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21. 发明专利

JP2010517233A Improved particle beam generator 审中-公开
公开(公告)号：JP2010517233A
公开(公告)日：2010-05-20
申请号：JP2009546818
申请日：2008-01-24
申请人：エヌエフエイビー・リミテッド
发明人：イースタム，デレク・アンソニー
IPC分类号： H01J37/12 , H01J1/304 , H01J37/063
CPC分类号： H01J37/073 , B82Y15/00 , H01J37/065 , H01J37/12 , H01J37/28 , H01J2237/03 , H01J2237/0492 , H01J2237/062 , H01J2237/06341 , H01J2237/1205 , H01J2237/1207
摘要： A particle beam generator comprising particle extraction means disposed adjacent a particle source and operable to extract particles from such a source into an extraction aperture of the extraction means to form a particle beam, particle accelerating means operable to accelerate the extracted particles to increase the energy of the beam, and focussing means operable to focus the particle beam, each of said extraction means, accelerating means and focussing means being arranged in sequence and having apertures therethrough and in alignment to define a passageway through which the particles are constrained to move, characterised in that the extraction means comprises a lens structure comprising at least a pair of electrodes separated by a layer of insulating material allowing the application of different potentials to each of the lens structure electrodes, one of said electrodes comprising an extraction plate having an extraction aperture formed therein, by means of which extraction plate particles may be drawn from the particle source and through the extraction aperture by means of a potential difference between the source and said extraction plate.

22. 发明专利

JP4385048B2 Charged beam gun 有权
公开(公告)号：JP4385048B2
公开(公告)日：2009-12-16
申请号：JP2006334370
申请日：2006-12-12
申请人：株式会社日立ハイテクノロジーズ
发明人：広靖加賀 , 健田中
IPC分类号： H01J37/06
CPC分类号： G01N23/2251 , H01J37/065 , H01J37/073 , H01J2237/006 , H01J2237/038 , H01J2237/06341

23. 发明专利

JP2009123683A Charged particle source with automated tip formation 有权
标题翻译：充电颗粒源自动提示形成
公开(公告)号：JP2009123683A
公开(公告)日：2009-06-04
申请号：JP2008229863
申请日：2008-09-08
申请人： Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh , アイシーティーインテグレーテッドサーキットテスティングゲゼルシャフトフィーアハルプライタープリーフテヒニックエムベーハー
发明人： WINKLER DIETER , WEIGEL UDO , GRIMM STEFAN
IPC分类号： H01J27/26 , H01J37/04 , H01J37/073 , H01J37/08
CPC分类号： H01J37/073 , H01J27/26 , H01J37/08 , H01J37/265 , H01J37/304 , H01J2237/06341 , H01J2237/0805 , H01J2237/0807 , H01J2237/30466 , H01J2237/30477 , H01J2237/31749
摘要： PROBLEM TO BE SOLVED: To provide a charged particle source with automated tip formation.
SOLUTION: A charged particle device includes: an emitter unit including an emitter tip 13; a voltage supply unit 222 configured to provide a constant voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply component 224 configured to provide a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; measuring units 142, 142', 142" for measuring an emitter characteristic; and a control unit 130 configured to receive a signal from the measuring units, and configured to control the pulsed voltage supply component.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有自动尖端形成的带电粒子源。电荷粒子装置包括：包括发射极尖端13的发射体单元; 电压供给单元222，被配置为提供恒定电压以在发射极尖端处产生稳定的提取场; 脉冲电压供应部件224，被配置为提供脉冲电压以在所述稳定提取场的顶部产生脉冲提取场; 测量单元142,142'，142“，用于测量发射极特性;以及控制单元130，被配置为从测量单元接收信号，并且被配置为控制脉冲电压供应分量。（C） JPO和INPIT

24. 发明专利

JP2009021128A Electron source 有权
标题翻译：电子源
公开(公告)号：JP2009021128A
公开(公告)日：2009-01-29
申请号：JP2007183452
申请日：2007-07-12
申请人： Denki Kagaku Kogyo Kk , 電気化学工業株式会社
发明人： NONOGAKI RYOZO , TERUI YOSHINORI
IPC分类号： H01J1/304 , H01J37/065
CPC分类号： H01J37/28 , H01J1/15 , H01J37/06 , H01J37/065 , H01J37/073 , H01J2237/061 , H01J2237/06316
摘要： PROBLEM TO BE SOLVED: To provide an electron source giving highly reliable and stable electron beams even if a device using the electron source suffers from vibration from the outside. SOLUTION: In the electron source, a cathode having an electron emission part is pinched for jointing by tips of two filaments each connected with two conductive terminals fitted to an insulator, and the other end of the cathode different from the electron emission part is fixed to the insulator, the two filaments in two-time symmetry with respect to a center axis of the two filaments. Preferably, an end different from the electron emission part of the cathode is fixed to the insulator through a metal material brazed to the insulator, or more preferably, the filaments have curved parts. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使使用电子源的器件受到来自外部的振动的影响，提供给予高度可靠和稳定的电子束的电子源。解决方案：在电子源中，具有电子发射部分的阴极被夹持以通过两个灯丝的末端接合，每个灯丝与安装在绝缘体上的两个导电端子连接，并且阴极的另一端不同于电子发射部分固定在绝缘体上，两根细丝相对于两根细丝的中心轴线两次对称。优选地，与阴极的电子发射部分不同的端部通过钎焊到绝缘体的金属材料固定到绝缘体上，或者更优选地，细丝具有弯曲部分。版权所有（C）2009，JPO＆INPIT

