 , H05K3/00
CPC分类号： G03F7/7035 , G03B27/20 , G03F7/2014 , G03F9/00 , H05K3/0008 , H05K3/0082
摘要： PROBLEM TO BE SOLVED: To provide an exposure device with which the uniform adhesion between a photomask and a printed wiring board can be obtained.
SOLUTION: A tapered part 21 is formed at the photomask 20 and the photomask is supported at a mask holder 2 in this tapered part. The mask holder 2 is supported by a copy frame 1 and is placed on a supporting arm 80 of a Z-axis moving device 8 by means of a load adjusting device 3. The photomask is thus made movable relative to the printed wiring board B while the photomask is guided by a guide device 4 and the position thereof in X-Y directions is maintained. The photomask 20 is brought into tight contact with the printed wiring board B by the weights of the copy frame 1, the mask holder 2 and the photomask 20 and its tight adhesion pressure is adjusted by the load adjusting device 3. The copy frame 1 is tiltable relative to a guide shaft 40 of the guide device and the uniformity in the tight contact of the photomask 20 and the printed wiring board B is improved by such constitution.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供可以获得光掩模和印刷线路板之间的均匀粘合的曝光装置。解决方案：在光掩模20处形成锥形部分21，并且光掩模被支撑在该锥形部分中的掩模保持器2处。掩模支架2由复制框架1支撑，并且通过负载调节装置3放置在Z轴移动装置8的支撑臂80上。因此，光掩模相对于印刷线路板B可移动，同时光掩模由引导装置4引导，并且保持其在XY方向上的位置。光掩模20通过复印框架1，掩模支架2和光掩模20的重量与印刷线路板B紧密接触，并且其紧密粘合压力由负载调节装置3调节。复印框架1是通过这样的结构，能够相对于引导装置的引导轴40倾斜并且光掩模20和印刷电路板B的紧密接触的均匀性得到改善。

9. 发明专利

JP2002333728A EXPOSURE DEVICE FOR MANUFACTURING MULTILAYER CIRCUIT BOARD 审中-公开
公开(公告)号：JP2002333728A
公开(公告)日：2002-11-22
申请号：JP2001317551
申请日：2001-10-16
申请人： ADTEC ENGINEENG CO LTD
发明人： SANNOMIYA KATSUYA , IDA RYOICHI , MOMOSE KATSUMI , GYODA MICHITOMO
IPC分类号： G03F1/22 , G03F7/20 , G03F9/00 , H05K3/00 , H05K3/46 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide an exposure device for manufacturing multilayer circuit board. SOLUTION: The positioning of a photomask 4 and a core board 60 is performed on the basis of mask mark 5 and board mark 7 and, according to the position, the positioning of X-ray irradiation device 1 is performed. Thereafter, on the formation of a buldup layer, the board mark 7 is irradiated with X-ray from the lower side by the X-ray irradiation device 1 and is projected on a fluorescent screen 3. The picture of board mark 7 on a fluorescent surface 39 of the fluorescent screen 3 is superposed on the mask mark 5 on the photomask 4 and is photographed by a CCD camera 2, an exposure stage 8 is driven in such a manner that the board mark 7 and the center of the picture of mask mark 5 coincide and, thus, the positioning of a board 6 and the photomask 4 is performed.

10. 发明专利

JP2002240060A MOLD AND METHOD FOR MANUFACTURING THE SAME 失效
公开(公告)号：JP2002240060A
公开(公告)日：2002-08-28
申请号：JP2001039467
申请日：2001-02-16
申请人： ADTEC ENGINEENG CO LTD
发明人： TAJIMA TSUNEMUNE , KOJIMA SHUNICHI
IPC分类号： F16C13/00 , B29C39/26
摘要： PROBLEM TO BE SOLVED: To provide a mold having high accuracy and simple to manufacture. SOLUTION: A temperature difference is formed in the longitudinal direction of a material to provide a thermal expansion difference, and a processing surface 11 is linearly formed to obtain a formed mold surface 10 having a desired shape.

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