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1. 发明专利

JP2015015200A 電子銃および電子顕微鏡审中-公开
标题翻译：电子枪和电子显微镜
公开(公告)号：JP2015015200A
公开(公告)日：2015-01-22
申请号：JP2013142230
申请日：2013-07-08
申请人：株式会社日立ハイテクノロジーズ , Hitachi High-Technologies Corp
发明人： ONISHI TAKASHI , WATANABE SHUNICHI
IPC分类号： H01J37/073 , H01J37/143 , H01J37/145
CPC分类号： H01J37/073 , H01J2237/06341 , H01J2237/06375 , H01J2237/14
摘要：【課題】本発明は、電界放出型電子銃及びそれを備える電子顕微鏡において、観察中に引出電圧を変更した場合、電子銃の焦点距離が変化せず、電子銃や電子光学系の再調整を容易にし、観察効率(スループット)を向上することが出来る電子銃及び電子顕微鏡を提供することである。【解決手段】上記の課題に鑑み、本発明は以下の構成を有する。電界放出電子銃において、引出電圧電位とは別の調整電位におかれ、電子源に対して、可変の調整電位が与えられた永久磁石を用いた磁場レンズを有することを特徴とする電界放出電子銃。【選択図】図2
摘要翻译：要解决的问题：提供一种电子枪和电子显微镜，其能够通过使电子枪和电子光学系统容易地重新调整而观察效率（生产量），其中电子枪和电子显微镜是场发射型电子枪和配备有电子枪的电子显微镜，电子枪的焦距在观察时的提取电压变化的情况下不变化。解决方案：场致发射型电子枪具有包括磁性使用位于除了提取电压电位之外的调整电位并且相对于电子源具有可变调节电位的永磁体的场透镜。

