专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

EP2513354B1 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION FOR AN INTERIOR OF A HOLLOW ARTICLE WITH HIGH ASPECT RATIO 有权
公开(公告)号：EP2513354B1
公开(公告)日：2018-08-15
申请号：EP10838345.6
申请日：2010-12-20
申请人： Duralar Technologies, LLC
发明人： UPADHYAYA, Deepak , BOINAPALLY, Karthik , BOARDMAN, William, J. , MAMOODY, Matthew , CASSERLY, Thomas, B. , HAZARIKA, Pankaj, Jyoti , DOAN, Duc
IPC分类号： C23C16/00 , H01J37/32 , C23C16/27 , C23C16/455
CPC分类号： H01J37/32568 , C23C16/045 , C23C16/26 , C23C16/503 , H01J37/32394 , H01J37/32449 , H01J37/32577 , H01J37/32596 , Y10T428/13
摘要： A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.

2. 发明授权

EP3109891B1 PLASMA CHEMICAL VAPOR DEPOSITION DEVICE 失效
标题翻译：等离子体化学气相沉积装置
公开(公告)号：EP3109891B1
公开(公告)日：2018-05-09
申请号：EP16176269.5
申请日：2016-06-24
申请人： Toyota Jidosha Kabushiki Kaisha
发明人： SATO, Yoji , SATO, Takayasu , NAKATA, Hiromichi , TACHIBANA, Kazutaka , ARIYADA, Osamu , TAKANO, Yuji , TSURUMOTO, Ryo
IPC分类号： H01J37/32
CPC分类号： C23C16/513 , C23C16/455 , H01J37/32211 , H01J37/32311 , H01J37/32577
摘要： A plasma chemical vapor deposition device includes a chamber (12), a first conductor (20) having an elongated shape, a second conductor (30) having a tubular shape, a high-frequency output device (45), and a direct-current power supply (46). A first connecting portion (23) of the first conductor (20) with the high-frequency output device (45) and a second connecting portion (24) of the first conductor (20) with the direct-current power supply (46) are both placed outside the chamber (12). A distance from one end of the first conductor (20) to the first connecting portion (23) is shorter than a distance from the one end of the first conductor (20) to the second connecting portion (24). An impedance change portion (25) is provided between the first connecting portion (23) and the second connecting portion (24) in the first conductor (20), the impedance change portion having an impedance different from an impedance between the one end of the first conductor (20) and the first connecting portion (23).

3. 发明授权

EP2581949B1 SURFACE FEED-IN ELECTRODE FOR DEPOSITION OF THIN FILM SOLAR BATTERY AND SIGNAL FEED-IN METHOD THEREOF 有权
标题翻译： OBERFLÄCHENEINSPEISELEKTRODE用于薄膜太阳电池的分离。确保SIGNALEINSPEISMETHODE
公开(公告)号：EP2581949B1
公开(公告)日：2017-03-01
申请号：EP10852666.6
申请日：2010-10-21
申请人： SHEN ZHEN SCIENCE & TECHNOLOGY DEVELOPMENT CO., LTD.
发明人： HU, Shengming , LI, Yi , HE, Zhubing , LI, Zhijian , ZHOU, Jianhua , WANG, Chunzhu
IPC分类号： H01L31/18 , C23C16/505 , H01J37/04 , H01J37/32 , C23C16/24
CPC分类号： C23C16/505 , C23C16/24 , H01J37/32091 , H01J37/32577 , H01L31/1804 , H01L31/1824 , Y02E10/545 , Y02E10/547 , Y02P70/521

4. 发明授权

EP2882885B8 VERFAHREN ZUM PLASMABESCHICHTEN EINES PRESSBLECHS 失效转让
标题翻译：方法等离子涂层的压板
公开(公告)号：EP2882885B8
公开(公告)日：2016-08-31
申请号：EP13791714.2
申请日：2013-08-06
申请人： Berndorf Hueck Band- und Preßblechtechnik GmbH
发明人： GEBESHUBER, Andreas , HEIM, Daniel , LAIMER, Johann , MÜLLER, Thomas , PROSCHEK, Michael , STADLER, Otto , STÖRI, Herbert
IPC分类号： C23C16/50 , B30B15/06 , C23C16/52 , H01J37/32
CPC分类号： H01J37/32532 , C23C16/50 , C23C16/52 , H01J37/32577

