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1. 发明专利

JP2010080632A Imprinting device and imprinting method 有权
标题翻译：印刷装置和印刷方法
公开(公告)号：JP2010080632A
公开(公告)日：2010-04-08
申请号：JP2008246334
申请日：2008-09-25
申请人： Canon Inc , キヤノン株式会社
发明人： KAWAKAMI EIGO , OKUJIMA SHINGO , INE HIDEKI , SEKI JUNICHI , TERASAKI ATSUNORI , OKINAKA MOTOKI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： B29C43/021 , B29C43/003 , B29C43/14 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5833 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To provide an imprinting device and an imprinting method capable of performing a process for performing imprinting by filling resin and a process for applying resin in parallel to achieve high throughput. SOLUTION: The imprinting device and the imprinting method include: a first drive mechanism for changing the relative positions of a substrate and a mold to a face direction in parallel with the substrate surface; and a second drive mechanism for changing the relative positions of the substrate and a coating mechanism to a face direction in parallel with the substrate surface. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够进行通过填充树脂进行压印的方法的压印装置和压印方法以及并行施加树脂的工艺以实现高生产率。压印装置和压印方法包括：用于将基板和模具的相对位置与基板表面平行地改变为面向方向的第一驱动机构; 以及第二驱动机构，用于将基板和涂覆机构的相对位置与基板表面平行地改变为面向方向。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2013043395A Ink-jet recording head 有权
标题翻译： INK-JET记录头
公开(公告)号：JP2013043395A
公开(公告)日：2013-03-04
申请号：JP2011183572
申请日：2011-08-25
申请人： Canon Inc , キヤノン株式会社
发明人： KARITA SEIICHIRO , AOKI TAKATSUNA , OKUJIMA SHINGO , NISHITANI EISUKE
IPC分类号： B41J2/05 , B41J2/135
CPC分类号： B41J2202/12
摘要： PROBLEM TO BE SOLVED: To provide an ink-jet recording head capable of reducing influence due to evaporation of water in ink.SOLUTION: The ink-jet recording head discharges a liquid supplied from a common liquid chamber 10 to a plurality of liquid chambers 12 from a discharge surface P via nozzles 9 extending from the liquid chambers 12. The ink-jet recording head has a groove part 7 formed to have a recessed shape at the positions of respective nozzles 9 of the discharge surface P, and a discharge opening 16 connected to the groove part 7. The ink-jet recording head forms a flow path in which the liquid flows sequentially through the common liquid chamber 10, the liquid chambers 12, the nozzles 9, the groove part 7, and the discharge opening 16.
摘要翻译：要解决的问题：提供能够减少由于油墨中的水蒸发引起的影响的喷墨记录头。解决方案：喷墨记录头通过从液体室12延伸的喷嘴9将从公共液体室10供应的液体从排出表面P排出到多个液体室12.喷墨记录头具有形成为在排出面P的各喷嘴9的位置处具有凹形形状的槽部7和连接到槽部7的排出口16.喷墨记录头形成液体流动的流路依次通过公共液体室10，液体室12，喷嘴9，凹槽部分7和排出口16.版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2010080630A Stamping device and method of manufacturing article 审中-公开
标题翻译：冲压装置及其制造方法
公开(公告)号：JP2010080630A
公开(公告)日：2010-04-08
申请号：JP2008246332
申请日：2008-09-25
申请人： Canon Inc , キヤノン株式会社
发明人： KAWAKAMI EIGO , INE HIDEKI , SEKI JUNICHI , TERASAKI ATSUNORI , OKUJIMA SHINGO , OKINAKA MOTOKI
IPC分类号： H01L21/027 , B29C39/10 , B29C39/22 , B29C43/36 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7015 , G03F9/7042
摘要： PROBLEM TO BE SOLVED: To reduce a stroke on the X-Y surface of an X-Y stage included in a stamping device.
