专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2009031561A Projection exposure apparatus and division exposure method 审中-公开
标题翻译：投影曝光装置和部分曝光方法
公开(公告)号：JP2009031561A
公开(公告)日：2009-02-12
申请号：JP2007195879
申请日：2007-07-27
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： OTSUKA AKIRA , NAKAGAWA WATARU , MORIYA MASARU
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70066 , G03F7/70433 , G03F9/7076 , G03F9/7088 , H05K3/0082
摘要： PROBLEM TO BE SOLVED: To provide an exposure apparatus performing division exposure with high alignment accuracy. SOLUTION: The position of a mask mark 20 overlaps the position of a substrate mark 30 upon exposure, the mask mark 20 being larger than the substrate mark 30 and blocking exposure light. The diameter ϕM of the circular mask mark 20 and the diameter ϕB of the circular substrate mark 30 satisfy ϕM>ϕB. The mask mark 20 has a light shielding film. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供以高对准精度进行分割曝光的曝光装置。解决方案：掩模标记20的位置在曝光时与衬底标记30的位置重叠，掩模标记20大于衬底标记30并阻挡曝光光。圆形掩模标记20的直径φM和圆形基板标记30的直径φB满足φM>φB。掩模标记20具有遮光膜。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008016758A Marking apparatus in manufacturing multi-layer circuit board 审中-公开
标题翻译：制造多层电路板的标记装置
公开(公告)号：JP2008016758A
公开(公告)日：2008-01-24
申请号：JP2006188972
申请日：2006-07-10
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： NAKAGAWA WATARU
IPC分类号： H05K1/02 , H05K3/46
CPC分类号： H05K3/4679 , H05K1/0269 , H05K3/0008 , H05K3/0082 , H05K3/064 , H05K3/4652 , H05K2201/0969 , H05K2201/09781 , H05K2201/09918
摘要： PROBLEM TO BE SOLVED: To provide a marking apparatus which efficiently forms an alignment mark for accurately aligning layers in manufacturing a multi-layer circuit board.
SOLUTION: Reference marks 50, 51 formed on a core substrate 60 of a substrate 5 are image-formed on a fluorescent plate 12 by being irradiated with X rays from an X-ray generator 11, and this is imaged by a visible light CCD camera 13 to simultaneously detect positions of the reference marks 50, 51. With the detected positions of the reference marks 50, 51 as criteria, ultraviolet rays are radiated from mirrors 22, 23 onto a dry film resist layer 55, and marks drawn on photo-masks 24, 25 are printed on the dry film resist layer 55.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在制造多层电路板时有效地形成用于精确对准层的对准标记的标记装置。解决方案：通过用X射线发生器11的X射线照射在基板5的芯基板60上形成的参考标记50,51在荧光板12上成像，并且通过可见光光CCD摄像机13同时检测参考标记50,51的位置。以参考标记50,51的检测位置作为标准，将紫外线从反射镜22,23辐射到干膜抗蚀剂层55上，光掩模24,25印刷在干膜抗蚀剂层55上。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006072100A Projection exposing device 审中-公开
标题翻译：投影曝光装置
公开(公告)号：JP2006072100A
公开(公告)日：2006-03-16
申请号：JP2004256940
申请日：2004-09-03
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： NAKAGAWA WATARU , HASHIMOTO KAZUNORI
IPC分类号： G03F7/20 , H05K3/00
CPC分类号： H05K3/0002 , G03F7/2022 , H05K3/0082 , H05K2201/09781 , H05K2201/09972 , H05K2203/056
摘要： PROBLEM TO BE SOLVED: To provide a projection exposing device which can expose information such as a coupon onto a periphery in division exposure. SOLUTION: All patterns to be transferred onto a printed wiring board 2 by exposure are drawn in a photomask 1, that is, pieces 10 as independent circuit patterns and a coupon 12 to be transferred onto the periphery of the printed wiring board 2 by exposure are drawn. Exposure is carried out as divided into 6 regions by division lines 19 which divide the exposure region. The photomask 1 is mounted on a photomask stage 5, and the exposure region is moved to an irradiation area 70 by a photomask moving device 50 and aligned by an alignment device (not shown in Figure) using an alignment mark 15 and a substrate mark (not shown). After the periphery of the exposure region is masked by a masking device 3, exposure is performed. This procedure is consecutively carried out in each region to complete exposure of the entire printed wiring board 2. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种投影曝光装置，其可以在分割曝光中将诸如优惠券的信息暴露在外围。解决方案：通过曝光将要传送到印刷线路板2上的所有图案都被绘制在光掩模1中，即作为独立电路图案的片10和被转印到印刷线路板2的周边上的优惠券12 通过曝光绘制。通过划分曝光区域的分割线19将曝光分成6个区域。光掩模1安装在光掩模台5上，并且通过光掩模移动装置50将曝光区域移动到照射区域70，并使用对准标记15和基板标记（未图示）对齐对准装置未示出）。在曝光区域的外围被掩蔽装置3掩蔽之后，进行曝光。该程序在各区域连续进行，以完成整个印刷电路板2的曝光。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2003021909A Exposure device 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2003021909A
公开(公告)日：2003-01-24
申请号：JP2001205812
申请日：2001-07-06
申请人： Adtec Engineeng Co Ltd , 株式会社アドテックエンジニアリング
发明人： MOMOSE KATSUMI , MIZUTANI GUNJI , NAKAGAWA WATARU , ASAMI MASATOSHI , KUGAMUURUTEI KUMUTEINI
IPC分类号： G03B27/58 , G03F1/00 , G03F1/68 , G03F7/20 , H05K3/00 , G03F1/08
CPC分类号： G03B27/58
摘要： PROBLEM TO BE SOLVED: To provide an exposure device where adhesive ness between a glass mask and an object to be exposed can be improved.
SOLUTION: In the device, a sealed space 4 is formed by installing a pressurizing glass 3 with a specified spacing on a backside of the glass mask 1. Pressurized air is introduced from a pressurizing source 5 to the sealed space 4, the pressure of the sealed space 4 is raised, the glass mask 1 is expanded in the direction of a base plate 50 and the adhesiveness with the base plate 50 is improved.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种曝光装置，其可以改善玻璃罩和待曝光物体之间的粘合性。解决方案：在该装置中，通过在玻璃掩模1的背面上安装具有指定间隔的加压玻璃3来形成密封空间4.加压空气从加压源5引入密封空间4，密封空间4升高，玻璃面罩1沿基板50的方向膨胀，并且与基板50的粘合性提高。