5. 发明公开

EP2513354A4 CHEMICAL VAPOR DEPOSITION FOR AN INTERIOR OF A HOLLOW ARTICLE WITH HIGH ASPECT RATIO 审中-公开
标题翻译：化学气相沉积，内部的中空制品宽高比HIGH
公开(公告)号：EP2513354A4
公开(公告)日：2016-02-10
申请号：EP10838345
申请日：2010-12-20
申请人： SUB ONE TECHNOLOGY INC
发明人： UPADHYAYA DEEPAK , BOINAPALLY KARTHIK , BOARDMAN WILLIAM J , MAMOODY MATTHEW , CASSERLY THOMAS B , HAZARIKA PANKAJ JYOTI , DOAN DUC
IPC分类号： C23C16/00 , C23C16/27 , C23C16/455 , H01J37/32
CPC分类号： H01J37/32568 , C23C16/045 , C23C16/26 , C23C16/503 , H01J37/32394 , H01J37/32449 , H01J37/32577 , H01J37/32596 , Y10T428/13

6. 发明公开

EP2469611A4 MOVABLE JIG FOR SILICON-BASED THIN FILM SOLAR CELL 有权
标题翻译：移动设备薄膜太阳能电池ON硅基
公开(公告)号：EP2469611A4
公开(公告)日：2013-05-29
申请号：EP10852665
申请日：2010-10-21
申请人： SHENZHEN TRONY SCIENCE & TECHNOLOGY DEV CO LTD
发明人： HU SHENGMING , LI YI , HE ZHUBING , LI ZHIJIAN , ZHOU JIANHUA , WANG CHUNZHU
IPC分类号： H01L31/18 , C23C16/505 , H01J37/32 , H01L31/042 , H05H1/46
CPC分类号： C23C16/505 , C23C16/545 , H01J37/32091 , H01J37/32577 , H01J37/32715 , H01L21/67313 , H01L21/67326 , H01L21/6734 , H01L31/18

7. 发明公开

EP2581948A1 DISCHARGE ELECTRODE PLATE ARRAY FOR FILM SOLAR CELL DISPOSITION 有权
标题翻译： ENTLADUNGSELEKTRODENPLATTENARRAYFÜRDIE ABSCHEIDUNG VON FOLIENSOLARZELLEN
公开(公告)号：EP2581948A1
公开(公告)日：2013-04-17
申请号：EP10852664.1
申请日：2010-10-21
申请人： Shenzhen Trony Science & Technology Development Co., Ltd.
发明人： LI, Zhijian , LI, Yi , HE, Zhubing , HE, Shengming , WANG, Chunzhu , ZHOU, Jianhua
IPC分类号： H01L31/18
CPC分类号： H01J1/02 , C23C16/517 , H01J37/32091 , H01J37/32577 , H01L31/202 , Y02E10/50 , Y02P70/521
摘要： A discharge electrode array for a silicon-based thin film solar cell deposition chamber is provided, relating to solar cell technologies. The discharge electrode array includes a signal feed component having a rectangular-shaped end, a flat waist corresponding to a feed-in port located in a hallowed rectangular area on a center region of a cathode plate having a shielding cover, connecting a feed-in power supply signal by surface contact. The electrode array includes at least a set of cathode plates and an anode plate, with two cathode plates sharing or surrounding one anode plate. Uniform large area and stable discharge driven by the RF/VHF power supply signal can be achieved, and the standing wave and the skin effect can be effectively removed. The production efficiency can be improved and the cost can be reduced.
摘要翻译：提供了一种与太阳能电池技术相关的用于硅基薄膜太阳能电池淀积室的放电电极阵列。放电电极阵列包括具有矩形端部的信号馈送部件，平坦的腰部对应于位于具有屏蔽罩的阴极板的中心区域上的仰卧矩形区域中的馈入端口，连接馈入电源信号通过表面接触。电极阵列至少包括一组阴极板和阳极板，两个阴极板共享或围绕一个阳极板。可以实现由RF / VHF电源信号驱动的均匀的大面积和稳定的放电，并且可以有效地消除驻波和皮肤效应。可以提高生产效率，降低成本。