SOLUTION: The stamping device forms a resin pattern in a shot by curing a liquid resin while keeping pressing a mold against the liquid resin arranged in the shot of a substrate in a Z-axis direction. The stamping device includes: a scope for measuring positioning misalignment on the X-Y plane between a mold mark formed in the mold held by a mold chuck and a substrate mark formed on the substrate held by a substrate chuck; a dispenser for arranging the liquid resin in the shot; and a reference mark provided on the X-Y stage. The X-Y stage includes its travel range so that the dispenser can arrange the liquid resin in all shots of the substrate held by the X-Y stage, and the reference mark is provided at a position on the X-Y stage capable of measuring positional misalignment to the mold mark within the travel range of the X-Y stage by a scope.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：减少包括在冲压装置中的X-Y平台的X-Y表面的行程。解决方案：冲压装置通过固化液体树脂，同时保持将模具压靠在基板的Z轴方向上布置的液体树脂上而在成型过程中形成树脂图案。冲压装置包括：用于测量在由模具卡盘保持的模具中形成的模具标记与形成在由基板卡盘保持的基板上的基板标记之间的X-Y平面上的定位未对准的范围; 用于将液体树脂布置在镜头中的分配器; 以及在X-Y平台上提供的参考标记。 XY台包括其行程范围，使得分配器可以在由XY台保持的基板的所有照射中布置液体树脂，并且将参考标记设置在XY台上的能够测量与模具标记的位置偏移的位置在XY平台的范围内。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009200505A Mold, imprint method, and method for manufacturing chip 有权
标题翻译：模具，印刷方法和制造芯片的方法
公开(公告)号：JP2009200505A
公开(公告)日：2009-09-03
申请号：JP2009095495
申请日：2009-04-10
申请人： Canon Inc , キヤノン株式会社
发明人： TERASAKI ATSUNORI , SEKI JUNICHI , SUEHIRA NOBUHITO , INE HIDEKI , OKUJIMA SHINGO
IPC分类号： H01L21/027 , B29C33/38 , B29C33/42 , B29C59/02
摘要： PROBLEM TO BE SOLVED: To provide a mold capable of a highly accurate alignment with a member to be processed even in such a state that a photocurable resin material is disposed between the mold and the member to be processed.
SOLUTION: The mold is constituted by a substrate formed of a first material and an alignment mark provided on the substrate and formed of a second material different from the first material, and the refractive index of the second material with respect to visible light of wavelength of 633 nm is not less than 1.7.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使在光固化树脂材料设置在模具和待加工构件之间的状态下，也能够提供能够与待加工构件高精度对准的模具。解决方案：模具由由第一材料形成的基板和设置在基板上并由与第一材料不同的第二材料形成的对准标记构成，第二材料相对于可见光的折射率的波长为633nm，不小于1.7。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2009060085A Imprint method and method of processing substrate, and structure using the method of processing substrate 有权
标题翻译：使用加工基板的方法的印刷方法和处理基板的方法和结构
公开(公告)号：JP2009060085A
公开(公告)日：2009-03-19
申请号：JP2008182301
申请日：2008-07-14
申请人： Canon Inc , キヤノン株式会社
发明人： OKUJIMA SHINGO , SEKI JUNICHI , ONO HARUTO , NAKATSUJI SHICHIRO
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24479
摘要： PROBLEM TO BE SOLVED: To provide an imprint method by which patterns between adjacent processing areas are joined with each other and manufacturing cost can be reduced, and to provide a method of processing a substrate. SOLUTION: The imprint method includes: a step of preparing the mold including a light blocking member at a position in which the pattern is not formed; a step of forming a pattern for a first time through steps including a step of bringing the mold into contact with a photocurable resin material provided on the substrate, a step of forming a first processed area by curing the photocurable resin material through light irradiation, and a step of removing a part of the photocurable resin material extruded from the first processed area into an outside area at a periphery of the first processed area: and a step of forming a pattern for a second time through steps including a step of bringing the mold into contact with a photocurable resin material provided on the substrate in an area which includes the outside area and is adjacent to the first processed area, a step of forming a second processed area by curing the photocurable resin material in the area, and a step of removing a part of the photocurable resin material extruded from the second processed area at a periphery of the second processed area. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种相邻处理区域之间的图案彼此连接并且可以降低制造成本的压印方法，并且提供一种处理基板的方法。压印方法包括：在未形成图案的位置准备包括遮光构件的模具的步骤; 通过包括使模具与设置在基板上的可光固化树脂材料接触的步骤的步骤，首先形成图案的步骤，通过光照射固化光固化性树脂材料来形成第一处理区域的步骤，以及将从第一处理区域挤出的部分可光固化树脂材料除去到第一处理区域周边的外部区域的步骤;以及通过包括使模具的第二工序的第二次形成图案的步骤与设置在包括外部区域并且与第一处理区域相邻的区域中的设置在基板上的可光固化树脂材料接触;通过固化该区域中的可光固化树脂材料形成第二处理区域的步骤，以及步骤从所述第二处理区域的周围除去从所述第二处理区域挤出的所述可光固化树脂材料的一部分。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2010034584A Mold, imprint method, and method of manufacturing chip 有权