25. 发明专利

JP2008180721A Defect inspecting method and substrate inspecting apparatus 审中-公开
标题翻译：缺陷检查方法和基板检查装置
公开(公告)号：JP2008180721A
公开(公告)日：2008-08-07
申请号：JP2008023853
申请日：2008-02-04
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G01Q30/02 , G01R31/302 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a high-throughput substrate inspecting apparatus capable of detecting a defect of a sample precisely. SOLUTION: The substrate inspecting apparatus 1 comprises a working chamber 30 being made vacuum, an electron-optical device 70 equipped with a L a B 6 electron source, a loader housing 40 for loading a wafer to/from the working chamber, and a mini environment device 20 which is connected to the working chamber and keeps the inside controlled atmospherically. The loader housing 40 comprises a first loading chamber connected to the mini environment device 20, a second loading chamber connected to the working chamber, a first shutter device 27 for selectively shutting the communication between the first and second loading chambers, and a second shutter device 45 for selectively shutting the communication between the second loading chamber and the working chamber. A vacuum exhaust pipe and an inert gas-use vent pipe are connected to each of the first and second loading chambers. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够精确地检测样品的缺陷的高通量基板检查装置。＆lt; P＆gt;解决方案：基板检查装置1包括被制成真空的工作室30，配备有电子束的电子 - 光学装置70，B电子源，用于将晶片装载到工作室的加载器壳体40和连接到工作室并保持内部受到大气控制的微型环境装置20。装载机壳体40包括连接到迷你环境装置20的第一装载室，连接到工作室的第二装载室，用于选择性地关闭第一和第二装载室之间的连通的第一闸板装置27和第二闸板装置 45，用于选择性地关闭第二装载室和工作室之间的连通。真空排气管和惰性气体使用排气管连接到第一和第二装载室中的每一个。版权所有（C）2008，JPO＆INPIT

26. 发明专利

JP2008047309A Field emission type electron gun, and its operation method 审中-公开
标题翻译：现场排放型电子枪及其操作方法
公开(公告)号：JP2008047309A
公开(公告)日：2008-02-28
申请号：JP2006219139
申请日：2006-08-11
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： FUJIEDA TADASHI , HIDAKA KISHIFU , HAYASHIBARA MITSUO , WATANABE SHUNICHI
IPC分类号： H01J37/073 , H01J1/304
CPC分类号： H01J37/073 , H01J37/265 , H01J2237/06316 , H01J2237/24535 , H01J2237/28
摘要： PROBLEM TO BE SOLVED: To provide a field emission type electron gun, and its operation method, capable of obtaining stable field emission current continuously for a long period of time and restraining spread of an energy distribution of field emission electron. SOLUTION: The field emission type electron gun includes an electron source constituted of fibrous carbon substance and a conductive base material supporting it, an extraction device for emitting electron in an electric field, an acceleration device for accelerating electron, and a means of heating the electron source. A minimum heating temperature is to be appropriately adjusted for a fluctuation width of the field emission current to be within a regulated value, after the electron source is kept heated before the field emission. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供能够长时间连续获得稳定的场致发射电流并抑制场致发射电子的能量分布的扩散的场致发射型电子枪及其操作方法。解决方案：场发射型电子枪包括由纤维状碳物质构成的电子源和支撑它的导电性基材，用于在电场中发射电子的提取装置，用于加速电子的加速装置加热电子源。在场发射之前，电子源保持加热之后，要将场致发射电流的波动宽度适当调整为最小加热温度。版权所有（C）2008，JPO＆INPIT

27. 发明专利

JP2007518223A Had a divergence control function hybrid multi-beam electron-emitting device 审中-公开
公开(公告)号：JP2007518223A
公开(公告)日：2007-07-05
申请号：JP2006546266
申请日：2004-12-29
申请人：コミツサリアタレネルジーアトミーク
发明人：シャルロット・ジロ , ジャン−リュク・マルタン , セルジュ・ジドン , ピエール・ニコラ , ヨアン・デュセレ
IPC分类号： H01J37/063 , H01J9/18 , H01J37/073 , H01J37/09 , H01J37/24 , H01J37/317
CPC分类号： H01J3/021 , B82Y10/00 , B82Y40/00 , H01J9/185 , H01J37/073 , H01J37/243 , H01J37/3177 , H01J2237/0635 , H01J2237/3175 , H01J2237/31774
摘要：本発明は、複数の電子ビーム（５９）を放出する電子放出デバイス（５０）に関するものである。本発明によるデバイスは、電子ビーム（６９）を放出する複数の放出源（６１）を備えている第１構造（６）と、複数のダイヤフラム開口（８）を備えている第２構造（７）と、を具備し、第１構造と第２構造とが、ハイブリッド化手段（９）によってハイブリッド化されている。