2. 发明专利

JP2008117662A Schottky electron gun and charged particle beam device mounted with schottky electron gun 有权
标题翻译：肖特基电子枪和充电颗粒光束装置与肖特电子枪
公开(公告)号：JP2008117662A
公开(公告)日：2008-05-22
申请号：JP2006300289
申请日：2006-11-06
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WATANABE SHUNICHI , FUKUHARA SATORU
IPC分类号： H01J37/073
CPC分类号： H01J2237/06316
摘要： PROBLEM TO BE SOLVED: To provide a Schottky electron gun having less generation of a flare component.
SOLUTION: The Schottky electron gun comprises a tungsten monocrystal electron source which is coated with zirconium oxide and of which tip is sharply etched, a filament to heat the tungsten monocrystal electron source, a suppressor electrode to suppress thermoelectrons generated from the filament, a drawing electrode which gives an electric field for emitting electron beams from the tungsten monocrystal electron source, and an accelerating electrode which accelerates the electron beams drawn from the drawing electrode to a prescribed accelerating voltage. The drawing electrode has a plurality of stops to restrict angles of electron beams to pass.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有较少产生耀斑部件的肖特基电子枪。解决方案：肖特基电子枪包括涂覆有氧化锆的钨单晶电子源，尖端被尖锐蚀刻，单丝加热钨单晶电子源，抑制电极抑制从灯丝产生的热电子，给出用于从钨单晶电子源发射电子束的电场的拉伸电极，以及加速电极，其将从拉制电极拉出的电子束加速到规定的加速电压。拉伸电极具有多个限制，以限制电子束的角度通过。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006012583A Scanning transmission electron microscope and electron beam energy spectroscopy using it 有权
标题翻译：扫描传输电子显微镜和电子束能量光谱使用它
公开(公告)号：JP2006012583A
公开(公告)日：2006-01-12
申请号：JP2004187570
申请日：2004-06-25
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NAKAMURA KUNIYASU , WATANABE SHUNICHI
IPC分类号： H01J37/28 , G01N23/00
CPC分类号： H01J37/04 , H01J37/05 , H01J37/265 , H01J37/28 , H01J2237/04922 , H01J2237/057 , H01J2237/2802
摘要： PROBLEM TO BE SOLVED: To provide a scanning transmission electron microscope capable of independently setting capturing angle ranges of a scattered electron beam detector and an energy spectrometer, and not requiring to change a condition of the energy spectrometer for the change of the capturing angle range of the scattered electron beam detector. SOLUTION: In the scanning transmission electron microscope provided with the energy spectrometer 18, a first rotational-symmetry lens 6 setting a scattered electron beam capturing angle is disposed in an upper part of the scattered electron beam detector detecting an electron beam scattered by a sample 32, a second rotational symmetry lens 13 is disposed between the scattered electron beam detector and the energy spectrometer 18, the scattered electron beam capturing angle is set with the first rotational symmetry lens 6, and an object point of the energy spectrometer 18 is set with the second rotational symmetry lens 13. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够独立地设置散射电子束检测器和能量光谱仪的捕获角度范围的扫描透射电子显微镜，并且不需要改变能量光谱仪的状态以改变捕获散射电子束检测器的角度范围。解决方案：在具有能量光谱仪18的扫描透射电子显微镜中，设置散射电子束捕获角的第一旋转对称透镜6设置在散射电子束检测器的上部，该散射电子束检测器检测由样品32，第二旋转对称透镜13设置在散射电子束检测器和能量光谱仪18之间，散射电子束捕获角度由第一旋转对称透镜6设定，能量谱仪18的物镜设置有第二旋转对称透镜13.版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2013045525A Electron gun and charged particle beam device 有权
标题翻译：电子枪和充电颗粒光束装置
公开(公告)号：JP2013045525A
公开(公告)日：2013-03-04
申请号：JP2011180851
申请日：2011-08-22
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： WATANABE SHUNICHI , ONISHI TAKASHI , OSE YOICHI , NAKAMURA KUNIYASU , MORIYAMA MASARU , SUZUKI TOMONORI
IPC分类号： H01J37/073 , H01J37/09
CPC分类号： H01J37/065 , H01J2237/0206 , H01J2237/0213 , H01J2237/026 , H01J2237/045 , H01J2237/06316
摘要： PROBLEM TO BE SOLVED: To suppress generation of a flare by decreasing the amount of secondary electrons generated at a diaphragm provided to a lead-out electrode of an electron gun.SOLUTION: When a diaphragm 7A of a lead-out electrode 5 closest to an electron source 1 in the electron gun is coated with a thin film of carbon etc., having a small secondary electron emission rate, the generation amount of secondary electrons can be reduced. The secondary electrons generated at the lead-out electrode which cause generation of a flare decrease, so the flare eventually decreases. Further, two diaphragms 7A, 7B are built in the lead-out electrode 5 and applied with a potential equal to that of the lead-out electrode so as to eliminate an electric field leaking from a lower part to an upper part of the lead-out electrode. Consequently, a secondary electron generated when an electron beam strikes on the lead-out electrode does not receive force passing from the lead-out electrode, so that the flare is reduced.