标题翻译：模具，印刷方法和制造芯片的方法
公开(公告)号：JP2010034584A
公开(公告)日：2010-02-12
申请号：JP2009254998
申请日：2009-11-06
申请人： Canon Inc , キヤノン株式会社
发明人： TERASAKI ATSUNORI , SEKI JUNICHI , SUEHIRA NOBUHITO , INE HIDEKI , OKUJIMA SHINGO
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a mold that can be accurately aligned with a workpiece even when photo-curing resin is interposed between the mold and the workpiece. SOLUTION: The mold includes a substrate made of a first material and an alignment mark that is provided on the substrate and is made of a second material different from the first material. The first and second materials have transparency allowing transmission of light in the wavelength range of at least a part of visible light and in the wavelength range of at least a part of ultraviolet light, and the second material has a refractive index of at least 1.7 relative to visible light having a wavelength of 633 nm. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使当光固化树脂插入在模具和工件之间时，也可以提供能够精确地对准工件的模具。解决方案：模具包括由第一材料制成的基板和设置在基板上并由与第一材料不同的第二材料制成的对准标记。第一和第二材料具有透明度，允许在至少一部分可见光的波长范围内和在紫外光的至少一部分的波长范围内的光的透射，并且第二材料的折射率至少为1.7相对到具有633nm波长的可见光。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2009177146A Method of processing substrate by imprinting 有权
标题翻译：通过印刷加工基板的方法
公开(公告)号：JP2009177146A
公开(公告)日：2009-08-06
申请号：JP2008321838
申请日：2008-12-18
申请人： Canon Inc , キヤノン株式会社
发明人： OKUJIMA SHINGO , SEKI JUNICHI , TERASAKI ATSUNORI
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide a method of processing a substrate capable of uniformizing a substrate pattern when processing the substrate by a step-and-repeat system imprinting.
SOLUTION: This method of processing a substrate includes: an imprinting process of applying a resin to the substrate to form a resin layer region with a resin layer formed thereon, and forming an uneven pattern of a mold in the resin layer region; a protective layer formation process of including a region in the resin layer region with the pattern formed therein, a region without having the pattern formed therein, and a region on the substrate without having the resin layer formed therein, and forming a protective layer over the regions; a reverse pattern formation process of etching the resin layer using the protective layer as a mask, and forming a reverse pattern consisting of a part of the protective layer and a part of the resin layer on the substrate; and a substrate etching process of etching the substrate by using the reverse pattern as a mask. The substrate is processed by repeating the series of processes multiple times.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种处理基板的方法，所述基板能够通过步进重复系统印刷处理基板时使基板图案均匀化。该处理基板的方法包括：向基板施加树脂以形成其上形成有树脂层的树脂层区域并在树脂层区域中形成模具的不均匀图案的印刷工艺; 在树脂层区域中形成图案的保护层形成工艺，不形成图案的区域和不形成有树脂层的基板上的区域，以及在其上形成保护层区域; 使用保护层作为掩模蚀刻树脂层的反向图案形成工艺，以及在基板上形成由保护层的一部分和树脂层的一部分组成的反向图案; 以及通过使用反向图案作为掩模来蚀刻基板的基板蚀刻工艺。通过多次重复一系列处理来处理衬底。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2009060084A Imprint method and method of processing substrate, and structure using the method of processing substrate 有权
标题翻译：使用加工基板的方法的印刷方法和处理基板的方法和结构
公开(公告)号：JP2009060084A
公开(公告)日：2009-03-19
申请号：JP2008182297
申请日：2008-07-14
申请人： Canon Inc , キヤノン株式会社
发明人： OKUJIMA SHINGO , SEKI JUNICHI , ONO HARUTO , TERASAKI ATSUNORI , NAKATSUJI SHICHIRO
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B29C33/424 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide an imprint method by which a resin layer in an extruded area extruded from a pattern formation area can be easily removed, and to provide a method of processing a substrate using the imprint method.