28. 发明专利

JP2006234789A Charge control device and measuring device including the charge control device 有权
标题翻译：充电控制装置和包括充电控制装置的测量装置
公开(公告)号：JP2006234789A
公开(公告)日：2006-09-07
申请号：JP2005298311
申请日：2005-10-13
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MAKINO HIROSHI , TEI TOMOKI , TANIMOTO NORIFUMI , TODOKORO HIDEO
IPC分类号： G01N23/225 , H01L21/66
CPC分类号： H01J37/073 , H01J37/026 , H01J37/28 , H01J2237/0048 , H01J2237/0635 , H01J2237/24564 , H01J2237/2594
摘要： PROBLEM TO BE SOLVED: To eliminate charging nonuniformity on the sample surface due to the emission fluctuations of a carbon nanotube electron source and the individual difference in the emission characteristics. SOLUTION: As a means for eliminating charging nonuniformity due to the nonuniformity of electron irradiation density, irradiating electrons and the sample are relatively moved, to equalize the electron irradiation density. As a means of monitoring the charges on the sample surface in real time, absorbed current flowing into the sample and the number of secondary electrons emitted from the sample and reflected electrons are measured. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了消除由于碳纳米管电子源的发射波动以及发射特性的个体差异导致的样品表面的充电不均匀性。解决方案：作为消除由于电子辐射密度不均匀引起的充电不均匀性的手段，照射电子和样品相对移动，以均衡电子照射密度。作为实时监测样品表面电荷的方法，测量流入样品的吸收电流和从样品和反射电子发射的二次电子数。版权所有（C）2006，JPO＆NCIPI

29. 发明专利

JP2004273419A Electron beam source, electron optical apparatus using such beam source, and method of operating electro beam source 有权
公开(公告)号：JP2004273419A
公开(公告)日：2004-09-30
申请号：JP2003332078
申请日：2003-09-24
申请人： Leo Elektronenmikroskopie Gmbh , エルエーオーエレクトローネンミクロスコピーゲーエムベーハー
发明人： STEIGERWALD MICHAEL
IPC分类号： H01J37/06 , H01J37/073 , H01J37/075 , H01J37/28 , H01L21/027
CPC分类号： H01J37/075 , H01J37/073 , H01J37/243 , H01J2237/06316 , H01J2237/065
摘要： PROBLEM TO BE SOLVED: To provide an electron beam source of which adjusting performance is improved so as to obtain desired electron beam intensity, and which operates at low source surface temperatures.
SOLUTION: This electron beam source 1 is provided with a source surface illuminated with a photon beam 29 of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. Emission of electrons is further assisted by an electric extraction field. Furthermore, a heater is provided to further assist emission of electrons by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.
COPYRIGHT: (C)2004,JPO&NCIPI

30. 发明专利

JPS595552A Electron gun 失效
标题翻译：电子枪
公开(公告)号：JPS595552A
公开(公告)日：1984-01-12
申请号：JP11373582
申请日：1982-06-30
申请人： Jeol Ltd
发明人： OOYAMA JIYUNICHI
IPC分类号： H01J3/02 , H01J37/073
CPC分类号： H01J37/073
摘要： PURPOSE:To suppress generation of ions which collide with the emitter and thereby extend the life thereof by setting a mesh electrode arranged nearer to the emitter of electron gun to a positive voltage a little higher than the voltage of anode electrode. CONSTITUTION:Electrons emitted from the emitter of a field emission type electron gun are accelectrated by the acceleration field formed between an anode 3 at the earth potential and a leadout electrode 2 and are extracted toward the lower side. A mesh electrode 5 having a high rate of electron beam transmission opening is provided through an electric insulator 4 at the area opposing to the emitter 1 located above the anode 3 and a positive voltage in several volts to ten odd of volts is applied to the anode 3 from a DC power source 6. Thereby, generated positive ion is returned by the electric field formed in the space and it is no longer accelerated toward the emitter by the electron acceleration field. As a result, the emitter is protected from collision with ions.
摘要翻译：目的：为了抑制与发射体碰撞的离子的产生，从而通过将布置在电子枪的发射极附近的网状电极设定为比阳极电极的电压稍高的正电压来延长其寿命。构成：从场致发射型电子枪的发射极发射的电子通过在地电位的阳极3与引出电极2之间形成的加速度场而被吸收，并向下侧取出。具有高电子束传输开口率的网状电极5通过位于阳极3上方的与发射体1相对的区域处的电绝缘体4提供，并且将几伏至十几伏特的正电压施加到阳极因此，所产生的正离子由在空间中形成的电场返回，并且不再通过电子加速场朝向发射极加速。结果，防止发射体与离子发生碰撞。

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