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91. 发明专利

JP2014229883A インプリント方法、インプリント装置及びデバイス製造方法有权
标题翻译：印刷方法，印刷装置和装置制造方法
公开(公告)号：JP2014229883A
公开(公告)日：2014-12-08
申请号：JP2013111351
申请日：2013-05-27
申请人：キヤノン株式会社 , Canon Inc
发明人： SATO KOJI , HIURA MITSURU
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , G03F7/70775 , G03F9/7003 , G03F9/7042 , G03F9/708 , G03F9/7088
摘要：【課題】インプリント材に形成されたパターンと、基板上のショット領域との重ね合わせ検査の精度を向上することができるインプリント方法を提供する。【解決手段】インプリント方法は、基板のマークを含むパターンが形成された基板上にインプリント材を供給する工程と、インプリント材に型のマークを含むパターンを有する型を接触させる工程と、型を接触させた状態でインプリント材を硬化させる工程と、インプリント材のマークを含むパターンをインプリント材に形成する形成工程とを有するインプリント方法であって、センサ上にインプリント材のマークの像及び基板のマークの像を形成する光学系を用い、型のマークが光学系の焦点深度外に位置するまで、インプリント材と型との間隔を広げた後、インプリント材のマーク及び基板のマークを検出して、基板のパターンとインプリント材のパターンとの相対的な位置ずれを求めることを特徴とする。【選択図】図6
摘要翻译：要解决的问题：提供能够提高在压印材料形成的图案与基板上的照射区域之间的覆盖检查的精度的压印方法。解决方案：压印方法包括以下步骤：将压印材料供应到形成包括基板的标记的图案的基板; 使模具包括包含模具的标记的图案与压印材料接触; 在模具接触的状态下使压印材料硬化; 以及在压印材料中形成包括压印材料的标记的图案。在使用用于形成压印材料的标记的图像的光学系统和传感器上的基板的标记的图像时，压印材料和模具之间的间隔被加宽，直到模具的标记位于然后检测光学系统的焦点深度，印记材料的标记和基板的标记，并且计算基板的图案和压印材料的图案之间的相对位置错位。

92. 发明专利

JP2013175709A Imprint device and method of manufacturing article using the same 有权
标题翻译：印刷装置及其制造方法
公开(公告)号：JP2013175709A
公开(公告)日：2013-09-05
申请号：JP2013006827
申请日：2013-01-18
申请人： Canon Inc , キヤノン株式会社
发明人： MATSUDA YOZO , HASEGAWA TAKAYASU , OKEURA MITSURU , HAYASHI TATSUYA
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B29C59/002 , B29C59/16 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F9/7003 , G03F9/7042 , G03F9/7065
摘要： PROBLEM TO BE SOLVED: To provide an imprint device which has an advantage in simplifying a mechanism for thermally correcting shape of a processed region of a substrate or shape of a pattern region of a die.SOLUTION: The imprint device forms a resin pattern on a processed region of a substrate by using a die containing a pattern region in which a pattern is formed. It includes a correction means for correcting shape of a target region which is any one of a pattern region of the die and the processed region of the substrate. The correction means includes a heating means for heating an object corresponding to the target region of the die and substrate in a heating region having an area smaller than the area of pattern region of the die, a scan means which changes relative position between the target region and the heating region so that the target region is scanned with the heating region, and a control means which acquires information about a corrective deformation amount of the target region, to control the heating means and the scan means based on the information.
摘要翻译：要解决的问题：提供一种压印装置，其具有简化用于热校正基板的处理区域的形状或模具的图案区域的形状的机构的优点。解决方案：压印装置在通过使用包含其中形成图案的图案区域的模具来处理衬底的处理区域。它包括用于校正作为模具的图案区域和基板的处理区域中的任何一个的目标区域的形状的校正装置。校正装置包括加热装置，用于在具有小于模具的图案区域的面积的加热区域中加热与模具和基板的目标区域相对应的物体;扫描装置，其改变目标区域之间的相对位置以及加热区域，使得目标区域被加热区域扫描，以及控制装置，其获取关于目标区域的校正变形量的信息，以基于该信息来控制加热装置和扫描装置。

93. 发明专利

JP5268239B2 Pattern forming apparatus, a pattern forming method 有权
公开(公告)号：JP5268239B2
公开(公告)日：2013-08-21
申请号：JP2006230222
申请日：2006-08-28
申请人：キヤノン株式会社
发明人：信人末平 , 淳一関 , 秀樹稲
IPC分类号： G01B11/00 , B29C59/02 , B82B3/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/0002 , B29C35/08 , B29C59/16 , B82Y10/00 , B82Y40/00 , G01B11/14 , G03F9/703 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate comprises a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light, an optical system for guiding the light from said light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope and a spectroscope for dispersing the reflected lights guided by said optical system into a spectrum. Furthermore, it comprises an image sensor for observing the light dispersed by said spectroscope, an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate on the basis of information obtained by said image sensor, characterized in that said analyzer is adapted to analyze a first distance as a distance between the surface of the mold and a surface formed at a position away from the surface of the mold on the basis of information obtained from lights emitted from said light source and reflected by the surface of the mold and the surface formed at the position away from the surface of the mold. In addition, said analyzer is adapted to analyze a second distance as a distance between the surface formed at the position away from the surface of the mold and the surface of the substrate on the basis of information obtained from lights emitted from said light source and reflected by the surface formed at the position away from the surface of the mold and the surface of the substrate. Moreover, said analyzer is adapted to calculate the distance between the surface of the mold and the surface of the substrate by subtracting the first distance from the second distance.