5. 发明专利

JP2000292942A EXPOSURE DEVICE AND EXPOSURE METHOD 失效
公开(公告)号：JP2000292942A
公开(公告)日：2000-10-20
申请号：JP9841299
申请日：1999-04-06
申请人： ADTEC ENGINEENG CO LTD
发明人： SANNOMIYA KATSUYA , NAKAGAWA WATARU
IPC分类号： H05K3/00 , G03F7/22 , G03F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To make it possible to effectively utilize the space of a substrate to be exposed and to make printable mask information to the outer peripheral part of the substrate to be exposed by subjecting the outer peripheral part of a printed circuit board to proper light shielding and exposing. SOLUTION: A light shielding device 2 is disposed between a light source device 6 and a glass mask 1. The light shielding device 2 may be constituted as part of the light source device 6 or as an independent device and is composed of light shielding plates 20 to 23 and air cylinders 25 to 28 for advancing and retreating these plates onto the mask outer peripheral part FM of the glass mask 1. The respective light shielding plates 20 to 23 are capable of selectively covering substrate information 10 to 13 so as to prohibit the exposure of these portions. While the mask outer peripheral part FM of the glass mask 1 is properly shielded of light, the part is exposed, thereby, the prevention of the occurrence of the useless space at the contact boundaries of the respective regions A to D is made possible. Even more, all of the substrate information 10 to 13 in the mask outer peripheral part FM of the glass mask 1 are printed to the outer peripheral part FW of the substrate W.