8. 发明公开

EP2469611A1 MOVABLE JIG FOR SILICON-BASED THIN FILM SOLAR CELL 有权
标题翻译： BEWEGLICHE VORRICHTUNGFÜREINEDÜNNSCHICHTSOLARZELLEAUF SILICIUMBASIS
公开(公告)号：EP2469611A1
公开(公告)日：2012-06-27
申请号：EP10852665.8
申请日：2010-10-21
申请人： Shenzhen Trony Science & Technology Development Co., Ltd.
发明人： HU, Shengming , LI, Yi , HE, Zhubing , LI, Zhijian , ZHOU, Jianhua , WANG, Chunzhu
IPC分类号： H01L31/18 , C23C16/505 , H05H1/46
CPC分类号： C23C16/505 , C23C16/545 , H01J37/32091 , H01J37/32577 , H01J37/32715 , H01L21/67313 , H01L21/67326 , H01L21/6734 , H01L31/18
摘要： A movable jig for a silicon-based thin film solar cell comprises parallel electrode plates (203,208), a supporting frame and a signal feed-in assembly (201). The supporting frame is a movable frame and its side frame (216) is grounded. A shield device is set on the jig or among jig arrays themselves for preventing from being disturbed. The signal feed-in assembly is a conductor and its middle portion and head portion form a ladder cylinder, and one end surface (201-1) of the signal feed-in assembly is triangular and can surface contact and connect with a sunken triangular feed-in port (203-1) in the center area of the back surface of the cathode plate (203) of the electrode plates, so the radio frequency/the very high frequency power supply signal can be fed in. Through the way of the surface feed-in in the center of the electrode plate, the consumption caused by the feeder distance in the way of one point feed-in or multipoint feed-in can be reduced, the large area stable discharge of the uniform electric field can be obtained, the production efficiency can be increased and the cost can be decreased.
摘要翻译：一种用于硅基薄膜太阳能电池的移动夹具包括平行电极板（203,208），支撑框架和信号馈入组件（201）。支撑框架是可移动框架，其侧框架（216）接地。屏蔽装置设置在夹具或夹具阵列之间，以防止被干扰。信号馈入组件是导体，其中间部分和头部形成梯形气缸，信号馈入组件的一个端面（201-1）是三角形的，并且可以与凹陷的三角形进给面接触并连接在电极板的阴极板（203）的后表面的中心区域中的入口（203-1），因此可以馈送射频/非常高频率的电源信号。通过在电极板的中心的表面馈入可以减少由一点馈入或多点馈入的馈线距离引起的消耗，可以获得均匀电场的大面积稳定放电，可以提高生产效率，降低成本。

9. 发明公开

EP2469610A1 CLAMPING UNIT FOR DEPOSITING THIN FILM SOLAR CELL AND SIGNAL FEED-IN METHOD 有权
标题翻译： KLEMMEINHEIT ZUR ABLAGERUNG EINERDÜNNSCHICHTSOLARZELLEUND SIGNALEINSPEISUNGSVERFAHREN
公开(公告)号：EP2469610A1
公开(公告)日：2012-06-27
申请号：EP10852663.3
申请日：2010-10-21
申请人： Shenzhen Trony Science & Technology Development Co., Ltd.
发明人： LI, Yi
IPC分类号： H01L31/18 , C23C16/505 , H01J37/04
CPC分类号： H01J37/32091 , C23C16/4587 , H01J37/32577 , H01J37/32715
摘要： A clamping unit for depositing a thin film solar cell and a signal feed-in method are provided. The clamping unit comprises an electrode plate module, a signal feed-in module (201), and a supporting frame. The electrode plate module is set with a shielding cover (204). The signal feed-in module (201) comprises a waist section and a head section, wherein the head section is a rectangular-shaped signal feed-in surface. The head section of the signal feed-in module (201) is surface contacted with and is connected to the feed-in port of the electrode plate module. The feed-in port is set on the concave rectangular surface which is arranged in the central region of the back side of the cathode plate of the electrode plate module. The clamping unit can effectively remove standing wave effect and skin effect, improve the yields and reduce the costs.
摘要翻译：提供了用于沉积薄膜太阳能电池的夹紧单元和信号馈入方法。夹持单元包括电极板模块，信号馈入模块（201）和支撑框架。电极板模块设置有屏蔽盖（204）。信号馈入模块（201）包括腰部和头部，其中头部是矩形信号馈入表面。信号馈入模块（201）的头部与电极板模块的馈入口表面接触并连接到电极板模块的馈入口。馈入口设置在凹形矩形表面上，该矩形表面布置在电极板模块的阴极板的背面的中心区域中。夹紧单元可有效消除驻波效应和皮肤效应，提高产量，降低成本。

10. 发明公开

EP2417626A2 MULTIFREQUENCY CAPACITIVELY COUPLED PLASMA ETCH CHAMBER 审中-公开
标题翻译：等离子刻蚀与电容式多频率和功率
公开(公告)号：EP2417626A2
公开(公告)日：2012-02-15
申请号：EP10762275.5
申请日：2010-04-06
申请人： LAM Research Corporation
发明人： MARAKHTANOV, Alexei , DHINDSA, Rajinder , KOSHIISHI, Akira , FISCHER, Andreas
IPC分类号： H01L21/3065 , H05H1/34 , H05H1/36
CPC分类号： H01L21/2633 , C23C16/5096 , H01J37/32091 , H01J37/32165 , H01J37/32174 , H01J37/32532 , H01J37/32577
摘要： A plasma processing system for use with a gas. The plasma processing system comprises a first electrode, a second electrode, a gas input port, a power source and a passive circuit. The gas input port is operable to provide the gas between the first electrode and the second electrode. The power source is operable to ignite plasma from the gas between the first electrode and the second electrode. The passive circuit is coupled to the second electrode and is configured to adjust one or more of an impedance, a voltage potential, and a DC bias potential of the second electrode. The passive radio frequency circuit comprises a capacitor arranged in parallel with an inductor.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式