94. 发明专利

JP5253756B2 Manufacturing apparatus and method of manufacturing a display plate 有权
公开(公告)号：JP5253756B2
公开(公告)日：2013-07-31
申请号：JP2007124050
申请日：2007-05-09
申请人：三星ディスプレイ株式會社Samsung Display Co.,Ltd.
发明人：在 ▲ヒョック▼ 張 , 南錫盧 , 廷 ▲モック▼ ▲ベ▼
IPC分类号： G09F9/00 , G02F1/13 , G02F1/1368
CPC分类号： G02F1/133555 , B29C59/026 , B82Y10/00 , B82Y40/00 , G02F1/136227 , G02F2202/023 , G03F7/0002 , G03F7/70791 , G03F9/7042 , G03F9/7076 , G03F9/7088 , H01L27/1214 , H01L27/1288
摘要： An imprint/soft lithography apparatus (fig.1) for manufacturing a flat panel display substrate (10) is disclosed which has a movable holder (40) on to which the substrate is placed. An alignment sensor (70) mounted under a window (44) in the holder determines the accuracy of alignment of the substrate and the imprint lithography stamp (or mould) (60) via alignment marks on the mould (66) and on the substrate (16). Registration of the mould and the substrate is performed with the parts in contact, but before hardening. Some or all of the patterning steps for manufacturing an active matrix flat panel display are carried out by the imprint lithographic technique. The alignment marks on the mould are coated with a film (68) to improve their reflectivity/absorption and to facilitate stamp removal after pressing. The imprinted organic film can be hardened in situ by UV light or by heating. A second hardening step may be needed for the area under the mould alignment marks, which were masked in the initial UV hardening process by the alignment mark film.

95. 发明专利

JP2013131607A Position detection device, imprint device and device manufacturing method 有权
标题翻译：位置检测装置，印刷装置和装置制造方法
公开(公告)号：JP2013131607A
公开(公告)日：2013-07-04
申请号：JP2011279722
申请日：2011-12-21
申请人： Canon Inc , キヤノン株式会社
发明人： MATSUMOTO TAKAHIRO
IPC分类号： H01L21/027
CPC分类号： G01B11/14 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7049
摘要： PROBLEM TO BE SOLVED: To provide a position detection device having improved detection accuracy as a position detection device for detecting a relative position of two objects.SOLUTION: The position detection device is a position detection device for irradiating diffraction gratings formed on each of two objects with light emitted from a light source, receiving diffracted light of the diffraction gratings, and thereby determining a relative position of the two objects; and includes an optical system for making plus first-order diffracted light and minus first-order diffracted light of the diffraction gratings interfere with each other, a light-receiving section and a processing section. The light-receiving section receives two-light flux interference light of the plus first-order diffracted light and the minus first-order diffracted light of the diffraction gratings formed on each of the two objects. The processing section determines the relative position of the two objects using two-light flux interference light in a region in which the two-light flux interference light by the diffracted light from each of the diffraction gratings does not overlap each other out of the two-light flux interference light by the diffracted light from the diffraction gratings formed on each of the two objects that has been received in the light-receiving section.
摘要翻译：要解决的问题：提供一种具有提高的检测精度的位置检测装置作为用于检测两个物体的相对位置的位置检测装置。解决方案：位置检测装置是用于照射形成在两个物体中的每一个上的衍射光栅的位置检测装置从光源发射的光，接收衍射光栅的衍射光，从而确定两个物体的相对位置; 并且包括用于制造加一级衍射光的光学系统和衍射光栅彼此干涉的负一级衍射光，光接收部分和处理部分。光接收部分接收形成在两个物体中的每一个上的一级衍射光和衍射光栅的负一级衍射光的二光束干涉光。处理部通过来自两个衍射光栅的衍射光的双光束干涉光在二维光束中彼此不重叠的区域中，使用双光束干涉光来确定两个物体的相对位置，来自衍射光栅的衍射光的光束干涉光形成在已经接收在光接收部分中的两个物体的每一个上。