SOLUTION: The imprint method is used to imprint a pattern of a mold to a resin on a substrate, and it includes: a step 101 of bringing the mold into contact with the resin formed on the substrate and form a first processing area wherein an uneven pattern corresponding to a pattern of the mold is formed and an extruded area made of the resin around the first processed area; a step 102 of forming a first protection layer for protecting the first processed area on the resin layer in the first processed area; and a step 103 of removing the resin layer in the protruded area while protecting the pattern formed on the resin layer of the first processed area by means of the first protection layer.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种压印方法，通过该方法可以容易地去除从图案形成区域挤出的挤出区域中的树脂层，并提供使用压印方法处理基板的方法。解决方案：压印方法用于将模具的图案压印到基板上的树脂上，并且其包括：使模具与形成在基板上的树脂接触并形成第一处理区域的步骤101 其中形成与所述模具的图案相对应的不均匀图案，并且在所述第一处理区域周围形成由所述树脂制成的挤压区域; 形成用于保护第一处理区域中的树脂层上的第一处理区域的第一保护层的步骤102; 以及通过第一保护层保护形成在第一处理区域的树脂层上的图案的步骤103，除去突出区域中的树脂层。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2009043998A Imprinting method and imprinting device 有权
标题翻译：印刷方法和印刷装置
公开(公告)号：JP2009043998A
公开(公告)日：2009-02-26
申请号：JP2007208266
申请日：2007-08-09
申请人： Canon Inc , キヤノン株式会社
发明人： SUEHIRA NOBUHITO , SEKI JUNICHI , OKUJIMA SHINGO
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： B29C43/021 , B29C33/424 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3634 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To provide an imprinting method and an imprinting device that can charge resin without expecting the resin to spread so as to form the resin to a prescribed thickness and shorten the charging time of the resin. SOLUTION: The imprinting method includes a first process of arranging a mold for a substrate so that first and second end portions of the mold may be at different intervals with the substrate, a second process of moving the mold or/and the substrate to a side on the substrate where uncured resin is provided, and making the uncured resin flow to between the mold and substrate from outside a front end portion of the mold viewed from the advance direction of the movement to charge the resin, and a third process of controlling the posture of the mold or/and the substrate to make intervals of the first and the second end portions of the model with the substrate different from the intervals of the arrangement in the first process. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够对树脂进行充电而不期望树脂扩散以形成树脂至规定厚度并缩短树脂的充电时间的压印方法和压印装置。解决方案：压印方法包括：为基板设置模具的第一过程，使得模具的第一和第二端部可以与基板处于不同的间隔;移动模具或/和基板的第二过程在未固化的树脂的基板上的一侧上，并且使未固化的树脂从运动的前进方向从模具的前端部的外侧流到模具和基板之间，以对树脂进行充电，并且第三工序控制模具或/和基板的姿势以使模型的第一和第二端部的间隔与基板的间隔不同于第一工序中的布置间隔。版权所有（C）2009，JPO＆INPIT

10. 发明专利

JP2007103915A Mold, imprint method, and method of manufacturing chip 有权
标题翻译：模具，印刷方法和制造芯片的方法
公开(公告)号：JP2007103915A
公开(公告)日：2007-04-19
申请号：JP2006194905
申请日：2006-07-14
申请人： Canon Inc , キヤノン株式会社
发明人： TERASAKI ATSUNORI , SEKI JUNICHI , SUEHIRA NOBUHITO , INE HIDEKI , OKUJIMA SHINGO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F9/7042
摘要： PROBLEM TO BE SOLVED: To provide a mold enabling precise alignment between the mold and a work piece even if interposing a photo-curing resin between the mold and the work piece.
SOLUTION: The mold has a substrate 2010 containing a first material, and an alignment mark 2102 that is formed on the substrate and contains a second material different from the first one. The first and second materials are transparent to light having at least a partial wavelength region in ultraviolet rays, and the refractive index of the second material is set to at least 1.7.
COPYRIGHT: (C)2007,JPO&INPIT

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