摘要翻译：要解决的问题：通过减少在设置在电子枪的引出电极上的隔膜处产生的二次电子的量来抑制耀斑的产生。解决方案：当电子枪中最靠近电子源1的引出电极5的膜片7A涂覆有二等电子发射速率小的碳等薄膜时，二次发生量的产生量可以减少电子。在引出电极处产生的二次电子产生耀斑减少，所以耀斑最终减小。此外，在引出电极5中内置两个膜7A，7B，并施加与引出电极相同的电位，以消除从引出电极5的下部到上部的电场泄漏。出电极。因此，当电子束撞击引出电极时产生的二次电子不会受到从引出电极通过的力，从而减少了耀斑。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2011243541A electronic microscope 有权
标题翻译：电子显微镜
公开(公告)号：JP2011243541A
公开(公告)日：2011-12-01
申请号：JP2010117317
申请日：2010-05-21
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ONISHI TAKASHI , WATANABE SHUNICHI , ICHIHASHI MIKIO
IPC分类号： H01J37/18 , H01J37/06 , H01J37/073 , H01J37/26
CPC分类号： H01J37/261 , H01J3/021 , H01J9/39 , H01J9/505 , H01J37/065 , H01J37/073 , H01J37/26 , H01J2237/022 , H01J2237/06341 , H01J2237/1035 , H01J2237/14 , H01J2237/182 , Y02W30/828
摘要： PROBLEM TO BE SOLVED: To enable efficient long observation without readjusting an electron gun and an electron optics system in a magnetic field immersion type Cold-FE electron gun.SOLUTION: An electron gun 1 includes a magnetic lens 120, which has a magnetic path including a permanent magnet and a focusing effect, and an electron source 101. A getter pump 16a is provided around or inside the electron gun 1. Thus, a vacuum pump which needs an electric power source is not needed to be mounted, and the electron source 101 is cleaned to recover the probe current by maintaining a high degree of vacuum inside the electron gun 1. Therefore, the electron optics system is not needed to be readjusted.
摘要翻译：要解决的问题：为了能够在磁场浸没型Cold-FE电子枪中不重新调整电子枪和电子光学系统，实现高效的长时间观察。解决方案：电子枪1包括具有包括永磁体和聚焦效应的磁路的磁性透镜120和电子源101.吸气泵16a设置在电子枪1的内部或内部。因此需要安装电源的真空泵，并且通过在电子枪1内保持高真空度来清洁电子源101以恢复探针电流。因此，电子光学系统不是需要重新调整。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2010272381A Electron gun 有权
标题翻译：电子枪
公开(公告)号：JP2010272381A
公开(公告)日：2010-12-02
申请号：JP2009123684
申请日：2009-05-22
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ICHIHASHI MIKIO , ONISHI TAKASHI , WATANABE SHUNICHI , TAMURA KEIJI
IPC分类号： H01J37/073
CPC分类号： H01J37/063 , H01J37/073 , H01J37/141 , H01J2237/06316 , H01J2237/06341 , H01J2237/065 , H01J2237/26
摘要： PROBLEM TO BE SOLVED: To provide a cold cathode type electron gun of low aberration, which exhibits high intensity even with a large current.
SOLUTION: An electric field emission type electron gun which extracts an electron beam from a cathode and converges the extracted electron beam, includes a magnetic field lens so as to arrange the cathode in a lens magnetic field. An extracting electrode for extracting an electron from the cathode is formed in a cylindrical shape without an aperture structure. The electron gun having a function for converging the electron beam by using a magnetic field, reduces incidentally generated electrostatic lens action, and exhibits high intensity and reduces aberration.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种低像差的冷阴极型电子枪，即使是大电流也显示高强度。解决方案：从阴极提取电子束并使提取的电子束收敛的电场发射型电子枪包括磁场透镜，以将阴极排列在透镜磁场中。用于从阴极提取电子的提取电极形成为没有孔结构的圆柱形形状。具有通过使用磁场会聚电子束的功能的电子枪减少了附带产生的静电透镜作用，并表现出高的强度并减小了像差。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2013225521A Electron gun 审中-公开
标题翻译：电子枪
公开(公告)号：JP2013225521A
公开(公告)日：2013-10-31
申请号：JP2013126253
申请日：2013-06-17
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ICHIHASHI MIKIO , ONISHI TAKASHI , WATANABE SHUNICHI , TAMURA KEIJI
IPC分类号： H01J37/073 , H01J37/141
摘要： PROBLEM TO BE SOLVED: To provide a cold cathode-type electron gun with low aberration that has high brightness even in a large current.SOLUTION: A field emission-type electron gun of the present invention draws electron beams out of a cathode and converges the drawn electron beams, and includes a magnetic field lens so that the cathode is arranged in a lens magnetic field. An extraction electrode for drawing electrons out of the cathode is configured in a cylindrical shape having no diaphragm structure. According to the present invention, the electron gun having a function to converge electron beams by using a magnetic field, reducing an electrostatic lens action occurring in association with the convergence, and having less aberration and high brightness, can be provided.
摘要翻译：要解决的问题：提供即使在大电流下也具有高亮度的低像差的冷阴极型电子枪。解决方案：本发明的场发射型电子枪将电子束从阴极中拉出并使并且包括磁场透镜，使得阴极被布置在透镜磁场中。用于从阴极抽出电子的提取电极被构造成没有膜结构的圆柱形形状。根据本发明，可以提供具有通过使用磁场会聚电子束的功能的电子枪，减少与会聚相关发生的静电透镜动作，并且具有较小的像差和高亮度。