97. 发明专利

JP2013026436A Imprint method and imprint system 有权
标题翻译： IMPRINT方法和印刷系统
公开(公告)号：JP2013026436A
公开(公告)日：2013-02-04
申请号：JP2011159746
申请日：2011-07-21
申请人： Toshiba Corp , 株式会社東芝
发明人： SUZUKI MASATO , KONO TAKUYA , TAKAKUWA MAHO , FUKUHARA KAZUYA
IPC分类号： H01L21/027 , B29C59/02 , G11B5/84
CPC分类号： G03F9/7042 , B29C2043/025 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To improve transfer pattern alignment accuracy.SOLUTION: An imprint method comprises the steps of: coating a photocuring organic material on a processed film; bringing an uneven pattern of a template into contact with the photocuring organic material; applying a force to the template with the template brought into contact with the photocuring organic material; curing the photocuring organic material by irradiating it with light with the template brought into contact with the photocuring organic material; releasing the template from the photocuring organic material after irradiating the photocuring organic material with the light. A magnitude of force to be applied to the template corresponds to the interval between a surface of the processed film and the template.
摘要翻译：要解决的问题：提高转印图案对准精度。解决方案：压印方法包括以下步骤：在加工膜上涂布光固化有机材料; 使模板的不均匀图案与光固化有机材料接触; 用与光固化有机材料接触的模板对模板施加力; 通过用光照射光固化有机材料，模板与光固化有机材料接触; 在用光照射光固化有机材料之后，从光固化有机材料中释放模板。施加到模板的力的大小对应于处理膜的表面和模板之间的间隔。版权所有（C）2013，JPO＆INPIT

98. 发明专利

JP2012212901A Imprint method, imprint apparatus, and member manufacturing method using the imprint method 有权
标题翻译：印刷方法，印刷装置和使用印刷方法的成员制造方法
公开(公告)号：JP2012212901A
公开(公告)日：2012-11-01
申请号：JP2012130289
申请日：2012-06-07
申请人： Canon Inc , キヤノン株式会社
发明人： OKUJIMA SHINGO , SEKI JUNICHI , SUEHIRA NOBUHITO , HARUMI KAZUYUKI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B05C11/00 , B29C59/002 , B82Y10/00 , B82Y40/00 , G03F9/7023 , G03F9/703 , G03F9/7042
摘要： PROBLEM TO BE SOLVED: To provide an imprint method with which some thought is put into a control condition concerning alignment in an imprint process to thereby enable more favorable alignment control.SOLUTION: An imprint method, with which a pattern formed on a mold is imprinted into a pattern formation layer on a substrate while performing control of alignment between the mold and the substrate, includes: a step for, after the alignment control is started, bringing the mold and the pattern formation layer into contact with each other by reducing a distance between the mold and the substrate while performing the alignment control; a step for, after the mold and the pattern formation layer contact each other, halting the alignment control; a step for, under a state where the alignment control is halted, further reducing the distance between the mold contacting the pattern formation layer and the substrate; a step for, under a state where the distance between the mold and the substrate is further reduced, curing the pattern formation layer; and a step for, after the pattern formation layer is cured, increasing the distance between the mold and the substrate.
摘要翻译：要解决的问题：提供一种压印方法，其中一些想法被置于关于压印处理中的对准的控制条件中，从而能够进行更好的对准控制。解决方案：在模具和基板之间进行对准控制的同时，将模具上形成的图案印刷在基板上的图案形成层中的压印方法包括：在对准控制为开始，通过在进行取向控制的同时减小模具和基板之间的距离使模具和图案形成层彼此接触; 在模具和图案形成层彼此接触之后，停止对准控制的步骤; 在对准控制停止的状态下进一步减小与图案形成层接触的模具与基板之间的距离的步骤; 在模具和基板之间的距离进一步减小的状态下固化图案形成层的步骤; 以及在图案形成层固化之后增加模具和基板之间的距离的步骤。版权所有（C）2013，JPO＆INPIT

99. 发明专利

JP2012064810A Template for nanoimprint and pattern transfer device 审中-公开
标题翻译： NANOIMPRINT和图案传输设备的模板
公开(公告)号：JP2012064810A
公开(公告)日：2012-03-29
申请号：JP2010208540
申请日：2010-09-16
申请人： Toshiba Corp , 株式会社東芝
发明人： SANHONGI AKIKO , INENAMI RYOICHI , KASA KENTARO , NAKAJIMA YUMI , SUZUKI MASATO , TAKAKUWA MAHO , FURUDONO YOKO
IPC分类号： H01L21/027 , B29C33/42 , B29C59/02
CPC分类号： G03F7/002 , G03F9/7042
摘要： PROBLEM TO BE SOLVED: To provide highly precise alignment without having any adverse effect.SOLUTION: A template for nanoimprint comprises a transfer pattern 16a and an alignment mark AM2 provided on the identical face. The alignment mark AM2 is composed of a polarizer or a phase difference film 17. During pattern transfer on a substrate by a nanoimprint technology, by using polarization or by detecting an optical phase difference, alignment between the substrate and the template for nanoimprint is performed.

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