6. 发明专利

JP2003131401A MARKING DEVICE FOR PRODUCTION OF MULTILAYERED CIRCUIT BOARD 审中-公开
公开(公告)号：JP2003131401A
公开(公告)日：2003-05-09
申请号：JP2001328514
申请日：2001-10-26
申请人： ADTEC ENGINEENG CO LTD
发明人： IDA RYOICHI , SANNOMIYA KATSUYA , MOMOSE KATSUMI , NAKAGAWA WATARU
IPC分类号： G03F9/00 , H05K1/02 , H05K3/00 , H05K3/46
摘要： PROBLEM TO BE SOLVED: To provide a marking device which forms alignment marks for aligning respective layers for production of a multilayered circuit board with good accuracy. SOLUTION: The image of a reference mark 50 formed on a core substrate 51 of a substrate 5 is formed on a fluorescent plate 12 by irradiation of X-rays from an X-ray generator 11 and this image is picked up by a visible light CCD camera 13, by which the position of the reference mark 50 is detected. The surface of a dry film resist layer 55 is irradiated with the UV rays from mirrors 22 and 23, with the detected position of the reference mark 50 as a reference, by which the marks drawn on photomasks 24 and 25 are printed onto the dry film resist layer 55.

7. 发明专利

JP2004012598A PROJECTION ALIGNER 审中-公开
公开(公告)号：JP2004012598A
公开(公告)日：2004-01-15
申请号：JP2002162979
申请日：2002-06-04
申请人： ADTEC ENGINEENG CO LTD
发明人： SANNOMIYA KATSUYA , NAKAGAWA WATARU
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a projection aligner having the ability of highly accurate positioning. SOLUTION: The mask mark 51 of a photomask 50 is irradiated with exposure light by an exposure lighting device 4. The image is formed in an imaging section 5 through a projection exposure lens 70, picked up by a CCD camera 2, with the data prepared and recorded in an arithmetic and control unit 11, and then used as a recorded mask mark 51'. After that, a substrate mark 61 is irradiated with infra-red light by an infra-red light emission device 3 to obtain the image of the substrate mark 61, with a positional error detected between the mask mark 51' and the substrate mark 61, and then the positioning is performed. The mask mark 51' and the substrate mark 61 are simultaneously displayed in a manner superimposed on a display device 12. COPYRIGHT: (C)2004,JPO

8. 发明专利

JP2001022099A EXPOSURE DEVICE 失效
公开(公告)号：JP2001022099A
公开(公告)日：2001-01-26
申请号：JP19446499
申请日：1999-07-08
申请人： ADTEC ENGINEENG CO LTD
发明人： SANNOMIYA KATSUYA , IDA RYOICHI , NAKAGAWA WATARU
IPC分类号： H01L21/027 , G03F9/00
摘要： PROBLEM TO BE SOLVED: To enable the execution of exposure with high accuracy in the exposure of a multilayered substrate. SOLUTION: This exposure device irradiates a copper foil mark mask mark E with an X-ray from a lower side by an X-ray tube bulb 2 and picks up the image of the copper foil mark R by an X-ray CCD camera 3. The image of the mask mark E of the mask M is picked up by a visible light CCD camera 4 and is subjected to image processing by an image processing device 7. The alignment of the multilayered substrate K and the mask M is executed by driving a stage 9 in such a manner as to align the centers of the copper foil mark R and the mask mark E. The surface of the conductive layer C of the multilayered substrate K is printed with the circuit patterns of the mask M by the exposure from an exposure light source L when the alignment ends.

9. 发明专利

JP2000181073A DEVICE AND METHOD FOR EXPOSURE 失效
公开(公告)号：JP2000181073A
公开(公告)日：2000-06-30
申请号：JP35442098
申请日：1998-12-14
申请人： ADTEC ENGINEENG CO LTD
发明人： NAKAGAWA WATARU , IDA RYOICHI , SANNOMIYA KATSUYA
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a drive are an exposure method in which no foreign matter sticks to be exposed on a mask, to suppress generation of defects in exposure, and without possibility of possibility the mask surface being flawed. SOLUTION: A protective film 1 is interposed between a film mask F and a substrate K and taken out by a take-up roll 3 each time exposure is carried out to interpose the protection film 1 which is always clean between the film mask F and substrate K. This protective film 1 prevents resist and foreign matter of the substrate K from sticking on the side of the film mask F, thereby preventing a defects in exposure from being generated.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式