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1. 发明专利

JP2005062706A Exposure apparatus 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2005062706A
公开(公告)日：2005-03-10
申请号：JP2003295746
申请日：2003-08-20
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： KUMAGAI KENICHI , HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of aligning with high accuracy and a small variance of errors.
SOLUTION: A platen 3 is moved for aligning and the positions of a substrate mark 10 and a mask mark 20 are identified to detect the error ΔD between the marks. Whether the ΔD is less than a tolerance D1 or not is decided by a deciding device 7, and if ΔD D1, aligning and deciding are repeated for specified times. If the error remains as ΔD>D1 even after repeating the procedure for the specified times, whether ΔD is less than D2 or not is decided. If ΔD D2, the substrate W is ejected out of the system.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够以高精度和小误差变化对准的曝光装置。
解决方案：移动台板3以进行对准，并且识别基板标记10和掩模标记20的位置以检测标记之间的误差ΔD。决定装置7决定ΔD是否小于公差D1，如果ΔD D1，则在指定时间内重复对准和判定。如果即使重复了规定时间后的ΔD> D1，则判断ΔD是否小于D2。如果ΔD D2，衬底W被排出系统。版权所有（C）2005，JPO＆NCIPI

2. 发明专利

JP2003186209A EXPOSURE DEVICE 审中-公开
公开(公告)号：JP2003186209A
公开(公告)日：2003-07-03
申请号：JP2001382887
申请日：2001-12-17
申请人： ADTEC ENGINEENG CO LTD
发明人： HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure device which attains alignment with high precision. SOLUTION: When a base plate 4 is turned by θ° and -θ° before alignment, the relative coordinates of a mask mark 30 and a base plate mark 40 are obtained. From the relative coordinates, the coordinate of the mask mark 30 against the coordinate axis 90 of the exposure device is obtained. Based upon the coordinate, the alignment is carried out. COPYRIGHT: (C)2003,JPO

3. 发明专利

JP2005003965A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2005003965A
公开(公告)日：2005-01-06
申请号：JP2003167711
申请日：2003-06-12
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： IMAI HIROYUKI , HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure device with which efficient exposure is performed while maintaining alignment accuracy.
SOLUTION: When dislocation between whole substrate marks 11 and whole mask marks 21 is a prescribed value or below, overall exposure is performed. In the case of the prescribed value or above, alignment and exposure in halved regions AB and CD are attempted. When dislocation between halved substrate marks 12 and halved mask marks 22 is a prescribed value or below, exposure is performed separately in the regions AB and CD. In the case of the prescribed value or above, alignment and exposure in quartered regions A, B, C and D are attempted. When dislocation between quartered substrate marks 13 and quartered mask marks 23 is a prescribed value or below, exposure is performed separately in the regions A, B, C and D. In the case of the prescribed value or above, exposure is discontinued.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在保持对准精度的同时进行有效曝光的曝光装置。解决方案：当整个基板标记11和整个掩模标记21之间的位错是规定值或更低时，执行总体曝光。在规定值以上的情况下，尝试对半部区域AB和CD进行对准和曝光。当半衬底标记12和一半掩模标记22之间的位错是规定值或更低时，在区域AB和CD中单独进行曝光。在规定值以上的情况下，尝试在四分之一区域A，B，C和D中的对准和曝光。当在四分之一的基板标记13和四分之一的掩模标记23之间的位错是规定值以下时，在区域A，B，C和D中分别进行曝光。在规定值以上的情况下，中断曝光。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2004309671A Exposure device 有权
公开(公告)号：JP2004309671A
公开(公告)日：2004-11-04
申请号：JP2003101068
申请日：2003-04-04
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： HASEGAWA KOJI
IPC分类号： G03F7/20 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure device which has a planar light source and can be made small-sized.
SOLUTION: A substrate 9 is mounted on a platen 4 and moved in XYZ and θ directions by a moving device 5. A photomask 30 having a circuit pattern drawn thereon is disposed opposing to the substrate 9. The photomask 30 is tightly stuck to the substrate 9 and is exposed along the circuit pattern to exposure light from an exposure light source 1. A camera 6 is disposed retractably between the exposure light source 1 and the photomask 30 and is used for positioning the photomask 30 and the substrate 9 on exposure. The exposure light source 1 is a planar light source having the specified number of laser diodes (LD) 10 arranged in a matrix which constitutes the planar flat light source composed of a plurality of point light sources.
COPYRIGHT: (C)2005,JPO&NCIPI

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