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1. 发明专利

JP2005062706A Exposure apparatus 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2005062706A
公开(公告)日：2005-03-10
申请号：JP2003295746
申请日：2003-08-20
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： KUMAGAI KENICHI , HASEGAWA KOJI
IPC分类号： G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of aligning with high accuracy and a small variance of errors.
SOLUTION: A platen 3 is moved for aligning and the positions of a substrate mark 10 and a mask mark 20 are identified to detect the error ΔD between the marks. Whether the ΔD is less than a tolerance D1 or not is decided by a deciding device 7, and if ΔD D1, aligning and deciding are repeated for specified times. If the error remains as ΔD>D1 even after repeating the procedure for the specified times, whether ΔD is less than D2 or not is decided. If ΔD D2, the substrate W is ejected out of the system.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供能够以高精度和小误差变化对准的曝光装置。
解决方案：移动台板3以进行对准，并且识别基板标记10和掩模标记20的位置以检测标记之间的误差ΔD。决定装置7决定ΔD是否小于公差D1，如果ΔD D1，则在指定时间内重复对准和判定。如果即使重复了规定时间后的ΔD> D1，则判断ΔD是否小于D2。如果ΔD D2，衬底W被排出系统。版权所有（C）2005，JPO＆NCIPI

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