PROBLEM TO BE SOLVED: To provide an imprint device which has an advantage in simplifying a mechanism for thermally correcting shape of a processed region of a substrate or shape of a pattern region of a die.SOLUTION: The imprint device forms a resin pattern on a processed region of a substrate by using a die containing a pattern region in which a pattern is formed. It includes a correction means for correcting shape of a target region which is any one of a pattern region of the die and the processed region of the substrate. The correction means includes a heating means for heating an object corresponding to the target region of the die and substrate in a heating region having an area smaller than the area of pattern region of the die, a scan means which changes relative position between the target region and the heating region so that the target region is scanned with the heating region, and a control means which acquires information about a corrective deformation amount of the target region, to control the heating means and the scan means based on the information.