8. 发明专利

JP2008251303A Electron emission element, and electron gun and electron beam application device using it 审中-公开
标题翻译：电子发射元件，电子枪和电子束应用装置
公开(公告)号：JP2008251303A
公开(公告)日：2008-10-16
申请号：JP2007090135
申请日：2007-03-30
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： OKAI MAKOTO , FUJIEDA TADASHI , HIDAKA KISHIO , HAYASHIBARA MITSUO , WATANABE SHUNICHI
IPC分类号： H01J1/304 , C01B31/02 , H01J37/073 , H01J37/305 , H01L21/027
CPC分类号： H01J37/073 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an electron emission element small in energy width, and a high-luminance and high-resolution electron microscope and an electron beam drawing device using the electron emission element. SOLUTION: This invention is characterized in that an electron beam emission element is formed by using carbon nanotubes which have closed structure regions at tips and in which distances between five-membered rings present in the closed structure regions are not shorter than 30 nm. The invention is characterized in that the electron beam emission element is formed by using the carbon nanotubes which have closed structure regions at tips and in which apex angles using the five-membered rings present in the closed structure regions as apexes are not smaller than 70°. The invention is characterized by constituting the electron gun, the electron microscope and the electron beam drawing device by using each electron beam emission element. By the invention, the high-luminance and high-resolution electron microscope and the electron beam drawing device can be obtained. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能量宽度小的电子发射元件，以及使用该电子发射元件的高亮度和高分辨率电子显微镜和电子束引出装置。解决方案：本发明的特征在于，通过使用在顶端具有闭合结构区域的碳纳米管形成电子束发射元件，并且在闭合结构区域中存在的五元环之间的距离不小于30nm 。本发明的特征在于，电子束发射元件是通过使用在顶端具有闭合结构区域的碳纳米管形成的，并且使用存在于封闭结构区域中的五元环作为顶点的顶角不小于70° 。本发明的特征在于通过使用每个电子束发射元件构成电子枪，电子显微镜和电子束引出装置。通过本发明，可以获得高亮度和高分辨率的电子显微镜和电子束描绘装置。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2013257983A Charged particle beam generating device, charged particle beam device, high voltage generator, and high potential device 有权
标题翻译：充电颗粒光束发生装置，充电颗粒光束装置，高压发生器和高电位装置
公开(公告)号：JP2013257983A
公开(公告)日：2013-12-26
申请号：JP2012132103
申请日：2012-06-11
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ONISHI TAKASHI , WATANABE SHUNICHI , KANEDA MINORU
IPC分类号： H01J37/248 , H01J37/067 , H01J37/16
CPC分类号： H01J37/04 , H01J27/024 , H01J29/485 , H01J37/026 , H01J37/067 , H01J37/073 , H01J37/16 , H01J37/241 , H01J37/248 , H01J2237/16
摘要： PROBLEM TO BE SOLVED: To provide a technique for enhancing maintainability without using a gas or liquid insulating material, or while reducing the amount thereof to be used, in a high voltage device.SOLUTION: The charged particle beam generating device includes a charged particle source, a plurality of first electrodes arranged in the irradiation direction of charged particles from the charged particle source, a plurality of insulation members arranged between the first electrodes, and a housing provided on the periphery of the plurality of first electrodes. The housing is formed of an insulating solid material, and includes a plurality of second electrodes arranged in close proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is connected electrically with at least one of the plurality of first electrodes, and each of the plurality of second electrodes has the same potential as that of the first electrode in close proximity thereto.
摘要翻译：要解决的问题：提供一种用于在不使用气体或液体绝缘材料的情况下提高可维护性的技术，或者在降低其使用量的同时，在高压装置中。解决方案：带电粒子束产生装置包括带电粒子源，从带电粒子源沿带电粒子的照射方向配置的多个第一电极，配置在第一电极之间的多个绝缘部件和设置在多个第一电极的周围的壳体。壳体由绝缘固体材料形成，并且包括布置成紧邻多个第一电极的多个第二电极。多个第二电极中的至少一个与多个第一电极中的至少一个电连接，并且多个第二电极中的每一个具有与第一电极非常接近的电位相同的电位。

10. 发明专利

JP2011192732A Magnetic field immersion type electron gun and electron beam apparatus 有权
标题翻译：磁场浸入式电子枪和电子束装置
公开(公告)号：JP2011192732A
公开(公告)日：2011-09-29
申请号：JP2010056095
申请日：2010-03-12
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： ONISHI TAKASHI , WATANABE SHUNICHI , TAMURA KEIJI , ICHIHASHI MIKIO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To achieve a reduced size of a magnetic path and stable behavior of an electron gun in a double-gap magnetic field immersion type electron gun. SOLUTION: The magnetic field immersion type electron gun has a double-gap magnetic path with three magnetic poles arranged on a coaxial line in which a magnetic lens has a hole in its central axis, wherein a permanent magnet is arranged in a gap of two gaps made up among the three magnetic poles, the gap on the side where there exists no electron source. COPYRIGHT: (C)2011,JPO&INPIT

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